Patent
US 9,156,699METHOD FOR PRODUCING GRAPHENE, AND GRAPHENE
Takatoshi YAMADA
US
Copyright © 2026 Matter42. All rights reserved.
Patent
Atlas literature
Patent
US 9,156,699Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a view schematically showing a copper foil substrate having an organic substance applied thereon according to the present invention;
FIG. 2 is a cross-sectional view schematically showing a surface wave microwave plasma treatment device used in Examples 1 and 2; -5-
FIG. 3 is a schematic view of graphene, formed on a copper foil, obtained according to the present invention;
FIG. 4 shows a Raman scattering spectrum of graphene formed in Example 1;
FIG. 5 is an enlarged view of the G band and the vicinity thereof of the Raman 5 scattering spectrum of graphene formed in Example 1;
FIG. 6 is an enlarged view of the 2D band and the vicinity thereof of the Raman scattering spectrum of graphene formed in Example 1;
FIG. 7 is a photograph showing a transmitted image of graphene formed in Example 1 observed by an electronic microscope; 10
FIG. 8 shows a Raman scattering spectrum of graphene formed in Example 2;
FIG. 9 is an enlarged view of the G band and the vicinity thereof of the Raman scattering spectrum of graphene formed in Example 2;
FIG. 10 is an enlarged view of the 2D band and the vicinity thereof of the Raman scattering spectrum of graphene formed in Example 2; 15
FIG. 11 is a cross-sectional view schematically showing a surface wave microwave plasma treatment device having a large area size used in Examples 3 and 4;
FIG. 12 shows the relationship between the time from the start of plasma treatment and the temperature of the substrate in Example 3; 20
FIG. 13 shows a Raman scattering spectrum of graphene formed on a copper foil having poly(methyl methacrylate) applied thereon as an organic substance in …
FIG. 14 shows a Raman scattering spectrum of graphene formed on a copper foil having benzotriazole applied thereon as an organic substance in Example 3; 25
FIG. 15 shows a Raman scattering spectrum of graphene formed on a copper foil having poly(methyl methacrylate) applied thereon as an organic substance in …
FIG. 16 shows a Raman scattering spectrum of graphene formed on a copper -6- foil having benzotriazole applied thereon as an organic substance in Example 4;
FIG. 17 shows a Raman scattering spectrum of a sample obtained by heat treatment performed on a copper foil having poly(methyl methacrylate) applied thereon as …
FIG. 18 shows a Raman scattering spectrum of a sample obtained by heat treatment performed on a copper foil having benzotriazole applied thereon as an organic …
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for producing graphene, comprising performing a surface wave microwave plasma treatment using hydrogen-containing gas on a metal substrate having an organic substance thereon under a low pressure of 50 Pa or lower while a temperature of the metal substrate having the organic substance thereoninside a surface wave microwave plasma treatment device is set to 500 ± °C or lower, thereby growing graphene on a surface of the organic substance.
The method for producing graphene according to claim 1, wherein the organic substance is poly(methyl methacrylate) or benzotriazole.
The method for producing graphene according to claim 1, wherein the metal substrate is a copper thin film. 4-5.
The method for producing graphene according to claim 1, wherein the plasma treatment is performed about 1 second to 50 minutes.
The method for producing graphene according to claim 1, wherein the organic substance is selected from a group consisting of acrylic resins, benzotriazoles, polymers, phenol resins, and combination thereof.
