Patent
US 9,272,910Title: METHODS OF NONDESTRUCTIVELY DELAMINATING GRAPHENE FROM A M ETAL SUBSTRATE
LOH Kian Ping, WANG Yu
28 March 2013·US
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Atlas literature
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US 9,272,910Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1. The electrochemical apparatus 10 of
FIG. 2B. The electrochemical apparatus 10 includes an extra take-up roller 120 so that the two SL-G structures 86 are taken up by respective take-up rollers …
FIG. 3, the electrochemical reaction in electrochemical apparatus 10 causes the water in electrolytic solution 30 to undergo hydrolysis, which creates small …
FIG. 4 is similar to
FIGS. 5 A through 5C are schematic side views that illustrate an example of how the graphene film of the SL-G structure can be transferred to a processing …
FIG. 6 is a plot of intensity (arbitrary units, a.u.) vs. Raman Shift (cm 1) for a Raman spectroscopy measurement made on three graphene films 60 formed as …
FIG. 7, it is observed that PMMA-G structure 86 can be peeled off completely by electrochemical delamination, as judged by the complete disappearance of …
FIG. 8 is a schematic diagram of electrochemical apparatus 10 similar to that shown in
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of removing a graphene film grown on a surface of a metal substrate, comprising: applying a support layer to an exposed surface of the graphene film to define a first structure having a graphene-metal interface; subjecting the first structure to an electrochemical process that forms gas bubbles at the graphene-metal interface, thereby causing the graphene and support layer to separate from the surface of the metal substrate as a second structure while substantially preserving the metal substrate; and processing the second structure to remove the support layer from the graphene film.
The method according to claim 1, further comprising forming the graphene film on the surface of the metal substrate using a chemical vapor deposition process.
The method according to claim 1, wherein the metal substrate is made of either copper (Cu), nickel (Ni), platinum (Pt) or Iridium (Ir).
The method according to claim 1, further comprising collecting the second structure using a take-up roller.
The method according to claim 1, wherein the metal substrate has previously been subjected to the electrochemical process.
The method according to claim 1, further comprising: immersing the first structure in an electrolytic solution; using the metal substrate as a cathode that is paired with an anode that is also immersed in the electrolytic solution; and 17 WO 2013/043120 PCT/SG₂₀₁₂/000318 providing an electrical potential between the cathode and the anode to effectuate the electrochemical process.
The method according to claim 1, further comprising: applying the second structure to a process substrate; and removing the support layer from the graphene film of the second structure, thereby leaving the graphene film on the process substrate.
The method according to claim 1, where the support layer is formed from a polymer, a metal or a non-metal.
The method according to claim 1, wherein the metal consists of copper and the support layer consists of poly (methyl methacrylate) (PMMA).
A method of removing a first graphene film from a first surface of a metal substrate on which the first graphene film has been formed, the method comprising: a) adding a first support layer to the first graphene film to form a first structure having an interface between the first graphene film and the first surface of the metal substrate; 18 WO 2013/043120 PCT/SG₂₀₁₂/000318 b) immersing at least a portion of the first structure in an electrolytic solution while using the first structure as a cathode, and including employing an anode in the electrolytic solution; and c) performing an electrochemical reaction by establishing an electrical potential between the anode and cathode through the electrolytic solution to cause the first graphene film and the first support layer to delaminate as a second structure from the first surface of the metal substrate while substantially preserving the metal substrate.
The method according to claim 13, wherein the electrolytic solution includes water and wherein the electrochemical reaction causes gas bubbles from the electrolysis of water to be generated at the interface, thereby causing said delamination of the second structure from the first structure.
The method according to claim 13, wherein the metal substrate has a second surface and the first structure includes a second graphene film on the second surface, and including a second support layer on the second graphene film to define another second structure, and wherein the electrochemical reaction delaminates both of the second structures from the metal substrate.
The method according to claim 13, further comprising collecting the second structure using a roll-and-release process.
