Patent
US 9,834,445POROUS GRAPHENE MEMBER, METHOD FOR MANUFACTURING SAME, AND APPARATUS FOR MANUFACTURING SAME USING THE METHOD
Hee-Yeon KIM
US
Copyright © 2026 Matter42. All rights reserved.
Patent
Atlas literature
Patent
US 9,834,445Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a flow chart of illustrating a method for manufacturing a porous graphene member in accordance with some embodiments of the present disclosure;
FIGS. 2 and 3, the apparatus 700 for manufacturing a porous graphene member comprises a material feeder, a simultaneous vaporizer and a deposition furnace 400 …
FIG. 3 is a block diagram illustrating an apparatus 700 for manufacturing a porous graphene member in accordance with 10 some embodiments of the present …
FIG. 4 is a block diagram illustrating an apparatus for 15 manufacturing a porous graphene member according to some embodiments of the present disclosure. …
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for manufacturing a porous graphene member, comprising: introducing a carbon source and a substitution reaction source comprisin g pyridine(C H 5 N) as a nitro g en precursor for forming through-holes in grap hene into a deposition furnace; thermally decomposing the carbon source and the substitution reaction source simultaneously to generate carbon atoms and substitution atoms, respectively, wherein the carbon atoms are deposited on a substrate present within the deposition furnace to form a graphene film consisting of a monoatomic layer structure, and during the deposition of carbon atoms, the substitution atoms not only interfere with covalent bonds between the carbon atoms to cause crystal defects, but also substitute for parts of the carbon atoms to in situ form through-holes in the graphene, thereby creating the porous graphene member; and releasing the porous graphene member from the substrate. Currently amended
The method of claim 1, wherein the substrate comprises at least one selected from among a copper plate and a copper-plated plate, both of which can prevent the monoatomic carbon layer from being thermally deformed and can allow the porous graphene member to be easily released therefrom. Original
The method of claim 1, wherein the method further comprises separately vaporizing the carbon source and the substitution reaction source at same time prior to introducing the carbon source and the substitution reaction source into the deposition furnace wherein the vaporized carbon source and the vaporized substitution reaction source are transmitted into the deposition furnace by a carrier gas. Original
The method of claim 1, wherein the carbon source and the substitution reaction source are introduced into the deposition furnace via respective pipes. Original
The method of claim 1, wherein the carbon source and the substitution reaction source are introduced into the deposition furnace through a common pipe where the carbon source and the substitution reaction source are mixed. Original
The method of claim 1, wherein the carbon source contains at least one selected from the group consisting of methane (CH 4), methanol (CH 3 0 H), carbon monoxide (CO), ethane (C 2 H 6), ethylene (C 2 H 4), ethanol (C 2 H 5 0 H), acetylene (C 2 H 2), acetone toluene (C 7 H 8), and xylene (C 8 HiO). Original
Canceled
An apparatus for manufacturing a porous graphene member, comprising: a material feeder comprising a first material feeder for providing a carbon source and a second material feeder for providing a substitution reaction source; a simultaneous vaporizer comprising a first vaporizer for vaporizing the carbon source and a second vaporizer for vaporizing the substitution reaction source; and a deposition furnace in which the carbon source fed from the first vaporizer and the substitution reaction source fed from the second vaporizer are simultaneously decomposed to generate carbon atoms and substitution atoms, respectively, wherein the carbon atoms are deposited on a substrate present within the deposition furnace to form a graphene film consisting of a monoatomic layer structure, and during the deposition of carbon atoms, the substitution atoms not only interfere with covalent bonds between the carbon atoms to cause crystal defects, but also substitute for parts of the carbon atoms to in situ form through-holes in the graphene, thereby creating the porous graphene member. Withdrawn
The apparatus of claim 9, wherein the substrate present in the deposition furnace comprises a metallic plate from which the porous graphene member can be released. Withdrawn
The apparatus of claim 9, further comprising a first pipe through which the first vaporizer communicates with the deposition furnace, and a second pipe through which the second vaporizer communicates with the deposition furnace, each of the first pipe and the second pipe being associated with a heating unit to heat the vaporized carbon source or the vaporized substitution source. Withdrawn
