Patent
US 9,929,079electronic component with GaN-based die on conductive package base
packaged electronic device with IC die on leadframe
silicon
Si
electrically insulative encapsulant
| — |
Thickness | 1.8–2.8 mm | — |
Thickness | 0.7–1.2 mm | — |
Thickness | 50–250 µm | — |
Thickness | 100–200 µm | — |
Thickness | 0.6–2 mm | — |
Thickness | 0.8–1.2 mm | — |
Thickness | 1–4 mm | — |
Thickness | 1.1–3.1 mm | — |
Thickness | 1.6–2.6 mm | — |
Thickness | 2–2.2 mm | — |
Thickness | 50000–1000000 nm | — |
Thickness | 150–500 µm | — |
Thickness | 0.5–4 mm | — |
Thickness | 1–3 mm | — |
Thickness | 2–3 mm | — |
Thickness | 0.5–1.5 mm | — |
Thickness | ≥ 1.5 mm | — |
Thickness | ≥ 0.8 mm | — |
Thickness | ≥ 1 mm | — |
Thickness | ≥ 2 mm | — |
Thickness | ≥ 2.8 mm | — |
Thickness | 1.1–3 mm | — |
electronic component with GaN-based die on conductive package base
packaged electronic device with IC die on leadframe
silicon
Si
electrically insulative encapsulant
| — |
Thickness | 1.8–2.8 mm | — |
Thickness | 0.7–1.2 mm | — |
Thickness | 50–250 µm | — |
Thickness | 100–200 µm | — |
Thickness | 0.6–2 mm | — |
Thickness | 0.8–1.2 mm | — |
Thickness | 1–4 mm | — |
Thickness | 1.1–3.1 mm | — |
Thickness | 1.6–2.6 mm | — |
Thickness | 2–2.2 mm | — |
Thickness | 50000–1000000 nm | — |
Thickness | 150–500 µm | — |
Thickness | 0.5–4 mm | — |
Thickness | 1–3 mm | — |
Thickness | 2–3 mm | — |
Thickness | 0.5–1.5 mm | — |
Thickness | ≥ 1.5 mm | — |
Thickness | ≥ 0.8 mm | — |
Thickness | ≥ 1 mm | — |
Thickness | ≥ 2 mm | — |
Thickness | ≥ 2.8 mm | — |
Thickness | 1.1–3 mm | — |
electronic component with GaN-based die on conductive package base
packaged electronic device with IC die on leadframe
silicon
Si
electrically insulative encapsulant
| — |
Thickness | 1.8–2.8 mm | — |
Thickness | 0.7–1.2 mm | — |
Thickness | 50–250 µm | — |
Thickness | 100–200 µm | — |
Thickness | 0.6–2 mm | — |
Thickness | 0.8–1.2 mm | — |
Thickness | 1–4 mm | — |
Thickness | 1.1–3.1 mm | — |
Thickness | 1.6–2.6 mm | — |
Thickness | 2–2.2 mm | — |
Thickness | 50000–1000000 nm | — |
Thickness | 150–500 µm | — |
Thickness | 0.5–4 mm | — |
Thickness | 1–3 mm | — |
Thickness | 2–3 mm | — |
Thickness | 0.5–1.5 mm | — |
Thickness | ≥ 1.5 mm | — |
Thickness | ≥ 0.8 mm | — |
Thickness | ≥ 1 mm | — |
Thickness | ≥ 2 mm | — |
Thickness | ≥ 2.8 mm | — |
Thickness | 1.1–3 mm | — |
electronic component with GaN-based die on conductive package base
packaged electronic device with IC die on leadframe
silicon
Si
electrically insulative encapsulant
| — |
Thickness | 1.8–2.8 mm | — |
Thickness | 0.7–1.2 mm | — |
Thickness | 50–250 µm | — |
Thickness | 100–200 µm | — |
Thickness | 0.6–2 mm | — |
Thickness | 0.8–1.2 mm | — |
Thickness | 1–4 mm | — |
Thickness | 1.1–3.1 mm | — |
Thickness | 1.6–2.6 mm | — |
Thickness | 2–2.2 mm | — |
Thickness | 50000–1000000 nm | — |
Thickness | 150–500 µm | — |
Thickness | 0.5–4 mm | — |
Thickness | 1–3 mm | — |
Thickness | 2–3 mm | — |
Thickness | 0.5–1.5 mm | — |
Thickness | ≥ 1.5 mm | — |
Thickness | ≥ 0.8 mm | — |
Thickness | ≥ 1 mm | — |
Thickness | ≥ 2 mm | — |
Thickness | ≥ 2.8 mm | — |
Thickness | 1.1–3 mm | — |