The method according to claim 13, further comprising: applying the second structure to a process substrate; and removing the first support layer from the first graphene film of the second structure, thereby leaving the first graphene film on the process substrate.
The method according to claim 13, further comprising: SVG 14344040.03-10-2014.HSYPVAF₃PXXIFW4.CLM15062364.26.489.2998.1567.3045.svg 0.157 3.593 Graph Black and white 19 WO 2013/043120 PCT/SG₂₀₁₂/000318 forming another first graphene film on the first surface of the recovered metal substrate; and performing acts a) through c) on the another first graphene film and the recovered metal substrate.
The method according to claim 13, where the first support layer is formed from a SVG 14344040.03-10-2014.HSYPVAF₃PXXIFW4.CLM15062365.7.314.875.1979.930.svg 0.183 5.55 Graph Black and white
The method according to claim 13, wherein the electrolytic solution comprises an acid solution, an alkaline solution, a neutral inorganic solution, an organic salt solution, a combined neutral inorganic and organic salt solution, or a conducting green solvent solution.
The method according to claim 13, wherein the metal substrate comprises a thin metallic foil.
The method according to claim 13, further comprising forming the first graphene film on the first surface of the metal substrate using a chemical vapor deposition process.
The method according to claim 13, wherein the first support layer comprises either a thermal release tap or polydimethylsiloxane (PDMS).
Materials described outside the worked examples.
graphene film
metal substrate
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
FIG. 2B. The electrochemical apparatus 10 includes an extra take-up roller 120 so that the two SL-G structures 86 are taken up by respective take-up rollers …
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 9,272,910Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1. The electrochemical apparatus 10 of
FIG. 2B. The electrochemical apparatus 10 includes an extra take-up roller 120 so that the two SL-G structures 86 are taken up by respective take-up rollers …
FIG. 3, the electrochemical reaction in electrochemical apparatus 10 causes the water in electrolytic solution 30 to undergo hydrolysis, which creates small …
FIG. 4 is similar to
FIGS. 5 A through 5C are schematic side views that illustrate an example of how the graphene film of the SL-G structure can be transferred to a processing …
FIG. 6 is a plot of intensity (arbitrary units, a.u.) vs. Raman Shift (cm 1) for a Raman spectroscopy measurement made on three graphene films 60 formed as …
FIG. 7, it is observed that PMMA-G structure 86 can be peeled off completely by electrochemical delamination, as judged by the complete disappearance of …
FIG. 8 is a schematic diagram of electrochemical apparatus 10 similar to that shown in
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of removing a graphene film grown on a surface of a metal substrate, comprising: applying a support layer to an exposed surface of the graphene film to define a first structure having a graphene-metal interface; subjecting the first structure to an electrochemical process that forms gas bubbles at the graphene-metal interface, thereby causing the graphene and support layer to separate from the surface of the metal substrate as a second structure while substantially preserving the metal substrate; and processing the second structure to remove the support layer from the graphene film.
The method according to claim 1, further comprising forming the graphene film on the surface of the metal substrate using a chemical vapor deposition process.
The method according to claim 1, wherein the metal substrate is made of either copper (Cu), nickel (Ni), platinum (Pt) or Iridium (Ir).
The method according to claim 1, further comprising collecting the second structure using a take-up roller.
The method according to claim 1, wherein the metal substrate has previously been subjected to the electrochemical process.
The method according to claim 1, further comprising: immersing the first structure in an electrolytic solution; using the metal substrate as a cathode that is paired with an anode that is also immersed in the electrolytic solution; and 17 WO 2013/043120 PCT/SG₂₀₁₂/000318 providing an electrical potential between the cathode and the anode to effectuate the electrochemical process.
The method according to claim 1, further comprising: applying the second structure to a process substrate; and removing the support layer from the graphene film of the second structure, thereby leaving the graphene film on the process substrate.
The method according to claim 1, where the support layer is formed from a polymer, a metal or a non-metal.
