Patent
US 10,836,132polyacrylonitrile
polymethyl methacrylate
polystyrene
polycarbonate
polyimides
polypropylene
polyethylene terephthalate
polyvinyl chloride
metal substrate
copper foil
Cu
methane
CH₄
hydrogen
H₂
| ≥ 10 GPa |
graphene layer |
Pressure | 0–25 Torr | — |
Pressure | 10–25 Torr | — |
Pressure | 23–100 mTorr | — |
Thickness | 100–500 nm | — |
Temperature | 600–1100 °C | — |
Duration | 1–120 minutes | — |
Temperature | 1000–3000 °C | — |
Thickness | ≤ 20 nm | — |
Thickness | ≤ 10 nm | — |
Thickness | ≤ 3 nm | — |
Thickness | ≥ 1 mm | — |
Temperature | 200–300 °C | — |
polyacrylonitrile
polymethyl methacrylate
polystyrene
polycarbonate
polyimides
polypropylene
polyethylene terephthalate
polyvinyl chloride
metal substrate
copper foil
Cu
methane
CH₄
hydrogen
H₂
| ≥ 10 GPa |
graphene layer |
Pressure | 0–25 Torr | — |
Pressure | 10–25 Torr | — |
Pressure | 23–100 mTorr | — |
Thickness | 100–500 nm | — |
Temperature | 600–1100 °C | — |
Duration | 1–120 minutes | — |
Temperature | 1000–3000 °C | — |
Thickness | ≤ 20 nm | — |
Thickness | ≤ 10 nm | — |
Thickness | ≤ 3 nm | — |
Thickness | ≥ 1 mm | — |
Temperature | 200–300 °C | — |
polyacrylonitrile
polymethyl methacrylate
polystyrene
polycarbonate
polyimides
polypropylene
polyethylene terephthalate
polyvinyl chloride
metal substrate
copper foil
Cu
methane
CH₄
hydrogen
H₂
| ≥ 10 GPa |
graphene layer |
Pressure | 0–25 Torr | — |
Pressure | 10–25 Torr | — |
Pressure | 23–100 mTorr | — |
Thickness | 100–500 nm | — |
Temperature | 600–1100 °C | — |
Duration | 1–120 minutes | — |
Temperature | 1000–3000 °C | — |
Thickness | ≤ 20 nm | — |
Thickness | ≤ 10 nm | — |
Thickness | ≤ 3 nm | — |
Thickness | ≥ 1 mm | — |
Temperature | 200–300 °C | — |
polyacrylonitrile
polymethyl methacrylate
polystyrene
polycarbonate
polyimides
polypropylene
polyethylene terephthalate
polyvinyl chloride
metal substrate
copper foil
Cu
methane
CH₄
hydrogen
H₂
| ≥ 10 GPa |
graphene layer |
Pressure | 0–25 Torr | — |
Pressure | 10–25 Torr | — |
Pressure | 23–100 mTorr | — |
Thickness | 100–500 nm | — |
Temperature | 600–1100 °C | — |
Duration | 1–120 minutes | — |
Temperature | 1000–3000 °C | — |
Thickness | ≤ 20 nm | — |
Thickness | ≤ 10 nm | — |
Thickness | ≤ 3 nm | — |
Thickness | ≥ 1 mm | — |
Temperature | 200–300 °C | — |