The method for producing graphene according to claim 1, wherein the organic substance is selected from a group consisting of polyacrylic acid, polyacrylic acid ester, polymethacrylic acid, polymethacrylic acid ester, poly(methyl methacrylate), polyethyleneglycol-bis (1,2,3-benzotriazolyl ether), polyethyleneglycol- 1,2,3-benzotriazolyl ether, poly (vinyl chloride), polyethylene, phenol resins, and combination thereof. 3 SVG 13963369.04-27-2015.I₈ZZSQPSPXXIFW3.CLM15060120.1.301.160.2249.249.svg 0.297 6.493 Graph Black and white
The method for producing graphene according to claim 1, wherein the metal substrate is made of a metal material selected from a group consisting of nickel, copper, iridium, platinum, and combination thereof.
canceled
canceled
A method for producing graphene, comprising performing a surface wave microwave plasma treatment using hydrogen-containing gas on a metal substrate having an organic substance thereon under a low pressure of 50 Pa or lower while a temperature of the metal substrate having the organic substance thereon inside a surface wave microwave plasma treatment device is set to 500 ± °C or lower, thereby forming a stack including the metal 2 SVG 13963369.04-27-2015.I₈ZZSQPSPXXIFW3.CLM15060119.1.301.160.2249.249.svg 0.297 6.493 Graph Black and white substrate and graphene grown on a surface of the organic substance applied on the metal substrate; and peeling off the graphene from the metal substrate.
The method for producing graphene according to claim 6, wherein the organic substance is poly(methyl methacrylate) or benzotriazole.
The method for producing graphene according to claim 6, wherein the metal substrate is a copper thin film. 9-10.
The method for producing graphene according to claim 6, wherein the plasma treatment is performed about 1 second to 50 minutes.
The method for producing graphene according to claim 6, wherein the organic substance is selected from a group consisting of acrylic resins, benzotriazoles, polymers, phenol resins, and combination thereof.
The method for producing graphene according to claim 6, wherein the organic substance is selected from a group consisting of polyacrylic acid, polyacrylic acid ester, polymethacrylic acid, polymethacrylic acid ester, poly(methyl methacrylate), polyethyleneglycol-bis (1,2,3-benzotriazolyl ether), polyethyleneglycol- 1,2,3-benzotriazolyl ether, poly (vinyl chloride), polyethylene, phenol resins, and combination thereof.
The method for producing graphene according to claim 6, wherein the metal substrate is made of a metal material selected from a group consisting of nickel, copper, iridium, platinum, and combination thereof. 4
canceled
canceled
Materials described outside the worked examples.
graphene
C
metal substrate
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Electron Density | 10¹¹ to 10¹² /cm3 | — |
Duration | 1–3000 s |
Patent
Atlas literature
Patent
US 9,156,699Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a view schematically showing a copper foil substrate having an organic substance applied thereon according to the present invention;
FIG. 2 is a cross-sectional view schematically showing a surface wave microwave plasma treatment device used in Examples 1 and 2; -5-
FIG. 3 is a schematic view of graphene, formed on a copper foil, obtained according to the present invention;
FIG. 4 shows a Raman scattering spectrum of graphene formed in Example 1;
FIG. 5 is an enlarged view of the G band and the vicinity thereof of the Raman 5 scattering spectrum of graphene formed in Example 1;
FIG. 6 is an enlarged view of the 2D band and the vicinity thereof of the Raman scattering spectrum of graphene formed in Example 1;
FIG. 7 is a photograph showing a transmitted image of graphene formed in Example 1 observed by an electronic microscope; 10
FIG. 8 shows a Raman scattering spectrum of graphene formed in Example 2;
FIG. 9 is an enlarged view of the G band and the vicinity thereof of the Raman scattering spectrum of graphene formed in Example 2;
FIG. 10 is an enlarged view of the 2D band and the vicinity thereof of the Raman scattering spectrum of graphene formed in Example 2; 15
FIG. 11 is a cross-sectional view schematically showing a surface wave microwave plasma treatment device having a large area size used in Examples 3 and 4;
FIG. 12 shows the relationship between the time from the start of plasma treatment and the temperature of the substrate in Example 3; 20
FIG. 13 shows a Raman scattering spectrum of graphene formed on a copper foil having poly(methyl methacrylate) applied thereon as an organic substance in …
FIG. 14 shows a Raman scattering spectrum of graphene formed on a copper foil having benzotriazole applied thereon as an organic substance in Example 3; 25
FIG. 15 shows a Raman scattering spectrum of graphene formed on a copper foil having poly(methyl methacrylate) applied thereon as an organic substance in …
FIG. 16 shows a Raman scattering spectrum of graphene formed on a copper -6- foil having benzotriazole applied thereon as an organic substance in Example 4;
FIG. 17 shows a Raman scattering spectrum of a sample obtained by heat treatment performed on a copper foil having poly(methyl methacrylate) applied thereon as …
FIG. 18 shows a Raman scattering spectrum of a sample obtained by heat treatment performed on a copper foil having benzotriazole applied thereon as an organic …
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for producing graphene, comprising performing a surface wave microwave plasma treatment using hydrogen-containing gas on a metal substrate having an organic substance thereon under a low pressure of 50 Pa or lower while a temperature of the metal substrate having the organic substance thereoninside a surface wave microwave plasma treatment device is set to 500 ± °C or lower, thereby growing graphene on a surface of the organic substance.
