Patent
US 10,124,438METHOD OF PATTERNING GRAPHENE HOLES AND METHOD OF FABRICATING GRAPHENE TRANSPARENT ELECTRODE BY USING PULSE LASER
Jeongyub LEE
US
Copyright © 2026 Matter42. All rights reserved.
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Atlas literature
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US 10,124,438Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a schematic view of a laser system for performing a method of patterning graphene holes and a method of fabricating a graphene transparent electrode, …
FIG. 2 is a graph illustrating a pulse waveform of a laser beam emitted from a laser system; [0028]
FIG. 3 is a view illustrating hole patterns formed on a graphene layer, according to example embodiments; 3 Atty. Dkt. No. 2557S I -002415-US [0029]
FIG. 4 is a view of hole patterns formed on a graphene layer, according to example embodiments; [0030]
FIG. 5 is a graph illustrating a change in a transmittance and a surface resistance of a graphene layer according to a pulse width of a pulse laser; [0031]
FIG. 6 is a graph illustrating a change in a hole diameter of hole patterns formed on a graphene layer according to an average output of a pulse laser; [0032]
FIG. 7 is a graph illustrating a change of a hole interval of hole patterns formed on a graphene layer according to a scanning speed of a pulse laser; [0033]
FIG. 8 is a graph illustrating a change of a transmittance and a surface resistance according to a spacing of holes of hole patterns formed on a graphene …
FIG. 9 is a graph illustrating a change of a transmittance and a surface resistance according to an average output of a pulse laser.
FIG. 10) without damaging the flexible transparent substrate 150 (of
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of patterning graphene holes, the method comprising: placing a substrate on a stage of a laser system, the substrate having a graphene layer on a surface thereof; generating a pulse laser from the laser system; and forming a plurality of hole patterns spaced apart from each other on the graphene layer by irradiating the pulse laser while the graphene layer is in motion.
The method of claim 1, wherein the placing places a flexible transparent substrate.
The method of claim 1, further comprising: reducing a surface resistance of the graphene layer by performing chemical doping on the graphene layer.
The method of claim 1, wherein the forming forms the plurality of hole patterns on the graphene layer by one of moving the stage and scanning the pulse laser.
The method of claim 1, wherein the generating generates the pulse laser having a pulse width of about 1 ns to about 200 ns.
The method of claim 1, wherein the generating generates the pulse laser having an average output of about 20 mW to about 600 mW.
The method of claim 1, wherein 14 Atty. Dkt. No. 2557S 1 -002415-US the generating generates the pulse laser having a scanning speed of about 200 mm/s to about 1,000 mm/s.
The method of claim 1, wherein the generating generates the pulse laser having a repetition rate of about 3 kHz to about 100 kHz.
A method of fabricating a graphene transparent electrode, the method comprising: providing a flexible transparent substrate; forming a graphene layer on the flexible transparent substrate; placing the flexible transparent substrate onto a stage of a laser system; generating a pulse laser from the laser system; and forming a plurality of hole patterns spaced apart from each other on the graphene layer by irradiating the pulse laser while the graphene layer is in motion.
The method of claim 10, wherein the generating generates the pulse laser having a wavelength of about 400 nm to about 1200 nm.
The method of claim 10, further comprising: reducing a surface resistance of the graphene layer by performing chemical doping on the graphene layer.
The method of claim 10, wherein the forming forms the plurality of hole patterns on the graphene layer by one of moving the stage and scanning the pulse laser.
The method of claim 10, wherein the generating generates the pulse laser having a pulse width of about 1 ns to about 200 ns.
The method of claim 10, wherein 15 Atty. Dkt. No. 2557S 1 -002415-US the generating generates the pulse laser having an average output of about 20 mW to about 600 mW.
The method of claim 10, wherein the generating generates the pulse laser having a scanning speed of about 200 mm/s to about 1,000 mm/s.