The apparatus of claim 9, further comprising a first pipe connected to the first vaporizer, a second pipe connected to the second vaporizer, and a common pipe that is connected to the deposition furnace and into which both the first pipe and the second pipe are convergent. Withdrawn
The apparatus of claim 9, wherein the carbon source fed from the first material feeder comprises at least one selected from the group consisting of methane (CH 4), methanol (CH 3 0 H), carbon monoxide (CO), ethane (C 2 H 6), ethylene (C 2 H 4), ethanol (C 2 H 5 0 H), acetylene (C 2 H 2), acetone (CH 3 COCH 3), propane (C 3 H 8), propylene (C 3 H 6), butane (C 4 H i o), pentane (C 5 H 12), pentene (C 5 Hi o), cyclopentadiene (C 5 H 6), hexane (C 6 H 14), cyclohexane (C 6 H 12), benzene (C 6 H 6), toluene (C 7 H 8), and xylene (C 8 Hio). Withdrawn
The apparatus of claim 9, wherein the substitution reaction source fed from the second material feeder comprises at least one selected from the group consisting of ammonia (NH 3), hydrazine (N 2 H 4), pyridine (C 5 H 5 N), pyrrole (C 4 H 5 N), acetonitrile (CH 3 CN), nitric acid (HNO 3), silver nitrate (AgNO 3), barium nitrate (Ba(N 0 3) 2), N,N- dimethylformamide ((CH 3) 2 NCHO), lithium nitride (Li 3 N), and cyanuric chloride (C 3 C 1 3 N 3). Withdrawn
The apparatus of claim 9, further comprises a carrier gas supply for transmitting into the deposition furnace the first carbon source and substitution reaction source that are vaporized in the first vaporizer and the second vaporizer, respectively. Withdrawn
The apparatus of claim 9, wherein the deposition furnace further comprises an atomic layer deposition (ALD) device for use in forming the monoatomic layer of carbon on the substrate. Withdrawn
The apparatus of claim 9, wherein the first vaporizer comprises a first heating furnace for providing heat to vaporize the carbon source, and the second vaporizer comprises a second heating furnace for providing heat to vaporize the substitution reaction source. Withdrawn
A porous graphene member having through-holes therein, wherein the through-holes are in situ formed as substitution atoms not only interfere with covalent bonds between the carbon atoms to cause crystal defects, but also substitute for parts of the carbon atoms to form through-holes in the graphene during the deposition of carbon atoms. Withdrawn
Layer stacks claimed or described, ordered top of device to substrate.
porous graphene member manufacturing apparatus
No layer stack recorded.
Materials described outside the worked examples.
porous graphene
pyridine
C₅H₅N
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Duration | 22–330 min | — |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 9,834,445Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a flow chart of illustrating a method for manufacturing a porous graphene member in accordance with some embodiments of the present disclosure;
FIGS. 2 and 3, the apparatus 700 for manufacturing a porous graphene member comprises a material feeder, a simultaneous vaporizer and a deposition furnace 400 …
FIG. 3 is a block diagram illustrating an apparatus 700 for manufacturing a porous graphene member in accordance with 10 some embodiments of the present …
FIG. 4 is a block diagram illustrating an apparatus for 15 manufacturing a porous graphene member according to some embodiments of the present disclosure. …
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for manufacturing a porous graphene member, comprising: introducing a carbon source and a substitution reaction source comprisin g pyridine(C H 5 N) as a nitro g en precursor for forming through-holes in grap hene into a deposition furnace; thermally decomposing the carbon source and the substitution reaction source simultaneously to generate carbon atoms and substitution atoms, respectively, wherein the carbon atoms are deposited on a substrate present within the deposition furnace to form a graphene film consisting of a monoatomic layer structure, and during the deposition of carbon atoms, the substitution atoms not only interfere with covalent bonds between the carbon atoms to cause crystal defects, but also substitute for parts of the carbon atoms to in situ form through-holes in the graphene, thereby creating the porous graphene member; and releasing the porous graphene member from the substrate. Currently amended
The method of claim 1, wherein the substrate comprises at least one selected from among a copper plate and a copper-plated plate, both of which can prevent the monoatomic carbon layer from being thermally deformed and can allow the porous graphene member to be easily released therefrom. Original
The method of claim 1, wherein the method further comprises separately vaporizing the carbon source and the substitution reaction source at same time prior to introducing the carbon source and the substitution reaction source into the deposition furnace wherein the vaporized carbon source and the vaporized substitution reaction source are transmitted into the deposition furnace by a carrier gas. Original
