Unusual flat and extended morphology of intercalated Cu under MoS2

Dapeng Jing; Yong Han; James W. Evans; Marek Kolmer; Zhe Fei; Michael C. Tringides

doi:10.1103/physrevmaterials.6.094008

Paper details

Research paper

Experimental GrowthExperimental Characterization

Unusual flat and extended morphology of intercalated Cu under MoS₂

Dapeng Jing, Yong Han, James W. Evans, Marek Kolmer et al.

2022

Samples

Each sample groups how it was prepared, characterized, and measured. Click a card to expand.

Cu deposited on pristine MoS₂ at 900 K; 3D islands observed without a carpet region.

1 preparation4 characterizations3 properties3 figures

ExperimentalCuStudied MaterialMoS₂Studied Material

Cu deposited on ion-bombarded MoS₂ at 900 K; 3D islands observed without a carpet region.

2 preparations1 characterization1 property1 figure

ExperimentalCuStudied MaterialMoS₂Studied Material

Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated Cu carpet surrounds islands and extends laterally.

2 preparations5 characterizations5 properties4 figures

ExperimentalCuStudied MaterialMoS₂Studied Material

Materials

Studied Material

studied material

MoS₂

Studied Material

Also known as

p-MoS₂

Why these are connected

Related documents with shared materials, methods, properties, or citations.

Unusual flat and extended morphology of intercalated Cu under MoS2 | Matter42 Literature

Properties

Type	Label	Value	Material	Sample	Source
Domain Island Density	3D Cu island density	0.01isl./um²	Cu	Cu deposited on pristine MoS₂ at 900 K; 3D islands observed Cu deposited on ion-bombarded MoS₂ at 900 K; 3D islands obse	—
Domain Island Density	3D Cu island density	0.01isl./um²	Cu	Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—
Thickness	Cu carpet thickness	4.7nm	Cu	Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—
Thickness	MoS₂ step height	0.7nm	MoS₂	Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—
Elemental Ratio	(Mo+S)/Cu ratio	20.45	Cu MoS₂	Cu deposited on pristine MoS₂ at 900 K; 3D islands observed Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—
Elemental Ratio	(Mo+S)/Cu ratio	19.57	Cu MoS₂	Cu deposited on pristine MoS₂ at 900 K; 3D islands observed Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—

Properties

Type	Label	Value	Material	Sample	Source
Domain Island Density	3D Cu island density	0.01isl./um²	Cu	Cu deposited on pristine MoS₂ at 900 K; 3D islands observed Cu deposited on ion-bombarded MoS₂ at 900 K; 3D islands obse	—
Domain Island Density	3D Cu island density	0.01isl./um²	Cu	Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—
Thickness	Cu carpet thickness	4.7nm	Cu	Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—
Thickness	MoS₂ step height	0.7nm	MoS₂	Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—
Elemental Ratio	(Mo+S)/Cu ratio	20.45	Cu MoS₂	Cu deposited on pristine MoS₂ at 900 K; 3D islands observed Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—
Elemental Ratio	(Mo+S)/Cu ratio	19.57	Cu MoS₂	Cu deposited on pristine MoS₂ at 900 K; 3D islands observed Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—

Properties

Type	Label	Value	Material	Sample	Source
Domain Island Density	3D Cu island density	0.01isl./um²	Cu	Cu deposited on pristine MoS₂ at 900 K; 3D islands observed Cu deposited on ion-bombarded MoS₂ at 900 K; 3D islands obse	—
Domain Island Density	3D Cu island density	0.01isl./um²	Cu	Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—
Thickness	Cu carpet thickness	4.7nm	Cu	Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—
Thickness	MoS₂ step height	0.7nm	MoS₂	Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—
Elemental Ratio	(Mo+S)/Cu ratio	20.45	Cu MoS₂	Cu deposited on pristine MoS₂ at 900 K; 3D islands observed Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—
Elemental Ratio	(Mo+S)/Cu ratio	19.57	Cu MoS₂	Cu deposited on pristine MoS₂ at 900 K; 3D islands observed Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—

