Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
Monolithically integrated InGaAs/GaAs quantum dot heterostructure grown on an exactly oriented Si(001) substrate, including a Si:P buffer, GaP nucleation layer, dislocation-filtering layers, GaAs buffer/cavity, DBR, and In0.33Ga0.67As quantum dots.
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
Monolithically integrated InGaAs/GaAs quantum dot heterostructure grown on an exactly oriented Si(001) substrate, including a Si:P buffer, GaP nucleation layer, dislocation-filtering layers, GaAs buffer/cavity, DBR, and In0.33Ga0.67As quantum dots.
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
Monolithically integrated InGaAs/GaAs quantum dot heterostructure grown on an exactly oriented Si(001) substrate, including a Si:P buffer, GaP nucleation layer, dislocation-filtering layers, GaAs buffer/cavity, DBR, and In0.33Ga0.67As quantum dots.
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
Monolithically integrated InGaAs/GaAs quantum dot heterostructure grown on an exactly oriented Si(001) substrate, including a Si:P buffer, GaP nucleation layer, dislocation-filtering layers, GaAs buffer/cavity, DBR, and In0.33Ga0.67As quantum dots.