The method of claim 1, wherein the carbon source and the substitution reaction source are introduced into the deposition furnace via respective pipes. Original
The method of claim 1, wherein the carbon source and the substitution reaction source are introduced into the deposition furnace through a common pipe where the carbon source and the substitution reaction source are mixed. Original
The method of claim 1, wherein the carbon source contains at least one selected from the group consisting of methane (CH 4), methanol (CH 3 0 H), carbon monoxide (CO), ethane (C 2 H 6), ethylene (C 2 H 4), ethanol (C 2 H 5 0 H), acetylene (C 2 H 2), acetone toluene (C 7 H 8), and xylene (C 8 HiO). Original
Canceled
An apparatus for manufacturing a porous graphene member, comprising: a material feeder comprising a first material feeder for providing a carbon source and a second material feeder for providing a substitution reaction source; a simultaneous vaporizer comprising a first vaporizer for vaporizing the carbon source and a second vaporizer for vaporizing the substitution reaction source; and a deposition furnace in which the carbon source fed from the first vaporizer and the substitution reaction source fed from the second vaporizer are simultaneously decomposed to generate carbon atoms and substitution atoms, respectively, wherein the carbon atoms are deposited on a substrate present within the deposition furnace to form a graphene film consisting of a monoatomic layer structure, and during the deposition of carbon atoms, the substitution atoms not only interfere with covalent bonds between the carbon atoms to cause crystal defects, but also substitute for parts of the carbon atoms to in situ form through-holes in the graphene, thereby creating the porous graphene member. Withdrawn
The apparatus of claim 9, wherein the substrate present in the deposition furnace comprises a metallic plate from which the porous graphene member can be released. Withdrawn
The apparatus of claim 9, further comprising a first pipe through which the first vaporizer communicates with the deposition furnace, and a second pipe through which the second vaporizer communicates with the deposition furnace, each of the first pipe and the second pipe being associated with a heating unit to heat the vaporized carbon source or the vaporized substitution source. Withdrawn
The apparatus of claim 9, further comprising a first pipe connected to the first vaporizer, a second pipe connected to the second vaporizer, and a common pipe that is connected to the deposition furnace and into which both the first pipe and the second pipe are convergent. Withdrawn
The apparatus of claim 9, wherein the carbon source fed from the first material feeder comprises at least one selected from the group consisting of methane (CH 4), methanol (CH 3 0 H), carbon monoxide (CO), ethane (C 2 H 6), ethylene (C 2 H 4), ethanol (C 2 H 5 0 H), acetylene (C 2 H 2), acetone (CH 3 COCH 3), propane (C 3 H 8), propylene (C 3 H 6), butane (C 4 H i o), pentane (C 5 H 12), pentene (C 5 Hi o), cyclopentadiene (C 5 H 6), hexane (C 6 H 14), cyclohexane (C 6 H 12), benzene (C 6 H 6), toluene (C 7 H 8), and xylene (C 8 Hio). Withdrawn
The apparatus of claim 9, wherein the substitution reaction source fed from the second material feeder comprises at least one selected from the group consisting of ammonia (NH 3), hydrazine (N 2 H 4), pyridine (C 5 H 5 N), pyrrole (C 4 H 5 N), acetonitrile (CH 3 CN), nitric acid (HNO 3), silver nitrate (AgNO 3), barium nitrate (Ba(N 0 3) 2), N,N- dimethylformamide ((CH 3) 2 NCHO), lithium nitride (Li 3 N), and cyanuric chloride (C 3 C 1 3 N 3). Withdrawn
The apparatus of claim 9, further comprises a carrier gas supply for transmitting into the deposition furnace the first carbon source and substitution reaction source that are vaporized in the first vaporizer and the second vaporizer, respectively. Withdrawn
The apparatus of claim 9, wherein the deposition furnace further comprises an atomic layer deposition (ALD) device for use in forming the monoatomic layer of carbon on the substrate. Withdrawn
The apparatus of claim 9, wherein the first vaporizer comprises a first heating furnace for providing heat to vaporize the carbon source, and the second vaporizer comprises a second heating furnace for providing heat to vaporize the substitution reaction source. Withdrawn
A porous graphene member having through-holes therein, wherein the through-holes are in situ formed as substitution atoms not only interfere with covalent bonds between the carbon atoms to cause crystal defects, but also substitute for parts of the carbon atoms to form through-holes in the graphene during the deposition of carbon atoms. Withdrawn
Layer stacks claimed or described, ordered top of device to substrate.
porous graphene member manufacturing apparatus
No layer stack recorded.