The method according to claim 1, wherein the metal consists of copper and the support layer consists of poly (methyl methacrylate) (PMMA).
A method of removing a first graphene film from a first surface of a metal substrate on which the first graphene film has been formed, the method comprising: a) adding a first support layer to the first graphene film to form a first structure having an interface between the first graphene film and the first surface of the metal substrate; 18 WO 2013/043120 PCT/SG₂₀₁₂/000318 b) immersing at least a portion of the first structure in an electrolytic solution while using the first structure as a cathode, and including employing an anode in the electrolytic solution; and c) performing an electrochemical reaction by establishing an electrical potential between the anode and cathode through the electrolytic solution to cause the first graphene film and the first support layer to delaminate as a second structure from the first surface of the metal substrate while substantially preserving the metal substrate.
The method according to claim 13, wherein the electrolytic solution includes water and wherein the electrochemical reaction causes gas bubbles from the electrolysis of water to be generated at the interface, thereby causing said delamination of the second structure from the first structure.
The method according to claim 13, wherein the metal substrate has a second surface and the first structure includes a second graphene film on the second surface, and including a second support layer on the second graphene film to define another second structure, and wherein the electrochemical reaction delaminates both of the second structures from the metal substrate.
The method according to claim 13, further comprising collecting the second structure using a roll-and-release process.
The method according to claim 13, further comprising: applying the second structure to a process substrate; and removing the first support layer from the first graphene film of the second structure, thereby leaving the first graphene film on the process substrate.
The method according to claim 13, further comprising: SVG 14344040.03-10-2014.HSYPVAF₃PXXIFW4.CLM15062364.26.489.2998.1567.3045.svg 0.157 3.593 Graph Black and white 19 WO 2013/043120 PCT/SG₂₀₁₂/000318 forming another first graphene film on the first surface of the recovered metal substrate; and performing acts a) through c) on the another first graphene film and the recovered metal substrate.
The method according to claim 13, where the first support layer is formed from a SVG 14344040.03-10-2014.HSYPVAF₃PXXIFW4.CLM15062365.7.314.875.1979.930.svg 0.183 5.55 Graph Black and white
The method according to claim 13, wherein the electrolytic solution comprises an acid solution, an alkaline solution, a neutral inorganic solution, an organic salt solution, a combined neutral inorganic and organic salt solution, or a conducting green solvent solution.
The method according to claim 13, wherein the metal substrate comprises a thin metallic foil.
The method according to claim 13, further comprising forming the first graphene film on the first surface of the metal substrate using a chemical vapor deposition process.
The method according to claim 13, wherein the first support layer comprises either a thermal release tap or polydimethylsiloxane (PDMS).
Materials described outside the worked examples.
graphene film
metal substrate
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
FIG. 2B. The electrochemical apparatus 10 includes an extra take-up roller 120 so that the two SL-G structures 86 are taken up by respective take-up rollers …
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 9,272,910Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1. The electrochemical apparatus 10 of
FIG. 2B. The electrochemical apparatus 10 includes an extra take-up roller 120 so that the two SL-G structures 86 are taken up by respective take-up rollers …
FIG. 3, the electrochemical reaction in electrochemical apparatus 10 causes the water in electrolytic solution 30 to undergo hydrolysis, which creates small …
FIG. 4 is similar to
FIGS. 5 A through 5C are schematic side views that illustrate an example of how the graphene film of the SL-G structure can be transferred to a processing …
FIG. 6 is a plot of intensity (arbitrary units, a.u.) vs. Raman Shift (cm 1) for a Raman spectroscopy measurement made on three graphene films 60 formed as …
FIG. 7, it is observed that PMMA-G structure 86 can be peeled off completely by electrochemical delamination, as judged by the complete disappearance of …
FIG. 8 is a schematic diagram of electrochemical apparatus 10 similar to that shown in
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of removing a graphene film grown on a surface of a metal substrate, comprising: applying a support layer to an exposed surface of the graphene film to define a first structure having a graphene-metal interface; subjecting the first structure to an electrochemical process that forms gas bubbles at the graphene-metal interface, thereby causing the graphene and support layer to separate from the surface of the metal substrate as a second structure while substantially preserving the metal substrate; and processing the second structure to remove the support layer from the graphene film.