Properties

Type	Label	Value	Material	Sample	Source
Domain Island Density	3D Cu island density	0.01isl./um²	Cu	Cu deposited on pristine MoS₂ at 900 K; 3D islands observed Cu deposited on ion-bombarded MoS₂ at 900 K; 3D islands obse	—
Domain Island Density	3D Cu island density	0.01isl./um²	Cu	Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—
Thickness	Cu carpet thickness	4.7nm	Cu	Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—
Thickness	MoS₂ step height	0.7nm	MoS₂	Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—
Elemental Ratio	(Mo+S)/Cu ratio	20.45	Cu MoS₂	Cu deposited on pristine MoS₂ at 900 K; 3D islands observed Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—
Elemental Ratio	(Mo+S)/Cu ratio	19.57	Cu MoS₂	Cu deposited on pristine MoS₂ at 900 K; 3D islands observed Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated C	—

Unusual flat and extended morphology of intercalated Cu under MoS₂

Samples

Cu deposited on pristine MoS₂ at 900 K; 3D islands observed without a carpet region.

Cu deposited on ion-bombarded MoS₂ at 900 K; 3D islands observed without a carpet region.

Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated Cu carpet surrounds islands and extends laterally.

Materials

Why these are connected

Unusual flat and extended morphology of intercalated Cu under MoS₂

Samples

Cu deposited on pristine MoS₂ at 900 K; 3D islands observed without a carpet region.

Cu deposited on ion-bombarded MoS₂ at 900 K; 3D islands observed without a carpet region.

Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated Cu carpet surrounds islands and extends laterally.

Materials

Why these are connected

Unusual flat and extended morphology of intercalated Cu under MoS₂

Samples

Cu deposited on pristine MoS₂ at 900 K; 3D islands observed without a carpet region.

Cu deposited on ion-bombarded MoS₂ at 900 K; 3D islands observed without a carpet region.

Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated Cu carpet surrounds islands and extends laterally.

Materials

Why these are connected

Unusual flat and extended morphology of intercalated Cu under MoS₂

Samples

Cu deposited on pristine MoS₂ at 900 K; 3D islands observed without a carpet region.

Cu deposited on ion-bombarded MoS₂ at 900 K; 3D islands observed without a carpet region.

Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated Cu carpet surrounds islands and extends laterally.

Materials

Why these are connected

Unusual flat and extended morphology of intercalated Cu under MoS₂

Samples

Cu deposited on pristine MoS₂ at 900 K; 3D islands observed without a carpet region.

Cu deposited on ion-bombarded MoS₂ at 900 K; 3D islands observed without a carpet region.

Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated Cu carpet surrounds islands and extends laterally.

Materials

Why these are connected

Unusual flat and extended morphology of intercalated Cu under MoS₂

Samples

Cu deposited on pristine MoS₂ at 900 K; 3D islands observed without a carpet region.

Cu deposited on ion-bombarded MoS₂ at 900 K; 3D islands observed without a carpet region.

Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated Cu carpet surrounds islands and extends laterally.

Materials

Why these are connected

Unusual flat and extended morphology of intercalated Cu under MoS₂

Samples

Cu deposited on pristine MoS₂ at 900 K; 3D islands observed without a carpet region.

Cu deposited on ion-bombarded MoS₂ at 900 K; 3D islands observed without a carpet region.

Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated Cu carpet surrounds islands and extends laterally.

Materials

Why these are connected

Unusual flat and extended morphology of intercalated Cu under MoS₂

Samples

Cu deposited on pristine MoS₂ at 900 K; 3D islands observed without a carpet region.

Cu deposited on ion-bombarded MoS₂ at 900 K; 3D islands observed without a carpet region.

Cu deposited on ion-bombarded MoS₂ at 1000 K; intercalated Cu carpet surrounds islands and extends laterally.

Materials

Why these are connected

Growth

Processing

Characterization

Properties

Growth

Processing

Characterization

Properties

Growth

Processing

Characterization

Properties

Growth

Processing

Characterization

Properties