Materials described outside the worked examples.
porous graphene
pyridine
C₅H₅N
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Duration | 22–330 min | — |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 9,834,445Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a flow chart of illustrating a method for manufacturing a porous graphene member in accordance with some embodiments of the present disclosure;
FIGS. 2 and 3, the apparatus 700 for manufacturing a porous graphene member comprises a material feeder, a simultaneous vaporizer and a deposition furnace 400 …
FIG. 3 is a block diagram illustrating an apparatus 700 for manufacturing a porous graphene member in accordance with 10 some embodiments of the present …
FIG. 4 is a block diagram illustrating an apparatus for 15 manufacturing a porous graphene member according to some embodiments of the present disclosure. …
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for manufacturing a porous graphene member, comprising: introducing a carbon source and a substitution reaction source comprisin g pyridine(C H 5 N) as a nitro g en precursor for forming through-holes in grap hene into a deposition furnace; thermally decomposing the carbon source and the substitution reaction source simultaneously to generate carbon atoms and substitution atoms, respectively, wherein the carbon atoms are deposited on a substrate present within the deposition furnace to form a graphene film consisting of a monoatomic layer structure, and during the deposition of carbon atoms, the substitution atoms not only interfere with covalent bonds between the carbon atoms to cause crystal defects, but also substitute for parts of the carbon atoms to in situ form through-holes in the graphene, thereby creating the porous graphene member; and releasing the porous graphene member from the substrate. Currently amended
The method of claim 1, wherein the substrate comprises at least one selected from among a copper plate and a copper-plated plate, both of which can prevent the monoatomic carbon layer from being thermally deformed and can allow the porous graphene member to be easily released therefrom. Original
The method of claim 1, wherein the method further comprises separately vaporizing the carbon source and the substitution reaction source at same time prior to introducing the carbon source and the substitution reaction source into the deposition furnace wherein the vaporized carbon source and the vaporized substitution reaction source are transmitted into the deposition furnace by a carrier gas. Original
The method of claim 1, wherein the carbon source and the substitution reaction source are introduced into the deposition furnace via respective pipes. Original
The method of claim 1, wherein the carbon source and the substitution reaction source are introduced into the deposition furnace through a common pipe where the carbon source and the substitution reaction source are mixed. Original
The method of claim 1, wherein the carbon source contains at least one selected from the group consisting of methane (CH 4), methanol (CH 3 0 H), carbon monoxide (CO), ethane (C 2 H 6), ethylene (C 2 H 4), ethanol (C 2 H 5 0 H), acetylene (C 2 H 2), acetone toluene (C 7 H 8), and xylene (C 8 HiO). Original
Canceled
An apparatus for manufacturing a porous graphene member, comprising: a material feeder comprising a first material feeder for providing a carbon source and a second material feeder for providing a substitution reaction source; a simultaneous vaporizer comprising a first vaporizer for vaporizing the carbon source and a second vaporizer for vaporizing the substitution reaction source; and a deposition furnace in which the carbon source fed from the first vaporizer and the substitution reaction source fed from the second vaporizer are simultaneously decomposed to generate carbon atoms and substitution atoms, respectively, wherein the carbon atoms are deposited on a substrate present within the deposition furnace to form a graphene film consisting of a monoatomic layer structure, and during the deposition of carbon atoms, the substitution atoms not only interfere with covalent bonds between the carbon atoms to cause crystal defects, but also substitute for parts of the carbon atoms to in situ form through-holes in the graphene, thereby creating the porous graphene member. Withdrawn
The apparatus of claim 9, wherein the substrate present in the deposition furnace comprises a metallic plate from which the porous graphene member can be released. Withdrawn
The apparatus of claim 9, further comprising a first pipe through which the first vaporizer communicates with the deposition furnace, and a second pipe through which the second vaporizer communicates with the deposition furnace, each of the first pipe and the second pipe being associated with a heating unit to heat the vaporized carbon source or the vaporized substitution source. Withdrawn
