Patent
US 9,120,675Graphene solutions
Alain Penicaud
US
Copyright © 2026 Matter42. All rights reserved.
Patent
Atlas literature
Patent
US 9,120,675Patent drawings and their descriptions. Click a drawing to enlarge it.
Figures 30 -
Figure 1 schematically illustrates one embodiment of the invention. In the illustrated example, graphite is reduced by a potassium compound (for example a potassium naphthalene 37 salt) in the presence of TH F to lead to a graphite int ercalation compound. The latter is isolated for example by …
Figure 2 shows two possible applica t ions, among others, of reduced graphene solu t ions of t he present application: (i) the deposit of graphene planes on a substrate and (ii) incorporation of said graphene planes in a polymer or a mixture of polymers for the prepara t ion of composite 10 …
Figure 3 shows a tunnelling microscopy picture (low resolution) of the de p osi t obtained by drying a solu t ion o f K(THF) YCX in NMP. The substrate is HOP G graphi t e (highly oriented pyrolytic graphite); the solution of NMP has been 15 diluted twice with acetone. The height of the large …
Figure 4 shows a tunnelling microscopy picture (STM) of a graphene deposit on a HOP G substrate by drop-casting an NMP solution of reduced graphene according to t he method of the 20 inven t ion, obtained from graphite par t icles from graphite electrodes. -
Figure 5 shows an atomic force microscopy picture (AFM) of a graphene deposit obtained by dip-coating an NMP solu t ion of reduced graphene on an Si/SiO₂ wafer. 25 -
Figure 6 shows an atomic force microscopy picture (AFM) of a graphene deposit obtained by dip-coating an NMP solution of reduced graphene on nickel-modified-surface mica. Examples Unless o t herw i se stated, all the experiments are carried ou t 30 under iner t a t mosphere, for example under argon …
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for solubilizing graphite, characterized in that it comprises the following steps, which are carried out under inert atmosphere: a) reduction of graphite by an alkali metal to lead to a graphite intercalation compound; and b) exposure of the graphite intercalation compound to a polar aprotic solvent to lead to a reduced graphene solution, wherein the polar aprotic solvent has a dielectric constant from 25 to 200.
A method according to claim 1, wherein the polar aprotic solvent has the following formula: SVG 12672773.07-08-2015.IBVBY₇I₉PXXIFW3.CLM.1.13.503.1613.865.1924.svg 1.037 1.207 Chemistry Black and white R 2)m (I) wherein n and m are independently 1 or 2; X represents O or S; R₁ represents a linear or branched C₁-C₆ alkyl or C 2-C alkenyl group, or a C 3-C₆ cycloalkyl or C₅-C₆ cycloalkenyl group; and R₂ represents H, a halogen atom, a linear or branched C 1-C₆ alkyl or C 2-C₆ alkenyl group, a C 3-C₆ cycloalkyl or C₅-C₆ cycloalkenyl group, or an -OR group wherein R represents a linear or branched C₁-C₆ alkyl or C 2-C₆ alkenyl group, a C₃-C₆ cycloalkyl or C₅-C₆ cycloalkenyl group. -2- AFDOCS/12256077.1 U.S. Patent Application No.: 12/672,773 Attorney Docket No.: 021305.00307
A method according to claim 1 or 2, wherein the graphite intercalation compound is in the form of a binary compound having the formula KC 8.
A method according to claim 1 or 2, wherein the graphite intercalation compound is in the form of a ternary compound having the structure M(Solv) yCx, wherein M is an alkali metal ion, Solv is an aprotic solvent molecule, x represents an integer between 6 and 200 and y represents an integer between 0 and 4.
A method according to claim 1, wherein the step of reduction a) is carried out in the presence of a nucleophilic solvent.
A method according to claim 1, wherein the reduction step a) is selected from the group comprising vapor-phase reduction by an alkali metal followed by exposure to an aprotic solvent whose structure contains at least one oxygen atom, electro- chemical reduction, and reduction by a polyaryl alkali salt in an aprotic solvent.
A method according to claim 1, wherein the reduction step a) comprises the addition of a polyaryl alkali salt of formula A *B- to graphite under inert atmosphere, wherein: A* represents a cation of an alkali ion, and B- represents an anion of a polyaromatic compound.
