Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1
FIG. 1 is an electric diagram of an example of a circuit comprising a monolithic component integrating a gallium 5 nitride field-effect power transistor;
FIG. 2
FIG. 2 is an electric diagram of an example of a circuit comprising an embodiment of a monolithic component integrating a gallium nitride field-effect power …
FIG. 3
FIG. 3 illustrates a step of a method of manufacturing a 10 monolithic component integrating a gallium nitride field- effect power transistor according to an …
FIG. 4
FIG. 4 illustrates another step of the method of
FIG. 5
FIG. 5 illustrates another step of the method of
FIG. 6
FIG. 6 illustrates another step of the method of
FIG. 7
FIG. 7 illustrates another step of the method of
FIG. 8
FIG. 8 illustrates a variation of the step of
FIG. 9
FIG. 9 illustrates another step of the method of
FIG. 10
FIG. 10 illustrates another step of the method of
FIG. 11
FIG. 11 illustrates another step of the method of
FIG. 12
FIG. 12 illustrates a variation of the method of
Claims
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
3 independent · 17 dependent
1
IndependentGaNAlGaNmonolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
A circuit, comprising: an electronic component that includes: gallium nitride substrate; an aluminum-gallium nitride layer; first and second connection terminals on the gallium nitride substrate; a field-effect power transistor on the gallium nitride substrate and including a gate structure, source, and drain, wherein the gate structure is directly on the gallium nitride substrate and includes a gate dielec-tric layer and a gate electrode; a passivation layer formed on the gate structure of the field-effect power transistor; a first Schottky diode formed on the gallium nitride substrate and coupled between and to both the first connection terminal and the gate electrode of the field-effect power transistor; and a second Schottky diode formed on the gallium nitride substrate and coupled between and to both the sec-ond connection terminal and the gate electrode of the field-effect power transistor; and a first capacitor coupled between and to both the first connection terminal and the source of the field-effect power transistor, the source and drain of the field-effect power transistor and anode and cathode terminals of each of the first Schottky diode and the second Schottky diode are in respective trenches extending in the passivation layer to the aluminum-gallium nitride layer.
2
Dependent← claim 1monolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, further comprising a second capacitor coupled between and to both the second connec-tion terminal and the source of the field-effect power tran-sistor.
3
Dependent← claim 1monolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, further comprising a control circuit that includes: a first connection terminal coupled to the first connection terminal of the electronic component and configured to supply a first fixed voltage corresponding to a voltage for controlling the field-effect power transistor to a first state, on or off; 5 a second connection terminal coupled to the gate elec-trode of the field-effect power transistor; and a first controlled switch coupled between the first con-nection terminal of the control circuit and the second connection terminal of the control circuit.
5
Dependent← claim 1GaNmonolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, wherein the first capacitor is integrated in or on the gallium nitride substrate.
6
Dependent← claim 1AlGaNmonolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, wherein: the second Schottky diode has an electrode in a first trench of the respective trenches that extends through the passivation layer and into the aluminum-gallium nitride layer.
7
Dependent← claim 1monolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, wherein the second Schottky diode has a first electrode coupled to the gate electrode of the field-effect power transistor and a second electrode coupled to the second connection terminal.
8
IndependentGaNmonolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
A circuit, comprising: an electronic component that includes: a gallium nitride substrate; first and second connection terminals formed on the gallium nitride substrate; a field-effect power transistor formed on the gallium nitride substrate and including a gate, source, and drain, wherein the gate is formed directly on the gallium nitride substrate; a first Schottky diode formed on the gallium nitride substrate and coupled between the first connection terminal and the gate of the field-effect power tran-sistor; and a second Schottky diode formed on the gallium nitride substrate and coupled between the second connec-tion terminal and the gate of the field-effect power transistor; and a first capacitor coupled between the first connection terminal and the source of the field-effect power tran-sistor, wherein the second Schottky diode has an electrode formed in a first trench in the gallium nitride substrate, and the gate of the field-effect power transistor is formed in a second trench in the gallium nitride substrate.
9
Dependent← claim 8monolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
The circuit of claim 8, further comprising a second capacitor coupled between the second connection terminal and the source of the field-effect power transistor.
10
Dependent← claim 8monolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
The circuit of claim 8, further comprising a control circuit that includes: 65 a first connection terminal connected to the first connec-tion terminal of the electronic component and config-B₂ ured to supply a first fixed voltage corresponding to a voltage for controlling the field-effect power transistor to a first state, on or off; a second connection terminal coupled to the gate of the field-effect power transistor; and a first controlled switch coupling the first connection terminal of the control circuit to the second connection terminal of the control circuit.
12
Dependent← claim 8GaNmonolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
The circuit of claim 8, wherein the first capacitor is integrated in or on the gallium nitride substrate.
13
Dependent← claim 8monolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
The circuit of claim 8, wherein the second Schottky diode has a first electrode connected to the gate of the field-effect power transistor and a second electrode con-nected to the second connection terminal.
14
IndependentGaNmonolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
A circuit, comprising: a monolithic component, including: a first substrate; a first plurality of terminals in the first substrate; a transistor coupled to the first plurality of terminals, the transistor being directly on the first substrate; a first Schottky diode having an anode coupled to the transistor; and a second Schottky diode having a cathode coupled to the transistor and to the anode of the first Schottky diode, wherein the second Schottky diode has an electrode formed in a first trench in a gallium nitride substrate, and a gate of the transistor is formed in a second trench in the gallium nitride substrate; a control circuit, including: a first connection terminal coupled to the first Schottky diode and to a first voltage; a second connection terminal coupled directly to a first one of the first plurality of terminals; and a first switch coupled between the first and second connection terminals; a first capacitor coupled between a cathode of the first Schottky diode and a source of the transistor, the first connection terminal being coupled between the cathode of the first Schottky diode and the first capacitor; and a second capacitor coupled between an anode of the second Schottky diode and a source of the transistor.
15
Dependent← claim 14monolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
The circuit of claim 14, further comprising a first metal terminal coupled to a cathode of the first Schottky diode and a second metal terminal coupled to an anode of the second Schottky diode.