The method according to claim 1, further comprising forming the graphene film on the surface of the metal substrate using a chemical vapor deposition process.
The method according to claim 1, wherein the metal substrate is made of either copper (Cu), nickel (Ni), platinum (Pt) or Iridium (Ir).
The method according to claim 1, further comprising collecting the second structure using a take-up roller.
The method according to claim 1, wherein the metal substrate has previously been subjected to the electrochemical process.
The method according to claim 1, further comprising: immersing the first structure in an electrolytic solution; using the metal substrate as a cathode that is paired with an anode that is also immersed in the electrolytic solution; and 17 WO 2013/043120 PCT/SG₂₀₁₂/000318 providing an electrical potential between the cathode and the anode to effectuate the electrochemical process.
The method according to claim 1, further comprising: applying the second structure to a process substrate; and removing the support layer from the graphene film of the second structure, thereby leaving the graphene film on the process substrate.
The method according to claim 1, where the support layer is formed from a polymer, a metal or a non-metal.
The method according to claim 1, wherein the metal consists of copper and the support layer consists of poly (methyl methacrylate) (PMMA).
A method of removing a first graphene film from a first surface of a metal substrate on which the first graphene film has been formed, the method comprising: a) adding a first support layer to the first graphene film to form a first structure having an interface between the first graphene film and the first surface of the metal substrate; 18 WO 2013/043120 PCT/SG₂₀₁₂/000318 b) immersing at least a portion of the first structure in an electrolytic solution while using the first structure as a cathode, and including employing an anode in the electrolytic solution; and c) performing an electrochemical reaction by establishing an electrical potential between the anode and cathode through the electrolytic solution to cause the first graphene film and the first support layer to delaminate as a second structure from the first surface of the metal substrate while substantially preserving the metal substrate.
The method according to claim 13, wherein the electrolytic solution includes water and wherein the electrochemical reaction causes gas bubbles from the electrolysis of water to be generated at the interface, thereby causing said delamination of the second structure from the first structure.
The method according to claim 13, wherein the metal substrate has a second surface and the first structure includes a second graphene film on the second surface, and including a second support layer on the second graphene film to define another second structure, and wherein the electrochemical reaction delaminates both of the second structures from the metal substrate.
The method according to claim 13, further comprising collecting the second structure using a roll-and-release process.
The method according to claim 13, further comprising: applying the second structure to a process substrate; and removing the first support layer from the first graphene film of the second structure, thereby leaving the first graphene film on the process substrate.
The method according to claim 13, further comprising: SVG 14344040.03-10-2014.HSYPVAF₃PXXIFW4.CLM15062364.26.489.2998.1567.3045.svg 0.157 3.593 Graph Black and white 19 WO 2013/043120 PCT/SG₂₀₁₂/000318 forming another first graphene film on the first surface of the recovered metal substrate; and performing acts a) through c) on the another first graphene film and the recovered metal substrate.
The method according to claim 13, where the first support layer is formed from a SVG 14344040.03-10-2014.HSYPVAF₃PXXIFW4.CLM15062365.7.314.875.1979.930.svg 0.183 5.55 Graph Black and white
The method according to claim 13, wherein the electrolytic solution comprises an acid solution, an alkaline solution, a neutral inorganic solution, an organic salt solution, a combined neutral inorganic and organic salt solution, or a conducting green solvent solution.
The method according to claim 13, wherein the metal substrate comprises a thin metallic foil.
The method according to claim 13, further comprising forming the first graphene film on the first surface of the metal substrate using a chemical vapor deposition process.