A method according to claim 1, wherein the mixing step b) is carried out at a temperature from -22 to 202 *C. -4- AFDOCS/12256077. 1 U.S. Patent Application No.: 12/672,773 Attorney Docket No.: 021305.00307
A method according to claim 1, wherein the mixing step b) is carried out under mechanical or magnetic stirring or by sonication, or without stirring.
A method according to claim 1, further including a step of centrifugation.
A reduced graphene solution obtained by a method according to claim 1.
A method according to claim 1, further comprising a step of evaporation of the polar aprotic solvent.
A method comprising preparing for the composite materials from the reduced graphene solution according to claim [[22]] 20.
A method according to claim 23, wherein the composite material is obtained by mixing a graphene solution and a polymer solution or a polymer mixture solution. -5- AFDOCS/12256077. 1 U.S. Patent Application No.: 12/672,773 Attorney Docket No.: 021305.00307
A method according to claim 23, wherein the composite material is obtained by in situ polymerization of a monomer or mixture or monomers in a graphene solution.
A method according to claim 23, wherein the composite.material is obtained by polymerization-grafting of a monomer on one or more graphene plane(s).
A method according to any one of claims 23 or more graft(s) of functional groups.
A method comprising preparing electronic or graphene solution according to claim [[22]] 20.
A method according to claim 28, wherein the capacitor or a transistor.
A method comprising depositing a reduced substrate.
Materials described outside the worked examples.
graphite
C
alkali metal
Measurements and analyses referenced in the patent, with their drawing references.
Figure 5 shows an atomic force microscopy picture (AFM) of a graphene deposit obtained by dip-coating an NMP solu t ion of reduced graphene on an Si/SiO₂ wafer. 25 -
Patent
Atlas literature
Patent
US 9,120,675Patent drawings and their descriptions. Click a drawing to enlarge it.
Figures 30 -
Figure 1 schematically illustrates one embodiment of the invention. In the illustrated example, graphite is reduced by a potassium compound (for example a potassium naphthalene 37 salt) in the presence of TH F to lead to a graphite int ercalation compound. The latter is isolated for example by …
Figure 2 shows two possible applica t ions, among others, of reduced graphene solu t ions of t he present application: (i) the deposit of graphene planes on a substrate and (ii) incorporation of said graphene planes in a polymer or a mixture of polymers for the prepara t ion of composite 10 …
Figure 3 shows a tunnelling microscopy picture (low resolution) of the de p osi t obtained by drying a solu t ion o f K(THF) YCX in NMP. The substrate is HOP G graphi t e (highly oriented pyrolytic graphite); the solution of NMP has been 15 diluted twice with acetone. The height of the large …
Figure 4 shows a tunnelling microscopy picture (STM) of a graphene deposit on a HOP G substrate by drop-casting an NMP solution of reduced graphene according to t he method of the 20 inven t ion, obtained from graphite par t icles from graphite electrodes. -
Figure 5 shows an atomic force microscopy picture (AFM) of a graphene deposit obtained by dip-coating an NMP solu t ion of reduced graphene on an Si/SiO₂ wafer. 25 -
Figure 6 shows an atomic force microscopy picture (AFM) of a graphene deposit obtained by dip-coating an NMP solution of reduced graphene on nickel-modified-surface mica. Examples Unless o t herw i se stated, all the experiments are carried ou t 30 under iner t a t mosphere, for example under argon …
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for solubilizing graphite, characterized in that it comprises the following steps, which are carried out under inert atmosphere: a) reduction of graphite by an alkali metal to lead to a graphite intercalation compound; and b) exposure of the graphite intercalation compound to a polar aprotic solvent to lead to a reduced graphene solution, wherein the polar aprotic solvent has a dielectric constant from 25 to 200.
A method according to claim 1, wherein the polar aprotic solvent has the following formula: SVG 12672773.07-08-2015.IBVBY₇I₉PXXIFW3.CLM.1.13.503.1613.865.1924.svg 1.037 1.207 Chemistry Black and white R 2)m (I) wherein n and m are independently 1 or 2; X represents O or S; R₁ represents a linear or branched C₁-C₆ alkyl or C 2-C alkenyl group, or a C 3-C₆ cycloalkyl or C₅-C₆ cycloalkenyl group; and R₂ represents H, a halogen atom, a linear or branched C 1-C₆ alkyl or C 2-C₆ alkenyl group, a C 3-C₆ cycloalkyl or C₅-C₆ cycloalkenyl group, or an -OR group wherein R represents a linear or branched C₁-C₆ alkyl or C 2-C₆ alkenyl group, a C₃-C₆ cycloalkyl or C₅-C₆ cycloalkenyl group. -2- AFDOCS/12256077.1 U.S. Patent Application No.: 12/672,773 Attorney Docket No.: 021305.00307
A method according to claim 1 or 2, wherein the graphite intercalation compound is in the form of a binary compound having the formula KC 8.
