Patent
US 10,529,980GRAPHENE COMPOUND, METHOD FOR FORMING GRAPHENE COMPOUND, AND POWER STORAGE DEVICE
Hiroshi KADOMA
US
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Patent
Atlas literature
Patent
US 10,529,980Patent drawings and their descriptions. Click a drawing to enlarge it.
FIGS. 1O A to 1 OD. [0230] A peak was observed in a range of 2 0 = 4 to 10 deg. in each of the samples. Table 1 shows the XRD peak angle and the average …
FIG. 2.
FIG. 3A). When the power storage device is curved and has an arc-shaped cross section, compressive stress is applied to a surface of the film on the side closer …
FIGS. 4A to 4C illustrate a flexible lithium-ion storage battery;
FIGS. 5 A to 5 F illustrate electronic devices of embodiments of the present invention; FI GS. 6A and 6B illustrate electronic devices of embodiments of the …
FIG. 6A. The glasses-type device 400 includes a frame 400a and a display portion 400b. The power storage device is provided in a temple of the frame 400a …
FIG. 7 B illustrates an automobile 8500, which is an EV including the power storage device. The automobile 8500 can be charged when the power storage device is …
FIG. 8 includes a power storage device 8602, side mirrors 8601, and indicators 8603. The power storage device 8602 can supply electric power to the indicators …
FIGS. 9A to 9C. [0225] Accordingly, the results indicate that Samples 1 to 3 were each chemically modified with the group having an ester bond. [0226] <X RD …
FIG. 10 D shows an XRD spectrum of Comparative sam ple 1. The horizontal axis represents the diffraction angle 2 0 [deg.] and the vertical axis represents the …
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
1-1 3. Canceled
Canceled
A method for forming a graphene compound, comprising steps of: stirring graphene oxide and a Lewis base to form a first mixed solution; mixing a silicon compound into the first mixed solution and stirring the mixed solution to form a second mixed solution; and filtering the second mixed solution and collecting an obtained residue, wherein the silicon compound has a substituted silan group and a chain group bonded to the substituted silan group, wherein the chain group comprises an ester group, and wherein the residue comprises a graphene compound. Currently amended
The method for forming a graphene compound, according to claim 14, wherein the Lewis base is one or more of butylamine, pentylamine, hexylamine, diethylamine, dipropylamine, dibutylamine, triethylamine, tripropylamine, and pyridine. Original
The method for forming a graphene compound, according to claim 14, wherein the silicon compound comprises 1 to 10 ester groups. Currently amended
The method for forming a graphene compound, according to claim 14, wherein the steps of stirring to form the first mixed solution, mixing the silicon compound into the first mixed solution, and stirring the mixed solution to form the second mixed solution is performed under an inert gas atmosphere. Original
Canceled
A method for forming a graphene compound, comprising steps of: stirring graphene oxide and butylamine to form a first mixed solution; mixing a silicon compound into the first mixed solution and stirring the mixed solution to form a second mixed solution; and filtering the second mixed solution and collecting an obtained residue, wherein the silicon compound is one of 11-acetoxyundecyltrichlorosilane, 2- acetoxyethyltrichlorosilane, and 2- (carbomethoxy)ethyltrichlorosilane, and wherein the residue comprises a graphene compound. Original
The method for forming a graphene compound, according to claim 19, wherein the steps of stirring to form the first mixed solution, mixing the silicon compound into the first mixed solution, and stirring the mixed solution to fo rm the second mixed solution is performed under an inert gas atmosphere. Original
21-22. Canceled
Canceled
Materials described outside the worked examples.
graphene oxide
Lewis base
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
FIGS. 1O A to 1 OD. [0230] A peak was observed in a range of 2 0 = 4 to 10 deg. in each of the samples. Table 1 shows the XRD peak angle and the average …
Table 1
Table 1 shows the XRD peak angle and the average interlayer distanc
p. 31
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 10,529,980Patent drawings and their descriptions. Click a drawing to enlarge it.
FIGS. 1O A to 1 OD. [0230] A peak was observed in a range of 2 0 = 4 to 10 deg. in each of the samples. Table 1 shows the XRD peak angle and the average …
FIG. 2.