16
Dependent← claim 14monolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
The circuit of claim 14, wherein the control circuit is in a second substrate distinct from the first substrate.
20
Dependent← claim 14monolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
The circuit of claim 14, wherein the second connec-tion terminal is coupled between the anode of the second Schottky diode and the second capacitor. ∗ ∗ ∗ ∗ ∗
Device structures
Layer stacks claimed or described, ordered top of device to substrate.
monolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
passivationlayerpassivation layer
AlGaNbarrier layer
GaNsubstrate
monolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
GaNsubstrate
monolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
Materials
Materials described outside the worked examples.
gallium nitride
GaN
Transistor Substrate
aluminum-gallium nitride
AlGaN
Epitaxial Layer
Characterization
Measurements and analyses referenced in the patent, with their drawing references.
fet electrical
Fet Electrical
FIG. 1 is an electric diagram of an example of a circuit comprising a monolithic component integrating a gallium 5 nitride field-effect power transistor;
Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1
FIG. 1 is an electric diagram of an example of a circuit comprising a monolithic component integrating a gallium 5 nitride field-effect power transistor;
FIG. 2
FIG. 2 is an electric diagram of an example of a circuit comprising an embodiment of a monolithic component integrating a gallium nitride field-effect power …
FIG. 3
FIG. 3 illustrates a step of a method of manufacturing a 10 monolithic component integrating a gallium nitride field- effect power transistor according to an …
FIG. 4
FIG. 4 illustrates another step of the method of
FIG. 5
FIG. 5 illustrates another step of the method of
FIG. 6
FIG. 6 illustrates another step of the method of
FIG. 7
FIG. 7 illustrates another step of the method of
FIG. 8
FIG. 8 illustrates a variation of the step of
FIG. 9
FIG. 9 illustrates another step of the method of
FIG. 10
FIG. 10 illustrates another step of the method of
FIG. 11
FIG. 11 illustrates another step of the method of
FIG. 12
FIG. 12 illustrates a variation of the method of
Claims
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
3 independent · 17 dependent
1
IndependentGaNAlGaNmonolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
A circuit, comprising: an electronic component that includes: gallium nitride substrate; an aluminum-gallium nitride layer; first and second connection terminals on the gallium nitride substrate; a field-effect power transistor on the gallium nitride substrate and including a gate structure, source, and drain, wherein the gate structure is directly on the gallium nitride substrate and includes a gate dielec-tric layer and a gate electrode; a passivation layer formed on the gate structure of the field-effect power transistor; a first Schottky diode formed on the gallium nitride substrate and coupled between and to both the first connection terminal and the gate electrode of the field-effect power transistor; and a second Schottky diode formed on the gallium nitride substrate and coupled between and to both the sec-ond connection terminal and the gate electrode of the field-effect power transistor; and a first capacitor coupled between and to both the first connection terminal and the source of the field-effect power transistor, the source and drain of the field-effect power transistor and anode and cathode terminals of each of the first Schottky diode and the second Schottky diode are in respective trenches extending in the passivation layer to the aluminum-gallium nitride layer.
2
Dependent← claim 1monolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, further comprising a second capacitor coupled between and to both the second connec-tion terminal and the source of the field-effect power tran-sistor.
3
Dependent← claim 1monolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, further comprising a control circuit that includes: a first connection terminal coupled to the first connection terminal of the electronic component and configured to supply a first fixed voltage corresponding to a voltage for controlling the field-effect power transistor to a first state, on or off; 5 a second connection terminal coupled to the gate elec-trode of the field-effect power transistor; and a first controlled switch coupled between the first con-nection terminal of the control circuit and the second connection terminal of the control circuit.
5
Dependent← claim 1GaNmonolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, wherein the first capacitor is integrated in or on the gallium nitride substrate.
6
Dependent← claim 1AlGaNmonolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, wherein: the second Schottky diode has an electrode in a first trench of the respective trenches that extends through the passivation layer and into the aluminum-gallium nitride layer.
7
Dependent← claim 1monolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, wherein the second Schottky diode has a first electrode coupled to the gate electrode of the field-effect power transistor and a second electrode coupled to the second connection terminal.
8
IndependentGaNmonolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
A circuit, comprising: an electronic component that includes: a gallium nitride substrate; first and second connection terminals formed on the gallium nitride substrate; a field-effect power transistor formed on the gallium nitride substrate and including a gate, source, and drain, wherein the gate is formed directly on the gallium nitride substrate; a first Schottky diode formed on the gallium nitride substrate and coupled between the first connection terminal and the gate of the field-effect power tran-sistor; and a second Schottky diode formed on the gallium nitride substrate and coupled between the second connec-tion terminal and the gate of the field-effect power transistor; and a first capacitor coupled between the first connection terminal and the source of the field-effect power tran-sistor, wherein the second Schottky diode has an electrode formed in a first trench in the gallium nitride substrate, and the gate of the field-effect power transistor is formed in a second trench in the gallium nitride substrate.
9
Dependent← claim 8monolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
The circuit of claim 8, further comprising a second capacitor coupled between the second connection terminal and the source of the field-effect power transistor.
10
Dependent← claim 8monolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
The circuit of claim 8, further comprising a control circuit that includes: 65 a first connection terminal connected to the first connec-tion terminal of the electronic component and config-B₂ ured to supply a first fixed voltage corresponding to a voltage for controlling the field-effect power transistor to a first state, on or off; a second connection terminal coupled to the gate of the field-effect power transistor; and a first controlled switch coupling the first connection terminal of the control circuit to the second connection terminal of the control circuit.
12
Dependent← claim 8GaNmonolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
The circuit of claim 8, wherein the first capacitor is integrated in or on the gallium nitride substrate.
13
Dependent← claim 8monolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
The circuit of claim 8, wherein the second Schottky diode has a first electrode connected to the gate of the field-effect power transistor and a second electrode con-nected to the second connection terminal.