A method according to claim 1 or 2, wherein the graphite intercalation compound is in the form of a ternary compound having the structure M(Solv) yCx, wherein M is an alkali metal ion, Solv is an aprotic solvent molecule, x represents an integer between 6 and 200 and y represents an integer between 0 and 4.
A method according to claim 1, wherein the step of reduction a) is carried out in the presence of a nucleophilic solvent.
A method according to claim 1, wherein the reduction step a) is selected from the group comprising vapor-phase reduction by an alkali metal followed by exposure to an aprotic solvent whose structure contains at least one oxygen atom, electro- chemical reduction, and reduction by a polyaryl alkali salt in an aprotic solvent.
A method according to claim 1, wherein the reduction step a) comprises the addition of a polyaryl alkali salt of formula A *B- to graphite under inert atmosphere, wherein: A* represents a cation of an alkali ion, and B- represents an anion of a polyaromatic compound.
A method according to claim 1, wherein the mixing step b) is carried out at a temperature from -22 to 202 *C. -4- AFDOCS/12256077. 1 U.S. Patent Application No.: 12/672,773 Attorney Docket No.: 021305.00307
A method according to claim 1, wherein the mixing step b) is carried out under mechanical or magnetic stirring or by sonication, or without stirring.
A method according to claim 1, further including a step of centrifugation.
A reduced graphene solution obtained by a method according to claim 1.
A method according to claim 1, further comprising a step of evaporation of the polar aprotic solvent.
A method comprising preparing for the composite materials from the reduced graphene solution according to claim [[22]] 20.
A method according to claim 23, wherein the composite material is obtained by mixing a graphene solution and a polymer solution or a polymer mixture solution. -5- AFDOCS/12256077. 1 U.S. Patent Application No.: 12/672,773 Attorney Docket No.: 021305.00307
A method according to claim 23, wherein the composite material is obtained by in situ polymerization of a monomer or mixture or monomers in a graphene solution.
A method according to claim 23, wherein the composite.material is obtained by polymerization-grafting of a monomer on one or more graphene plane(s).
A method according to any one of claims 23 or more graft(s) of functional groups.
A method comprising preparing electronic or graphene solution according to claim [[22]] 20.
A method according to claim 28, wherein the capacitor or a transistor.
A method comprising depositing a reduced substrate.
Materials described outside the worked examples.
graphite
C
alkali metal
Measurements and analyses referenced in the patent, with their drawing references.
Figure 5 shows an atomic force microscopy picture (AFM) of a graphene deposit obtained by dip-coating an NMP solu t ion of reduced graphene on an Si/SiO₂ wafer. 25 -
Patent
Atlas literature
Patent
US 9,120,675Patent drawings and their descriptions. Click a drawing to enlarge it.
Figures 30 -
Figure 1 schematically illustrates one embodiment of the invention. In the illustrated example, graphite is reduced by a potassium compound (for example a potassium naphthalene 37 salt) in the presence of TH F to lead to a graphite int ercalation compound. The latter is isolated for example by …
Figure 2 shows two possible applica t ions, among others, of reduced graphene solu t ions of t he present application: (i) the deposit of graphene planes on a substrate and (ii) incorporation of said graphene planes in a polymer or a mixture of polymers for the prepara t ion of composite 10 …
Figure 3 shows a tunnelling microscopy picture (low resolution) of the de p osi t obtained by drying a solu t ion o f K(THF) YCX in NMP. The substrate is HOP G graphi t e (highly oriented pyrolytic graphite); the solution of NMP has been 15 diluted twice with acetone. The height of the large …
Figure 4 shows a tunnelling microscopy picture (STM) of a graphene deposit on a HOP G substrate by drop-casting an NMP solution of reduced graphene according to t he method of the 20 inven t ion, obtained from graphite par t icles from graphite electrodes. -
Figure 5 shows an atomic force microscopy picture (AFM) of a graphene deposit obtained by dip-coating an NMP solu t ion of reduced graphene on an Si/SiO₂ wafer. 25 -
Figure 6 shows an atomic force microscopy picture (AFM) of a graphene deposit obtained by dip-coating an NMP solution of reduced graphene on nickel-modified-surface mica. Examples Unless o t herw i se stated, all the experiments are carried ou t 30 under iner t a t mosphere, for example under argon …
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for solubilizing graphite, characterized in that it comprises the following steps, which are carried out under inert atmosphere: a) reduction of graphite by an alkali metal to lead to a graphite intercalation compound; and b) exposure of the graphite intercalation compound to a polar aprotic solvent to lead to a reduced graphene solution, wherein the polar aprotic solvent has a dielectric constant from 25 to 200.