The method of claim 10, wherein the generating generates the pulse laser having a repetition rate of about 3 kHz to about 100 kHz. 16
Layer stacks claimed or described, ordered top of device to substrate.
graphene transparent electrode
Materials described outside the worked examples.
graphene
flexible transparent substrate
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
FIG. 2 is a graph illustrating a pulse waveform of a laser beam emitted from a laser system; [0028]
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Thickness | 400–1200 nm | — |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 10,124,438Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a schematic view of a laser system for performing a method of patterning graphene holes and a method of fabricating a graphene transparent electrode, …
FIG. 2 is a graph illustrating a pulse waveform of a laser beam emitted from a laser system; [0028]
FIG. 3 is a view illustrating hole patterns formed on a graphene layer, according to example embodiments; 3 Atty. Dkt. No. 2557S I -002415-US [0029]
FIG. 4 is a view of hole patterns formed on a graphene layer, according to example embodiments; [0030]
FIG. 5 is a graph illustrating a change in a transmittance and a surface resistance of a graphene layer according to a pulse width of a pulse laser; [0031]
FIG. 6 is a graph illustrating a change in a hole diameter of hole patterns formed on a graphene layer according to an average output of a pulse laser; [0032]
FIG. 7 is a graph illustrating a change of a hole interval of hole patterns formed on a graphene layer according to a scanning speed of a pulse laser; [0033]
FIG. 8 is a graph illustrating a change of a transmittance and a surface resistance according to a spacing of holes of hole patterns formed on a graphene …
FIG. 9 is a graph illustrating a change of a transmittance and a surface resistance according to an average output of a pulse laser.
FIG. 10) without damaging the flexible transparent substrate 150 (of
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of patterning graphene holes, the method comprising: placing a substrate on a stage of a laser system, the substrate having a graphene layer on a surface thereof; generating a pulse laser from the laser system; and forming a plurality of hole patterns spaced apart from each other on the graphene layer by irradiating the pulse laser while the graphene layer is in motion.
The method of claim 1, wherein the placing places a flexible transparent substrate.
The method of claim 1, further comprising: reducing a surface resistance of the graphene layer by performing chemical doping on the graphene layer.
The method of claim 1, wherein the forming forms the plurality of hole patterns on the graphene layer by one of moving the stage and scanning the pulse laser.
The method of claim 1, wherein the generating generates the pulse laser having a pulse width of about 1 ns to about 200 ns.
The method of claim 1, wherein the generating generates the pulse laser having an average output of about 20 mW to about 600 mW.
The method of claim 1, wherein 14 Atty. Dkt. No. 2557S 1 -002415-US the generating generates the pulse laser having a scanning speed of about 200 mm/s to about 1,000 mm/s.
The method of claim 1, wherein the generating generates the pulse laser having a repetition rate of about 3 kHz to about 100 kHz.
A method of fabricating a graphene transparent electrode, the method comprising: providing a flexible transparent substrate; forming a graphene layer on the flexible transparent substrate; placing the flexible transparent substrate onto a stage of a laser system; generating a pulse laser from the laser system; and forming a plurality of hole patterns spaced apart from each other on the graphene layer by irradiating the pulse laser while the graphene layer is in motion.
The method of claim 10, wherein the generating generates the pulse laser having a wavelength of about 400 nm to about 1200 nm.
The method of claim 10, further comprising: reducing a surface resistance of the graphene layer by performing chemical doping on the graphene layer.
The method of claim 10, wherein the forming forms the plurality of hole patterns on the graphene layer by one of moving the stage and scanning the pulse laser.
The method of claim 10, wherein the generating generates the pulse laser having a pulse width of about 1 ns to about 200 ns.
The method of claim 10, wherein 15 Atty. Dkt. No. 2557S 1 -002415-US the generating generates the pulse laser having an average output of about 20 mW to about 600 mW.
The method of claim 10, wherein the generating generates the pulse laser having a scanning speed of about 200 mm/s to about 1,000 mm/s.
