DIRECT CHEMICAL VAPOR DEPOSITION OF GRAPHENE ON DIELECTRIC SURFACES

Yuegang Zhang

Patent

Atlas literature

Patent

US 8,709,881

DIRECT CHEMICAL VAPOR DEPOSITION OF GRAPHENE ON DIELECTRIC SURFACES

Yuegang Zhang

Claims

Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.

5 independent · 26 dependent

1
Independenttwo-dimensional (2-D) materialCu
A method of providing a two-dimensional (2-D) material on a substrate, comprising: providing the substrate having a substrate surface and a metallic layer formed on the substrate surface, wherein the metallic layer has a metallic surface; depositing a ﬁlm on the metallic surface, wherein the ﬁlm comprises the 2-D material; and dewetting the metallic layer so that the ﬁlm is provided on the substrate surface.
1. 2
  Dependent← claim 1
  The method of claim 1, further comprising removing the metallic layer.
2. 4
  Dependent← claim 1dielectric material
  The method of claim 1, wherein the substrate further comprises a wafer formed from a dielectric material and the substrate surface is a surface of the wafer.
3. 6
  Dependent← claim 1dielectric material
  The method of claim 1, wherein the substrate comprises an insulating layer formed from a dielectric material, wherein the substrate surface comprises a surface of the insulating layer.
4. 9
  Dependent← claim 1
  The method of claim 1, wherein providing the substrate having the substrate surface and the metallic layer formed on the substrate surface further comprises forming the metallic layer on the substrate surface.
5. 11
  Dependent← claim 1
  The method of claim 1, further comprising heating the substrate.
6. 17
  Dependent← claim 1grapheneBN
  The method of claim 1, wherein the 2-D material is selected from a group comprising graphene and boron-nitride.
19
IndependentgrapheneCu
A method of creating graphene, comprising: providing a substrate having a substrate surface and a metallic layer formed on the substrate surface, wherein the metallic layer has a metallic surface; depositing a carbon-based ﬁlm on the metallic surface, wherein the carbon-based ﬁlm comprises the graphene; and dewetting the metallic layer so that the carbon-based ﬁlm is provided on the substrate surface.
1. 20
  Dependent← claim 19
  The method of claim 19, further comprising removing the metallic layer.
2. 22
  Dependent← claim 19graphene
  The method of claim 19, wherein the carbon-based ﬁlm has a location with a Raman signature that measures intensity in arbitrary units versus Raman shift in cm I and the Raman signature has a G-band and G'-band with a ratio between a peak intensity of a G-band and a peak intensity of the G'-band that is less than one (1) after the carbon-based ﬁlm is provided on the substrate surface.
3. 23
  Dependent← claim 19
  The method of claim 19, wherein providing the substrate having the substrate surface and the metallic layer formed on the substrate surface includes providing the metallic layer with a thickness between about 20 nanometers to 1 micrometer.
4. 26
  Dependent← claim 19
  The method of claim 19, further comprising heating the substrate. 4 SVG 13098929.12-03-2013.HORLDX₁BPXXIFW3.CLM₈071580.1.276.134.2222.182.svg 0.16 6.487 Graph Black and white
5. 28
  Dependent← claim 19graphene
  The method of claim 19, wherein the graphene is either single-layer graphene or few-layer graphene. 29-31..
29
Independent
canceled
30
Independent
canceled
31
Independent
canceled

Materials

Materials described outside the worked examples.

two-dimensional (2-D) material

Film Material Deposited On Metallic Surface

copper

Metallic Layer (Catalyst)

Process steps

Additional fabrication and treatment steps described in the patent.

Electron Beam Physical Vapor Deposition

Step 1

Process details

description:Forming the metallic layer on the substrate surface by an electron-beam physical vapor deposition process

Materials:Cu

Reported properties

Performance values and ranges asserted in the specification or claims.

Property	Value	Material
Raman I(G)/I(G') ratio for graphene film on substrate surface	≤ 1 dimensionless	graphene
Thickness	20–1000 nm

Why these are connected

Related documents with shared materials, methods, properties, or citations.

DIRECT CHEMICAL VAPOR DEPOSITION OF GRAPHENE ON DIELECTRIC SURFACES | Matter42 Literature