A method according to claim 1, wherein the polar aprotic solvent has the following formula: SVG 12672773.07-08-2015.IBVBY₇I₉PXXIFW3.CLM.1.13.503.1613.865.1924.svg 1.037 1.207 Chemistry Black and white R 2)m (I) wherein n and m are independently 1 or 2; X represents O or S; R₁ represents a linear or branched C₁-C₆ alkyl or C 2-C alkenyl group, or a C 3-C₆ cycloalkyl or C₅-C₆ cycloalkenyl group; and R₂ represents H, a halogen atom, a linear or branched C 1-C₆ alkyl or C 2-C₆ alkenyl group, a C 3-C₆ cycloalkyl or C₅-C₆ cycloalkenyl group, or an -OR group wherein R represents a linear or branched C₁-C₆ alkyl or C 2-C₆ alkenyl group, a C₃-C₆ cycloalkyl or C₅-C₆ cycloalkenyl group. -2- AFDOCS/12256077.1 U.S. Patent Application No.: 12/672,773 Attorney Docket No.: 021305.00307
A method according to claim 1 or 2, wherein the graphite intercalation compound is in the form of a binary compound having the formula KC 8.
A method according to claim 1 or 2, wherein the graphite intercalation compound is in the form of a ternary compound having the structure M(Solv) yCx, wherein M is an alkali metal ion, Solv is an aprotic solvent molecule, x represents an integer between 6 and 200 and y represents an integer between 0 and 4.
A method according to claim 1, wherein the step of reduction a) is carried out in the presence of a nucleophilic solvent.
A method according to claim 1, wherein the reduction step a) is selected from the group comprising vapor-phase reduction by an alkali metal followed by exposure to an aprotic solvent whose structure contains at least one oxygen atom, electro- chemical reduction, and reduction by a polyaryl alkali salt in an aprotic solvent.
A method according to claim 1, wherein the reduction step a) comprises the addition of a polyaryl alkali salt of formula A *B- to graphite under inert atmosphere, wherein: A* represents a cation of an alkali ion, and B- represents an anion of a polyaromatic compound.
A method according to claim 1, wherein the mixing step b) is carried out at a temperature from -22 to 202 *C. -4- AFDOCS/12256077. 1 U.S. Patent Application No.: 12/672,773 Attorney Docket No.: 021305.00307
A method according to claim 1, wherein the mixing step b) is carried out under mechanical or magnetic stirring or by sonication, or without stirring.
A method according to claim 1, further including a step of centrifugation.
A reduced graphene solution obtained by a method according to claim 1.
A method according to claim 1, further comprising a step of evaporation of the polar aprotic solvent.
A method comprising preparing for the composite materials from the reduced graphene solution according to claim [[22]] 20.
A method according to claim 23, wherein the composite material is obtained by mixing a graphene solution and a polymer solution or a polymer mixture solution. -5- AFDOCS/12256077. 1 U.S. Patent Application No.: 12/672,773 Attorney Docket No.: 021305.00307
A method according to claim 23, wherein the composite material is obtained by in situ polymerization of a monomer or mixture or monomers in a graphene solution.
A method according to claim 23, wherein the composite.material is obtained by polymerization-grafting of a monomer on one or more graphene plane(s).
A method according to any one of claims 23 or more graft(s) of functional groups.
A method comprising preparing electronic or graphene solution according to claim [[22]] 20.
A method according to claim 28, wherein the capacitor or a transistor.
A method comprising depositing a reduced substrate.
Materials described outside the worked examples.
graphite
C
alkali metal
Measurements and analyses referenced in the patent, with their drawing references.
