Research paper
Experimental GrowthExperimental CharacterizationComputational DFTEach sample groups how it was prepared, characterized, and measured. Click a card to expand.
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
1 preparation5 characterizations8 properties5 figures
1 preparation5 characterizations9 properties5 figures
1 preparation1 characterization2 properties
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Formation Energy | oxygen vacancy formation energy | 1.055eV | — | — | ||
| Formation Energy | oxygen vacancy formation energy | 1.775eV | — | — | ||
| Formation Energy | S interstitial incorporation in WO₃ | 3.44eV | — | — | ||
| Formation Energy | S incorporation on oxygen vacancy site in WO₃ | 2.55eV | — | — | ||
| Adsorption Energy | S adsorption on WO₃(001) oxygen vacancy site | -1.256eV | — | — | ||
| Pl Intensity Enhancement Factor | overall PL emission enhancement | 40 | — | |||
| Pl Peak Fwhm | A-exciton/PL peak width | decreases with precursor growth temperature | — | |||
| Domain Size | typical grain size | 200nm | — | |||
| Domain Size | triangle edge length | 18-26um | — | |||
| Domain Size | grain size | ~200nm | — | |||
| Layer Fraction | layer distribution | primarily monolayer with smaller bilayer contribution | — | |||
| Layer Fraction | layer distribution | monolayer and multilayer patches present | — | |||
| Defect Assignment | dominant defect type | W vacancies are dominant intrinsic defects in mono- and bilayers WS2 | — | |||
| Grain Boundary Type | bilayer grain-boundary description | AA' and AB-oriented coalescence; turbostatic moiré patterns in distinct grain boundaries | — | |||
| Xps Binding Energy | W 4f7/2 | 35.9eV | WO₃-x precursor film grown by PLD on sapphire in O₂ at 500 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 600 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 700 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 800 °WO₃-x precursor film grown by PLD on sapphire in Ar at 500 °WO₃-x precursor film grown by PLD on sapphire in Ar at 800 ° | — | ||
| Xps Binding Energy | W 4f7/2 | 34.7eV | WO₃-x precursor film grown by PLD on sapphire in O₂ at 500 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 600 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 700 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 800 °WO₃-x precursor film grown by PLD on sapphire in Ar at 500 °WO₃-x precursor film grown by PLD on sapphire in Ar at 800 ° | — | ||
| Xps Binding Energy | W 4f7/2 | 32.6eV | — | |||
| Xps Binding Energy | W 4f7/2 | 32eV | — | |||
| Xps Binding Energy | W 4f7/2 | 36eV | — | |||
| Xps Peak Fwhm | W 4f7/2 | 0.7eV | — |
Related documents with shared materials, methods, properties, or citations.
Liquid Metal Printed Ultrathin Oxides for Monolayer WS2 Top-Gate Transistors
Interlayer Exciton–Phonon Bound State in Bi2Se3/monolayer WS2 van der Waals Heterostructures
Scalable Synthesis of Large-Area WS2 Thin Films from Tungsten Precursors by Thermal CVD and Their Application in Schottky-Barrier Solar Cells
Fe-assisted epitaxial growth of 4-inch single-crystal transition-metal dichalcogenides on c-plane sapphire without miscut angle
Enhancement of Second Harmonic Generation in Monolayer WS2 by Feedback-Based Wavefront Shaping
GRAPHENE SHEET AND METHOD FOR PRODUCING THE SAME
Dative epitaxy of commensurate monocrystalline covalent-van der Waals moiré supercrystal
Observation of Topological Nodal-Ring Phonons in Monolayer Hexagonal Boron Nitride
METHOD FOR FORMING HEXAGONAL BORON NITRIDE THIN FILM, METHOD FOR FORMING MULTI-LAYERED STRUCTURE AND METHOD FOR MANUFACTURING SWITCHING ELEMENT USING THE SAME
