Patent
US 9,284,196GRAPHENE-LIKE NANOSHEET STRUCTURE NETWORK ON A SUBSTRATE AND THE METHOD FOR FORMING THE SAME
LYJames Lee
US
Copyright © 2026 Matter42. All rights reserved.
Patent
Atlas literature
Patent
US 9,284,196Patent drawings and their descriptions. Click a drawing to enlarge it.
Figure 1. A tube furnace with 2 " quartz tube, vacuum flange and 30 segments temperature controller.
Figure 2. Schematic of a delivery system for liquid carbon sources.
Figure 3. Schematic of a delivery system for gas carbon sources.
Figure 4. Photos of (a) a quartz plate and (b) a graphene-like network coated quartz plate using CVD of naphthalene.
Figure 5. SEM images of free standing graphene like coating.
Figure 6. Raman spectra of (a) quartz, (b) thermally reduced commercial graphene from graphene oxide, (c) quartz surface coated by CVD of naphthalene with carbide source, and (d) quartz surface coated by CVD of naphthalene without carbide source.
Figure 7. Photos of (a) a Si wafer and (b) a graphene-like network coated Si wafer using CVD of naphthalene.
Figure 8. Photo of a graphene-like network coated quartz plate using CVD of benzene.
Figure 9. Photo of a graphene-like network coated quartz plate using CVD of ethylene.
Figure 10, illustrates a Table 1, property comparison of DLC coating on steel, graphene-like network coated quartz plate using graphene nanopaper, CVD of naphthalene, benzene and ethylene.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for coating a nanosheet structure network on a substrate, comprising: providing a substrate and a polymer, wherein the polymer is selected from one of the group and combinations thereof consisting of a Si containing compound; decomposing the Si containing compound in a furnace or the quartz tubes of a furnace to form a gas composition by heating at 500 to 1500 ° C in an air free environment; providing an argon gas as a carrier to deliver a hydrocarbon compound vapor to the furnace or quartz tubes of the furnace at 500 to 1500 ° C, so as to form a reactive species which is the gas composition decomposed from the Si containing compound and the hydrocarbon compound vapor; and depositing the reactive species on the substrate in the furnace or quartz tubes of the furnace at 500 to 1500 ° C to form a nanosheet structure network having a covalent bond to the substrate.
The method of claim 1, wherein the substrate comprises ceramics, quartz, glass, silicon wafer and metals.
The method of claim 1, wherein the Si containing compound is selected from one of the group and combinations thereof consisting of silicone rubber, polydimethylsiloxane, organosilicon, silane-grafted polymers, silicon-containing metallocene polymers, polydimethylsiloxane and methyltrichlorosilan e(CH₃ -Si-C l3).
The method of claim 1, wherein the silicon containing compound further comprises fillers, gold, copper halide, and metallocenes.
The method of claim 1, wherein the temperature ranges from 750 to 950 °C. 16
The method of claim 1, wherein the hydrocarbon compound comprises ketones, aldehydes, esters, alkane, alkene, and alkyne.
The method of claim 1, wherein the nanosheet structure network is a graphene-like network.
11. The method of claim 1, wherein the covalent bond is a carbide bond.
A method for coating a nanosheet structure network on a substrate comprising: providing a substrate into a furnace or quartz tubes of the furnace; heating the furnace or quartz tubes of the furnace at 500 to 1500 ° C in an air free environment; providing an argon gas as a carry gas into the quartz tubes of the furnace at 500 to 1500 °C to deliver a vapor, wherein the vapor is consisting of a hydrocarbon compound and a silicon compound; and depositing the vapor on the substrate in the furnace or quartz tubes of the furnace at 500 to 1500 ° C so as to form a nanosheet structure network having a covalent bond to the substrate.
The method of claim 13, wherein the substrate comprises ceramics, quartz, glass, silicon wafer and metals.
The method of claim 13, wherein the temperature ranges from 750 to 950 °C. 17
The method of claim 13, wherein the hydrocarbon compound is selected from one of the group and combinations thereof consisting of benzene, toluene, xylene.
The method of claim 13, wherein the silicon compound is tetra-alkyl orthosilicate.
The method of claim 13, wherein the silicon compound further comprises fillers, gold, copper halide, and metallocenes.
The method of claim 13, wherein the nanosheet structure network is graphene-like network.
The method of claim 13, wherein the covalent bond is a carbide bond.