The method of claim 10, wherein the generating generates the pulse laser having a repetition rate of about 3 kHz to about 100 kHz. 16
Layer stacks claimed or described, ordered top of device to substrate.
graphene transparent electrode
Materials described outside the worked examples.
graphene
flexible transparent substrate
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
FIG. 2 is a graph illustrating a pulse waveform of a laser beam emitted from a laser system; [0028]
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Thickness | 400–1200 nm | — |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 10,124,438Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a schematic view of a laser system for performing a method of patterning graphene holes and a method of fabricating a graphene transparent electrode, …
FIG. 2 is a graph illustrating a pulse waveform of a laser beam emitted from a laser system; [0028]
FIG. 3 is a view illustrating hole patterns formed on a graphene layer, according to example embodiments; 3 Atty. Dkt. No. 2557S I -002415-US [0029]
FIG. 4 is a view of hole patterns formed on a graphene layer, according to example embodiments; [0030]
FIG. 5 is a graph illustrating a change in a transmittance and a surface resistance of a graphene layer according to a pulse width of a pulse laser; [0031]
FIG. 6 is a graph illustrating a change in a hole diameter of hole patterns formed on a graphene layer according to an average output of a pulse laser; [0032]
FIG. 7 is a graph illustrating a change of a hole interval of hole patterns formed on a graphene layer according to a scanning speed of a pulse laser; [0033]
FIG. 8 is a graph illustrating a change of a transmittance and a surface resistance according to a spacing of holes of hole patterns formed on a graphene …
FIG. 9 is a graph illustrating a change of a transmittance and a surface resistance according to an average output of a pulse laser.
FIG. 10) without damaging the flexible transparent substrate 150 (of
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of patterning graphene holes, the method comprising: placing a substrate on a stage of a laser system, the substrate having a graphene layer on a surface thereof; generating a pulse laser from the laser system; and forming a plurality of hole patterns spaced apart from each other on the graphene layer by irradiating the pulse laser while the graphene layer is in motion.
The method of claim 1, wherein the placing places a flexible transparent substrate.
The method of claim 1, further comprising: reducing a surface resistance of the graphene layer by performing chemical doping on the graphene layer.
The method of claim 1, wherein the forming forms the plurality of hole patterns on the graphene layer by one of moving the stage and scanning the pulse laser.
The method of claim 1, wherein the generating generates the pulse laser having a pulse width of about 1 ns to about 200 ns.
The method of claim 1, wherein the generating generates the pulse laser having an average output of about 20 mW to about 600 mW.
The method of claim 1, wherein 14 Atty. Dkt. No. 2557S 1 -002415-US the generating generates the pulse laser having a scanning speed of about 200 mm/s to about 1,000 mm/s.
The method of claim 1, wherein the generating generates the pulse laser having a repetition rate of about 3 kHz to about 100 kHz.
A method of fabricating a graphene transparent electrode, the method comprising: providing a flexible transparent substrate; forming a graphene layer on the flexible transparent substrate; placing the flexible transparent substrate onto a stage of a laser system; generating a pulse laser from the laser system; and forming a plurality of hole patterns spaced apart from each other on the graphene layer by irradiating the pulse laser while the graphene layer is in motion.
The method of claim 10, wherein the generating generates the pulse laser having a wavelength of about 400 nm to about 1200 nm.
The method of claim 10, further comprising: reducing a surface resistance of the graphene layer by performing chemical doping on the graphene layer.
The method of claim 10, wherein the forming forms the plurality of hole patterns on the graphene layer by one of moving the stage and scanning the pulse laser.
The method of claim 10, wherein the generating generates the pulse laser having a pulse width of about 1 ns to about 200 ns.
The method of claim 10, wherein 15 Atty. Dkt. No. 2557S 1 -002415-US the generating generates the pulse laser having an average output of about 20 mW to about 600 mW.