FIG. 3A). When the power storage device is curved and has an arc-shaped cross section, compressive stress is applied to a surface of the film on the side closer …
FIGS. 4A to 4C illustrate a flexible lithium-ion storage battery;
FIGS. 5 A to 5 F illustrate electronic devices of embodiments of the present invention; FI GS. 6A and 6B illustrate electronic devices of embodiments of the …
FIG. 6A. The glasses-type device 400 includes a frame 400a and a display portion 400b. The power storage device is provided in a temple of the frame 400a …
FIG. 7 B illustrates an automobile 8500, which is an EV including the power storage device. The automobile 8500 can be charged when the power storage device is …
FIG. 8 includes a power storage device 8602, side mirrors 8601, and indicators 8603. The power storage device 8602 can supply electric power to the indicators …
FIGS. 9A to 9C. [0225] Accordingly, the results indicate that Samples 1 to 3 were each chemically modified with the group having an ester bond. [0226] <X RD …
FIG. 10 D shows an XRD spectrum of Comparative sam ple 1. The horizontal axis represents the diffraction angle 2 0 [deg.] and the vertical axis represents the …
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
1-1 3. Canceled
Canceled
A method for forming a graphene compound, comprising steps of: stirring graphene oxide and a Lewis base to form a first mixed solution; mixing a silicon compound into the first mixed solution and stirring the mixed solution to form a second mixed solution; and filtering the second mixed solution and collecting an obtained residue, wherein the silicon compound has a substituted silan group and a chain group bonded to the substituted silan group, wherein the chain group comprises an ester group, and wherein the residue comprises a graphene compound. Currently amended
The method for forming a graphene compound, according to claim 14, wherein the Lewis base is one or more of butylamine, pentylamine, hexylamine, diethylamine, dipropylamine, dibutylamine, triethylamine, tripropylamine, and pyridine. Original
The method for forming a graphene compound, according to claim 14, wherein the silicon compound comprises 1 to 10 ester groups. Currently amended
The method for forming a graphene compound, according to claim 14, wherein the steps of stirring to form the first mixed solution, mixing the silicon compound into the first mixed solution, and stirring the mixed solution to form the second mixed solution is performed under an inert gas atmosphere. Original
Canceled
A method for forming a graphene compound, comprising steps of: stirring graphene oxide and butylamine to form a first mixed solution; mixing a silicon compound into the first mixed solution and stirring the mixed solution to form a second mixed solution; and filtering the second mixed solution and collecting an obtained residue, wherein the silicon compound is one of 11-acetoxyundecyltrichlorosilane, 2- acetoxyethyltrichlorosilane, and 2- (carbomethoxy)ethyltrichlorosilane, and wherein the residue comprises a graphene compound. Original
The method for forming a graphene compound, according to claim 19, wherein the steps of stirring to form the first mixed solution, mixing the silicon compound into the first mixed solution, and stirring the mixed solution to fo rm the second mixed solution is performed under an inert gas atmosphere. Original
21-22. Canceled
Canceled
Materials described outside the worked examples.
graphene oxide
Lewis base
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
FIGS. 1O A to 1 OD. [0230] A peak was observed in a range of 2 0 = 4 to 10 deg. in each of the samples. Table 1 shows the XRD peak angle and the average …
Table 1
Table 1 shows the XRD peak angle and the average interlayer distanc
p. 31
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 10,529,980Patent drawings and their descriptions. Click a drawing to enlarge it.
FIGS. 1O A to 1 OD. [0230] A peak was observed in a range of 2 0 = 4 to 10 deg. in each of the samples. Table 1 shows the XRD peak angle and the average …
FIG. 2.
FIG. 3A). When the power storage device is curved and has an arc-shaped cross section, compressive stress is applied to a surface of the film on the side closer …
FIGS. 4A to 4C illustrate a flexible lithium-ion storage battery;
FIGS. 5 A to 5 F illustrate electronic devices of embodiments of the present invention; FI GS. 6A and 6B illustrate electronic devices of embodiments of the …
FIG. 6A. The glasses-type device 400 includes a frame 400a and a display portion 400b. The power storage device is provided in a temple of the frame 400a …
FIG. 7 B illustrates an automobile 8500, which is an EV including the power storage device. The automobile 8500 can be charged when the power storage device is …
FIG. 8 includes a power storage device 8602, side mirrors 8601, and indicators 8603. The power storage device 8602 can supply electric power to the indicators …
FIGS. 9A to 9C. [0225] Accordingly, the results indicate that Samples 1 to 3 were each chemically modified with the group having an ester bond. [0226] <X RD …
FIG. 10 D shows an XRD spectrum of Comparative sam ple 1. The horizontal axis represents the diffraction angle 2 0 [deg.] and the vertical axis represents the …
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
1-1 3. Canceled
Canceled
A method for forming a graphene compound, comprising steps of: stirring graphene oxide and a Lewis base to form a first mixed solution; mixing a silicon compound into the first mixed solution and stirring the mixed solution to form a second mixed solution; and filtering the second mixed solution and collecting an obtained residue, wherein the silicon compound has a substituted silan group and a chain group bonded to the substituted silan group, wherein the chain group comprises an ester group, and wherein the residue comprises a graphene compound. Currently amended