Layer stacks claimed or described, ordered top of device to substrate.
graphene-like nanosheet structure network coated substrate
Materials described outside the worked examples.
Si containing compound (polymer)
hydrocarbon compound
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
Figure 5. SEM images of free standing graphene like coating.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Raman G band position of nanosheet structure network | 1594 | graphene-like nanosheet structure network |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 9,284,196Patent drawings and their descriptions. Click a drawing to enlarge it.
Figure 1. A tube furnace with 2 " quartz tube, vacuum flange and 30 segments temperature controller.
Figure 2. Schematic of a delivery system for liquid carbon sources.
Figure 3. Schematic of a delivery system for gas carbon sources.
Figure 4. Photos of (a) a quartz plate and (b) a graphene-like network coated quartz plate using CVD of naphthalene.
Figure 5. SEM images of free standing graphene like coating.
Figure 6. Raman spectra of (a) quartz, (b) thermally reduced commercial graphene from graphene oxide, (c) quartz surface coated by CVD of naphthalene with carbide source, and (d) quartz surface coated by CVD of naphthalene without carbide source.
Figure 7. Photos of (a) a Si wafer and (b) a graphene-like network coated Si wafer using CVD of naphthalene.
Figure 8. Photo of a graphene-like network coated quartz plate using CVD of benzene.
Figure 9. Photo of a graphene-like network coated quartz plate using CVD of ethylene.
Figure 10, illustrates a Table 1, property comparison of DLC coating on steel, graphene-like network coated quartz plate using graphene nanopaper, CVD of naphthalene, benzene and ethylene.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for coating a nanosheet structure network on a substrate, comprising: providing a substrate and a polymer, wherein the polymer is selected from one of the group and combinations thereof consisting of a Si containing compound; decomposing the Si containing compound in a furnace or the quartz tubes of a furnace to form a gas composition by heating at 500 to 1500 ° C in an air free environment; providing an argon gas as a carrier to deliver a hydrocarbon compound vapor to the furnace or quartz tubes of the furnace at 500 to 1500 ° C, so as to form a reactive species which is the gas composition decomposed from the Si containing compound and the hydrocarbon compound vapor; and depositing the reactive species on the substrate in the furnace or quartz tubes of the furnace at 500 to 1500 ° C to form a nanosheet structure network having a covalent bond to the substrate.
The method of claim 1, wherein the substrate comprises ceramics, quartz, glass, silicon wafer and metals.
The method of claim 1, wherein the Si containing compound is selected from one of the group and combinations thereof consisting of silicone rubber, polydimethylsiloxane, organosilicon, silane-grafted polymers, silicon-containing metallocene polymers, polydimethylsiloxane and methyltrichlorosilan e(CH₃ -Si-C l3).
The method of claim 1, wherein the silicon containing compound further comprises fillers, gold, copper halide, and metallocenes.
The method of claim 1, wherein the temperature ranges from 750 to 950 °C. 16
The method of claim 1, wherein the hydrocarbon compound comprises ketones, aldehydes, esters, alkane, alkene, and alkyne.
The method of claim 1, wherein the nanosheet structure network is a graphene-like network.
11. The method of claim 1, wherein the covalent bond is a carbide bond.
A method for coating a nanosheet structure network on a substrate comprising: providing a substrate into a furnace or quartz tubes of the furnace; heating the furnace or quartz tubes of the furnace at 500 to 1500 ° C in an air free environment; providing an argon gas as a carry gas into the quartz tubes of the furnace at 500 to 1500 °C to deliver a vapor, wherein the vapor is consisting of a hydrocarbon compound and a silicon compound; and depositing the vapor on the substrate in the furnace or quartz tubes of the furnace at 500 to 1500 ° C so as to form a nanosheet structure network having a covalent bond to the substrate.
The method of claim 13, wherein the substrate comprises ceramics, quartz, glass, silicon wafer and metals.
The method of claim 13, wherein the temperature ranges from 750 to 950 °C. 17
The method of claim 13, wherein the hydrocarbon compound is selected from one of the group and combinations thereof consisting of benzene, toluene, xylene.
The method of claim 13, wherein the silicon compound is tetra-alkyl orthosilicate.
The method of claim 13, wherein the silicon compound further comprises fillers, gold, copper halide, and metallocenes.
The method of claim 13, wherein the nanosheet structure network is graphene-like network.
The method of claim 13, wherein the covalent bond is a carbide bond.