The method of claim 10, wherein the generating generates the pulse laser having a scanning speed of about 200 mm/s to about 1,000 mm/s.
The method of claim 10, wherein the generating generates the pulse laser having a repetition rate of about 3 kHz to about 100 kHz. 16
Layer stacks claimed or described, ordered top of device to substrate.
graphene transparent electrode
Materials described outside the worked examples.
graphene
flexible transparent substrate
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
FIG. 2 is a graph illustrating a pulse waveform of a laser beam emitted from a laser system; [0028]
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Thickness | 400–1200 nm | — |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 10,124,438Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a schematic view of a laser system for performing a method of patterning graphene holes and a method of fabricating a graphene transparent electrode, …
FIG. 2 is a graph illustrating a pulse waveform of a laser beam emitted from a laser system; [0028]
FIG. 3 is a view illustrating hole patterns formed on a graphene layer, according to example embodiments; 3 Atty. Dkt. No. 2557S I -002415-US [0029]
FIG. 4 is a view of hole patterns formed on a graphene layer, according to example embodiments; [0030]
FIG. 5 is a graph illustrating a change in a transmittance and a surface resistance of a graphene layer according to a pulse width of a pulse laser; [0031]
FIG. 6 is a graph illustrating a change in a hole diameter of hole patterns formed on a graphene layer according to an average output of a pulse laser; [0032]
FIG. 7 is a graph illustrating a change of a hole interval of hole patterns formed on a graphene layer according to a scanning speed of a pulse laser; [0033]
FIG. 8 is a graph illustrating a change of a transmittance and a surface resistance according to a spacing of holes of hole patterns formed on a graphene …
FIG. 9 is a graph illustrating a change of a transmittance and a surface resistance according to an average output of a pulse laser.
FIG. 10) without damaging the flexible transparent substrate 150 (of
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of patterning graphene holes, the method comprising: placing a substrate on a stage of a laser system, the substrate having a graphene layer on a surface thereof; generating a pulse laser from the laser system; and forming a plurality of hole patterns spaced apart from each other on the graphene layer by irradiating the pulse laser while the graphene layer is in motion.
The method of claim 1, wherein the placing places a flexible transparent substrate.
The method of claim 1, further comprising: reducing a surface resistance of the graphene layer by performing chemical doping on the graphene layer.
The method of claim 1, wherein the forming forms the plurality of hole patterns on the graphene layer by one of moving the stage and scanning the pulse laser.
The method of claim 1, wherein the generating generates the pulse laser having a pulse width of about 1 ns to about 200 ns.
The method of claim 1, wherein the generating generates the pulse laser having an average output of about 20 mW to about 600 mW.
The method of claim 1, wherein 14 Atty. Dkt. No. 2557S 1 -002415-US the generating generates the pulse laser having a scanning speed of about 200 mm/s to about 1,000 mm/s.
The method of claim 1, wherein the generating generates the pulse laser having a repetition rate of about 3 kHz to about 100 kHz.
A method of fabricating a graphene transparent electrode, the method comprising: providing a flexible transparent substrate; forming a graphene layer on the flexible transparent substrate; placing the flexible transparent substrate onto a stage of a laser system; generating a pulse laser from the laser system; and forming a plurality of hole patterns spaced apart from each other on the graphene layer by irradiating the pulse laser while the graphene layer is in motion.
The method of claim 10, wherein the generating generates the pulse laser having a wavelength of about 400 nm to about 1200 nm.
The method of claim 10, further comprising: reducing a surface resistance of the graphene layer by performing chemical doping on the graphene layer.
The method of claim 10, wherein the forming forms the plurality of hole patterns on the graphene layer by one of moving the stage and scanning the pulse laser.
The method of claim 10, wherein the generating generates the pulse laser having a pulse width of about 1 ns to about 200 ns.