14
IndependentGaNmonolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
A circuit, comprising: a monolithic component, including: a first substrate; a first plurality of terminals in the first substrate; a transistor coupled to the first plurality of terminals, the transistor being directly on the first substrate; a first Schottky diode having an anode coupled to the transistor; and a second Schottky diode having a cathode coupled to the transistor and to the anode of the first Schottky diode, wherein the second Schottky diode has an electrode formed in a first trench in a gallium nitride substrate, and a gate of the transistor is formed in a second trench in the gallium nitride substrate; a control circuit, including: a first connection terminal coupled to the first Schottky diode and to a first voltage; a second connection terminal coupled directly to a first one of the first plurality of terminals; and a first switch coupled between the first and second connection terminals; a first capacitor coupled between a cathode of the first Schottky diode and a source of the transistor, the first connection terminal being coupled between the cathode of the first Schottky diode and the first capacitor; and a second capacitor coupled between an anode of the second Schottky diode and a source of the transistor.
15
Dependent← claim 14monolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
The circuit of claim 14, further comprising a first metal terminal coupled to a cathode of the first Schottky diode and a second metal terminal coupled to an anode of the second Schottky diode.
16
Dependent← claim 14monolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
The circuit of claim 14, wherein the control circuit is in a second substrate distinct from the first substrate.
20
Dependent← claim 14monolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
The circuit of claim 14, wherein the second connec-tion terminal is coupled between the anode of the second Schottky diode and the second capacitor. ∗ ∗ ∗ ∗ ∗
Device structures
Layer stacks claimed or described, ordered top of device to substrate.
monolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
passivationlayerpassivation layer
AlGaNbarrier layer
GaNsubstrate
monolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
GaNsubstrate
monolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
Materials
Materials described outside the worked examples.
gallium nitride
GaN
Transistor Substrate
aluminum-gallium nitride
AlGaN
Epitaxial Layer
Characterization
Measurements and analyses referenced in the patent, with their drawing references.
fet electrical
Fet Electrical
FIG. 1 is an electric diagram of an example of a circuit comprising a monolithic component integrating a gallium 5 nitride field-effect power transistor;
Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1
FIG. 1 is an electric diagram of an example of a circuit comprising a monolithic component integrating a gallium 5 nitride field-effect power transistor;
FIG. 2
FIG. 2 is an electric diagram of an example of a circuit comprising an embodiment of a monolithic component integrating a gallium nitride field-effect power …
FIG. 3
FIG. 3 illustrates a step of a method of manufacturing a 10 monolithic component integrating a gallium nitride field- effect power transistor according to an …
FIG. 4
FIG. 4 illustrates another step of the method of
FIG. 5
FIG. 5 illustrates another step of the method of
FIG. 6
FIG. 6 illustrates another step of the method of
FIG. 7
FIG. 7 illustrates another step of the method of
FIG. 8
FIG. 8 illustrates a variation of the step of
FIG. 9
FIG. 9 illustrates another step of the method of
FIG. 10
FIG. 10 illustrates another step of the method of
FIG. 11
FIG. 11 illustrates another step of the method of
FIG. 12
FIG. 12 illustrates a variation of the method of
Claims
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
3 independent · 17 dependent
1
IndependentGaNAlGaNmonolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
A circuit, comprising: an electronic component that includes: gallium nitride substrate; an aluminum-gallium nitride layer; first and second connection terminals on the gallium nitride substrate; a field-effect power transistor on the gallium nitride substrate and including a gate structure, source, and drain, wherein the gate structure is directly on the gallium nitride substrate and includes a gate dielec-tric layer and a gate electrode; a passivation layer formed on the gate structure of the field-effect power transistor; a first Schottky diode formed on the gallium nitride substrate and coupled between and to both the first connection terminal and the gate electrode of the field-effect power transistor; and a second Schottky diode formed on the gallium nitride substrate and coupled between and to both the sec-ond connection terminal and the gate electrode of the field-effect power transistor; and a first capacitor coupled between and to both the first connection terminal and the source of the field-effect power transistor, the source and drain of the field-effect power transistor and anode and cathode terminals of each of the first Schottky diode and the second Schottky diode are in respective trenches extending in the passivation layer to the aluminum-gallium nitride layer.
2
Dependent← claim 1monolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, further comprising a second capacitor coupled between and to both the second connec-tion terminal and the source of the field-effect power tran-sistor.
3
Dependent← claim 1monolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, further comprising a control circuit that includes: a first connection terminal coupled to the first connection terminal of the electronic component and configured to supply a first fixed voltage corresponding to a voltage for controlling the field-effect power transistor to a first state, on or off; 5 a second connection terminal coupled to the gate elec-trode of the field-effect power transistor; and a first controlled switch coupled between the first con-nection terminal of the control circuit and the second connection terminal of the control circuit.
5
Dependent← claim 1GaNmonolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, wherein the first capacitor is integrated in or on the gallium nitride substrate.
6
Dependent← claim 1AlGaNmonolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, wherein: the second Schottky diode has an electrode in a first trench of the respective trenches that extends through the passivation layer and into the aluminum-gallium nitride layer.
7
Dependent← claim 1monolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, wherein the second Schottky diode has a first electrode coupled to the gate electrode of the field-effect power transistor and a second electrode coupled to the second connection terminal.
8
IndependentGaNmonolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
A circuit, comprising: an electronic component that includes: a gallium nitride substrate; first and second connection terminals formed on the gallium nitride substrate; a field-effect power transistor formed on the gallium nitride substrate and including a gate, source, and drain, wherein the gate is formed directly on the gallium nitride substrate; a first Schottky diode formed on the gallium nitride substrate and coupled between the first connection terminal and the gate of the field-effect power tran-sistor; and a second Schottky diode formed on the gallium nitride substrate and coupled between the second connec-tion terminal and the gate of the field-effect power transistor; and a first capacitor coupled between the first connection terminal and the source of the field-effect power tran-sistor, wherein the second Schottky diode has an electrode formed in a first trench in the gallium nitride substrate, and the gate of the field-effect power transistor is formed in a second trench in the gallium nitride substrate.
9
Dependent← claim 8monolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
The circuit of claim 8, further comprising a second capacitor coupled between the second connection terminal and the source of the field-effect power transistor.
