Research paper
Experimental GrowthExperimental CharacterizationComputational DFTEach sample groups how it was prepared, characterized, and measured. Click a card to expand.
1 preparation4 characterizations4 properties3 figures
1 preparation3 characterizations4 properties2 figures
1 preparation3 characterizations4 properties2 figures
2 preparations1 characterization1 property1 figure
1 preparation1 characterization1 property1 figure
1 preparation3 characterizations4 properties2 figures
1 characterization5 properties1 figure
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Dopant Concentration | Re concentration | 0.1atom% | — | |||
| Dopant Concentration | Re concentration | 1.4atom% | — | |||
| Dopant Concentration | Re concentration | 6atom% | — | |||
| Dopant Concentration | Re concentration | 8atom% | — | |||
| Dopant Concentration | Re concentration | 3.6atom% | — | |||
| Dopant Concentration | Re concentration | 10atom% | — | |||
| Raman Peak | E' | 385cm⁻¹ | — | |||
| Raman Peak | A1' | 405cm⁻¹ | — | |||
| Raman Peak | substrate mode | 417cm⁻¹ | — | |||
| Pairing Energy | Re-Re pair binding energy | 0.44eV | — | |||
| Ionization Energy | Re dopant ionization energy | 0.06eV | — | |||
| Ionization Energy | Re dopant ionization energy | 0.37eV | — | |||
| Ionization Energy | Re dopant ionization energy | 0.51eV | — | |||
| Formation Energy | Re dopant formation energy | 0.25eV | — |
Related documents with shared materials, methods, properties, or citations.
Defect Engineered 2D MoS2 Materials for ML-enabled Neurotransmitter SERS Detection
Durable Enhancement of MoS2 Single-Layer Photoluminescence by Ultraviolet Laser Treatment Under Ambient Conditions
Tailoring Amorphous Boron Nitride for High-Performance 2D Electronics
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
1 preparation4 characterizations4 properties3 figures
1 preparation3 characterizations4 properties2 figures
1 preparation3 characterizations4 properties2 figures
2 preparations1 characterization1 property1 figure
1 preparation1 characterization1 property1 figure
1 preparation3 characterizations4 properties2 figures
1 characterization5 properties1 figure
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Dopant Concentration | Re concentration | 0.1atom% | — | |||
| Dopant Concentration | Re concentration | 1.4atom% | — | |||
| Dopant Concentration | Re concentration | 6atom% | — | |||
| Dopant Concentration | Re concentration | 8atom% | — | |||
| Dopant Concentration | Re concentration | 3.6atom% | — | |||
| Dopant Concentration | Re concentration | 10atom% | — | |||
| Raman Peak | E' | 385cm⁻¹ | — | |||
| Raman Peak | A1' | 405cm⁻¹ | — | |||
| Raman Peak | substrate mode | 417cm⁻¹ | — | |||
| Pairing Energy | Re-Re pair binding energy | 0.44eV | — | |||
| Ionization Energy | Re dopant ionization energy | 0.06eV | — | |||
| Ionization Energy | Re dopant ionization energy | 0.37eV | — | |||
| Ionization Energy | Re dopant ionization energy | 0.51eV | — | |||
| Formation Energy | Re dopant formation energy | 0.25eV | — |
Related documents with shared materials, methods, properties, or citations.
Defect Engineered 2D MoS2 Materials for ML-enabled Neurotransmitter SERS Detection
Durable Enhancement of MoS2 Single-Layer Photoluminescence by Ultraviolet Laser Treatment Under Ambient Conditions
Tailoring Amorphous Boron Nitride for High-Performance 2D Electronics
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
1 preparation4 characterizations4 properties3 figures
1 preparation3 characterizations4 properties2 figures
1 preparation3 characterizations4 properties2 figures
2 preparations1 characterization1 property1 figure
1 preparation1 characterization1 property1 figure
1 preparation3 characterizations4 properties2 figures
1 characterization5 properties1 figure
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Dopant Concentration | Re concentration | 0.1atom% | — | |||
| Dopant Concentration | Re concentration | 1.4atom% | — | |||
| Dopant Concentration | Re concentration | 6atom% | — | |||
| Dopant Concentration | Re concentration | 8atom% | — | |||
| Dopant Concentration | Re concentration | 3.6atom% | — | |||
| Dopant Concentration | Re concentration | 10atom% | — | |||
| Raman Peak | E' | 385cm⁻¹ | — | |||
| Raman Peak | A1' | 405cm⁻¹ | — | |||
| Raman Peak | substrate mode | 417cm⁻¹ | — | |||
| Pairing Energy | Re-Re pair binding energy | 0.44eV | — | |||
| Ionization Energy | Re dopant ionization energy | 0.06eV | — | |||
| Ionization Energy | Re dopant ionization energy | 0.37eV | — | |||
| Ionization Energy | Re dopant ionization energy | 0.51eV | — | |||
| Formation Energy | Re dopant formation energy | 0.25eV | — |
Related documents with shared materials, methods, properties, or citations.
Defect Engineered 2D MoS2 Materials for ML-enabled Neurotransmitter SERS Detection
Durable Enhancement of MoS2 Single-Layer Photoluminescence by Ultraviolet Laser Treatment Under Ambient Conditions
Tailoring Amorphous Boron Nitride for High-Performance 2D Electronics
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
1 preparation4 characterizations4 properties3 figures
1 preparation3 characterizations4 properties2 figures
1 preparation3 characterizations4 properties2 figures
2 preparations1 characterization1 property1 figure
1 preparation1 characterization1 property1 figure
1 preparation3 characterizations4 properties2 figures
1 characterization5 properties1 figure
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Dopant Concentration | Re concentration | 0.1atom% | — | |||
| Dopant Concentration | Re concentration | 1.4atom% | — | |||
| Dopant Concentration | Re concentration | 6atom% | — | |||
| Dopant Concentration | Re concentration | 8atom% | — | |||
| Dopant Concentration | Re concentration | 3.6atom% | — | |||
| Dopant Concentration | Re concentration | 10atom% | — | |||
| Raman Peak | E' | 385cm⁻¹ | — | |||
| Raman Peak | A1' | 405cm⁻¹ | — | |||
| Raman Peak | substrate mode | 417cm⁻¹ | — | |||
| Pairing Energy | Re-Re pair binding energy | 0.44eV | — | |||
| Ionization Energy | Re dopant ionization energy | 0.06eV | — | |||
| Ionization Energy | Re dopant ionization energy | 0.37eV | — | |||
| Ionization Energy | Re dopant ionization energy | 0.51eV | — | |||
| Formation Energy | Re dopant formation energy | 0.25eV | — |
Related documents with shared materials, methods, properties, or citations.
Defect Engineered 2D MoS2 Materials for ML-enabled Neurotransmitter SERS Detection
Durable Enhancement of MoS2 Single-Layer Photoluminescence by Ultraviolet Laser Treatment Under Ambient Conditions
Tailoring Amorphous Boron Nitride for High-Performance 2D Electronics