Research paper
Experimental CharacterizationComputational MultiscaleEach sample groups how it was prepared, characterized, and measured. Click a card to expand.
5 preparations3 characterizations2 properties1 figure
7 preparations4 characterizations6 properties2 figures
7 preparations5 characterizations7 properties2 figures
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Layer Thickness | p-GaN | 200nm | — | |||
| Layer Count | InGaN/GaN QWs | 5 | — | |||
| Etch Depth | p-GaN pore depth | 140nm | — | |||
| Etch Depth | p-GaN pore depth | 170nm | — | |||
| Coupling Distance | distance from pore bottom to active area | 30nm | — | |||
| Light Output Increase | light output power increase | 46% | — | |||
| Enhancement Factor | maximum enhancement factor | 2.38 | — | |||
| Field Localization | electric field distribution | localized at certain locations around the metal microcavity | — | |||
| PL Peak | regex-detected PL peak | 439.9nm | — | — | — | — |
Related documents with shared materials, methods, properties, or citations.
Comparison of reverse current mechanisms in GaN Schottky diodes grown on sapphire versus ammonothermal GaN substrates
Few-Mode and Anisotropic Quantum Transport in InSb Nanoribbons Using an All-van der Waals Material-Based Gate
ZrN nucleation layer provides backside ohmic contact to MBE-grown GaN nanowires
ZINC STANNATE OHMIC CONTACTS FOR P-TYPE GALLIUM NITRIDE
Initial demonstration of AlGaAs-GaAsP-β-Ga2O3 n-p-n double heterojunctions
POWDER OF GALLIUM NITRIDE AND METHOD FOR PRODUCING THE SAME
Enhanced polariton interactions in suspended WS2 monolayer microcavity
Investigating Spectral Dynamics and Spin Signatures of a Mechanically Isolated Quantum Emitter in hBN
Thermal analysis of GaN-based photonic membranes for optoelectronics
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
5 preparations3 characterizations2 properties1 figure
7 preparations4 characterizations6 properties2 figures
7 preparations5 characterizations7 properties2 figures
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Layer Thickness | p-GaN | 200nm | — | |||
| Layer Count | InGaN/GaN QWs | 5 | — | |||
| Etch Depth | p-GaN pore depth | 140nm | — | |||
| Etch Depth | p-GaN pore depth | 170nm | — | |||
| Coupling Distance | distance from pore bottom to active area | 30nm | — | |||
| Light Output Increase | light output power increase | 46% | — | |||
| Enhancement Factor | maximum enhancement factor | 2.38 | — | |||
| Field Localization | electric field distribution | localized at certain locations around the metal microcavity | — | |||
| PL Peak | regex-detected PL peak | 439.9nm | — | — | — | — |
Related documents with shared materials, methods, properties, or citations.
Comparison of reverse current mechanisms in GaN Schottky diodes grown on sapphire versus ammonothermal GaN substrates
Few-Mode and Anisotropic Quantum Transport in InSb Nanoribbons Using an All-van der Waals Material-Based Gate
ZrN nucleation layer provides backside ohmic contact to MBE-grown GaN nanowires
ZINC STANNATE OHMIC CONTACTS FOR P-TYPE GALLIUM NITRIDE
Initial demonstration of AlGaAs-GaAsP-β-Ga2O3 n-p-n double heterojunctions
POWDER OF GALLIUM NITRIDE AND METHOD FOR PRODUCING THE SAME
Enhanced polariton interactions in suspended WS2 monolayer microcavity
Investigating Spectral Dynamics and Spin Signatures of a Mechanically Isolated Quantum Emitter in hBN
Thermal analysis of GaN-based photonic membranes for optoelectronics
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
5 preparations3 characterizations2 properties1 figure
7 preparations4 characterizations6 properties2 figures
7 preparations5 characterizations7 properties2 figures
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Layer Thickness | p-GaN | 200nm | — | |||
| Layer Count | InGaN/GaN QWs | 5 | — | |||
| Etch Depth | p-GaN pore depth | 140nm | — | |||
| Etch Depth | p-GaN pore depth | 170nm | — | |||
| Coupling Distance | distance from pore bottom to active area | 30nm | — | |||
| Light Output Increase | light output power increase | 46% | — | |||
| Enhancement Factor | maximum enhancement factor | 2.38 | — | |||
| Field Localization | electric field distribution | localized at certain locations around the metal microcavity | — | |||
| PL Peak | regex-detected PL peak | 439.9nm | — | — | — | — |
Related documents with shared materials, methods, properties, or citations.
Comparison of reverse current mechanisms in GaN Schottky diodes grown on sapphire versus ammonothermal GaN substrates
Few-Mode and Anisotropic Quantum Transport in InSb Nanoribbons Using an All-van der Waals Material-Based Gate
ZrN nucleation layer provides backside ohmic contact to MBE-grown GaN nanowires
ZINC STANNATE OHMIC CONTACTS FOR P-TYPE GALLIUM NITRIDE
Initial demonstration of AlGaAs-GaAsP-β-Ga2O3 n-p-n double heterojunctions
POWDER OF GALLIUM NITRIDE AND METHOD FOR PRODUCING THE SAME
Enhanced polariton interactions in suspended WS2 monolayer microcavity
Investigating Spectral Dynamics and Spin Signatures of a Mechanically Isolated Quantum Emitter in hBN
Thermal analysis of GaN-based photonic membranes for optoelectronics
Each sample groups how it was prepared, characterized, and measured. Click a card to expand.
5 preparations3 characterizations2 properties1 figure
7 preparations4 characterizations6 properties2 figures
7 preparations5 characterizations7 properties2 figures
| Type | Label | Value | Material | Sample | Condition | Source |
|---|---|---|---|---|---|---|
| Layer Thickness | p-GaN | 200nm | — | |||
| Layer Count | InGaN/GaN QWs | 5 | — | |||
| Etch Depth | p-GaN pore depth | 140nm | — | |||
| Etch Depth | p-GaN pore depth | 170nm | — | |||
| Coupling Distance | distance from pore bottom to active area | 30nm | — | |||
| Light Output Increase | light output power increase | 46% | — | |||
| Enhancement Factor | maximum enhancement factor | 2.38 | — | |||
| Field Localization | electric field distribution | localized at certain locations around the metal microcavity | — | |||
| PL Peak | regex-detected PL peak | 439.9nm | — | — | — | — |
Related documents with shared materials, methods, properties, or citations.
Comparison of reverse current mechanisms in GaN Schottky diodes grown on sapphire versus ammonothermal GaN substrates
Few-Mode and Anisotropic Quantum Transport in InSb Nanoribbons Using an All-van der Waals Material-Based Gate
ZrN nucleation layer provides backside ohmic contact to MBE-grown GaN nanowires
ZINC STANNATE OHMIC CONTACTS FOR P-TYPE GALLIUM NITRIDE
Initial demonstration of AlGaAs-GaAsP-β-Ga2O3 n-p-n double heterojunctions
POWDER OF GALLIUM NITRIDE AND METHOD FOR PRODUCING THE SAME
Enhanced polariton interactions in suspended WS2 monolayer microcavity
Investigating Spectral Dynamics and Spin Signatures of a Mechanically Isolated Quantum Emitter in hBN
Thermal analysis of GaN-based photonic membranes for optoelectronics