Patent
US 9,219,008GRAPHENE PATTERNING METHOD AND PATTERNING MEMBER
Takashi MATSUMOTO
US
Copyright © 2026 Matter42. All rights reserved.
Patent
Atlas literature
Patent
US 9,219,008Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a sectional view schematically show in g a configuration of a substrate process in g apparatus for perform in g a graphene pattern in g method accord …
FIG. 2 is a bottom view of a slot plate employed in the substrate process in g apparatus shown in
FIGS. 3A to 3C are diagrams schematically show in g a constitution of the patter ning member denoted in
FIGS. 4A to 4 D are diagrams show in g a process of the graphene pattern in g method 2 accord in g to an embodiment of the present disclosure [0014]
FIGS. 5 A to 5 C are diagrams for explai ni ng the structure of the graphene pattern formed on the substrate through the graphene patterning method of
FIG. 6 is a graph represent in g measured sheet resistance values of Examples 1 and 2 and Comparative Example 1 [0016]
FIG. 7 is a graph represent in g measured sheet resistance values of Examples 1 and 3 and Comparative Example 2
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A graphene patterning method for forming a graphene of a predetermined pattern, comprising: bringing a patterning member in which a catalyst metal layer of the predetermined pattern is formed into contact with a substrate having a graphene oxide film, wherein, in bringing the patterning member, the catalyst metal layer is brought into contact with the graphene oxide film under an environment in which a reducing gas exists.
The method of Claim 1, wherein at least one of the substrate and the patterning member is heated. 2 App l. No. 14/153,788 Attorney Docket No. 33027U Response to Office Action mailed
The method of Claim 1, wherein the catalyst metal layer comprises at least one metal selected from the group consisting of Cu, Ag, A u, Pt, Cr, Mn, Fe, Co, Ni and Mo.
The method of Claim 1, wherein the patterning member comprises a plurality of catalyst metal layers of the predetermined pattern making contact with portions of the substrate.
canceled
The method of Claim [[2]] 1, wherein plasma is generated from the reducing gas.
The method of Claim [[2]]1, wherein the reducing gas comprises at least one gas selected from the group consisting of a H 2 gas, an NH 3 gas, a H 4 N 2 gas, a CH 4 gas, a C 2 H 4 gas and a C 2 H 2 gas.
canceled
canceled
Layer stacks claimed or described, ordered top of device to substrate.
patterning member with catalyst metal layer
Materials described outside the worked examples.
graphene oxide film
catalyst metal layer
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
FIG. 6 is a graph represent in g measured sheet resistance values of Examples 1 and 2 and Comparative Example 1 [0016]
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Thickness | 1–50 nm | — |
Pressure |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 9,219,008Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a sectional view schematically show in g a configuration of a substrate process in g apparatus for perform in g a graphene pattern in g method accord …
FIG. 2 is a bottom view of a slot plate employed in the substrate process in g apparatus shown in
FIGS. 3A to 3C are diagrams schematically show in g a constitution of the patter ning member denoted in
FIGS. 4A to 4 D are diagrams show in g a process of the graphene pattern in g method 2 accord in g to an embodiment of the present disclosure [0014]
FIGS. 5 A to 5 C are diagrams for explai ni ng the structure of the graphene pattern formed on the substrate through the graphene patterning method of
FIG. 6 is a graph represent in g measured sheet resistance values of Examples 1 and 2 and Comparative Example 1 [0016]
FIG. 7 is a graph represent in g measured sheet resistance values of Examples 1 and 3 and Comparative Example 2
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A graphene patterning method for forming a graphene of a predetermined pattern, comprising: bringing a patterning member in which a catalyst metal layer of the predetermined pattern is formed into contact with a substrate having a graphene oxide film, wherein, in bringing the patterning member, the catalyst metal layer is brought into contact with the graphene oxide film under an environment in which a reducing gas exists.
The method of Claim 1, wherein at least one of the substrate and the patterning member is heated. 2 App l. No. 14/153,788 Attorney Docket No. 33027U Response to Office Action mailed
The method of Claim 1, wherein the catalyst metal layer comprises at least one metal selected from the group consisting of Cu, Ag, A u, Pt, Cr, Mn, Fe, Co, Ni and Mo.
