Patent
US 9,663,369Cerium (IV) Salts as Effective Dopant for Carbon Nanotubes and Graphene
Ali Afzali-Ardakani, Bhupesh Chandra, George S. Tulevski
US
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US 9,663,369Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
. A process f or doping a carbon ma terial to reduce its electr ical resi stivit y comprising combining a Ce (IV) salt dissolved in a solvent comprising water with a carbon material comprising CNT or graphene wherein said Ce (IV) salt is selected from a Ce (IV) salt of a nitrogen oxide acid, Ce (IV) salt of a sulfur oxide acid, Ce (IV) salt of a lower alkyl organo sulfur acid, or Ce (IV) salt of a substituted lower alkane organo sulfur acid.
The process of claim 1 wherein said salt comprises Ce (IV) ammonium nitrate, Ce (IV) ammonium sulfate, Ce (IV) lower alkyl l sulfonate and Ce (IV) trihalo lower alkanesulfonate.
The process of claim 1 wherein said Ce (IV) salt comprises Ce (IV) ammonium nitrate.
The process of claim 1 wherein said Ce (IV) salt comprises Ce (IV) ammonium sulfate.
The process of claim 1 wherein said Ce (I V) salt comprises Ce (IV) methylsulfonate. 2 SVG 13329184.10-21-2014.I₁M₂TUH₉PXXIFW1.CLM33449716.1.294.131.2242.271.svg 0.467 6.493 Chemistry Black and white
The process of claim 1 wherein said Ce (IV) salt comprises Ce (I V) trifluoromethanesulfonate.
The process of claim 1 wherein said carbon material comprises a CNT.
8. The process of claim 1 wherein said carbon material comprises graphene.
A product made by the process of claim 1.
Materials described outside the worked examples.
Ce(IV) salt of a nitrogen oxide acid
Ce(IV) salt of a sulfur oxide acid
Additional fabrication and treatment steps described in the patent.
Patent
Atlas literature
Patent
US 9,663,369Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
. A process f or doping a carbon ma terial to reduce its electr ical resi stivit y comprising combining a Ce (IV) salt dissolved in a solvent comprising water with a carbon material comprising CNT or graphene wherein said Ce (IV) salt is selected from a Ce (IV) salt of a nitrogen oxide acid, Ce (IV) salt of a sulfur oxide acid, Ce (IV) salt of a lower alkyl organo sulfur acid, or Ce (IV) salt of a substituted lower alkane organo sulfur acid.
The process of claim 1 wherein said salt comprises Ce (IV) ammonium nitrate, Ce (IV) ammonium sulfate, Ce (IV) lower alkyl l sulfonate and Ce (IV) trihalo lower alkanesulfonate.
The process of claim 1 wherein said Ce (IV) salt comprises Ce (IV) ammonium nitrate.
The process of claim 1 wherein said Ce (IV) salt comprises Ce (IV) ammonium sulfate.
The process of claim 1 wherein said Ce (I V) salt comprises Ce (IV) methylsulfonate. 2 SVG 13329184.10-21-2014.I₁M₂TUH₉PXXIFW1.CLM33449716.1.294.131.2242.271.svg 0.467 6.493 Chemistry Black and white
The process of claim 1 wherein said Ce (IV) salt comprises Ce (I V) trifluoromethanesulfonate.
The process of claim 1 wherein said carbon material comprises a CNT.
8. The process of claim 1 wherein said carbon material comprises graphene.
A product made by the process of claim 1.
Materials described outside the worked examples.
Ce(IV) salt of a nitrogen oxide acid
Ce(IV) salt of a sulfur oxide acid
Additional fabrication and treatment steps described in the patent.
Patent
Atlas literature
Patent
US 9,663,369Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
. A process f or doping a carbon ma terial to reduce its electr ical resi stivit y comprising combining a Ce (IV) salt dissolved in a solvent comprising water with a carbon material comprising CNT or graphene wherein said Ce (IV) salt is selected from a Ce (IV) salt of a nitrogen oxide acid, Ce (IV) salt of a sulfur oxide acid, Ce (IV) salt of a lower alkyl organo sulfur acid, or Ce (IV) salt of a substituted lower alkane organo sulfur acid.
The process of claim 1 wherein said salt comprises Ce (IV) ammonium nitrate, Ce (IV) ammonium sulfate, Ce (IV) lower alkyl l sulfonate and Ce (IV) trihalo lower alkanesulfonate.
The process of claim 1 wherein said Ce (IV) salt comprises Ce (IV) ammonium nitrate.