The method for producing graphene according to claim 1, wherein the organic substance is poly(methyl methacrylate) or benzotriazole.
The method for producing graphene according to claim 1, wherein the metal substrate is a copper thin film. 4-5.
The method for producing graphene according to claim 1, wherein the plasma treatment is performed about 1 second to 50 minutes.
The method for producing graphene according to claim 1, wherein the organic substance is selected from a group consisting of acrylic resins, benzotriazoles, polymers, phenol resins, and combination thereof.
The method for producing graphene according to claim 1, wherein the organic substance is selected from a group consisting of polyacrylic acid, polyacrylic acid ester, polymethacrylic acid, polymethacrylic acid ester, poly(methyl methacrylate), polyethyleneglycol-bis (1,2,3-benzotriazolyl ether), polyethyleneglycol- 1,2,3-benzotriazolyl ether, poly (vinyl chloride), polyethylene, phenol resins, and combination thereof. 3 SVG 13963369.04-27-2015.I₈ZZSQPSPXXIFW3.CLM15060120.1.301.160.2249.249.svg 0.297 6.493 Graph Black and white
The method for producing graphene according to claim 1, wherein the metal substrate is made of a metal material selected from a group consisting of nickel, copper, iridium, platinum, and combination thereof.
canceled
canceled
A method for producing graphene, comprising performing a surface wave microwave plasma treatment using hydrogen-containing gas on a metal substrate having an organic substance thereon under a low pressure of 50 Pa or lower while a temperature of the metal substrate having the organic substance thereon inside a surface wave microwave plasma treatment device is set to 500 ± °C or lower, thereby forming a stack including the metal 2 SVG 13963369.04-27-2015.I₈ZZSQPSPXXIFW3.CLM15060119.1.301.160.2249.249.svg 0.297 6.493 Graph Black and white substrate and graphene grown on a surface of the organic substance applied on the metal substrate; and peeling off the graphene from the metal substrate.
The method for producing graphene according to claim 6, wherein the organic substance is poly(methyl methacrylate) or benzotriazole.
The method for producing graphene according to claim 6, wherein the metal substrate is a copper thin film. 9-10.
The method for producing graphene according to claim 6, wherein the plasma treatment is performed about 1 second to 50 minutes.
The method for producing graphene according to claim 6, wherein the organic substance is selected from a group consisting of acrylic resins, benzotriazoles, polymers, phenol resins, and combination thereof.
The method for producing graphene according to claim 6, wherein the organic substance is selected from a group consisting of polyacrylic acid, polyacrylic acid ester, polymethacrylic acid, polymethacrylic acid ester, poly(methyl methacrylate), polyethyleneglycol-bis (1,2,3-benzotriazolyl ether), polyethyleneglycol- 1,2,3-benzotriazolyl ether, poly (vinyl chloride), polyethylene, phenol resins, and combination thereof.