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Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
1 preparation5 characterizations8 properties5 figures
1 preparation5 characterizations9 properties5 figures
1 preparation1 characterization2 properties
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Formation Energy | oxygen vacancy formation energy | 1.055eV | — | — | ||
| Formation Energy | oxygen vacancy formation energy | 1.775eV | — | — | ||
| Formation Energy | S interstitial incorporation in WO₃ | 3.44eV | — | — | ||
| Formation Energy | S incorporation on oxygen vacancy site in WO₃ | 2.55eV | — | — | ||
| Adsorption Energy | S adsorption on WO₃(001) oxygen vacancy site | -1.256eV | — | — | ||
| Pl Intensity Enhancement Factor | overall PL emission enhancement | 40 | — | |||
| Pl Peak Fwhm | A-exciton/PL peak width | decreases with precursor growth temperature | — | |||
| Domain Size | typical grain size | 200nm | — | |||
| Domain Size | triangle edge length | 18-26um | — | |||
| Domain Size | grain size | ~200nm | — | |||
| Layer Fraction | layer distribution | primarily monolayer with smaller bilayer contribution | — | |||
| Layer Fraction | layer distribution | monolayer and multilayer patches present | — | |||
| Defect Assignment | dominant defect type | W vacancies are dominant intrinsic defects in mono- and bilayers WS2 | — | |||
| Grain Boundary Type | bilayer grain-boundary description | AA' and AB-oriented coalescence; turbostatic moiré patterns in distinct grain boundaries | — | |||
| Xps Binding Energy | W 4f7/2 | 35.9eV | WO₃-x precursor film grown by PLD on sapphire in O₂ at 500 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 600 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 700 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 800 °WO₃-x precursor film grown by PLD on sapphire in Ar at 500 °WO₃-x precursor film grown by PLD on sapphire in Ar at 800 ° | — | ||
| Xps Binding Energy | W 4f7/2 | 34.7eV | WO₃-x precursor film grown by PLD on sapphire in O₂ at 500 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 600 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 700 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 800 °WO₃-x precursor film grown by PLD on sapphire in Ar at 500 °WO₃-x precursor film grown by PLD on sapphire in Ar at 800 ° | — | ||
| Xps Binding Energy | W 4f7/2 | 32.6eV | — | |||
| Xps Binding Energy | W 4f7/2 | 32eV | — | |||
| Xps Binding Energy | W 4f7/2 | 36eV | — | |||
| Xps Peak Fwhm | W 4f7/2 | 0.7eV | — |
Related documents with shared materials, methods, properties, or citations.
Liquid Metal Printed Ultrathin Oxides for Monolayer WS2 Top-Gate Transistors
Interlayer Exciton–Phonon Bound State in Bi2Se3/monolayer WS2 van der Waals Heterostructures
Scalable Synthesis of Large-Area WS2 Thin Films from Tungsten Precursors by Thermal CVD and Their Application in Schottky-Barrier Solar Cells
Fe-assisted epitaxial growth of 4-inch single-crystal transition-metal dichalcogenides on c-plane sapphire without miscut angle
Enhancement of Second Harmonic Generation in Monolayer WS2 by Feedback-Based Wavefront Shaping
GRAPHENE SHEET AND METHOD FOR PRODUCING THE SAME
Dative epitaxy of commensurate monocrystalline covalent-van der Waals moiré supercrystal
Observation of Topological Nodal-Ring Phonons in Monolayer Hexagonal Boron Nitride
METHOD FOR FORMING HEXAGONAL BORON NITRIDE THIN FILM, METHOD FOR FORMING MULTI-LAYERED STRUCTURE AND METHOD FOR MANUFACTURING SWITCHING ELEMENT USING THE SAME
Preferred Synthesis of Armchair Transition Metal Dichalcogenide Nanotubes
Toward All 2D-based Printed Raindrop Triboelectric Nanogenerators