The method for forming a graphene compound, according to claim 14, wherein the Lewis base is one or more of butylamine, pentylamine, hexylamine, diethylamine, dipropylamine, dibutylamine, triethylamine, tripropylamine, and pyridine. Original
The method for forming a graphene compound, according to claim 14, wherein the silicon compound comprises 1 to 10 ester groups. Currently amended
The method for forming a graphene compound, according to claim 14, wherein the steps of stirring to form the first mixed solution, mixing the silicon compound into the first mixed solution, and stirring the mixed solution to form the second mixed solution is performed under an inert gas atmosphere. Original
Canceled
A method for forming a graphene compound, comprising steps of: stirring graphene oxide and butylamine to form a first mixed solution; mixing a silicon compound into the first mixed solution and stirring the mixed solution to form a second mixed solution; and filtering the second mixed solution and collecting an obtained residue, wherein the silicon compound is one of 11-acetoxyundecyltrichlorosilane, 2- acetoxyethyltrichlorosilane, and 2- (carbomethoxy)ethyltrichlorosilane, and wherein the residue comprises a graphene compound. Original
The method for forming a graphene compound, according to claim 19, wherein the steps of stirring to form the first mixed solution, mixing the silicon compound into the first mixed solution, and stirring the mixed solution to fo rm the second mixed solution is performed under an inert gas atmosphere. Original
21-22. Canceled
Canceled
Materials described outside the worked examples.
graphene oxide
Lewis base
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
FIGS. 1O A to 1 OD. [0230] A peak was observed in a range of 2 0 = 4 to 10 deg. in each of the samples. Table 1 shows the XRD peak angle and the average …
Table 1
Table 1 shows the XRD peak angle and the average interlayer distanc
p. 31
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 10,529,980Patent drawings and their descriptions. Click a drawing to enlarge it.
FIGS. 1O A to 1 OD. [0230] A peak was observed in a range of 2 0 = 4 to 10 deg. in each of the samples. Table 1 shows the XRD peak angle and the average …
FIG. 2.
FIG. 3A). When the power storage device is curved and has an arc-shaped cross section, compressive stress is applied to a surface of the film on the side closer …
FIGS. 4A to 4C illustrate a flexible lithium-ion storage battery;
FIGS. 5 A to 5 F illustrate electronic devices of embodiments of the present invention; FI GS. 6A and 6B illustrate electronic devices of embodiments of the …
FIG. 6A. The glasses-type device 400 includes a frame 400a and a display portion 400b. The power storage device is provided in a temple of the frame 400a …
FIG. 7 B illustrates an automobile 8500, which is an EV including the power storage device. The automobile 8500 can be charged when the power storage device is …
FIG. 8 includes a power storage device 8602, side mirrors 8601, and indicators 8603. The power storage device 8602 can supply electric power to the indicators …
FIGS. 9A to 9C. [0225] Accordingly, the results indicate that Samples 1 to 3 were each chemically modified with the group having an ester bond. [0226] <X RD …
FIG. 10 D shows an XRD spectrum of Comparative sam ple 1. The horizontal axis represents the diffraction angle 2 0 [deg.] and the vertical axis represents the …
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
1-1 3. Canceled
Canceled
A method for forming a graphene compound, comprising steps of: stirring graphene oxide and a Lewis base to form a first mixed solution; mixing a silicon compound into the first mixed solution and stirring the mixed solution to form a second mixed solution; and filtering the second mixed solution and collecting an obtained residue, wherein the silicon compound has a substituted silan group and a chain group bonded to the substituted silan group, wherein the chain group comprises an ester group, and wherein the residue comprises a graphene compound. Currently amended
The method for forming a graphene compound, according to claim 14, wherein the Lewis base is one or more of butylamine, pentylamine, hexylamine, diethylamine, dipropylamine, dibutylamine, triethylamine, tripropylamine, and pyridine. Original
The method for forming a graphene compound, according to claim 14, wherein the silicon compound comprises 1 to 10 ester groups. Currently amended
The method for forming a graphene compound, according to claim 14, wherein the steps of stirring to form the first mixed solution, mixing the silicon compound into the first mixed solution, and stirring the mixed solution to form the second mixed solution is performed under an inert gas atmosphere. Original
Canceled
A method for forming a graphene compound, comprising steps of: stirring graphene oxide and butylamine to form a first mixed solution; mixing a silicon compound into the first mixed solution and stirring the mixed solution to form a second mixed solution; and filtering the second mixed solution and collecting an obtained residue, wherein the silicon compound is one of 11-acetoxyundecyltrichlorosilane, 2- acetoxyethyltrichlorosilane, and 2- (carbomethoxy)ethyltrichlorosilane, and wherein the residue comprises a graphene compound. Original
The method for forming a graphene compound, according to claim 19, wherein the steps of stirring to form the first mixed solution, mixing the silicon compound into the first mixed solution, and stirring the mixed solution to fo rm the second mixed solution is performed under an inert gas atmosphere. Original
21-22. Canceled
Canceled
Materials described outside the worked examples.