The method for producing graphene according to claim 6, wherein the metal substrate is made of a metal material selected from a group consisting of nickel, copper, iridium, platinum, and combination thereof. 4
canceled
canceled
Materials described outside the worked examples.
graphene
C
metal substrate
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Electron Density | 10¹¹ to 10¹² /cm3 | — |
Duration | 1–3000 s |
Patent
Atlas literature
Patent
US 9,156,699Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a view schematically showing a copper foil substrate having an organic substance applied thereon according to the present invention;
FIG. 2 is a cross-sectional view schematically showing a surface wave microwave plasma treatment device used in Examples 1 and 2; -5-
FIG. 3 is a schematic view of graphene, formed on a copper foil, obtained according to the present invention;
FIG. 4 shows a Raman scattering spectrum of graphene formed in Example 1;
FIG. 5 is an enlarged view of the G band and the vicinity thereof of the Raman 5 scattering spectrum of graphene formed in Example 1;
FIG. 6 is an enlarged view of the 2D band and the vicinity thereof of the Raman scattering spectrum of graphene formed in Example 1;
FIG. 7 is a photograph showing a transmitted image of graphene formed in Example 1 observed by an electronic microscope; 10
FIG. 8 shows a Raman scattering spectrum of graphene formed in Example 2;
FIG. 9 is an enlarged view of the G band and the vicinity thereof of the Raman scattering spectrum of graphene formed in Example 2;
FIG. 10 is an enlarged view of the 2D band and the vicinity thereof of the Raman scattering spectrum of graphene formed in Example 2; 15
FIG. 11 is a cross-sectional view schematically showing a surface wave microwave plasma treatment device having a large area size used in Examples 3 and 4;
FIG. 12 shows the relationship between the time from the start of plasma treatment and the temperature of the substrate in Example 3; 20
FIG. 13 shows a Raman scattering spectrum of graphene formed on a copper foil having poly(methyl methacrylate) applied thereon as an organic substance in …
FIG. 14 shows a Raman scattering spectrum of graphene formed on a copper foil having benzotriazole applied thereon as an organic substance in Example 3; 25
FIG. 15 shows a Raman scattering spectrum of graphene formed on a copper foil having poly(methyl methacrylate) applied thereon as an organic substance in …
FIG. 16 shows a Raman scattering spectrum of graphene formed on a copper -6- foil having benzotriazole applied thereon as an organic substance in Example 4;
FIG. 17 shows a Raman scattering spectrum of a sample obtained by heat treatment performed on a copper foil having poly(methyl methacrylate) applied thereon as …
FIG. 18 shows a Raman scattering spectrum of a sample obtained by heat treatment performed on a copper foil having benzotriazole applied thereon as an organic …
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for producing graphene, comprising performing a surface wave microwave plasma treatment using hydrogen-containing gas on a metal substrate having an organic substance thereon under a low pressure of 50 Pa or lower while a temperature of the metal substrate having the organic substance thereoninside a surface wave microwave plasma treatment device is set to 500 ± °C or lower, thereby growing graphene on a surface of the organic substance.
The method for producing graphene according to claim 1, wherein the organic substance is poly(methyl methacrylate) or benzotriazole.
The method for producing graphene according to claim 1, wherein the metal substrate is a copper thin film. 4-5.
The method for producing graphene according to claim 1, wherein the plasma treatment is performed about 1 second to 50 minutes.
The method for producing graphene according to claim 1, wherein the organic substance is selected from a group consisting of acrylic resins, benzotriazoles, polymers, phenol resins, and combination thereof.