10
Dependent← claim 8monolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
The circuit of claim 8, further comprising a control circuit that includes: 65 a first connection terminal connected to the first connec-tion terminal of the electronic component and config-B₂ ured to supply a first fixed voltage corresponding to a voltage for controlling the field-effect power transistor to a first state, on or off; a second connection terminal coupled to the gate of the field-effect power transistor; and a first controlled switch coupling the first connection terminal of the control circuit to the second connection terminal of the control circuit.
12
Dependent← claim 8GaNmonolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
The circuit of claim 8, wherein the first capacitor is integrated in or on the gallium nitride substrate.
13
Dependent← claim 8monolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
The circuit of claim 8, wherein the second Schottky diode has a first electrode connected to the gate of the field-effect power transistor and a second electrode con-nected to the second connection terminal.
14
IndependentGaNmonolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
A circuit, comprising: a monolithic component, including: a first substrate; a first plurality of terminals in the first substrate; a transistor coupled to the first plurality of terminals, the transistor being directly on the first substrate; a first Schottky diode having an anode coupled to the transistor; and a second Schottky diode having a cathode coupled to the transistor and to the anode of the first Schottky diode, wherein the second Schottky diode has an electrode formed in a first trench in a gallium nitride substrate, and a gate of the transistor is formed in a second trench in the gallium nitride substrate; a control circuit, including: a first connection terminal coupled to the first Schottky diode and to a first voltage; a second connection terminal coupled directly to a first one of the first plurality of terminals; and a first switch coupled between the first and second connection terminals; a first capacitor coupled between a cathode of the first Schottky diode and a source of the transistor, the first connection terminal being coupled between the cathode of the first Schottky diode and the first capacitor; and a second capacitor coupled between an anode of the second Schottky diode and a source of the transistor.
15
Dependent← claim 14monolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
The circuit of claim 14, further comprising a first metal terminal coupled to a cathode of the first Schottky diode and a second metal terminal coupled to an anode of the second Schottky diode.
16
Dependent← claim 14monolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
The circuit of claim 14, wherein the control circuit is in a second substrate distinct from the first substrate.
20
Dependent← claim 14monolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
The circuit of claim 14, wherein the second connec-tion terminal is coupled between the anode of the second Schottky diode and the second capacitor. ∗ ∗ ∗ ∗ ∗
Device structures
Layer stacks claimed or described, ordered top of device to substrate.
monolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
passivationlayerpassivation layer
AlGaNbarrier layer
GaNsubstrate
monolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
GaNsubstrate
monolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
Materials
Materials described outside the worked examples.
gallium nitride
GaN
Transistor Substrate
aluminum-gallium nitride
AlGaN
Epitaxial Layer
Characterization
Measurements and analyses referenced in the patent, with their drawing references.
fet electrical
Fet Electrical
FIG. 1 is an electric diagram of an example of a circuit comprising a monolithic component integrating a gallium 5 nitride field-effect power transistor;
Patent drawings and their descriptions. Click a drawing to enlarge it.
FIG. 1
FIG. 1 is an electric diagram of an example of a circuit comprising a monolithic component integrating a gallium 5 nitride field-effect power transistor;
FIG. 2
FIG. 2 is an electric diagram of an example of a circuit comprising an embodiment of a monolithic component integrating a gallium nitride field-effect power …
FIG. 3
FIG. 3 illustrates a step of a method of manufacturing a 10 monolithic component integrating a gallium nitride field- effect power transistor according to an …
FIG. 4
FIG. 4 illustrates another step of the method of
FIG. 5
FIG. 5 illustrates another step of the method of
FIG. 6
FIG. 6 illustrates another step of the method of
FIG. 7
FIG. 7 illustrates another step of the method of
FIG. 8
FIG. 8 illustrates a variation of the step of
FIG. 9
FIG. 9 illustrates another step of the method of
FIG. 10
FIG. 10 illustrates another step of the method of
FIG. 11
FIG. 11 illustrates another step of the method of
FIG. 12
FIG. 12 illustrates a variation of the method of
Claims
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
3 independent · 17 dependent
1
IndependentGaNAlGaNmonolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
A circuit, comprising: an electronic component that includes: gallium nitride substrate; an aluminum-gallium nitride layer; first and second connection terminals on the gallium nitride substrate; a field-effect power transistor on the gallium nitride substrate and including a gate structure, source, and drain, wherein the gate structure is directly on the gallium nitride substrate and includes a gate dielec-tric layer and a gate electrode; a passivation layer formed on the gate structure of the field-effect power transistor; a first Schottky diode formed on the gallium nitride substrate and coupled between and to both the first connection terminal and the gate electrode of the field-effect power transistor; and a second Schottky diode formed on the gallium nitride substrate and coupled between and to both the sec-ond connection terminal and the gate electrode of the field-effect power transistor; and a first capacitor coupled between and to both the first connection terminal and the source of the field-effect power transistor, the source and drain of the field-effect power transistor and anode and cathode terminals of each of the first Schottky diode and the second Schottky diode are in respective trenches extending in the passivation layer to the aluminum-gallium nitride layer.
2
Dependent← claim 1monolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, further comprising a second capacitor coupled between and to both the second connec-tion terminal and the source of the field-effect power tran-sistor.
3
Dependent← claim 1monolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, further comprising a control circuit that includes: a first connection terminal coupled to the first connection terminal of the electronic component and configured to supply a first fixed voltage corresponding to a voltage for controlling the field-effect power transistor to a first state, on or off; 5 a second connection terminal coupled to the gate elec-trode of the field-effect power transistor; and a first controlled switch coupled between the first con-nection terminal of the control circuit and the second connection terminal of the control circuit.
5
Dependent← claim 1GaNmonolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, wherein the first capacitor is integrated in or on the gallium nitride substrate.
6
Dependent← claim 1AlGaNmonolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, wherein: the second Schottky diode has an electrode in a first trench of the respective trenches that extends through the passivation layer and into the aluminum-gallium nitride layer.
