METHOD OF MANUFACTURING GRAPHENE FILM AND METHOD OF MANUFACTURING PELLICLE USING THE SAME The present non-provisional patent application claims priority, as per Paris Convention, from Japanese Patent Application No. 2016-220221 ﬁled on 2016-11- 11, the disclosure of which is

Yu YANASE

Patent

Atlas literature

Patent

US 10,053,367

METHOD OF MANUFACTURING GRAPHENE FILM AND METHOD OF MANUFACTURING PELLICLE USING THE SAME The present non-provisional patent application claims priority, as per Paris Convention, from Japanese Patent Application No. 2016-220221 ﬁled on 2016-11- 11, the disclosure of which is

Yu YANASE

Drawings

Patent drawings and their descriptions. Click a drawing to enlarge it.

FIG. 1

FIGS. 1 I-1 J, after the base material 1 is removed by the wet etching liquid 6, a solvent 9 having a lower surface tension than the wet etching liquid 6 is …

Claims

Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.

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Dependent← claim 1fluororesinfluorine-based solventgraphene
[Claim 2 1 The method for manufacturing a graphene ﬁlm as claimed in Claim 1 wherein said protective ﬁlm is a ﬂuororesin, and said solvent is a ﬂuorine-based solvent.
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Dependent← claim 3film-like grapheneprotective filmetching liquidpellicle
[Claim 3 1 A method for manufacturing a pellicle characterized by using a ﬁlm-like graphene which is manufactured through steps including: (i) preparing a ﬁlm-like graphene provided on a base material; (ii) coating said graphene with a protective ﬁlm; (iii) removing said base material by wet etching with an etching liquid; (iv) dissolving the protective ﬁlm using a solvent whose surface tension is lower than that of said wet etching liquid.

Device structures

Layer stacks claimed or described, ordered top of device to substrate.

pellicle

film-like graphenemembrane

Materials

Materials described outside the worked examples.

fluororesin

Protective Film

fluorine-based solvent

Solvent

graphene

Process steps

Additional fabrication and treatment steps described in the patent.

Wet Etching

Step 1

Process details

steps:preparing a film-like graphene provided on a base material, coating said graphene with a protective film, removing said base material by wet etching with an etching liquid, dissolving the protective film using a solvent whose surface tension is lower than that of said wet etching liquid

Materials:film-like grapheneprotective film

METHOD OF MANUFACTURING GRAPHENE FILM AND METHOD OF MANUFACTURING PELLICLE USING THE SAME The present non-provisional patent application claims priority, as per Paris Convention, from Japanese Patent Application No. 2016-220221 ﬁled on 2016-11- 11, the disclosure of which is | Matter42 Literature