The method for producing graphene according to claim 1, wherein the organic substance is selected from a group consisting of polyacrylic acid, polyacrylic acid ester, polymethacrylic acid, polymethacrylic acid ester, poly(methyl methacrylate), polyethyleneglycol-bis (1,2,3-benzotriazolyl ether), polyethyleneglycol- 1,2,3-benzotriazolyl ether, poly (vinyl chloride), polyethylene, phenol resins, and combination thereof. 3 SVG 13963369.04-27-2015.I₈ZZSQPSPXXIFW3.CLM15060120.1.301.160.2249.249.svg 0.297 6.493 Graph Black and white
The method for producing graphene according to claim 1, wherein the metal substrate is made of a metal material selected from a group consisting of nickel, copper, iridium, platinum, and combination thereof.
canceled
canceled
A method for producing graphene, comprising performing a surface wave microwave plasma treatment using hydrogen-containing gas on a metal substrate having an organic substance thereon under a low pressure of 50 Pa or lower while a temperature of the metal substrate having the organic substance thereon inside a surface wave microwave plasma treatment device is set to 500 ± °C or lower, thereby forming a stack including the metal 2 SVG 13963369.04-27-2015.I₈ZZSQPSPXXIFW3.CLM15060119.1.301.160.2249.249.svg 0.297 6.493 Graph Black and white substrate and graphene grown on a surface of the organic substance applied on the metal substrate; and peeling off the graphene from the metal substrate.
The method for producing graphene according to claim 6, wherein the organic substance is poly(methyl methacrylate) or benzotriazole.
The method for producing graphene according to claim 6, wherein the metal substrate is a copper thin film. 9-10.
The method for producing graphene according to claim 6, wherein the plasma treatment is performed about 1 second to 50 minutes.
The method for producing graphene according to claim 6, wherein the organic substance is selected from a group consisting of acrylic resins, benzotriazoles, polymers, phenol resins, and combination thereof.
The method for producing graphene according to claim 6, wherein the organic substance is selected from a group consisting of polyacrylic acid, polyacrylic acid ester, polymethacrylic acid, polymethacrylic acid ester, poly(methyl methacrylate), polyethyleneglycol-bis (1,2,3-benzotriazolyl ether), polyethyleneglycol- 1,2,3-benzotriazolyl ether, poly (vinyl chloride), polyethylene, phenol resins, and combination thereof.
The method for producing graphene according to claim 6, wherein the metal substrate is made of a metal material selected from a group consisting of nickel, copper, iridium, platinum, and combination thereof. 4
canceled
canceled
Materials described outside the worked examples.
graphene
C
metal substrate
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Electron Density | 10¹¹ to 10¹² /cm3 | — |
Duration | 1–3000 s |
Patent
Atlas literature
Patent
US 9,156,699Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1 is a view schematically showing a copper foil substrate having an organic substance applied thereon according to the present invention;
FIG. 2 is a cross-sectional view schematically showing a surface wave microwave plasma treatment device used in Examples 1 and 2; -5-
FIG. 3 is a schematic view of graphene, formed on a copper foil, obtained according to the present invention;
FIG. 4 shows a Raman scattering spectrum of graphene formed in Example 1;
FIG. 5 is an enlarged view of the G band and the vicinity thereof of the Raman 5 scattering spectrum of graphene formed in Example 1;
FIG. 6 is an enlarged view of the 2D band and the vicinity thereof of the Raman scattering spectrum of graphene formed in Example 1;
FIG. 7 is a photograph showing a transmitted image of graphene formed in Example 1 observed by an electronic microscope; 10
FIG. 8 shows a Raman scattering spectrum of graphene formed in Example 2;
FIG. 9 is an enlarged view of the G band and the vicinity thereof of the Raman scattering spectrum of graphene formed in Example 2;
FIG. 10 is an enlarged view of the 2D band and the vicinity thereof of the Raman scattering spectrum of graphene formed in Example 2; 15
FIG. 11 is a cross-sectional view schematically showing a surface wave microwave plasma treatment device having a large area size used in Examples 3 and 4;
FIG. 12 shows the relationship between the time from the start of plasma treatment and the temperature of the substrate in Example 3; 20
