Patent
US 9,129,882METHOD OF FABRICATING GRAPHENE NANO DEVICE
Eun Kyoung JEON
US
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Atlas literature
Patent
US 9,129,882Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a flowchart for explaining a method of fabricating a graphene nano device according to an embodiment of the inventive concept; [0022]
FIGS. 2A to 9A are plan views for explaining a method of fabricating a graphene nano device according to an embodiment of the inventive concept; and 15 [0023]
FIGS. 3A and 3 B) in the second area B remained after performing the first etching process. [0034] After forming the second metal mask pattern 133 on the …
FIGS. 4A and 4 B) from the substrate 100, a third metal mask pattern 20 143 may be formed on the substrate 100 on which the first and second graphene patterns …
FIGS. 5 A and 5B) from a planar view. In detail, the first metal electrode pattern M 1 may be spaced apart from the second graphene pattern 113 in the opposite …
FIGS. 6A and 6 B, first and second metal electrode 5 patterns M 1 and M₂ may be formed in the second area B of the substrate 100. In some embodiments, the first …
FIGS. 8A and 8 B, a second membrane mask pattern 163 20 may be formed on the product including the micro graphene pattern G. [0043] In some embodiments, the …
FIGS. 9A and 9 B, a micro metal electrode pattern M₃ may be formed on the substrate 100 exposed by the fifth opening 165 (see
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of fabricating a graphene nano device, comprising: forming a first metal mask pattern on a substrate on which a graphene layer is formed; and 5 forming a graphene pattern by performing an etching process on the graphene layer using the first metal mask pattern as an etching mask, wherein the forming of the first metal mask pattern comprises: forming a first adhesive layer on the graphene layer; disposing the first metal mask pattern prepared in advance on the first 10 adhesive layer; and heating the first adhesive layer to attach the first metal mask pattern on the substrate.
The method of fabricating a graphene nano device of claim 1, further 15 comprising: forming a first membrane mask pattern on the graphene pattern; and performing an etching process on the grapheme pattern using the first membrane mask pattern as an etching mask to form a micro graphene pattern.
The method of fabricating a graphene nano device of claim 1, wherein a portion of the substrate is exposed by the etching process, the method further comprising forming a metal electrode pattern on the exposed substrate, 25 wherein the forming of the metal mask pattern on the substrate comprises: 17 forming a second metal mask pattern on the substrate; depositing a metal layer on the substrate on which the second metal mask pattern is formed; and removing the second metal mask pattern after depositing the metal layer.
The method of fabricating a graphene nano device of claim 1, wherein 15 a portion of the substrate is exposed by the etching process, the method further comprising forming a micro metal electrode pattern on the exposed substrate, wherein the forming of the micro metal electrode pattern comprises: forming a second membrane mask pattern on the substrate; 20 depositing a metal layer on the substrate on which the second membrane mask pattern is formed; and removing the second membrane mask pattern after depositing the metal layer. 18
The method of fabricating a graphene nano device of claim 1, further comprising separating the first metal mask pattern from the substrate after forming the graphene pattern, wherein the first metal mask pattern is separated from the substrate by 5 removing the first adhesive layer using an organic solvent. 19
Layer stacks claimed or described, ordered top of device to substrate.
graphene nano device
Materials described outside the worked examples.
graphene layer
first metal mask pattern
first adhesive layer
Additional fabrication and treatment steps described in the patent.
Patent
Atlas literature
Patent
US 9,129,882Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a flowchart for explaining a method of fabricating a graphene nano device according to an embodiment of the inventive concept; [0022]
FIGS. 2A to 9A are plan views for explaining a method of fabricating a graphene nano device according to an embodiment of the inventive concept; and 15 [0023]
FIGS. 3A and 3 B) in the second area B remained after performing the first etching process. [0034] After forming the second metal mask pattern 133 on the …
FIGS. 4A and 4 B) from the substrate 100, a third metal mask pattern 20 143 may be formed on the substrate 100 on which the first and second graphene patterns …
FIGS. 5 A and 5B) from a planar view. In detail, the first metal electrode pattern M 1 may be spaced apart from the second graphene pattern 113 in the opposite …
FIGS. 6A and 6 B, first and second metal electrode 5 patterns M 1 and M₂ may be formed in the second area B of the substrate 100. In some embodiments, the first …
FIGS. 8A and 8 B, a second membrane mask pattern 163 20 may be formed on the product including the micro graphene pattern G. [0043] In some embodiments, the …
FIGS. 9A and 9 B, a micro metal electrode pattern M₃ may be formed on the substrate 100 exposed by the fifth opening 165 (see
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of fabricating a graphene nano device, comprising: forming a first metal mask pattern on a substrate on which a graphene layer is formed; and 5 forming a graphene pattern by performing an etching process on the graphene layer using the first metal mask pattern as an etching mask, wherein the forming of the first metal mask pattern comprises: forming a first adhesive layer on the graphene layer; disposing the first metal mask pattern prepared in advance on the first 10 adhesive layer; and heating the first adhesive layer to attach the first metal mask pattern on the substrate.