The method according to claim 13, wherein the first support layer comprises either a thermal release tap or polydimethylsiloxane (PDMS).
Materials described outside the worked examples.
graphene film
metal substrate
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
FIG. 2B. The electrochemical apparatus 10 includes an extra take-up roller 120 so that the two SL-G structures 86 are taken up by respective take-up rollers …
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 9,272,910Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1. The electrochemical apparatus 10 of
FIG. 2B. The electrochemical apparatus 10 includes an extra take-up roller 120 so that the two SL-G structures 86 are taken up by respective take-up rollers …
FIG. 3, the electrochemical reaction in electrochemical apparatus 10 causes the water in electrolytic solution 30 to undergo hydrolysis, which creates small …
FIG. 4 is similar to
FIGS. 5 A through 5C are schematic side views that illustrate an example of how the graphene film of the SL-G structure can be transferred to a processing …
FIG. 6 is a plot of intensity (arbitrary units, a.u.) vs. Raman Shift (cm 1) for a Raman spectroscopy measurement made on three graphene films 60 formed as …
FIG. 7, it is observed that PMMA-G structure 86 can be peeled off completely by electrochemical delamination, as judged by the complete disappearance of …
FIG. 8 is a schematic diagram of electrochemical apparatus 10 similar to that shown in
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of removing a graphene film grown on a surface of a metal substrate, comprising: applying a support layer to an exposed surface of the graphene film to define a first structure having a graphene-metal interface; subjecting the first structure to an electrochemical process that forms gas bubbles at the graphene-metal interface, thereby causing the graphene and support layer to separate from the surface of the metal substrate as a second structure while substantially preserving the metal substrate; and processing the second structure to remove the support layer from the graphene film.
The method according to claim 1, further comprising forming the graphene film on the surface of the metal substrate using a chemical vapor deposition process.
The method according to claim 1, wherein the metal substrate is made of either copper (Cu), nickel (Ni), platinum (Pt) or Iridium (Ir).
The method according to claim 1, further comprising collecting the second structure using a take-up roller.
The method according to claim 1, wherein the metal substrate has previously been subjected to the electrochemical process.
The method according to claim 1, further comprising: immersing the first structure in an electrolytic solution; using the metal substrate as a cathode that is paired with an anode that is also immersed in the electrolytic solution; and 17 WO 2013/043120 PCT/SG₂₀₁₂/000318 providing an electrical potential between the cathode and the anode to effectuate the electrochemical process.
The method according to claim 1, further comprising: applying the second structure to a process substrate; and removing the support layer from the graphene film of the second structure, thereby leaving the graphene film on the process substrate.
The method according to claim 1, where the support layer is formed from a polymer, a metal or a non-metal.
The method according to claim 1, wherein the metal consists of copper and the support layer consists of poly (methyl methacrylate) (PMMA).
A method of removing a first graphene film from a first surface of a metal substrate on which the first graphene film has been formed, the method comprising: a) adding a first support layer to the first graphene film to form a first structure having an interface between the first graphene film and the first surface of the metal substrate; 18 WO 2013/043120 PCT/SG₂₀₁₂/000318 b) immersing at least a portion of the first structure in an electrolytic solution while using the first structure as a cathode, and including employing an anode in the electrolytic solution; and c) performing an electrochemical reaction by establishing an electrical potential between the anode and cathode through the electrolytic solution to cause the first graphene film and the first support layer to delaminate as a second structure from the first surface of the metal substrate while substantially preserving the metal substrate.
The method according to claim 13, wherein the electrolytic solution includes water and wherein the electrochemical reaction causes gas bubbles from the electrolysis of water to be generated at the interface, thereby causing said delamination of the second structure from the first structure.
The method according to claim 13, wherein the metal substrate has a second surface and the first structure includes a second graphene film on the second surface, and including a second support layer on the second graphene film to define another second structure, and wherein the electrochemical reaction delaminates both of the second structures from the metal substrate.