The method of Claim 1, wherein the patterning member comprises a plurality of catalyst metal layers of the predetermined pattern making contact with portions of the substrate.
canceled
The method of Claim [[2]] 1, wherein plasma is generated from the reducing gas.
The method of Claim [[2]]1, wherein the reducing gas comprises at least one gas selected from the group consisting of a H 2 gas, an NH 3 gas, a H 4 N 2 gas, a CH 4 gas, a C 2 H 4 gas and a C 2 H 2 gas.
canceled
canceled
Layer stacks claimed or described, ordered top of device to substrate.
patterning member with catalyst metal layer
Materials described outside the worked examples.
graphene oxide film
catalyst metal layer
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
FIG. 6 is a graph represent in g measured sheet resistance values of Examples 1 and 2 and Comparative Example 1 [0016]
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Thickness | 1–50 nm | — |
Pressure |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 9,219,008Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a sectional view schematically show in g a configuration of a substrate process in g apparatus for perform in g a graphene pattern in g method accord …
FIG. 2 is a bottom view of a slot plate employed in the substrate process in g apparatus shown in
FIGS. 3A to 3C are diagrams schematically show in g a constitution of the patter ning member denoted in
FIGS. 4A to 4 D are diagrams show in g a process of the graphene pattern in g method 2 accord in g to an embodiment of the present disclosure [0014]
FIGS. 5 A to 5 C are diagrams for explai ni ng the structure of the graphene pattern formed on the substrate through the graphene patterning method of
FIG. 6 is a graph represent in g measured sheet resistance values of Examples 1 and 2 and Comparative Example 1 [0016]
FIG. 7 is a graph represent in g measured sheet resistance values of Examples 1 and 3 and Comparative Example 2
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A graphene patterning method for forming a graphene of a predetermined pattern, comprising: bringing a patterning member in which a catalyst metal layer of the predetermined pattern is formed into contact with a substrate having a graphene oxide film, wherein, in bringing the patterning member, the catalyst metal layer is brought into contact with the graphene oxide film under an environment in which a reducing gas exists.
The method of Claim 1, wherein at least one of the substrate and the patterning member is heated. 2 App l. No. 14/153,788 Attorney Docket No. 33027U Response to Office Action mailed
The method of Claim 1, wherein the catalyst metal layer comprises at least one metal selected from the group consisting of Cu, Ag, A u, Pt, Cr, Mn, Fe, Co, Ni and Mo.
The method of Claim 1, wherein the patterning member comprises a plurality of catalyst metal layers of the predetermined pattern making contact with portions of the substrate.
canceled
The method of Claim [[2]] 1, wherein plasma is generated from the reducing gas.
The method of Claim [[2]]1, wherein the reducing gas comprises at least one gas selected from the group consisting of a H 2 gas, an NH 3 gas, a H 4 N 2 gas, a CH 4 gas, a C 2 H 4 gas and a C 2 H 2 gas.
canceled
canceled
Layer stacks claimed or described, ordered top of device to substrate.
patterning member with catalyst metal layer
Materials described outside the worked examples.
graphene oxide film
catalyst metal layer
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
FIG. 6 is a graph represent in g measured sheet resistance values of Examples 1 and 2 and Comparative Example 1 [0016]
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Thickness | 1–50 nm | — |
Pressure |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 9,219,008Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a sectional view schematically show in g a configuration of a substrate process in g apparatus for perform in g a graphene pattern in g method accord …
FIG. 2 is a bottom view of a slot plate employed in the substrate process in g apparatus shown in
FIGS. 3A to 3C are diagrams schematically show in g a constitution of the patter ning member denoted in
FIGS. 4A to 4 D are diagrams show in g a process of the graphene pattern in g method 2 accord in g to an embodiment of the present disclosure [0014]
FIGS. 5 A to 5 C are diagrams for explai ni ng the structure of the graphene pattern formed on the substrate through the graphene patterning method of
FIG. 6 is a graph represent in g measured sheet resistance values of Examples 1 and 2 and Comparative Example 1 [0016]
FIG. 7 is a graph represent in g measured sheet resistance values of Examples 1 and 3 and Comparative Example 2
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A graphene patterning method for forming a graphene of a predetermined pattern, comprising: bringing a patterning member in which a catalyst metal layer of the predetermined pattern is formed into contact with a substrate having a graphene oxide film, wherein, in bringing the patterning member, the catalyst metal layer is brought into contact with the graphene oxide film under an environment in which a reducing gas exists.