7
Dependent← claim 1monolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
The circuit of claim 1, wherein the second Schottky diode has a first electrode coupled to the gate electrode of the field-effect power transistor and a second electrode coupled to the second connection terminal.
8
IndependentGaNmonolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
A circuit, comprising: an electronic component that includes: a gallium nitride substrate; first and second connection terminals formed on the gallium nitride substrate; a field-effect power transistor formed on the gallium nitride substrate and including a gate, source, and drain, wherein the gate is formed directly on the gallium nitride substrate; a first Schottky diode formed on the gallium nitride substrate and coupled between the first connection terminal and the gate of the field-effect power tran-sistor; and a second Schottky diode formed on the gallium nitride substrate and coupled between the second connec-tion terminal and the gate of the field-effect power transistor; and a first capacitor coupled between the first connection terminal and the source of the field-effect power tran-sistor, wherein the second Schottky diode has an electrode formed in a first trench in the gallium nitride substrate, and the gate of the field-effect power transistor is formed in a second trench in the gallium nitride substrate.
9
Dependent← claim 8monolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
The circuit of claim 8, further comprising a second capacitor coupled between the second connection terminal and the source of the field-effect power transistor.
10
Dependent← claim 8monolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
The circuit of claim 8, further comprising a control circuit that includes: 65 a first connection terminal connected to the first connec-tion terminal of the electronic component and config-B₂ ured to supply a first fixed voltage corresponding to a voltage for controlling the field-effect power transistor to a first state, on or off; a second connection terminal coupled to the gate of the field-effect power transistor; and a first controlled switch coupling the first connection terminal of the control circuit to the second connection terminal of the control circuit.
12
Dependent← claim 8GaNmonolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
The circuit of claim 8, wherein the first capacitor is integrated in or on the gallium nitride substrate.
13
Dependent← claim 8monolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
The circuit of claim 8, wherein the second Schottky diode has a first electrode connected to the gate of the field-effect power transistor and a second electrode con-nected to the second connection terminal.
14
IndependentGaNmonolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
A circuit, comprising: a monolithic component, including: a first substrate; a first plurality of terminals in the first substrate; a transistor coupled to the first plurality of terminals, the transistor being directly on the first substrate; a first Schottky diode having an anode coupled to the transistor; and a second Schottky diode having a cathode coupled to the transistor and to the anode of the first Schottky diode, wherein the second Schottky diode has an electrode formed in a first trench in a gallium nitride substrate, and a gate of the transistor is formed in a second trench in the gallium nitride substrate; a control circuit, including: a first connection terminal coupled to the first Schottky diode and to a first voltage; a second connection terminal coupled directly to a first one of the first plurality of terminals; and a first switch coupled between the first and second connection terminals; a first capacitor coupled between a cathode of the first Schottky diode and a source of the transistor, the first connection terminal being coupled between the cathode of the first Schottky diode and the first capacitor; and a second capacitor coupled between an anode of the second Schottky diode and a source of the transistor.
15
Dependent← claim 14monolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
The circuit of claim 14, further comprising a first metal terminal coupled to a cathode of the first Schottky diode and a second metal terminal coupled to an anode of the second Schottky diode.
16
Dependent← claim 14monolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
The circuit of claim 14, wherein the control circuit is in a second substrate distinct from the first substrate.
20
Dependent← claim 14monolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
The circuit of claim 14, wherein the second connec-tion terminal is coupled between the anode of the second Schottky diode and the second capacitor. ∗ ∗ ∗ ∗ ∗
Device structures
Layer stacks claimed or described, ordered top of device to substrate.
monolithic GaN power transistor component with dual Schottky diode gate protection and passivation trench structure
passivationlayerpassivation layer
AlGaNbarrier layer
GaNsubstrate
monolithic GaN field-effect power transistor with dual Schottky diodes (trench gate and trench diode electrode)
GaNsubstrate
monolithic GaN transistor with dual Schottky diodes and full gate-drive control circuit
Materials
Materials described outside the worked examples.
gallium nitride
GaN
Transistor Substrate
aluminum-gallium nitride
AlGaN
Epitaxial Layer
Characterization
Measurements and analyses referenced in the patent, with their drawing references.
fet electrical
Fet Electrical
FIG. 1 is an electric diagram of an example of a circuit comprising a monolithic component integrating a gallium 5 nitride field-effect power transistor;
GaN HEMT field-effect power transistor (described embodiment)
GaNsubstrate
silicon
Si
Control Circuit Substrate
silicon carbide
SiC
Optional Support Substrate
sapphire
Optional Support Substrate
Fet Electrical
FIG. 2 is an electric diagram of an example of a circuit comprising an embodiment of a monolithic component integrating a gallium nitride field-effect power …
FIG. 3 illustrates a step of a method of manufacturing a 10 monolithic component integrating a gallium nitride field- effect power transistor according to an …
US 7,825,435 B27,825,435 B2 11/2010 Machida et al.
US 7,875,907 B27,875,907 B2 * 1/2011 Honea................. H01L 27/0605examiner
US 7,898,004 B27,898,004 B2 3/2011 Wu et al.
US 7,915,645 B27,915,645 B2 3/2011 Briere
US 8,227,810 B28,227,810 B2 7/2012 Okada et al.
US 8,546,849 B28,546,849 B2 10/2013 Cheah et al.
US 8,581,301 B28,581,301 B2 * 11/2013 Saito..................... H01L 29/872examiner
US 8,772,842 B28,772,842 B2 7/2014 Dora
US 8,895,993 B28,895,993 B2 11/2014 Kalnitsky et al.
US 8,946,724 B18,946,724 B1 2/2015 Shinohara et al.
US 8,981,380 B28,981,380 B2 3/2015 Briere
US 9,087,704 B29,087,704 B2 7/2015 Jeon et al.
US 9,123,536 B29,123,536 B2 * 9/2015 Ikeda...................... H01L 25/18examiner
US 9,142,550 B29,142,550 B2 9/2015 Prechtl et al.
US 9,220,135 B29,220,135 B2 12/2015 Huang et al.