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
1 preparation5 characterizations8 properties5 figures
1 preparation5 characterizations9 properties5 figures
1 preparation1 characterization2 properties
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Formation Energy | oxygen vacancy formation energy | 1.055eV | — | — | ||
| Formation Energy | oxygen vacancy formation energy | 1.775eV | — | — | ||
| Formation Energy | S interstitial incorporation in WO₃ | 3.44eV | — | — | ||
| Formation Energy | S incorporation on oxygen vacancy site in WO₃ | 2.55eV | — | — | ||
| Adsorption Energy | S adsorption on WO₃(001) oxygen vacancy site | -1.256eV | — | — | ||
| Pl Intensity Enhancement Factor | overall PL emission enhancement | 40 | — | |||
| Pl Peak Fwhm | A-exciton/PL peak width | decreases with precursor growth temperature | — | |||
| Domain Size | typical grain size | 200nm | — | |||
| Domain Size | triangle edge length | 18-26um | — | |||
| Domain Size | grain size | ~200nm | — | |||
| Layer Fraction | layer distribution | primarily monolayer with smaller bilayer contribution | — | |||
| Layer Fraction | layer distribution | monolayer and multilayer patches present | — | |||
| Defect Assignment | dominant defect type | W vacancies are dominant intrinsic defects in mono- and bilayers WS2 | — | |||
| Grain Boundary Type | bilayer grain-boundary description | AA' and AB-oriented coalescence; turbostatic moiré patterns in distinct grain boundaries | — | |||
| Xps Binding Energy | W 4f7/2 | 35.9eV | WO₃-x precursor film grown by PLD on sapphire in O₂ at 500 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 600 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 700 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 800 °WO₃-x precursor film grown by PLD on sapphire in Ar at 500 °WO₃-x precursor film grown by PLD on sapphire in Ar at 800 ° | — | ||
| Xps Binding Energy | W 4f7/2 | 34.7eV | WO₃-x precursor film grown by PLD on sapphire in O₂ at 500 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 600 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 700 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 800 °WO₃-x precursor film grown by PLD on sapphire in Ar at 500 °WO₃-x precursor film grown by PLD on sapphire in Ar at 800 ° | — | ||
| Xps Binding Energy | W 4f7/2 | 32.6eV | — | |||
| Xps Binding Energy | W 4f7/2 | 32eV | — | |||
| Xps Binding Energy | W 4f7/2 | 36eV | — | |||
| Xps Peak Fwhm | W 4f7/2 | 0.7eV | — |
Related documents with shared materials, methods, properties, or citations.
Liquid Metal Printed Ultrathin Oxides for Monolayer WS2 Top-Gate Transistors
Interlayer Exciton–Phonon Bound State in Bi2Se3/monolayer WS2 van der Waals Heterostructures
Scalable Synthesis of Large-Area WS2 Thin Films from Tungsten Precursors by Thermal CVD and Their Application in Schottky-Barrier Solar Cells
Fe-assisted epitaxial growth of 4-inch single-crystal transition-metal dichalcogenides on c-plane sapphire without miscut angle
Enhancement of Second Harmonic Generation in Monolayer WS2 by Feedback-Based Wavefront Shaping
GRAPHENE SHEET AND METHOD FOR PRODUCING THE SAME
Dative epitaxy of commensurate monocrystalline covalent-van der Waals moiré supercrystal
Observation of Topological Nodal-Ring Phonons in Monolayer Hexagonal Boron Nitride
METHOD FOR FORMING HEXAGONAL BORON NITRIDE THIN FILM, METHOD FOR FORMING MULTI-LAYERED STRUCTURE AND METHOD FOR MANUFACTURING SWITCHING ELEMENT USING THE SAME
Preferred Synthesis of Armchair Transition Metal Dichalcogenide Nanotubes
Toward All 2D-based Printed Raindrop Triboelectric Nanogenerators