The apparatus of claim 9, further comprising a first pipe connected to the first vaporizer, a second pipe connected to the second vaporizer, and a common pipe that is connected to the deposition furnace and into which both the first pipe and the second pipe are convergent. Withdrawn
The apparatus of claim 9, wherein the carbon source fed from the first material feeder comprises at least one selected from the group consisting of methane (CH 4), methanol (CH 3 0 H), carbon monoxide (CO), ethane (C 2 H 6), ethylene (C 2 H 4), ethanol (C 2 H 5 0 H), acetylene (C 2 H 2), acetone (CH 3 COCH 3), propane (C 3 H 8), propylene (C 3 H 6), butane (C 4 H i o), pentane (C 5 H 12), pentene (C 5 Hi o), cyclopentadiene (C 5 H 6), hexane (C 6 H 14), cyclohexane (C 6 H 12), benzene (C 6 H 6), toluene (C 7 H 8), and xylene (C 8 Hio). Withdrawn
The apparatus of claim 9, wherein the substitution reaction source fed from the second material feeder comprises at least one selected from the group consisting of ammonia (NH 3), hydrazine (N 2 H 4), pyridine (C 5 H 5 N), pyrrole (C 4 H 5 N), acetonitrile (CH 3 CN), nitric acid (HNO 3), silver nitrate (AgNO 3), barium nitrate (Ba(N 0 3) 2), N,N- dimethylformamide ((CH 3) 2 NCHO), lithium nitride (Li 3 N), and cyanuric chloride (C 3 C 1 3 N 3). Withdrawn
The apparatus of claim 9, further comprises a carrier gas supply for transmitting into the deposition furnace the first carbon source and substitution reaction source that are vaporized in the first vaporizer and the second vaporizer, respectively. Withdrawn
The apparatus of claim 9, wherein the deposition furnace further comprises an atomic layer deposition (ALD) device for use in forming the monoatomic layer of carbon on the substrate. Withdrawn
The apparatus of claim 9, wherein the first vaporizer comprises a first heating furnace for providing heat to vaporize the carbon source, and the second vaporizer comprises a second heating furnace for providing heat to vaporize the substitution reaction source. Withdrawn
A porous graphene member having through-holes therein, wherein the through-holes are in situ formed as substitution atoms not only interfere with covalent bonds between the carbon atoms to cause crystal defects, but also substitute for parts of the carbon atoms to form through-holes in the graphene during the deposition of carbon atoms. Withdrawn
Layer stacks claimed or described, ordered top of device to substrate.
porous graphene member manufacturing apparatus
No layer stack recorded.
Materials described outside the worked examples.
porous graphene
pyridine
C₅H₅N
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Duration | 22–330 min | — |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 9,834,445Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a flow chart of illustrating a method for manufacturing a porous graphene member in accordance with some embodiments of the present disclosure;
FIGS. 2 and 3, the apparatus 700 for manufacturing a porous graphene member comprises a material feeder, a simultaneous vaporizer and a deposition furnace 400 …
FIG. 3 is a block diagram illustrating an apparatus 700 for manufacturing a porous graphene member in accordance with 10 some embodiments of the present …
FIG. 4 is a block diagram illustrating an apparatus for 15 manufacturing a porous graphene member according to some embodiments of the present disclosure. …
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for manufacturing a porous graphene member, comprising: introducing a carbon source and a substitution reaction source comprisin g pyridine(C H 5 N) as a nitro g en precursor for forming through-holes in grap hene into a deposition furnace; thermally decomposing the carbon source and the substitution reaction source simultaneously to generate carbon atoms and substitution atoms, respectively, wherein the carbon atoms are deposited on a substrate present within the deposition furnace to form a graphene film consisting of a monoatomic layer structure, and during the deposition of carbon atoms, the substitution atoms not only interfere with covalent bonds between the carbon atoms to cause crystal defects, but also substitute for parts of the carbon atoms to in situ form through-holes in the graphene, thereby creating the porous graphene member; and releasing the porous graphene member from the substrate. Currently amended
The method of claim 1, wherein the substrate comprises at least one selected from among a copper plate and a copper-plated plate, both of which can prevent the monoatomic carbon layer from being thermally deformed and can allow the porous graphene member to be easily released therefrom. Original
The method of claim 1, wherein the method further comprises separately vaporizing the carbon source and the substitution reaction source at same time prior to introducing the carbon source and the substitution reaction source into the deposition furnace wherein the vaporized carbon source and the vaporized substitution reaction source are transmitted into the deposition furnace by a carrier gas. Original
