Abstract

The mean free path of photocarriers is a crucial parameter for material design, device optimization, and new optoelectronics applications. Currently, this parameter remains unknown for many materials, and experimental means available for its measurement are considerably lacking. Meanwhile, it remains an unclear issue whether the mean free path of the photogenerated high-energy “hot” carriers is significantly different from that of the local-equilibrium-state carriers near the Fermi surface or around the band edge. Based on the concept of transient grating Fourier transform and utilizing a virtual lock-in amplification technique, we proposed and demonstrated an efficient experimental technique for measuring the mean free path of photocarriers. This method has facilitated direct observation of the photocarrier transport behavior across the transition between diffusive and ballistic motion, from which we surprisingly find that the mean free path of photogenerated hot carriers in Silicon membrane and GaAs quantum well can reach micron scale, more than an order of magnitude larger compared to the electrically-measured one. This work provides new ideas for characterization of photoelectronic devices under operating status and is expected to greatly enhance the understanding of the photocarrier transport process in opto-electronic or photonic materials.

Abstract

The mean free path of photocarriers is a crucial parameter for material design, device optimization, and new optoelectronics applications. Currently, this parameter remains unknown for many materials, and experimental means available for its measurement are considerably lacking. Meanwhile, it remains an unclear issue whether the mean free path of the photogenerated high-energy “hot” carriers is significantly different from that of the local-equilibrium-state carriers near the Fermi surface or around the band edge. Based on the concept of transient grating Fourier transform and utilizing a virtual lock-in amplification technique, we proposed and demonstrated an efficient experimental technique for measuring the mean free path of photocarriers. This method has facilitated direct observation of the photocarrier transport behavior across the transition between diffusive and ballistic motion, from which we surprisingly find that the mean free path of photogenerated hot carriers in Silicon membrane and GaAs quantum well can reach micron scale, more than an order of magnitude larger compared to the electrically-measured one. This work provides new ideas for characterization of photoelectronic devices under operating status and is expected to greatly enhance the understanding of the photocarrier transport process in opto-electronic or photonic materials.

Abstract

The mean free path of photocarriers is a crucial parameter for material design, device optimization, and new optoelectronics applications. Currently, this parameter remains unknown for many materials, and experimental means available for its measurement are considerably lacking. Meanwhile, it remains an unclear issue whether the mean free path of the photogenerated high-energy “hot” carriers is significantly different from that of the local-equilibrium-state carriers near the Fermi surface or around the band edge. Based on the concept of transient grating Fourier transform and utilizing a virtual lock-in amplification technique, we proposed and demonstrated an efficient experimental technique for measuring the mean free path of photocarriers. This method has facilitated direct observation of the photocarrier transport behavior across the transition between diffusive and ballistic motion, from which we surprisingly find that the mean free path of photogenerated hot carriers in Silicon membrane and GaAs quantum well can reach micron scale, more than an order of magnitude larger compared to the electrically-measured one. This work provides new ideas for characterization of photoelectronic devices under operating status and is expected to greatly enhance the understanding of the photocarrier transport process in opto-electronic or photonic materials.

Abstract

The mean free path of photocarriers is a crucial parameter for material design, device optimization, and new optoelectronics applications. Currently, this parameter remains unknown for many materials, and experimental means available for its measurement are considerably lacking. Meanwhile, it remains an unclear issue whether the mean free path of the photogenerated high-energy “hot” carriers is significantly different from that of the local-equilibrium-state carriers near the Fermi surface or around the band edge. Based on the concept of transient grating Fourier transform and utilizing a virtual lock-in amplification technique, we proposed and demonstrated an efficient experimental technique for measuring the mean free path of photocarriers. This method has facilitated direct observation of the photocarrier transport behavior across the transition between diffusive and ballistic motion, from which we surprisingly find that the mean free path of photogenerated hot carriers in Silicon membrane and GaAs quantum well can reach micron scale, more than an order of magnitude larger compared to the electrically-measured one. This work provides new ideas for characterization of photoelectronic devices under operating status and is expected to greatly enhance the understanding of the photocarrier transport process in opto-electronic or photonic materials.