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
2 preparations1 characterization2 properties1 figure
1 preparation5 characterizations8 properties5 figures
1 preparation5 characterizations9 properties5 figures
1 preparation1 characterization2 properties
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Formation Energy | oxygen vacancy formation energy | 1.055eV | — | — | ||
| Formation Energy | oxygen vacancy formation energy | 1.775eV | — | — | ||
| Formation Energy | S interstitial incorporation in WO₃ | 3.44eV | — | — | ||
| Formation Energy | S incorporation on oxygen vacancy site in WO₃ | 2.55eV | — | — | ||
| Adsorption Energy | S adsorption on WO₃(001) oxygen vacancy site | -1.256eV | — | — | ||
| Pl Intensity Enhancement Factor | overall PL emission enhancement | 40 | — | |||
| Pl Peak Fwhm | A-exciton/PL peak width | decreases with precursor growth temperature | — | |||
| Domain Size | typical grain size | 200nm | — | |||
| Domain Size | triangle edge length | 18-26um | — | |||
| Domain Size | grain size | ~200nm | — | |||
| Layer Fraction | layer distribution | primarily monolayer with smaller bilayer contribution | — | |||
| Layer Fraction | layer distribution | monolayer and multilayer patches present | — | |||
| Defect Assignment | dominant defect type | W vacancies are dominant intrinsic defects in mono- and bilayers WS2 | — | |||
| Grain Boundary Type | bilayer grain-boundary description | AA' and AB-oriented coalescence; turbostatic moiré patterns in distinct grain boundaries | — | |||
| Xps Binding Energy | W 4f7/2 | 35.9eV | WO₃-x precursor film grown by PLD on sapphire in O₂ at 500 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 600 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 700 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 800 °WO₃-x precursor film grown by PLD on sapphire in Ar at 500 °WO₃-x precursor film grown by PLD on sapphire in Ar at 800 ° | — | ||
| Xps Binding Energy | W 4f7/2 | 34.7eV | WO₃-x precursor film grown by PLD on sapphire in O₂ at 500 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 600 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 700 °WO₃-x precursor film grown by PLD on sapphire in O₂ at 800 °WO₃-x precursor film grown by PLD on sapphire in Ar at 500 °WO₃-x precursor film grown by PLD on sapphire in Ar at 800 ° | — | ||
| Xps Binding Energy | W 4f7/2 | 32.6eV | — | |||
| Xps Binding Energy | W 4f7/2 | 32eV | — | |||
| Xps Binding Energy | W 4f7/2 | 36eV | — | |||
| Xps Peak Fwhm | W 4f7/2 | 0.7eV | — |
Related documents with shared materials, methods, properties, or citations.
Liquid Metal Printed Ultrathin Oxides for Monolayer WS2 Top-Gate Transistors
Interlayer Exciton–Phonon Bound State in Bi2Se3/monolayer WS2 van der Waals Heterostructures
Scalable Synthesis of Large-Area WS2 Thin Films from Tungsten Precursors by Thermal CVD and Their Application in Schottky-Barrier Solar Cells
Fe-assisted epitaxial growth of 4-inch single-crystal transition-metal dichalcogenides on c-plane sapphire without miscut angle
Enhancement of Second Harmonic Generation in Monolayer WS2 by Feedback-Based Wavefront Shaping
GRAPHENE SHEET AND METHOD FOR PRODUCING THE SAME
Dative epitaxy of commensurate monocrystalline covalent-van der Waals moiré supercrystal
Observation of Topological Nodal-Ring Phonons in Monolayer Hexagonal Boron Nitride
METHOD FOR FORMING HEXAGONAL BORON NITRIDE THIN FILM, METHOD FOR FORMING MULTI-LAYERED STRUCTURE AND METHOD FOR MANUFACTURING SWITCHING ELEMENT USING THE SAME
Preferred Synthesis of Armchair Transition Metal Dichalcogenide Nanotubes
Toward All 2D-based Printed Raindrop Triboelectric Nanogenerators