Figure 5 shows an atomic force microscopy picture (AFM) of a graphene deposit obtained by dip-coating an NMP solu t ion of reduced graphene on an Si/SiO₂ wafer. 25 -
Patent
Atlas literature
Patent
US 9,120,675Patent drawings and their descriptions. Click a drawing to enlarge it.
Figures 30 -
Figure 1 schematically illustrates one embodiment of the invention. In the illustrated example, graphite is reduced by a potassium compound (for example a potassium naphthalene 37 salt) in the presence of TH F to lead to a graphite int ercalation compound. The latter is isolated for example by …
Figure 2 shows two possible applica t ions, among others, of reduced graphene solu t ions of t he present application: (i) the deposit of graphene planes on a substrate and (ii) incorporation of said graphene planes in a polymer or a mixture of polymers for the prepara t ion of composite 10 …
Figure 3 shows a tunnelling microscopy picture (low resolution) of the de p osi t obtained by drying a solu t ion o f K(THF) YCX in NMP. The substrate is HOP G graphi t e (highly oriented pyrolytic graphite); the solution of NMP has been 15 diluted twice with acetone. The height of the large …
Figure 4 shows a tunnelling microscopy picture (STM) of a graphene deposit on a HOP G substrate by drop-casting an NMP solution of reduced graphene according to t he method of the 20 inven t ion, obtained from graphite par t icles from graphite electrodes. -
Figure 5 shows an atomic force microscopy picture (AFM) of a graphene deposit obtained by dip-coating an NMP solu t ion of reduced graphene on an Si/SiO₂ wafer. 25 -
Figure 6 shows an atomic force microscopy picture (AFM) of a graphene deposit obtained by dip-coating an NMP solution of reduced graphene on nickel-modified-surface mica. Examples Unless o t herw i se stated, all the experiments are carried ou t 30 under iner t a t mosphere, for example under argon …
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method for solubilizing graphite, characterized in that it comprises the following steps, which are carried out under inert atmosphere: a) reduction of graphite by an alkali metal to lead to a graphite intercalation compound; and b) exposure of the graphite intercalation compound to a polar aprotic solvent to lead to a reduced graphene solution, wherein the polar aprotic solvent has a dielectric constant from 25 to 200.
A method according to claim 1, wherein the polar aprotic solvent has the following formula: SVG 12672773.07-08-2015.IBVBY₇I₉PXXIFW3.CLM.1.13.503.1613.865.1924.svg 1.037 1.207 Chemistry Black and white R 2)m (I) wherein n and m are independently 1 or 2; X represents O or S; R₁ represents a linear or branched C₁-C₆ alkyl or C 2-C alkenyl group, or a C 3-C₆ cycloalkyl or C₅-C₆ cycloalkenyl group; and R₂ represents H, a halogen atom, a linear or branched C 1-C₆ alkyl or C 2-C₆ alkenyl group, a C 3-C₆ cycloalkyl or C₅-C₆ cycloalkenyl group, or an -OR group wherein R represents a linear or branched C₁-C₆ alkyl or C 2-C₆ alkenyl group, a C₃-C₆ cycloalkyl or C₅-C₆ cycloalkenyl group. -2- AFDOCS/12256077.1 U.S. Patent Application No.: 12/672,773 Attorney Docket No.: 021305.00307
A method according to claim 1 or 2, wherein the graphite intercalation compound is in the form of a binary compound having the formula KC 8.
A method according to claim 1 or 2, wherein the graphite intercalation compound is in the form of a ternary compound having the structure M(Solv) yCx, wherein M is an alkali metal ion, Solv is an aprotic solvent molecule, x represents an integer between 6 and 200 and y represents an integer between 0 and 4.
A method according to claim 1, wherein the step of reduction a) is carried out in the presence of a nucleophilic solvent.
A method according to claim 1, wherein the reduction step a) is selected from the group comprising vapor-phase reduction by an alkali metal followed by exposure to an aprotic solvent whose structure contains at least one oxygen atom, electro- chemical reduction, and reduction by a polyaryl alkali salt in an aprotic solvent.
A method according to claim 1, wherein the reduction step a) comprises the addition of a polyaryl alkali salt of formula A *B- to graphite under inert atmosphere, wherein: A* represents a cation of an alkali ion, and B- represents an anion of a polyaromatic compound.