Layer stacks claimed or described, ordered top of device to substrate.
graphene-like nanosheet structure network coated substrate
Materials described outside the worked examples.
Si containing compound (polymer)
hydrocarbon compound
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
Figure 5. SEM images of free standing graphene like coating.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Raman G band position of nanosheet structure network | 1594 | graphene-like nanosheet structure network |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 9,284,196Patent drawings and their descriptions. Click a drawing to enlarge it.
Figure 1. A tube furnace with 2 " quartz tube, vacuum flange and 30 segments temperature controller.
Figure 2. Schematic of a delivery system for liquid carbon sources.
Figure 3. Schematic of a delivery system for gas carbon sources.
Figure 4. Photos of (a) a quartz plate and (b) a graphene-like network coated quartz plate using CVD of naphthalene.
Figure 5. SEM images of free standing graphene like coating.
Figure 6. Raman spectra of (a) quartz, (b) thermally reduced commercial graphene from graphene oxide, (c) quartz surface coated by CVD of naphthalene with carbide source, and (d) quartz surface coated by CVD of naphthalene without carbide source.
Figure 7. Photos of (a) a Si wafer and (b) a graphene-like network coated Si wafer using CVD of naphthalene.
Figure 8. Photo of a graphene-like network coated quartz plate using CVD of benzene.
Figure 9. Photo of a graphene-like network coated quartz plate using CVD of ethylene.
Figure 10, illustrates a Table 1, property comparison of DLC coating on steel, graphene-like network coated quartz plate using graphene nanopaper, CVD of naphthalene, benzene and ethylene.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for coating a nanosheet structure network on a substrate, comprising: providing a substrate and a polymer, wherein the polymer is selected from one of the group and combinations thereof consisting of a Si containing compound; decomposing the Si containing compound in a furnace or the quartz tubes of a furnace to form a gas composition by heating at 500 to 1500 ° C in an air free environment; providing an argon gas as a carrier to deliver a hydrocarbon compound vapor to the furnace or quartz tubes of the furnace at 500 to 1500 ° C, so as to form a reactive species which is the gas composition decomposed from the Si containing compound and the hydrocarbon compound vapor; and depositing the reactive species on the substrate in the furnace or quartz tubes of the furnace at 500 to 1500 ° C to form a nanosheet structure network having a covalent bond to the substrate.
The method of claim 1, wherein the substrate comprises ceramics, quartz, glass, silicon wafer and metals.
The method of claim 1, wherein the Si containing compound is selected from one of the group and combinations thereof consisting of silicone rubber, polydimethylsiloxane, organosilicon, silane-grafted polymers, silicon-containing metallocene polymers, polydimethylsiloxane and methyltrichlorosilan e(CH₃ -Si-C l3).
The method of claim 1, wherein the silicon containing compound further comprises fillers, gold, copper halide, and metallocenes.
The method of claim 1, wherein the temperature ranges from 750 to 950 °C. 16
The method of claim 1, wherein the hydrocarbon compound comprises ketones, aldehydes, esters, alkane, alkene, and alkyne.
The method of claim 1, wherein the nanosheet structure network is a graphene-like network.
11. The method of claim 1, wherein the covalent bond is a carbide bond.
A method for coating a nanosheet structure network on a substrate comprising: providing a substrate into a furnace or quartz tubes of the furnace; heating the furnace or quartz tubes of the furnace at 500 to 1500 ° C in an air free environment; providing an argon gas as a carry gas into the quartz tubes of the furnace at 500 to 1500 °C to deliver a vapor, wherein the vapor is consisting of a hydrocarbon compound and a silicon compound; and depositing the vapor on the substrate in the furnace or quartz tubes of the furnace at 500 to 1500 ° C so as to form a nanosheet structure network having a covalent bond to the substrate.
The method of claim 13, wherein the substrate comprises ceramics, quartz, glass, silicon wafer and metals.
The method of claim 13, wherein the temperature ranges from 750 to 950 °C. 17
The method of claim 13, wherein the hydrocarbon compound is selected from one of the group and combinations thereof consisting of benzene, toluene, xylene.
The method of claim 13, wherein the silicon compound is tetra-alkyl orthosilicate.
The method of claim 13, wherein the silicon compound further comprises fillers, gold, copper halide, and metallocenes.
The method of claim 13, wherein the nanosheet structure network is graphene-like network.
The method of claim 13, wherein the covalent bond is a carbide bond.