The method of fabricating a graphene nano device of claim 1, further 15 comprising: forming a first membrane mask pattern on the graphene pattern; and performing an etching process on the grapheme pattern using the first membrane mask pattern as an etching mask to form a micro graphene pattern.
The method of fabricating a graphene nano device of claim 1, wherein a portion of the substrate is exposed by the etching process, the method further comprising forming a metal electrode pattern on the exposed substrate, 25 wherein the forming of the metal mask pattern on the substrate comprises: 17 forming a second metal mask pattern on the substrate; depositing a metal layer on the substrate on which the second metal mask pattern is formed; and removing the second metal mask pattern after depositing the metal layer.
The method of fabricating a graphene nano device of claim 1, wherein 15 a portion of the substrate is exposed by the etching process, the method further comprising forming a micro metal electrode pattern on the exposed substrate, wherein the forming of the micro metal electrode pattern comprises: forming a second membrane mask pattern on the substrate; 20 depositing a metal layer on the substrate on which the second membrane mask pattern is formed; and removing the second membrane mask pattern after depositing the metal layer. 18
The method of fabricating a graphene nano device of claim 1, further comprising separating the first metal mask pattern from the substrate after forming the graphene pattern, wherein the first metal mask pattern is separated from the substrate by 5 removing the first adhesive layer using an organic solvent. 19
Layer stacks claimed or described, ordered top of device to substrate.
graphene nano device
Materials described outside the worked examples.
graphene layer
first metal mask pattern
first adhesive layer
Additional fabrication and treatment steps described in the patent.
Patent
Atlas literature
Patent
US 9,129,882Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a flowchart for explaining a method of fabricating a graphene nano device according to an embodiment of the inventive concept; [0022]
FIGS. 2A to 9A are plan views for explaining a method of fabricating a graphene nano device according to an embodiment of the inventive concept; and 15 [0023]
FIGS. 3A and 3 B) in the second area B remained after performing the first etching process. [0034] After forming the second metal mask pattern 133 on the …
FIGS. 4A and 4 B) from the substrate 100, a third metal mask pattern 20 143 may be formed on the substrate 100 on which the first and second graphene patterns …
FIGS. 5 A and 5B) from a planar view. In detail, the first metal electrode pattern M 1 may be spaced apart from the second graphene pattern 113 in the opposite …
FIGS. 6A and 6 B, first and second metal electrode 5 patterns M 1 and M₂ may be formed in the second area B of the substrate 100. In some embodiments, the first …
FIGS. 8A and 8 B, a second membrane mask pattern 163 20 may be formed on the product including the micro graphene pattern G. [0043] In some embodiments, the …
FIGS. 9A and 9 B, a micro metal electrode pattern M₃ may be formed on the substrate 100 exposed by the fifth opening 165 (see
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of fabricating a graphene nano device, comprising: forming a first metal mask pattern on a substrate on which a graphene layer is formed; and 5 forming a graphene pattern by performing an etching process on the graphene layer using the first metal mask pattern as an etching mask, wherein the forming of the first metal mask pattern comprises: forming a first adhesive layer on the graphene layer; disposing the first metal mask pattern prepared in advance on the first 10 adhesive layer; and heating the first adhesive layer to attach the first metal mask pattern on the substrate.
The method of fabricating a graphene nano device of claim 1, further 15 comprising: forming a first membrane mask pattern on the graphene pattern; and performing an etching process on the grapheme pattern using the first membrane mask pattern as an etching mask to form a micro graphene pattern.
The method of fabricating a graphene nano device of claim 1, wherein a portion of the substrate is exposed by the etching process, the method further comprising forming a metal electrode pattern on the exposed substrate, 25 wherein the forming of the metal mask pattern on the substrate comprises: 17 forming a second metal mask pattern on the substrate; depositing a metal layer on the substrate on which the second metal mask pattern is formed; and removing the second metal mask pattern after depositing the metal layer.
The method of fabricating a graphene nano device of claim 1, wherein 15 a portion of the substrate is exposed by the etching process, the method further comprising forming a micro metal electrode pattern on the exposed substrate, wherein the forming of the micro metal electrode pattern comprises: forming a second membrane mask pattern on the substrate; 20 depositing a metal layer on the substrate on which the second membrane mask pattern is formed; and removing the second membrane mask pattern after depositing the metal layer. 18
The method of fabricating a graphene nano device of claim 1, further comprising separating the first metal mask pattern from the substrate after forming the graphene pattern, wherein the first metal mask pattern is separated from the substrate by 5 removing the first adhesive layer using an organic solvent. 19
Layer stacks claimed or described, ordered top of device to substrate.
graphene nano device
Materials described outside the worked examples.
graphene layer
first metal mask pattern
first adhesive layer
Additional fabrication and treatment steps described in the patent.