US 9,276,569 B29,276,569 B2 * 3/2016 Ikeda...................... H01L 25/18examiner
US 9,306,544 B29,306,544 B2 4/2016 Jeon et al.
US 9,484,418 B29,484,418 B2 11/2016 Huang et al.
US 9,536,984 B29,536,984 B2 1/2017 Azize et al.
US 9,543,841 B29,543,841 B2 1/2017 Boulharts et al.
US 9,653,449 B29,653,449 B2 * 5/2017 Ikeda............... H03K 17/08148examiner
US 9,685,857 B29,685,857 B2 6/2017 Barauna et al.
US 9,754,931 B29,754,931 B2 * 9/2017 Jeon...................... H01L 29/778examiner
US 9,819,316 B29,819,316 B2 * 11/2017 Helms..................... H03F 1/301examiner
US 9,859,882 B29,859,882 B2 1/2018 Zhang et al.
US 10,050,620 B210,050,620 B2 * 8/2018 Sato..................... H03K 17/567examiner
US 10,224,401 B210,224,401 B2 3/2019 Mishra et al.
US 10,263,538 B210,263,538 B2 4/2019 Ikeda
US 10,388,650 B210,388,650 B2 8/2019 Wang et al.
US 10,420,188 B210,420,188 B2 * 9/2019 Leegate................. B64D 25/14examiner
US 10,461,561 B210,461,561 B2 * 10/2019 Zhang................. H02J 7/00718examiner
US 10,573,516 B210,573,516 B2 2/2020 Odnoblyudov et al.
US 10,749,019 B210,749,019 B2 8/2020 Jeon et al.
US 10,826,484 B210,826,484 B2 * 11/2020 Hu................... H03K 17/04106examiner
US 11,063,589 B111,063,589 B1 * 7/2021 Mweene.......... H03K 17/08122examiner
US 11,335,799 B211,335,799 B2 5/2022 Jiang
US 2007/0228477 A12007/0228477 A1 10/2007 Suzuki et al.
US 2008/0197908 A12008/0197908 A1 * 8/2008 Williams.............. H02M 3/155examiner
US 2013/0009165 A12013/0009165 A1 1/2013 Park et al.
US 2013/0240893 A12013/0240893 A1 9/2013 Bedell et al.
US 2013/0248931 A12013/0248931 A1 9/2013 Saito et al.
US 2015/0137135 A12015/0137135 A1 5/2015 Green et al.
US 2016/0086938 A12016/0086938 A1 3/2016 Kinzer
US 2019/0096879 A12019/0096879 A1 3/2019 Chen et al.
CN 104183651 ACN 104183651 A 12/2014
CN 106711039 ACN 106711039 A 5/2017
Cited non-patent literature · 2
Integrated Gate Drivers Based on High-Voltage Energy Storing for GaN Transistors. Seidel et al., “Integrated Gate Drivers Based on High-Voltage Energy Storing for GaN Transistors,” IEEE Journal of Solid-State Circuits 53(12):3446-3454, Dec. 2018.
An Efficient High-Frequency Drive Circuit for GaN Power HFETs. Wang, et al., “An Efficient High-Frequency Drive Circuit for GaN Power HFETs”, IEEE Transactions on Industry Applications, vol. 45(2), Mar. 2009, pp. 843-853.
GaN HEMT field-effect power transistor (described embodiment)
GaNsubstrate
silicon
Si
Control Circuit Substrate
silicon carbide
SiC
Optional Support Substrate
sapphire
Optional Support Substrate
Fet Electrical
FIG. 2 is an electric diagram of an example of a circuit comprising an embodiment of a monolithic component integrating a gallium nitride field-effect power …
FIG. 3 illustrates a step of a method of manufacturing a 10 monolithic component integrating a gallium nitride field- effect power transistor according to an …
US 7,825,435 B27,825,435 B2 11/2010 Machida et al.
US 7,875,907 B27,875,907 B2 * 1/2011 Honea................. H01L 27/0605examiner
US 7,898,004 B27,898,004 B2 3/2011 Wu et al.
US 7,915,645 B27,915,645 B2 3/2011 Briere
US 8,227,810 B28,227,810 B2 7/2012 Okada et al.
US 8,546,849 B28,546,849 B2 10/2013 Cheah et al.
US 8,581,301 B28,581,301 B2 * 11/2013 Saito..................... H01L 29/872examiner
US 8,772,842 B28,772,842 B2 7/2014 Dora
US 8,895,993 B28,895,993 B2 11/2014 Kalnitsky et al.
US 8,946,724 B18,946,724 B1 2/2015 Shinohara et al.
US 8,981,380 B28,981,380 B2 3/2015 Briere
US 9,087,704 B29,087,704 B2 7/2015 Jeon et al.
US 9,123,536 B29,123,536 B2 * 9/2015 Ikeda...................... H01L 25/18examiner
US 9,142,550 B29,142,550 B2 9/2015 Prechtl et al.
US 9,220,135 B29,220,135 B2 12/2015 Huang et al.
US 9,276,569 B29,276,569 B2 * 3/2016 Ikeda...................... H01L 25/18examiner
US 9,306,544 B29,306,544 B2 4/2016 Jeon et al.
US 9,484,418 B29,484,418 B2 11/2016 Huang et al.
US 9,536,984 B29,536,984 B2 1/2017 Azize et al.
US 9,543,841 B29,543,841 B2 1/2017 Boulharts et al.
US 9,653,449 B29,653,449 B2 * 5/2017 Ikeda............... H03K 17/08148examiner
US 9,685,857 B29,685,857 B2 6/2017 Barauna et al.
US 9,754,931 B29,754,931 B2 * 9/2017 Jeon...................... H01L 29/778examiner
US 9,819,316 B29,819,316 B2 * 11/2017 Helms..................... H03F 1/301examiner
US 9,859,882 B29,859,882 B2 1/2018 Zhang et al.
US 10,050,620 B210,050,620 B2 * 8/2018 Sato..................... H03K 17/567examiner
US 10,224,401 B210,224,401 B2 3/2019 Mishra et al.
