Patent
US 10,615,222flexible free-standing micro-display panel
No layer stack recorded.
flexible LED display with 2D array of continuous semiconductor film LED structures
No layer stack recorded.
photonic system with flexible free-standing LED as optical waveguide
No layer stack recorded.
sapphire
Al₂O₃
soft metal layer
acetone
C₃H₆O
n-type GaN
p-type GaN
Ni/Au current spreading layer
indium-tin-oxide (ITO)
Ti/Au contact
| 3.4–6.2 eV |
| — |
Thickness | 200–1770 nm | — |
flexible free-standing micro-display panel
No layer stack recorded.
flexible LED display with 2D array of continuous semiconductor film LED structures
No layer stack recorded.
photonic system with flexible free-standing LED as optical waveguide
No layer stack recorded.
sapphire
Al₂O₃
soft metal layer
acetone
C₃H₆O
n-type GaN
p-type GaN
Ni/Au current spreading layer
indium-tin-oxide (ITO)
Ti/Au contact
| 3.4–6.2 eV |
| — |
Thickness | 200–1770 nm | — |
flexible free-standing micro-display panel
No layer stack recorded.
flexible LED display with 2D array of continuous semiconductor film LED structures
No layer stack recorded.
photonic system with flexible free-standing LED as optical waveguide
No layer stack recorded.
sapphire
Al₂O₃
soft metal layer
acetone
C₃H₆O
n-type GaN
p-type GaN
Ni/Au current spreading layer
indium-tin-oxide (ITO)
Ti/Au contact
| 3.4–6.2 eV |
| — |
Thickness | 200–1770 nm | — |
flexible free-standing micro-display panel
No layer stack recorded.
flexible LED display with 2D array of continuous semiconductor film LED structures
No layer stack recorded.
photonic system with flexible free-standing LED as optical waveguide
No layer stack recorded.
sapphire
Al₂O₃
soft metal layer
acetone
C₃H₆O
n-type GaN
p-type GaN
Ni/Au current spreading layer
indium-tin-oxide (ITO)
Ti/Au contact
| 3.4–6.2 eV |
| — |
Thickness | 200–1770 nm | — |