The method of claim 1, wherein the carbon source and the substitution reaction source are introduced into the deposition furnace via respective pipes. Original
The method of claim 1, wherein the carbon source and the substitution reaction source are introduced into the deposition furnace through a common pipe where the carbon source and the substitution reaction source are mixed. Original
The method of claim 1, wherein the carbon source contains at least one selected from the group consisting of methane (CH 4), methanol (CH 3 0 H), carbon monoxide (CO), ethane (C 2 H 6), ethylene (C 2 H 4), ethanol (C 2 H 5 0 H), acetylene (C 2 H 2), acetone toluene (C 7 H 8), and xylene (C 8 HiO). Original
Canceled
An apparatus for manufacturing a porous graphene member, comprising: a material feeder comprising a first material feeder for providing a carbon source and a second material feeder for providing a substitution reaction source; a simultaneous vaporizer comprising a first vaporizer for vaporizing the carbon source and a second vaporizer for vaporizing the substitution reaction source; and a deposition furnace in which the carbon source fed from the first vaporizer and the substitution reaction source fed from the second vaporizer are simultaneously decomposed to generate carbon atoms and substitution atoms, respectively, wherein the carbon atoms are deposited on a substrate present within the deposition furnace to form a graphene film consisting of a monoatomic layer structure, and during the deposition of carbon atoms, the substitution atoms not only interfere with covalent bonds between the carbon atoms to cause crystal defects, but also substitute for parts of the carbon atoms to in situ form through-holes in the graphene, thereby creating the porous graphene member. Withdrawn
The apparatus of claim 9, wherein the substrate present in the deposition furnace comprises a metallic plate from which the porous graphene member can be released. Withdrawn
The apparatus of claim 9, further comprising a first pipe through which the first vaporizer communicates with the deposition furnace, and a second pipe through which the second vaporizer communicates with the deposition furnace, each of the first pipe and the second pipe being associated with a heating unit to heat the vaporized carbon source or the vaporized substitution source. Withdrawn
The apparatus of claim 9, further comprising a first pipe connected to the first vaporizer, a second pipe connected to the second vaporizer, and a common pipe that is connected to the deposition furnace and into which both the first pipe and the second pipe are convergent. Withdrawn
The apparatus of claim 9, wherein the carbon source fed from the first material feeder comprises at least one selected from the group consisting of methane (CH 4), methanol (CH 3 0 H), carbon monoxide (CO), ethane (C 2 H 6), ethylene (C 2 H 4), ethanol (C 2 H 5 0 H), acetylene (C 2 H 2), acetone (CH 3 COCH 3), propane (C 3 H 8), propylene (C 3 H 6), butane (C 4 H i o), pentane (C 5 H 12), pentene (C 5 Hi o), cyclopentadiene (C 5 H 6), hexane (C 6 H 14), cyclohexane (C 6 H 12), benzene (C 6 H 6), toluene (C 7 H 8), and xylene (C 8 Hio). Withdrawn
The apparatus of claim 9, wherein the substitution reaction source fed from the second material feeder comprises at least one selected from the group consisting of ammonia (NH 3), hydrazine (N 2 H 4), pyridine (C 5 H 5 N), pyrrole (C 4 H 5 N), acetonitrile (CH 3 CN), nitric acid (HNO 3), silver nitrate (AgNO 3), barium nitrate (Ba(N 0 3) 2), N,N- dimethylformamide ((CH 3) 2 NCHO), lithium nitride (Li 3 N), and cyanuric chloride (C 3 C 1 3 N 3). Withdrawn
The apparatus of claim 9, further comprises a carrier gas supply for transmitting into the deposition furnace the first carbon source and substitution reaction source that are vaporized in the first vaporizer and the second vaporizer, respectively. Withdrawn
The apparatus of claim 9, wherein the deposition furnace further comprises an atomic layer deposition (ALD) device for use in forming the monoatomic layer of carbon on the substrate. Withdrawn
The apparatus of claim 9, wherein the first vaporizer comprises a first heating furnace for providing heat to vaporize the carbon source, and the second vaporizer comprises a second heating furnace for providing heat to vaporize the substitution reaction source. Withdrawn
A porous graphene member having through-holes therein, wherein the through-holes are in situ formed as substitution atoms not only interfere with covalent bonds between the carbon atoms to cause crystal defects, but also substitute for parts of the carbon atoms to form through-holes in the graphene during the deposition of carbon atoms. Withdrawn
Layer stacks claimed or described, ordered top of device to substrate.
porous graphene member manufacturing apparatus
No layer stack recorded.
Materials described outside the worked examples.
porous graphene
pyridine
C₅H₅N
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Duration | 22–330 min | — |
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