The method of Claim 1, wherein at least one of the substrate and the patterning member is heated. 2 App l. No. 14/153,788 Attorney Docket No. 33027U Response to Office Action mailed
The method of Claim 1, wherein the catalyst metal layer comprises at least one metal selected from the group consisting of Cu, Ag, A u, Pt, Cr, Mn, Fe, Co, Ni and Mo.
The method of Claim 1, wherein the patterning member comprises a plurality of catalyst metal layers of the predetermined pattern making contact with portions of the substrate.
canceled
The method of Claim [[2]] 1, wherein plasma is generated from the reducing gas.
The method of Claim [[2]]1, wherein the reducing gas comprises at least one gas selected from the group consisting of a H 2 gas, an NH 3 gas, a H 4 N 2 gas, a CH 4 gas, a C 2 H 4 gas and a C 2 H 2 gas.
canceled
canceled
Layer stacks claimed or described, ordered top of device to substrate.
patterning member with catalyst metal layer
Materials described outside the worked examples.
graphene oxide film
catalyst metal layer
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
FIG. 6 is a graph represent in g measured sheet resistance values of Examples 1 and 2 and Comparative Example 1 [0016]
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Thickness | 1–50 nm | — |
Pressure |
Related documents with shared materials, methods, properties, or citations.
reducing gas
H₂ gas
H₂
NH₃ gas
NH₃
H₄N₂ gas
H₄N₂
CH₄ gas
CH₄
C₂H₄ gas
C₂H₄
C₂H₂ gas
C₂H₂
Cu
Ag
Au
Pt
Cr
Mn
Fe
Co
Ni
Mo
graphene
substrate
FIG. 7 is a graph represent in g measured sheet resistance values of Examples 1 and 3 and Comparative Example 2
| 1–10 Torr |
| — |
METHOD AND SYSTEM FOR PRODUCING GRAPHENE AND FUNCTIONALIZED GRAPHENE
METHOD OF FORMING A GRAPHENE STRUCTURE
reducing gas
H₂ gas
H₂
NH₃ gas
NH₃
H₄N₂ gas
H₄N₂
CH₄ gas
CH₄
C₂H₄ gas
C₂H₄
C₂H₂ gas
C₂H₂
Cu
Ag
Au
Pt
Cr
Mn
Fe
Co
Ni
Mo
graphene
substrate
FIG. 7 is a graph represent in g measured sheet resistance values of Examples 1 and 3 and Comparative Example 2
| 1–10 Torr |
| — |
METHOD AND SYSTEM FOR PRODUCING GRAPHENE AND FUNCTIONALIZED GRAPHENE
METHOD OF FORMING A GRAPHENE STRUCTURE
reducing gas
H₂ gas
H₂
NH₃ gas
NH₃
H₄N₂ gas
H₄N₂
CH₄ gas
CH₄
C₂H₄ gas
C₂H₄
C₂H₂ gas
C₂H₂
Cu
Ag
Au
Pt
Cr
Mn
Fe
Co
Ni
Mo
graphene
substrate
FIG. 7 is a graph represent in g measured sheet resistance values of Examples 1 and 3 and Comparative Example 2
| 1–10 Torr |
| — |
METHOD AND SYSTEM FOR PRODUCING GRAPHENE AND FUNCTIONALIZED GRAPHENE
METHOD OF FORMING A GRAPHENE STRUCTURE
reducing gas
H₂ gas
H₂
NH₃ gas
NH₃
H₄N₂ gas
H₄N₂
CH₄ gas
CH₄
C₂H₄ gas
C₂H₄
C₂H₂ gas
C₂H₂
Cu
Ag
Au
Pt
Cr
Mn
Fe
Co
Ni
Mo
graphene
substrate
FIG. 7 is a graph represent in g measured sheet resistance values of Examples 1 and 3 and Comparative Example 2
| 1–10 Torr |
| — |
METHOD AND SYSTEM FOR PRODUCING GRAPHENE AND FUNCTIONALIZED GRAPHENE