Patent
Atlas literature
Patent
US 9,129,882Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a flowchart for explaining a method of fabricating a graphene nano device according to an embodiment of the inventive concept; [0022]
FIGS. 2A to 9A are plan views for explaining a method of fabricating a graphene nano device according to an embodiment of the inventive concept; and 15 [0023]
FIGS. 3A and 3 B) in the second area B remained after performing the first etching process. [0034] After forming the second metal mask pattern 133 on the …
FIGS. 4A and 4 B) from the substrate 100, a third metal mask pattern 20 143 may be formed on the substrate 100 on which the first and second graphene patterns …
FIGS. 5 A and 5B) from a planar view. In detail, the first metal electrode pattern M 1 may be spaced apart from the second graphene pattern 113 in the opposite …
FIGS. 6A and 6 B, first and second metal electrode 5 patterns M 1 and M₂ may be formed in the second area B of the substrate 100. In some embodiments, the first …
FIGS. 8A and 8 B, a second membrane mask pattern 163 20 may be formed on the product including the micro graphene pattern G. [0043] In some embodiments, the …
FIGS. 9A and 9 B, a micro metal electrode pattern M₃ may be formed on the substrate 100 exposed by the fifth opening 165 (see
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of fabricating a graphene nano device, comprising: forming a first metal mask pattern on a substrate on which a graphene layer is formed; and 5 forming a graphene pattern by performing an etching process on the graphene layer using the first metal mask pattern as an etching mask, wherein the forming of the first metal mask pattern comprises: forming a first adhesive layer on the graphene layer; disposing the first metal mask pattern prepared in advance on the first 10 adhesive layer; and heating the first adhesive layer to attach the first metal mask pattern on the substrate.
The method of fabricating a graphene nano device of claim 1, further 15 comprising: forming a first membrane mask pattern on the graphene pattern; and performing an etching process on the grapheme pattern using the first membrane mask pattern as an etching mask to form a micro graphene pattern.
The method of fabricating a graphene nano device of claim 1, wherein a portion of the substrate is exposed by the etching process, the method further comprising forming a metal electrode pattern on the exposed substrate, 25 wherein the forming of the metal mask pattern on the substrate comprises: 17 forming a second metal mask pattern on the substrate; depositing a metal layer on the substrate on which the second metal mask pattern is formed; and removing the second metal mask pattern after depositing the metal layer.
The method of fabricating a graphene nano device of claim 1, wherein 15 a portion of the substrate is exposed by the etching process, the method further comprising forming a micro metal electrode pattern on the exposed substrate, wherein the forming of the micro metal electrode pattern comprises: forming a second membrane mask pattern on the substrate; 20 depositing a metal layer on the substrate on which the second membrane mask pattern is formed; and removing the second membrane mask pattern after depositing the metal layer. 18
The method of fabricating a graphene nano device of claim 1, further comprising separating the first metal mask pattern from the substrate after forming the graphene pattern, wherein the first metal mask pattern is separated from the substrate by 5 removing the first adhesive layer using an organic solvent. 19
Layer stacks claimed or described, ordered top of device to substrate.
graphene nano device
Materials described outside the worked examples.
graphene layer
first metal mask pattern
first adhesive layer
Additional fabrication and treatment steps described in the patent.
first membrane mask pattern
second adhesive layer
silicon oxide layer
SiO₂
silicon nitride layer
Si₃N₄
silicon oxynitride layer
SiON
metal layer
third adhesive layer
organic solvent
first metal mask pattern (Ti, Cr, Mo, Ta or Al)
substrate
first membrane mask pattern
second adhesive layer
silicon oxide layer
SiO₂
silicon nitride layer
Si₃N₄
silicon oxynitride layer
SiON
metal layer
third adhesive layer
organic solvent
first metal mask pattern (Ti, Cr, Mo, Ta or Al)
substrate
first membrane mask pattern
second adhesive layer
silicon oxide layer
SiO₂
silicon nitride layer
Si₃N₄
silicon oxynitride layer
SiON
metal layer
third adhesive layer
organic solvent
first metal mask pattern (Ti, Cr, Mo, Ta or Al)
substrate
first membrane mask pattern
second adhesive layer
silicon oxide layer
SiO₂
silicon nitride layer
Si₃N₄
silicon oxynitride layer
SiON
metal layer
third adhesive layer
organic solvent
first metal mask pattern (Ti, Cr, Mo, Ta or Al)
substrate