The method of claim 10, wherein 15 Atty. Dkt. No. 2557S 1 -002415-US the generating generates the pulse laser having an average output of about 20 mW to about 600 mW.
The method of claim 10, wherein the generating generates the pulse laser having a scanning speed of about 200 mm/s to about 1,000 mm/s.
The method of claim 10, wherein the generating generates the pulse laser having a repetition rate of about 3 kHz to about 100 kHz. 16
Layer stacks claimed or described, ordered top of device to substrate.
graphene transparent electrode
Materials described outside the worked examples.
graphene
flexible transparent substrate
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
FIG. 2 is a graph illustrating a pulse waveform of a laser beam emitted from a laser system; [0028]
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Thickness | 400–1200 nm | — |
Related documents with shared materials, methods, properties, or citations.
polyethylenenaphthalate
polyethyleneterephthalate
polycarbonate
polyimide
polyethersulfone
FIG. 5 is a graph illustrating a change in a transmittance and a surface resistance of a graphene layer according to a pulse width of a pulse laser; [0031]
FIG. 6 is a graph illustrating a change in a hole diameter of hole patterns formed on a graphene layer according to an average output of a pulse laser; [0032]
FIG. 7 is a graph illustrating a change of a hole interval of hole patterns formed on a graphene layer according to a scanning speed of a pulse laser; [0033]
FIG. 8 is a graph illustrating a change of a transmittance and a surface resistance according to a spacing of holes of hole patterns formed on a graphene …
FIG. 9 is a graph illustrating a change of a transmittance and a surface resistance according to an average output of a pulse laser.
polyethylenenaphthalate
polyethyleneterephthalate
polycarbonate
polyimide
polyethersulfone
FIG. 5 is a graph illustrating a change in a transmittance and a surface resistance of a graphene layer according to a pulse width of a pulse laser; [0031]
FIG. 6 is a graph illustrating a change in a hole diameter of hole patterns formed on a graphene layer according to an average output of a pulse laser; [0032]
FIG. 7 is a graph illustrating a change of a hole interval of hole patterns formed on a graphene layer according to a scanning speed of a pulse laser; [0033]
FIG. 8 is a graph illustrating a change of a transmittance and a surface resistance according to a spacing of holes of hole patterns formed on a graphene …
FIG. 9 is a graph illustrating a change of a transmittance and a surface resistance according to an average output of a pulse laser.
polyethylenenaphthalate
polyethyleneterephthalate
polycarbonate
polyimide
polyethersulfone
FIG. 5 is a graph illustrating a change in a transmittance and a surface resistance of a graphene layer according to a pulse width of a pulse laser; [0031]
FIG. 6 is a graph illustrating a change in a hole diameter of hole patterns formed on a graphene layer according to an average output of a pulse laser; [0032]
FIG. 7 is a graph illustrating a change of a hole interval of hole patterns formed on a graphene layer according to a scanning speed of a pulse laser; [0033]
FIG. 8 is a graph illustrating a change of a transmittance and a surface resistance according to a spacing of holes of hole patterns formed on a graphene …
FIG. 9 is a graph illustrating a change of a transmittance and a surface resistance according to an average output of a pulse laser.
polyethylenenaphthalate
polyethyleneterephthalate
polycarbonate
polyimide
polyethersulfone
FIG. 5 is a graph illustrating a change in a transmittance and a surface resistance of a graphene layer according to a pulse width of a pulse laser; [0031]
FIG. 6 is a graph illustrating a change in a hole diameter of hole patterns formed on a graphene layer according to an average output of a pulse laser; [0032]
FIG. 7 is a graph illustrating a change of a hole interval of hole patterns formed on a graphene layer according to a scanning speed of a pulse laser; [0033]
FIG. 8 is a graph illustrating a change of a transmittance and a surface resistance according to a spacing of holes of hole patterns formed on a graphene …
FIG. 9 is a graph illustrating a change of a transmittance and a surface resistance according to an average output of a pulse laser.