Layer stacks claimed or described, ordered top of device to substrate.
graphene-like nanosheet structure network coated substrate
Materials described outside the worked examples.
Si containing compound (polymer)
hydrocarbon compound
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
Figure 5. SEM images of free standing graphene like coating.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Raman G band position of nanosheet structure network | 1594 | graphene-like nanosheet structure network |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 9,284,196Patent drawings and their descriptions. Click a drawing to enlarge it.
Figure 1. A tube furnace with 2 " quartz tube, vacuum flange and 30 segments temperature controller.
Figure 2. Schematic of a delivery system for liquid carbon sources.
Figure 3. Schematic of a delivery system for gas carbon sources.
Figure 4. Photos of (a) a quartz plate and (b) a graphene-like network coated quartz plate using CVD of naphthalene.
Figure 5. SEM images of free standing graphene like coating.
Figure 6. Raman spectra of (a) quartz, (b) thermally reduced commercial graphene from graphene oxide, (c) quartz surface coated by CVD of naphthalene with carbide source, and (d) quartz surface coated by CVD of naphthalene without carbide source.
Figure 7. Photos of (a) a Si wafer and (b) a graphene-like network coated Si wafer using CVD of naphthalene.
Figure 8. Photo of a graphene-like network coated quartz plate using CVD of benzene.
Figure 9. Photo of a graphene-like network coated quartz plate using CVD of ethylene.
Figure 10, illustrates a Table 1, property comparison of DLC coating on steel, graphene-like network coated quartz plate using graphene nanopaper, CVD of naphthalene, benzene and ethylene.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for coating a nanosheet structure network on a substrate, comprising: providing a substrate and a polymer, wherein the polymer is selected from one of the group and combinations thereof consisting of a Si containing compound; decomposing the Si containing compound in a furnace or the quartz tubes of a furnace to form a gas composition by heating at 500 to 1500 ° C in an air free environment; providing an argon gas as a carrier to deliver a hydrocarbon compound vapor to the furnace or quartz tubes of the furnace at 500 to 1500 ° C, so as to form a reactive species which is the gas composition decomposed from the Si containing compound and the hydrocarbon compound vapor; and depositing the reactive species on the substrate in the furnace or quartz tubes of the furnace at 500 to 1500 ° C to form a nanosheet structure network having a covalent bond to the substrate.
The method of claim 1, wherein the substrate comprises ceramics, quartz, glass, silicon wafer and metals.
The method of claim 1, wherein the Si containing compound is selected from one of the group and combinations thereof consisting of silicone rubber, polydimethylsiloxane, organosilicon, silane-grafted polymers, silicon-containing metallocene polymers, polydimethylsiloxane and methyltrichlorosilan e(CH₃ -Si-C l3).
The method of claim 1, wherein the silicon containing compound further comprises fillers, gold, copper halide, and metallocenes.
The method of claim 1, wherein the temperature ranges from 750 to 950 °C. 16
The method of claim 1, wherein the hydrocarbon compound comprises ketones, aldehydes, esters, alkane, alkene, and alkyne.
The method of claim 1, wherein the nanosheet structure network is a graphene-like network.
11. The method of claim 1, wherein the covalent bond is a carbide bond.
A method for coating a nanosheet structure network on a substrate comprising: providing a substrate into a furnace or quartz tubes of the furnace; heating the furnace or quartz tubes of the furnace at 500 to 1500 ° C in an air free environment; providing an argon gas as a carry gas into the quartz tubes of the furnace at 500 to 1500 °C to deliver a vapor, wherein the vapor is consisting of a hydrocarbon compound and a silicon compound; and depositing the vapor on the substrate in the furnace or quartz tubes of the furnace at 500 to 1500 ° C so as to form a nanosheet structure network having a covalent bond to the substrate.
The method of claim 13, wherein the substrate comprises ceramics, quartz, glass, silicon wafer and metals.
The method of claim 13, wherein the temperature ranges from 750 to 950 °C. 17
The method of claim 13, wherein the hydrocarbon compound is selected from one of the group and combinations thereof consisting of benzene, toluene, xylene.
The method of claim 13, wherein the silicon compound is tetra-alkyl orthosilicate.
The method of claim 13, wherein the silicon compound further comprises fillers, gold, copper halide, and metallocenes.
The method of claim 13, wherein the nanosheet structure network is graphene-like network.
The method of claim 13, wherein the covalent bond is a carbide bond.