US 10,263,538 B210,263,538 B2 4/2019 Ikeda
US 10,388,650 B210,388,650 B2 8/2019 Wang et al.
US 10,420,188 B210,420,188 B2 * 9/2019 Leegate................. B64D 25/14examiner
US 10,461,561 B210,461,561 B2 * 10/2019 Zhang................. H02J 7/00718examiner
US 10,573,516 B210,573,516 B2 2/2020 Odnoblyudov et al.
US 10,749,019 B210,749,019 B2 8/2020 Jeon et al.
US 10,826,484 B210,826,484 B2 * 11/2020 Hu................... H03K 17/04106examiner
US 11,063,589 B111,063,589 B1 * 7/2021 Mweene.......... H03K 17/08122examiner
US 11,335,799 B211,335,799 B2 5/2022 Jiang
US 2007/0228477 A12007/0228477 A1 10/2007 Suzuki et al.
US 2008/0197908 A12008/0197908 A1 * 8/2008 Williams.............. H02M 3/155examiner
US 2013/0009165 A12013/0009165 A1 1/2013 Park et al.
US 2013/0240893 A12013/0240893 A1 9/2013 Bedell et al.
US 2013/0248931 A12013/0248931 A1 9/2013 Saito et al.
US 2015/0137135 A12015/0137135 A1 5/2015 Green et al.
US 2016/0086938 A12016/0086938 A1 3/2016 Kinzer
US 2019/0096879 A12019/0096879 A1 3/2019 Chen et al.
CN 104183651 ACN 104183651 A 12/2014
CN 106711039 ACN 106711039 A 5/2017
Cited non-patent literature · 2
Integrated Gate Drivers Based on High-Voltage Energy Storing for GaN Transistors. Seidel et al., “Integrated Gate Drivers Based on High-Voltage Energy Storing for GaN Transistors,” IEEE Journal of Solid-State Circuits 53(12):3446-3454, Dec. 2018.
An Efficient High-Frequency Drive Circuit for GaN Power HFETs. Wang, et al., “An Efficient High-Frequency Drive Circuit for GaN Power HFETs”, IEEE Transactions on Industry Applications, vol. 45(2), Mar. 2009, pp. 843-853.
GaN HEMT field-effect power transistor (described embodiment)
GaNsubstrate
silicon
Si
Control Circuit Substrate
silicon carbide
SiC
Optional Support Substrate
sapphire
Optional Support Substrate
Fet Electrical
FIG. 2 is an electric diagram of an example of a circuit comprising an embodiment of a monolithic component integrating a gallium nitride field-effect power …
FIG. 3 illustrates a step of a method of manufacturing a 10 monolithic component integrating a gallium nitride field- effect power transistor according to an …
US 7,825,435 B27,825,435 B2 11/2010 Machida et al.
US 7,875,907 B27,875,907 B2 * 1/2011 Honea................. H01L 27/0605examiner
US 7,898,004 B27,898,004 B2 3/2011 Wu et al.
US 7,915,645 B27,915,645 B2 3/2011 Briere
US 8,227,810 B28,227,810 B2 7/2012 Okada et al.
US 8,546,849 B28,546,849 B2 10/2013 Cheah et al.
US 8,581,301 B28,581,301 B2 * 11/2013 Saito..................... H01L 29/872examiner
US 8,772,842 B28,772,842 B2 7/2014 Dora
US 8,895,993 B28,895,993 B2 11/2014 Kalnitsky et al.
US 8,946,724 B18,946,724 B1 2/2015 Shinohara et al.
US 8,981,380 B28,981,380 B2 3/2015 Briere
US 9,087,704 B29,087,704 B2 7/2015 Jeon et al.
US 9,123,536 B29,123,536 B2 * 9/2015 Ikeda...................... H01L 25/18examiner
US 9,142,550 B29,142,550 B2 9/2015 Prechtl et al.
US 9,220,135 B29,220,135 B2 12/2015 Huang et al.
US 9,276,569 B29,276,569 B2 * 3/2016 Ikeda...................... H01L 25/18examiner
US 9,306,544 B29,306,544 B2 4/2016 Jeon et al.
US 9,484,418 B29,484,418 B2 11/2016 Huang et al.
US 9,536,984 B29,536,984 B2 1/2017 Azize et al.
US 9,543,841 B29,543,841 B2 1/2017 Boulharts et al.
US 9,653,449 B29,653,449 B2 * 5/2017 Ikeda............... H03K 17/08148examiner
US 9,685,857 B29,685,857 B2 6/2017 Barauna et al.
US 9,754,931 B29,754,931 B2 * 9/2017 Jeon...................... H01L 29/778examiner
US 9,819,316 B29,819,316 B2 * 11/2017 Helms..................... H03F 1/301examiner
US 9,859,882 B29,859,882 B2 1/2018 Zhang et al.
US 10,050,620 B210,050,620 B2 * 8/2018 Sato..................... H03K 17/567examiner
US 10,224,401 B210,224,401 B2 3/2019 Mishra et al.
US 10,263,538 B210,263,538 B2 4/2019 Ikeda
US 10,388,650 B210,388,650 B2 8/2019 Wang et al.
US 10,420,188 B210,420,188 B2 * 9/2019 Leegate................. B64D 25/14examiner
US 10,461,561 B210,461,561 B2 * 10/2019 Zhang................. H02J 7/00718examiner
US 10,573,516 B210,573,516 B2 2/2020 Odnoblyudov et al.
US 10,749,019 B210,749,019 B2 8/2020 Jeon et al.
US 10,826,484 B210,826,484 B2 * 11/2020 Hu................... H03K 17/04106examiner
US 11,063,589 B111,063,589 B1 * 7/2021 Mweene.......... H03K 17/08122examiner
US 11,335,799 B211,335,799 B2 5/2022 Jiang
US 2007/0228477 A12007/0228477 A1 10/2007 Suzuki et al.
US 2008/0197908 A12008/0197908 A1 * 8/2008 Williams.............. H02M 3/155examiner
US 2013/0009165 A12013/0009165 A1 1/2013 Park et al.