A method according to claim 1, wherein the mixing step b) is carried out at a temperature from -22 to 202 *C. -4- AFDOCS/12256077. 1 U.S. Patent Application No.: 12/672,773 Attorney Docket No.: 021305.00307
A method according to claim 1, wherein the mixing step b) is carried out under mechanical or magnetic stirring or by sonication, or without stirring.
A method according to claim 1, further including a step of centrifugation.
A reduced graphene solution obtained by a method according to claim 1.
A method according to claim 1, further comprising a step of evaporation of the polar aprotic solvent.
A method comprising preparing for the composite materials from the reduced graphene solution according to claim [[22]] 20.
A method according to claim 23, wherein the composite material is obtained by mixing a graphene solution and a polymer solution or a polymer mixture solution. -5- AFDOCS/12256077. 1 U.S. Patent Application No.: 12/672,773 Attorney Docket No.: 021305.00307
A method according to claim 23, wherein the composite material is obtained by in situ polymerization of a monomer or mixture or monomers in a graphene solution.
A method according to claim 23, wherein the composite.material is obtained by polymerization-grafting of a monomer on one or more graphene plane(s).
A method according to any one of claims 23 or more graft(s) of functional groups.
A method comprising preparing electronic or graphene solution according to claim [[22]] 20.
A method according to claim 28, wherein the capacitor or a transistor.
A method comprising depositing a reduced substrate.
Materials described outside the worked examples.
graphite
C
alkali metal
Measurements and analyses referenced in the patent, with their drawing references.
Figure 5 shows an atomic force microscopy picture (AFM) of a graphene deposit obtained by dip-coating an NMP solu t ion of reduced graphene on an Si/SiO₂ wafer. 25 -
polar aprotic solvent
reduced graphene solution
KC₈
ternary graphite intercalation compound M(Solv)yCx
M(Solv)yCx
benzene
C₆H₆
toluene
C₇H₈
THF
C₄H₈O
K(THF)yCx
polyaryl alkali salt
A+B-
polyaromatic compound
N-methylpyrrolidone
C₅H₉NO
graphene-polymer composite
Figure 6 shows an atomic force microscopy picture (AFM) of a graphene deposit obtained by dip-coating an NMP solution of reduced graphene on nickel-modified-surface mica. Examples Unless o t herw i se stated, all the experiments are carried ou t 30 under iner t a t mosphere, for example under argon …
polar aprotic solvent
reduced graphene solution
KC₈
ternary graphite intercalation compound M(Solv)yCx
M(Solv)yCx
benzene
C₆H₆
toluene
C₇H₈
THF
C₄H₈O
K(THF)yCx
polyaryl alkali salt
A+B-
polyaromatic compound
N-methylpyrrolidone
C₅H₉NO
graphene-polymer composite
Figure 6 shows an atomic force microscopy picture (AFM) of a graphene deposit obtained by dip-coating an NMP solution of reduced graphene on nickel-modified-surface mica. Examples Unless o t herw i se stated, all the experiments are carried ou t 30 under iner t a t mosphere, for example under argon …
polar aprotic solvent
reduced graphene solution
KC₈
ternary graphite intercalation compound M(Solv)yCx
M(Solv)yCx
benzene
C₆H₆
toluene
C₇H₈
THF
C₄H₈O
K(THF)yCx
polyaryl alkali salt
A+B-
polyaromatic compound
N-methylpyrrolidone
C₅H₉NO
graphene-polymer composite
Figure 6 shows an atomic force microscopy picture (AFM) of a graphene deposit obtained by dip-coating an NMP solution of reduced graphene on nickel-modified-surface mica. Examples Unless o t herw i se stated, all the experiments are carried ou t 30 under iner t a t mosphere, for example under argon …
polar aprotic solvent
reduced graphene solution
KC₈
ternary graphite intercalation compound M(Solv)yCx
M(Solv)yCx
benzene
C₆H₆
toluene
C₇H₈
THF
C₄H₈O
K(THF)yCx
polyaryl alkali salt
A+B-
polyaromatic compound
N-methylpyrrolidone
C₅H₉NO
graphene-polymer composite
Figure 6 shows an atomic force microscopy picture (AFM) of a graphene deposit obtained by dip-coating an NMP solution of reduced graphene on nickel-modified-surface mica. Examples Unless o t herw i se stated, all the experiments are carried ou t 30 under iner t a t mosphere, for example under argon …