Layer stacks claimed or described, ordered top of device to substrate.
graphene-like nanosheet structure network coated substrate
Materials described outside the worked examples.
Si containing compound (polymer)
hydrocarbon compound
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
Figure 5. SEM images of free standing graphene like coating.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Raman G band position of nanosheet structure network | 1594 | graphene-like nanosheet structure network |
Related documents with shared materials, methods, properties, or citations.
graphene-like nanosheet structure network
substrate (ceramics, quartz, glass, silicon wafer, metals)
metal substrate (structural steels, carbon steels, copper, titanium and alloys)
SiO₂ thin layer coating
SiO₂
silicon compound (tetra-alkyl orthosilicate)
tetra-ethyl orthosilicate (TEOS)
Si(OC₂H₅)4
silicone rubber
polydimethylsiloxane (PDMS)
methyltrichlorosilane (CH₃-Si-Cl₃)
CH₃SiCl₃
argon gas
Ar
Figure 6. Raman spectra of (a) quartz, (b) thermally reduced commercial graphene from graphene oxide, (c) quartz surface coated by CVD of naphthalene with carbide source, and (d) quartz surface coated by CVD of naphthalene without carbide source.
Raman D band position of nanosheet structure network |
| 1338 |
graphene-like nanosheet structure network |
Temperature | 500–1500 °C | — |
Temperature | 12–24 K | — |
Temperature | 750–950 °C | — |
graphene-like nanosheet structure network
substrate (ceramics, quartz, glass, silicon wafer, metals)
metal substrate (structural steels, carbon steels, copper, titanium and alloys)
SiO₂ thin layer coating
SiO₂
silicon compound (tetra-alkyl orthosilicate)
tetra-ethyl orthosilicate (TEOS)
Si(OC₂H₅)4
silicone rubber
polydimethylsiloxane (PDMS)
methyltrichlorosilane (CH₃-Si-Cl₃)
CH₃SiCl₃
argon gas
Ar
Figure 6. Raman spectra of (a) quartz, (b) thermally reduced commercial graphene from graphene oxide, (c) quartz surface coated by CVD of naphthalene with carbide source, and (d) quartz surface coated by CVD of naphthalene without carbide source.
Raman D band position of nanosheet structure network |
| 1338 |
graphene-like nanosheet structure network |
Temperature | 500–1500 °C | — |
Temperature | 12–24 K | — |
Temperature | 750–950 °C | — |
graphene-like nanosheet structure network
substrate (ceramics, quartz, glass, silicon wafer, metals)
metal substrate (structural steels, carbon steels, copper, titanium and alloys)
SiO₂ thin layer coating
SiO₂
silicon compound (tetra-alkyl orthosilicate)
tetra-ethyl orthosilicate (TEOS)
Si(OC₂H₅)4
silicone rubber
polydimethylsiloxane (PDMS)
methyltrichlorosilane (CH₃-Si-Cl₃)
CH₃SiCl₃
argon gas
Ar
Figure 6. Raman spectra of (a) quartz, (b) thermally reduced commercial graphene from graphene oxide, (c) quartz surface coated by CVD of naphthalene with carbide source, and (d) quartz surface coated by CVD of naphthalene without carbide source.
Raman D band position of nanosheet structure network |
| 1338 |
graphene-like nanosheet structure network |
Temperature | 500–1500 °C | — |
Temperature | 12–24 K | — |
Temperature | 750–950 °C | — |
graphene-like nanosheet structure network
substrate (ceramics, quartz, glass, silicon wafer, metals)
metal substrate (structural steels, carbon steels, copper, titanium and alloys)
SiO₂ thin layer coating
SiO₂
silicon compound (tetra-alkyl orthosilicate)
tetra-ethyl orthosilicate (TEOS)
Si(OC₂H₅)4
silicone rubber
polydimethylsiloxane (PDMS)
methyltrichlorosilane (CH₃-Si-Cl₃)
CH₃SiCl₃
argon gas
Ar
Figure 6. Raman spectra of (a) quartz, (b) thermally reduced commercial graphene from graphene oxide, (c) quartz surface coated by CVD of naphthalene with carbide source, and (d) quartz surface coated by CVD of naphthalene without carbide source.
Raman D band position of nanosheet structure network |
| 1338 |
graphene-like nanosheet structure network |
Temperature | 500–1500 °C | — |
Temperature | 12–24 K | — |
Temperature | 750–950 °C | — |