US 2013/0240893 A12013/0240893 A1 9/2013 Bedell et al.
US 2013/0248931 A12013/0248931 A1 9/2013 Saito et al.
US 2015/0137135 A12015/0137135 A1 5/2015 Green et al.
US 2016/0086938 A12016/0086938 A1 3/2016 Kinzer
US 2019/0096879 A12019/0096879 A1 3/2019 Chen et al.
CN 104183651 ACN 104183651 A 12/2014
CN 106711039 ACN 106711039 A 5/2017
Cited non-patent literature · 2
Integrated Gate Drivers Based on High-Voltage Energy Storing for GaN Transistors. Seidel et al., “Integrated Gate Drivers Based on High-Voltage Energy Storing for GaN Transistors,” IEEE Journal of Solid-State Circuits 53(12):3446-3454, Dec. 2018.
An Efficient High-Frequency Drive Circuit for GaN Power HFETs. Wang, et al., “An Efficient High-Frequency Drive Circuit for GaN Power HFETs”, IEEE Transactions on Industry Applications, vol. 45(2), Mar. 2009, pp. 843-853.
GaN HEMT field-effect power transistor (described embodiment)
GaNsubstrate
silicon
Si
Control Circuit Substrate
silicon carbide
SiC
Optional Support Substrate
sapphire
Optional Support Substrate
Fet Electrical
FIG. 2 is an electric diagram of an example of a circuit comprising an embodiment of a monolithic component integrating a gallium nitride field-effect power …
FIG. 3 illustrates a step of a method of manufacturing a 10 monolithic component integrating a gallium nitride field- effect power transistor according to an …
US 7,825,435 B27,825,435 B2 11/2010 Machida et al.
US 7,875,907 B27,875,907 B2 * 1/2011 Honea................. H01L 27/0605examiner
US 7,898,004 B27,898,004 B2 3/2011 Wu et al.
US 7,915,645 B27,915,645 B2 3/2011 Briere
US 8,227,810 B28,227,810 B2 7/2012 Okada et al.
US 8,546,849 B28,546,849 B2 10/2013 Cheah et al.
US 8,581,301 B28,581,301 B2 * 11/2013 Saito..................... H01L 29/872examiner
US 8,772,842 B28,772,842 B2 7/2014 Dora
US 8,895,993 B28,895,993 B2 11/2014 Kalnitsky et al.
US 8,946,724 B18,946,724 B1 2/2015 Shinohara et al.
US 8,981,380 B28,981,380 B2 3/2015 Briere
US 9,087,704 B29,087,704 B2 7/2015 Jeon et al.
US 9,123,536 B29,123,536 B2 * 9/2015 Ikeda...................... H01L 25/18examiner
US 9,142,550 B29,142,550 B2 9/2015 Prechtl et al.
US 9,220,135 B29,220,135 B2 12/2015 Huang et al.
US 9,276,569 B29,276,569 B2 * 3/2016 Ikeda...................... H01L 25/18examiner
US 9,306,544 B29,306,544 B2 4/2016 Jeon et al.
US 9,484,418 B29,484,418 B2 11/2016 Huang et al.
US 9,536,984 B29,536,984 B2 1/2017 Azize et al.
US 9,543,841 B29,543,841 B2 1/2017 Boulharts et al.
US 9,653,449 B29,653,449 B2 * 5/2017 Ikeda............... H03K 17/08148examiner
US 9,685,857 B29,685,857 B2 6/2017 Barauna et al.
US 9,754,931 B29,754,931 B2 * 9/2017 Jeon...................... H01L 29/778examiner
US 9,819,316 B29,819,316 B2 * 11/2017 Helms..................... H03F 1/301examiner
US 9,859,882 B29,859,882 B2 1/2018 Zhang et al.
US 10,050,620 B210,050,620 B2 * 8/2018 Sato..................... H03K 17/567examiner
US 10,224,401 B210,224,401 B2 3/2019 Mishra et al.
US 10,263,538 B210,263,538 B2 4/2019 Ikeda
US 10,388,650 B210,388,650 B2 8/2019 Wang et al.
US 10,420,188 B210,420,188 B2 * 9/2019 Leegate................. B64D 25/14examiner
US 10,461,561 B210,461,561 B2 * 10/2019 Zhang................. H02J 7/00718examiner
US 10,573,516 B210,573,516 B2 2/2020 Odnoblyudov et al.
US 10,749,019 B210,749,019 B2 8/2020 Jeon et al.
US 10,826,484 B210,826,484 B2 * 11/2020 Hu................... H03K 17/04106examiner
US 11,063,589 B111,063,589 B1 * 7/2021 Mweene.......... H03K 17/08122examiner
US 11,335,799 B211,335,799 B2 5/2022 Jiang
US 2007/0228477 A12007/0228477 A1 10/2007 Suzuki et al.
US 2008/0197908 A12008/0197908 A1 * 8/2008 Williams.............. H02M 3/155examiner
US 2013/0009165 A12013/0009165 A1 1/2013 Park et al.
US 2013/0240893 A12013/0240893 A1 9/2013 Bedell et al.
US 2013/0248931 A12013/0248931 A1 9/2013 Saito et al.
US 2015/0137135 A12015/0137135 A1 5/2015 Green et al.
US 2016/0086938 A12016/0086938 A1 3/2016 Kinzer
US 2019/0096879 A12019/0096879 A1 3/2019 Chen et al.
CN 104183651 ACN 104183651 A 12/2014
CN 106711039 ACN 106711039 A 5/2017
Cited non-patent literature · 2
Integrated Gate Drivers Based on High-Voltage Energy Storing for GaN Transistors. Seidel et al., “Integrated Gate Drivers Based on High-Voltage Energy Storing for GaN Transistors,” IEEE Journal of Solid-State Circuits 53(12):3446-3454, Dec. 2018.
An Efficient High-Frequency Drive Circuit for GaN Power HFETs. Wang, et al., “An Efficient High-Frequency Drive Circuit for GaN Power HFETs”, IEEE Transactions on Industry Applications, vol. 45(2), Mar. 2009, pp. 843-853.