graphene oxide
Lewis base
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
FIGS. 1O A to 1 OD. [0230] A peak was observed in a range of 2 0 = 4 to 10 deg. in each of the samples. Table 1 shows the XRD peak angle and the average …
Table 1
Table 1 shows the XRD peak angle and the average interlayer distanc
p. 31
Related documents with shared materials, methods, properties, or citations.
silicon compound with substituted silan group and chain group comprising ester group
Lewis base (butylamine, pentylamine, hexylamine, diethylamine, dipropylamine, dibutylamine, triethylamine, tripropylamine, or pyridine)
butylamine
11-acetoxyundecyltrichlorosilane
2-acetoxyethyltrichlorosilane
2-(carbomethoxy)ethyltrichlorosilane
graphene compound
FIGS. 9A to 9C. [0225] Accordingly, the results indicate that Samples 1 to 3 were each chemically modified with the group having an ester bond. [0226] <X RD …
FIGS. 9A to 9C. [0225] Accordingly, the results indicate that Samples 1 to 3 were each chemically modified with the group having an ester bond. [0226] <X RD …
FIG. 10 D shows an XRD spectrum of Comparative sam ple 1. The horizontal axis represents the diffraction angle 2 0 [deg.] and the vertical axis represents the …
silicon compound with substituted silan group and chain group comprising ester group
Lewis base (butylamine, pentylamine, hexylamine, diethylamine, dipropylamine, dibutylamine, triethylamine, tripropylamine, or pyridine)
butylamine
11-acetoxyundecyltrichlorosilane
2-acetoxyethyltrichlorosilane
2-(carbomethoxy)ethyltrichlorosilane
graphene compound
FIGS. 9A to 9C. [0225] Accordingly, the results indicate that Samples 1 to 3 were each chemically modified with the group having an ester bond. [0226] <X RD …
FIGS. 9A to 9C. [0225] Accordingly, the results indicate that Samples 1 to 3 were each chemically modified with the group having an ester bond. [0226] <X RD …
FIG. 10 D shows an XRD spectrum of Comparative sam ple 1. The horizontal axis represents the diffraction angle 2 0 [deg.] and the vertical axis represents the …
silicon compound with substituted silan group and chain group comprising ester group
Lewis base (butylamine, pentylamine, hexylamine, diethylamine, dipropylamine, dibutylamine, triethylamine, tripropylamine, or pyridine)
butylamine
11-acetoxyundecyltrichlorosilane
2-acetoxyethyltrichlorosilane
2-(carbomethoxy)ethyltrichlorosilane
graphene compound
FIGS. 9A to 9C. [0225] Accordingly, the results indicate that Samples 1 to 3 were each chemically modified with the group having an ester bond. [0226] <X RD …
FIGS. 9A to 9C. [0225] Accordingly, the results indicate that Samples 1 to 3 were each chemically modified with the group having an ester bond. [0226] <X RD …
FIG. 10 D shows an XRD spectrum of Comparative sam ple 1. The horizontal axis represents the diffraction angle 2 0 [deg.] and the vertical axis represents the …
silicon compound with substituted silan group and chain group comprising ester group
Lewis base (butylamine, pentylamine, hexylamine, diethylamine, dipropylamine, dibutylamine, triethylamine, tripropylamine, or pyridine)
butylamine
11-acetoxyundecyltrichlorosilane
2-acetoxyethyltrichlorosilane
2-(carbomethoxy)ethyltrichlorosilane
graphene compound
FIGS. 9A to 9C. [0225] Accordingly, the results indicate that Samples 1 to 3 were each chemically modified with the group having an ester bond. [0226] <X RD …
FIGS. 9A to 9C. [0225] Accordingly, the results indicate that Samples 1 to 3 were each chemically modified with the group having an ester bond. [0226] <X RD …
FIG. 10 D shows an XRD spectrum of Comparative sam ple 1. The horizontal axis represents the diffraction angle 2 0 [deg.] and the vertical axis represents the …