The method according to claim 13, further comprising collecting the second structure using a roll-and-release process.
The method according to claim 13, further comprising: applying the second structure to a process substrate; and removing the first support layer from the first graphene film of the second structure, thereby leaving the first graphene film on the process substrate.
The method according to claim 13, further comprising: SVG 14344040.03-10-2014.HSYPVAF₃PXXIFW4.CLM15062364.26.489.2998.1567.3045.svg 0.157 3.593 Graph Black and white 19 WO 2013/043120 PCT/SG₂₀₁₂/000318 forming another first graphene film on the first surface of the recovered metal substrate; and performing acts a) through c) on the another first graphene film and the recovered metal substrate.
The method according to claim 13, where the first support layer is formed from a SVG 14344040.03-10-2014.HSYPVAF₃PXXIFW4.CLM15062365.7.314.875.1979.930.svg 0.183 5.55 Graph Black and white
The method according to claim 13, wherein the electrolytic solution comprises an acid solution, an alkaline solution, a neutral inorganic solution, an organic salt solution, a combined neutral inorganic and organic salt solution, or a conducting green solvent solution.
The method according to claim 13, wherein the metal substrate comprises a thin metallic foil.
The method according to claim 13, further comprising forming the first graphene film on the first surface of the metal substrate using a chemical vapor deposition process.
The method according to claim 13, wherein the first support layer comprises either a thermal release tap or polydimethylsiloxane (PDMS).
Materials described outside the worked examples.
graphene film
metal substrate
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
FIG. 2B. The electrochemical apparatus 10 includes an extra take-up roller 120 so that the two SL-G structures 86 are taken up by respective take-up rollers …
Related documents with shared materials, methods, properties, or citations.
support layer
copper
Cu
nickel
Ni
platinum
Pt
iridium
Ir
electrolytic solution
poly(methyl methacrylate)
PMMA
potassium persulfate
K₂S₂O₈
polydimethylsiloxane
PDMS
FIG. 6 is a plot of intensity (arbitrary units, a.u.) vs. Raman Shift (cm 1) for a Raman spectroscopy measurement made on three graphene films 60 formed as …
FIG. 7, it is observed that PMMA-G structure 86 can be peeled off completely by electrochemical delamination, as judged by the complete disappearance of …
support layer
copper
Cu
nickel
Ni
platinum
Pt
iridium
Ir
electrolytic solution
poly(methyl methacrylate)
PMMA
potassium persulfate
K₂S₂O₈
polydimethylsiloxane
PDMS
FIG. 6 is a plot of intensity (arbitrary units, a.u.) vs. Raman Shift (cm 1) for a Raman spectroscopy measurement made on three graphene films 60 formed as …
FIG. 7, it is observed that PMMA-G structure 86 can be peeled off completely by electrochemical delamination, as judged by the complete disappearance of …
support layer
copper
Cu
nickel
Ni
platinum
Pt
iridium
Ir
electrolytic solution
poly(methyl methacrylate)
PMMA
potassium persulfate
K₂S₂O₈
polydimethylsiloxane
PDMS
FIG. 6 is a plot of intensity (arbitrary units, a.u.) vs. Raman Shift (cm 1) for a Raman spectroscopy measurement made on three graphene films 60 formed as …
FIG. 7, it is observed that PMMA-G structure 86 can be peeled off completely by electrochemical delamination, as judged by the complete disappearance of …
support layer
copper
Cu
nickel
Ni
platinum
Pt
iridium
Ir
electrolytic solution
poly(methyl methacrylate)
PMMA
potassium persulfate
K₂S₂O₈
polydimethylsiloxane
PDMS
FIG. 6 is a plot of intensity (arbitrary units, a.u.) vs. Raman Shift (cm 1) for a Raman spectroscopy measurement made on three graphene films 60 formed as …
FIG. 7, it is observed that PMMA-G structure 86 can be peeled off completely by electrochemical delamination, as judged by the complete disappearance of …