Research paperTheoreticalComputational Kinetic ModelInterplay of carrier density and mobility in Al-Rich (Al,Ga)N-Channel HEMTs: Impact on high-power device performance potentialBadal Mondal, Pietro Pampili, Jayjit Mukherjee, David Moran et al.2025·10.1063/5.0277051·arXiv:2502.13809AbstractWe present device-scale simulations of Al-rich AlxGa1−xN-channel HEMTs, accounting for composition-, thickness-, and temperature-dependent 2DEG density and low-field mobility. Using a 1D self-consistent Schrödinger-Poisson solver and analytical mobility modeling, we show that Al-rich channels can outperform GaN-channel counterparts at and above room temperature, and that assuming constant 2DEG density can under- or overestimate device performance.Read more
Representative simulated AlN/Al0.75Ga0.25N/AlN HEMT heterostructure used for band-diagram illustration and carrier-distribution analysis.1 propertySimulated Supercell DftAlxGa1−xNStudied MaterialAlNStudied MaterialExpand
Representative simulated AlN/Al0.5Ga0.5N/AlN HEMT structure corresponding to maximum 2DEG density in the composition map.1 propertySimulatedAlxGa1−xNStudied MaterialAlNStudied MaterialExpand
Representative simulated AlN/Al0.9Ga0.1N HEMT structure corresponding to the highest low-field mobility trend.No measurements recordedSimulatedAlxGa1−xNStudied MaterialAlNStudied MaterialExpand
Representative GaN-channel HEMT used as the normalization and comparison baseline against Al-rich channel devices.1 propertySimulatedAlNStudied MaterialGaNStudied MaterialExpand
Research paperTheoreticalComputational Kinetic ModelInterplay of carrier density and mobility in Al-Rich (Al,Ga)N-Channel HEMTs: Impact on high-power device performance potentialBadal Mondal, Pietro Pampili, Jayjit Mukherjee, David Moran et al.2025·10.1063/5.0277051·arXiv:2502.13809AbstractWe present device-scale simulations of Al-rich AlxGa1−xN-channel HEMTs, accounting for composition-, thickness-, and temperature-dependent 2DEG density and low-field mobility. Using a 1D self-consistent Schrödinger-Poisson solver and analytical mobility modeling, we show that Al-rich channels can outperform GaN-channel counterparts at and above room temperature, and that assuming constant 2DEG density can under- or overestimate device performance.Read more
Representative simulated AlN/Al0.75Ga0.25N/AlN HEMT heterostructure used for band-diagram illustration and carrier-distribution analysis.1 propertySimulated Supercell DftAlxGa1−xNStudied MaterialAlNStudied MaterialExpand
Representative simulated AlN/Al0.5Ga0.5N/AlN HEMT structure corresponding to maximum 2DEG density in the composition map.1 propertySimulatedAlxGa1−xNStudied MaterialAlNStudied MaterialExpand
Representative simulated AlN/Al0.9Ga0.1N HEMT structure corresponding to the highest low-field mobility trend.No measurements recordedSimulatedAlxGa1−xNStudied MaterialAlNStudied MaterialExpand
Representative GaN-channel HEMT used as the normalization and comparison baseline against Al-rich channel devices.1 propertySimulatedAlNStudied MaterialGaNStudied MaterialExpand
Research paperTheoreticalComputational Kinetic ModelInterplay of carrier density and mobility in Al-Rich (Al,Ga)N-Channel HEMTs: Impact on high-power device performance potentialBadal Mondal, Pietro Pampili, Jayjit Mukherjee, David Moran et al.2025·10.1063/5.0277051·arXiv:2502.13809AbstractWe present device-scale simulations of Al-rich AlxGa1−xN-channel HEMTs, accounting for composition-, thickness-, and temperature-dependent 2DEG density and low-field mobility. Using a 1D self-consistent Schrödinger-Poisson solver and analytical mobility modeling, we show that Al-rich channels can outperform GaN-channel counterparts at and above room temperature, and that assuming constant 2DEG density can under- or overestimate device performance.Read more
Representative simulated AlN/Al0.75Ga0.25N/AlN HEMT heterostructure used for band-diagram illustration and carrier-distribution analysis.1 propertySimulated Supercell DftAlxGa1−xNStudied MaterialAlNStudied MaterialExpand
Representative simulated AlN/Al0.5Ga0.5N/AlN HEMT structure corresponding to maximum 2DEG density in the composition map.1 propertySimulatedAlxGa1−xNStudied MaterialAlNStudied MaterialExpand
Representative simulated AlN/Al0.9Ga0.1N HEMT structure corresponding to the highest low-field mobility trend.No measurements recordedSimulatedAlxGa1−xNStudied MaterialAlNStudied MaterialExpand
Representative GaN-channel HEMT used as the normalization and comparison baseline against Al-rich channel devices.1 propertySimulatedAlNStudied MaterialGaNStudied MaterialExpand
Research paperTheoreticalComputational Kinetic ModelInterplay of carrier density and mobility in Al-Rich (Al,Ga)N-Channel HEMTs: Impact on high-power device performance potentialBadal Mondal, Pietro Pampili, Jayjit Mukherjee, David Moran et al.2025·10.1063/5.0277051·arXiv:2502.13809AbstractWe present device-scale simulations of Al-rich AlxGa1−xN-channel HEMTs, accounting for composition-, thickness-, and temperature-dependent 2DEG density and low-field mobility. Using a 1D self-consistent Schrödinger-Poisson solver and analytical mobility modeling, we show that Al-rich channels can outperform GaN-channel counterparts at and above room temperature, and that assuming constant 2DEG density can under- or overestimate device performance.Read more
Representative simulated AlN/Al0.75Ga0.25N/AlN HEMT heterostructure used for band-diagram illustration and carrier-distribution analysis.1 propertySimulated Supercell DftAlxGa1−xNStudied MaterialAlNStudied MaterialExpand
Representative simulated AlN/Al0.5Ga0.5N/AlN HEMT structure corresponding to maximum 2DEG density in the composition map.1 propertySimulatedAlxGa1−xNStudied MaterialAlNStudied MaterialExpand
Representative simulated AlN/Al0.9Ga0.1N HEMT structure corresponding to the highest low-field mobility trend.No measurements recordedSimulatedAlxGa1−xNStudied MaterialAlNStudied MaterialExpand
Representative GaN-channel HEMT used as the normalization and comparison baseline against Al-rich channel devices.1 propertySimulatedAlNStudied MaterialGaNStudied MaterialExpand