Abstract

A general method was developed to intercalate metals under layered materials through a controlled density of sputtered defects. The current work extends the method to Cu intercalation under MoS2. Although the growth conditions needed for intercalation under graphite and MoS₂ are similar, the resulting intercalated phases differ strongly. Cu islands nucleate on top of MoS₂ and supply material that transfers below MoS₂ through sputtered defects under the island base, producing a uniform intercalated Cu carpet morphology that spreads over the mesoscale. The intercalated Cu layer is characterized by SEM, AFM, XPS, and EDS.

Abstract

A general method was developed to intercalate metals under layered materials through a controlled density of sputtered defects. The current work extends the method to Cu intercalation under MoS2. Although the growth conditions needed for intercalation under graphite and MoS₂ are similar, the resulting intercalated phases differ strongly. Cu islands nucleate on top of MoS₂ and supply material that transfers below MoS₂ through sputtered defects under the island base, producing a uniform intercalated Cu carpet morphology that spreads over the mesoscale. The intercalated Cu layer is characterized by SEM, AFM, XPS, and EDS.

Abstract

A general method was developed to intercalate metals under layered materials through a controlled density of sputtered defects. The current work extends the method to Cu intercalation under MoS2. Although the growth conditions needed for intercalation under graphite and MoS₂ are similar, the resulting intercalated phases differ strongly. Cu islands nucleate on top of MoS₂ and supply material that transfers below MoS₂ through sputtered defects under the island base, producing a uniform intercalated Cu carpet morphology that spreads over the mesoscale. The intercalated Cu layer is characterized by SEM, AFM, XPS, and EDS.

Abstract

A general method was developed to intercalate metals under layered materials through a controlled density of sputtered defects. The current work extends the method to Cu intercalation under MoS2. Although the growth conditions needed for intercalation under graphite and MoS₂ are similar, the resulting intercalated phases differ strongly. Cu islands nucleate on top of MoS₂ and supply material that transfers below MoS₂ through sputtered defects under the island base, producing a uniform intercalated Cu carpet morphology that spreads over the mesoscale. The intercalated Cu layer is characterized by SEM, AFM, XPS, and EDS.