Research paperExperimental CharacterizationLaser-stimulated photodetachment of electrons from the negatively charged dielectric substratesY. Ussenov, M. N. Shneider, S. Yatom, Y. Raitses2024·10.1063/5.0237392·arXiv:2404.08773AbstractIt is shown experimentally that the photodetachment yield of surplus electrons created by plasma-induced charging of non-conductive surfaces of dielectric materials depends on the initial surface charge density and do not correlate with the tabulated affinity values of these materials. This unexpected result obtained using laser stimulated photodetachment for fused silica, boron nitride, and alumina, is critically important for understanding of charging and discharging dynamics, secondary electron emission and photo emission effects affecting plasma-wall interactions relevant to surface and capacitively coupled discharges, dusty plasmas, electrostatic probe diagnostics and applications for plasma processing of materials, plasma propulsion and gas breakdown.Read more
Industrial-grade fused silica dielectric substrate used for plasma charging and laser-stimulated photodetachment measurements.2 preparations2 characterizations3 properties2 figuresExperimentalSiO₂Studied MaterialExpand
Industrial-grade alumina dielectric substrate used for plasma charging and laser-stimulated photodetachment measurements.2 preparations2 characterizations3 properties2 figuresExperimentalAl₂O₃Studied MaterialExpand
Industrial-grade hexagonal boron nitride dielectric substrate used for plasma charging and laser-stimulated photodetachment measurements.2 preparations2 characterizations3 properties2 figuresExperimentalBNStudied MaterialExpand
Research paperExperimental CharacterizationLaser-stimulated photodetachment of electrons from the negatively charged dielectric substratesY. Ussenov, M. N. Shneider, S. Yatom, Y. Raitses2024·10.1063/5.0237392·arXiv:2404.08773AbstractIt is shown experimentally that the photodetachment yield of surplus electrons created by plasma-induced charging of non-conductive surfaces of dielectric materials depends on the initial surface charge density and do not correlate with the tabulated affinity values of these materials. This unexpected result obtained using laser stimulated photodetachment for fused silica, boron nitride, and alumina, is critically important for understanding of charging and discharging dynamics, secondary electron emission and photo emission effects affecting plasma-wall interactions relevant to surface and capacitively coupled discharges, dusty plasmas, electrostatic probe diagnostics and applications for plasma processing of materials, plasma propulsion and gas breakdown.Read more
Industrial-grade fused silica dielectric substrate used for plasma charging and laser-stimulated photodetachment measurements.2 preparations2 characterizations3 properties2 figuresExperimentalSiO₂Studied MaterialExpand
Industrial-grade alumina dielectric substrate used for plasma charging and laser-stimulated photodetachment measurements.2 preparations2 characterizations3 properties2 figuresExperimentalAl₂O₃Studied MaterialExpand
Industrial-grade hexagonal boron nitride dielectric substrate used for plasma charging and laser-stimulated photodetachment measurements.2 preparations2 characterizations3 properties2 figuresExperimentalBNStudied MaterialExpand
Research paperExperimental CharacterizationLaser-stimulated photodetachment of electrons from the negatively charged dielectric substratesY. Ussenov, M. N. Shneider, S. Yatom, Y. Raitses2024·10.1063/5.0237392·arXiv:2404.08773AbstractIt is shown experimentally that the photodetachment yield of surplus electrons created by plasma-induced charging of non-conductive surfaces of dielectric materials depends on the initial surface charge density and do not correlate with the tabulated affinity values of these materials. This unexpected result obtained using laser stimulated photodetachment for fused silica, boron nitride, and alumina, is critically important for understanding of charging and discharging dynamics, secondary electron emission and photo emission effects affecting plasma-wall interactions relevant to surface and capacitively coupled discharges, dusty plasmas, electrostatic probe diagnostics and applications for plasma processing of materials, plasma propulsion and gas breakdown.Read more
Industrial-grade fused silica dielectric substrate used for plasma charging and laser-stimulated photodetachment measurements.2 preparations2 characterizations3 properties2 figuresExperimentalSiO₂Studied MaterialExpand
Industrial-grade alumina dielectric substrate used for plasma charging and laser-stimulated photodetachment measurements.2 preparations2 characterizations3 properties2 figuresExperimentalAl₂O₃Studied MaterialExpand
Industrial-grade hexagonal boron nitride dielectric substrate used for plasma charging and laser-stimulated photodetachment measurements.2 preparations2 characterizations3 properties2 figuresExperimentalBNStudied MaterialExpand
Research paperExperimental CharacterizationLaser-stimulated photodetachment of electrons from the negatively charged dielectric substratesY. Ussenov, M. N. Shneider, S. Yatom, Y. Raitses2024·10.1063/5.0237392·arXiv:2404.08773AbstractIt is shown experimentally that the photodetachment yield of surplus electrons created by plasma-induced charging of non-conductive surfaces of dielectric materials depends on the initial surface charge density and do not correlate with the tabulated affinity values of these materials. This unexpected result obtained using laser stimulated photodetachment for fused silica, boron nitride, and alumina, is critically important for understanding of charging and discharging dynamics, secondary electron emission and photo emission effects affecting plasma-wall interactions relevant to surface and capacitively coupled discharges, dusty plasmas, electrostatic probe diagnostics and applications for plasma processing of materials, plasma propulsion and gas breakdown.Read more
Industrial-grade fused silica dielectric substrate used for plasma charging and laser-stimulated photodetachment measurements.2 preparations2 characterizations3 properties2 figuresExperimentalSiO₂Studied MaterialExpand
Industrial-grade alumina dielectric substrate used for plasma charging and laser-stimulated photodetachment measurements.2 preparations2 characterizations3 properties2 figuresExperimentalAl₂O₃Studied MaterialExpand
Industrial-grade hexagonal boron nitride dielectric substrate used for plasma charging and laser-stimulated photodetachment measurements.2 preparations2 characterizations3 properties2 figuresExperimentalBNStudied MaterialExpand