FIG. 13 shows a Raman scattering spectrum of graphene formed on a copper foil having poly(methyl methacrylate) applied thereon as an organic substance in …
FIG. 14 shows a Raman scattering spectrum of graphene formed on a copper foil having benzotriazole applied thereon as an organic substance in Example 3; 25
FIG. 15 shows a Raman scattering spectrum of graphene formed on a copper foil having poly(methyl methacrylate) applied thereon as an organic substance in …
FIG. 16 shows a Raman scattering spectrum of graphene formed on a copper -6- foil having benzotriazole applied thereon as an organic substance in Example 4;
FIG. 17 shows a Raman scattering spectrum of a sample obtained by heat treatment performed on a copper foil having poly(methyl methacrylate) applied thereon as …
FIG. 18 shows a Raman scattering spectrum of a sample obtained by heat treatment performed on a copper foil having benzotriazole applied thereon as an organic …
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for producing graphene, comprising performing a surface wave microwave plasma treatment using hydrogen-containing gas on a metal substrate having an organic substance thereon under a low pressure of 50 Pa or lower while a temperature of the metal substrate having the organic substance thereoninside a surface wave microwave plasma treatment device is set to 500 ± °C or lower, thereby growing graphene on a surface of the organic substance.
The method for producing graphene according to claim 1, wherein the organic substance is poly(methyl methacrylate) or benzotriazole.
The method for producing graphene according to claim 1, wherein the metal substrate is a copper thin film. 4-5.
The method for producing graphene according to claim 1, wherein the plasma treatment is performed about 1 second to 50 minutes.
The method for producing graphene according to claim 1, wherein the organic substance is selected from a group consisting of acrylic resins, benzotriazoles, polymers, phenol resins, and combination thereof.
The method for producing graphene according to claim 1, wherein the organic substance is selected from a group consisting of polyacrylic acid, polyacrylic acid ester, polymethacrylic acid, polymethacrylic acid ester, poly(methyl methacrylate), polyethyleneglycol-bis (1,2,3-benzotriazolyl ether), polyethyleneglycol- 1,2,3-benzotriazolyl ether, poly (vinyl chloride), polyethylene, phenol resins, and combination thereof. 3 SVG 13963369.04-27-2015.I₈ZZSQPSPXXIFW3.CLM15060120.1.301.160.2249.249.svg 0.297 6.493 Graph Black and white
The method for producing graphene according to claim 1, wherein the metal substrate is made of a metal material selected from a group consisting of nickel, copper, iridium, platinum, and combination thereof.
canceled
canceled
A method for producing graphene, comprising performing a surface wave microwave plasma treatment using hydrogen-containing gas on a metal substrate having an organic substance thereon under a low pressure of 50 Pa or lower while a temperature of the metal substrate having the organic substance thereon inside a surface wave microwave plasma treatment device is set to 500 ± °C or lower, thereby forming a stack including the metal 2 SVG 13963369.04-27-2015.I₈ZZSQPSPXXIFW3.CLM15060119.1.301.160.2249.249.svg 0.297 6.493 Graph Black and white substrate and graphene grown on a surface of the organic substance applied on the metal substrate; and peeling off the graphene from the metal substrate.
The method for producing graphene according to claim 6, wherein the organic substance is poly(methyl methacrylate) or benzotriazole.
The method for producing graphene according to claim 6, wherein the metal substrate is a copper thin film. 9-10.
The method for producing graphene according to claim 6, wherein the plasma treatment is performed about 1 second to 50 minutes.
The method for producing graphene according to claim 6, wherein the organic substance is selected from a group consisting of acrylic resins, benzotriazoles, polymers, phenol resins, and combination thereof.
The method for producing graphene according to claim 6, wherein the organic substance is selected from a group consisting of polyacrylic acid, polyacrylic acid ester, polymethacrylic acid, polymethacrylic acid ester, poly(methyl methacrylate), polyethyleneglycol-bis (1,2,3-benzotriazolyl ether), polyethyleneglycol- 1,2,3-benzotriazolyl ether, poly (vinyl chloride), polyethylene, phenol resins, and combination thereof.