The process of claim 1 wherein said Ce (IV) salt comprises Ce (IV) ammonium sulfate.
The process of claim 1 wherein said Ce (I V) salt comprises Ce (IV) methylsulfonate. 2 SVG 13329184.10-21-2014.I₁M₂TUH₉PXXIFW1.CLM33449716.1.294.131.2242.271.svg 0.467 6.493 Chemistry Black and white
The process of claim 1 wherein said Ce (IV) salt comprises Ce (I V) trifluoromethanesulfonate.
The process of claim 1 wherein said carbon material comprises a CNT.
8. The process of claim 1 wherein said carbon material comprises graphene.
A product made by the process of claim 1.
Materials described outside the worked examples.
Ce(IV) salt of a nitrogen oxide acid
Ce(IV) salt of a sulfur oxide acid
Additional fabrication and treatment steps described in the patent.
Patent
Atlas literature
Patent
US 9,663,369Patent drawings and their descriptions. Click a drawing to enlarge it.
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
. A process f or doping a carbon ma terial to reduce its electr ical resi stivit y comprising combining a Ce (IV) salt dissolved in a solvent comprising water with a carbon material comprising CNT or graphene wherein said Ce (IV) salt is selected from a Ce (IV) salt of a nitrogen oxide acid, Ce (IV) salt of a sulfur oxide acid, Ce (IV) salt of a lower alkyl organo sulfur acid, or Ce (IV) salt of a substituted lower alkane organo sulfur acid.
The process of claim 1 wherein said salt comprises Ce (IV) ammonium nitrate, Ce (IV) ammonium sulfate, Ce (IV) lower alkyl l sulfonate and Ce (IV) trihalo lower alkanesulfonate.
The process of claim 1 wherein said Ce (IV) salt comprises Ce (IV) ammonium nitrate.
The process of claim 1 wherein said Ce (IV) salt comprises Ce (IV) ammonium sulfate.
The process of claim 1 wherein said Ce (I V) salt comprises Ce (IV) methylsulfonate. 2 SVG 13329184.10-21-2014.I₁M₂TUH₉PXXIFW1.CLM33449716.1.294.131.2242.271.svg 0.467 6.493 Chemistry Black and white
The process of claim 1 wherein said Ce (IV) salt comprises Ce (I V) trifluoromethanesulfonate.
The process of claim 1 wherein said carbon material comprises a CNT.
8. The process of claim 1 wherein said carbon material comprises graphene.
A product made by the process of claim 1.
Materials described outside the worked examples.
Ce(IV) salt of a nitrogen oxide acid
Ce(IV) salt of a sulfur oxide acid
Additional fabrication and treatment steps described in the patent.
carbon nanotube
graphene
Ce(IV) salt of a lower alkyl organo sulfur acid
Ce(IV) salt of a substituted lower alkane organo sulfur acid
Ce(IV) ammonium nitrate
Ce(IV) ammonium sulfate
Ce(IV) lower alkyl sulfonate
Ce(IV) trihalo lower alkanesulfonate
Ce(IV) methylsulfonate
Ce(IV) trifluoromethanesulfonate
water
H₂O
carbon nanotube
graphene
Ce(IV) salt of a lower alkyl organo sulfur acid
Ce(IV) salt of a substituted lower alkane organo sulfur acid
Ce(IV) ammonium nitrate
Ce(IV) ammonium sulfate
Ce(IV) lower alkyl sulfonate
Ce(IV) trihalo lower alkanesulfonate
Ce(IV) methylsulfonate
Ce(IV) trifluoromethanesulfonate
water
H₂O
carbon nanotube
graphene
Ce(IV) salt of a lower alkyl organo sulfur acid
Ce(IV) salt of a substituted lower alkane organo sulfur acid
Ce(IV) ammonium nitrate
Ce(IV) ammonium sulfate
Ce(IV) lower alkyl sulfonate
Ce(IV) trihalo lower alkanesulfonate
Ce(IV) methylsulfonate
Ce(IV) trifluoromethanesulfonate
water
H₂O
carbon nanotube
graphene
Ce(IV) salt of a lower alkyl organo sulfur acid
Ce(IV) salt of a substituted lower alkane organo sulfur acid
Ce(IV) ammonium nitrate
Ce(IV) ammonium sulfate
Ce(IV) lower alkyl sulfonate
Ce(IV) trihalo lower alkanesulfonate
Ce(IV) methylsulfonate
Ce(IV) trifluoromethanesulfonate
water
H₂O