The method for producing graphene according to claim 6, wherein the metal substrate is made of a metal material selected from a group consisting of nickel, copper, iridium, platinum, and combination thereof. 4
canceled
canceled
Materials described outside the worked examples.
graphene
C
metal substrate
Additional fabrication and treatment steps described in the patent.
Measurements and analyses referenced in the patent, with their drawing references.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Electron Density | 10¹¹ to 10¹² /cm3 | — |
Duration | 1–3000 s |
hydrogen-containing gas
poly(methyl methacrylate)
benzotriazole
copper thin film
Cu
organic substance (acrylic resins, benzotriazoles, polymers, phenol resins)
organic substance (polyacrylic acid, polyacrylic acid ester, polymethacrylic acid, polymethacrylic acid ester, poly(methyl methacrylate), polyethyleneglycol-bis(1,2,3-benzotriazolyl ether), polyethyleneglycol-1,2,3-benzotriazolyl ether, poly(vinyl chloride), polyethylene, phenol resins)
metal substrate (nickel, copper, iridium, platinum)
| — |
Duration | 1–1200 s | — |
Thickness | 40–190 mm | — |
Pressure | 2–50 Pa | — |
Pressure | 2–20 Pa | — |
Pressure | 0.0001 Pa | — |
hydrogen-containing gas
poly(methyl methacrylate)
benzotriazole
copper thin film
Cu
organic substance (acrylic resins, benzotriazoles, polymers, phenol resins)
organic substance (polyacrylic acid, polyacrylic acid ester, polymethacrylic acid, polymethacrylic acid ester, poly(methyl methacrylate), polyethyleneglycol-bis(1,2,3-benzotriazolyl ether), polyethyleneglycol-1,2,3-benzotriazolyl ether, poly(vinyl chloride), polyethylene, phenol resins)
metal substrate (nickel, copper, iridium, platinum)
| — |
Duration | 1–1200 s | — |
Thickness | 40–190 mm | — |
Pressure | 2–50 Pa | — |
Pressure | 2–20 Pa | — |
Pressure | 0.0001 Pa | — |
hydrogen-containing gas
poly(methyl methacrylate)
benzotriazole
copper thin film
Cu
organic substance (acrylic resins, benzotriazoles, polymers, phenol resins)
organic substance (polyacrylic acid, polyacrylic acid ester, polymethacrylic acid, polymethacrylic acid ester, poly(methyl methacrylate), polyethyleneglycol-bis(1,2,3-benzotriazolyl ether), polyethyleneglycol-1,2,3-benzotriazolyl ether, poly(vinyl chloride), polyethylene, phenol resins)
metal substrate (nickel, copper, iridium, platinum)
| — |
Duration | 1–1200 s | — |
Thickness | 40–190 mm | — |
Pressure | 2–50 Pa | — |
Pressure | 2–20 Pa | — |
Pressure | 0.0001 Pa | — |
hydrogen-containing gas
poly(methyl methacrylate)
benzotriazole
copper thin film
Cu
organic substance (acrylic resins, benzotriazoles, polymers, phenol resins)
organic substance (polyacrylic acid, polyacrylic acid ester, polymethacrylic acid, polymethacrylic acid ester, poly(methyl methacrylate), polyethyleneglycol-bis(1,2,3-benzotriazolyl ether), polyethyleneglycol-1,2,3-benzotriazolyl ether, poly(vinyl chloride), polyethylene, phenol resins)
metal substrate (nickel, copper, iridium, platinum)
| — |
Duration | 1–1200 s | — |
Thickness | 40–190 mm | — |
Pressure | 2–50 Pa | — |
Pressure | 2–20 Pa | — |
Pressure | 0.0001 Pa | — |