Patent
US 10,873,075silicon
Si
silicon oxide
SiOx
polymeric material (buffer layer)
boric acid
B(OH)3
citric acid
glutaraldehyde (GA)
fumaric acid
pyrolyzed polymeric material
polyvinyl alcohol (PVA)
polyvinyl butyral (PVB)
polyvinyl formal (PVF)
polyacrylonitrile (PAN)
binder (PTFE, PVDF, poly(acrylic) acid, ETFE, polyamide, polyimide, polyethylene, styrene-butadiene rubber, cellulose, polyacrylate rubber)
graphene
graphene oxide
partially reduced graphene oxide
| — |
Duration | 30–300 s | — |
Duration | 2–24 hours | — |
Thickness | 50–400 nm | — |
Thickness | 1–50 nm | — |
Thickness | 1–25 nm | — |
Thickness | 1–10 nm | — |
Duration | 3–5 hours | — |
Thickness | ≤ 500 nm | — |
silicon
Si
silicon oxide
SiOx
polymeric material (buffer layer)
boric acid
B(OH)3
citric acid
glutaraldehyde (GA)
fumaric acid
pyrolyzed polymeric material
polyvinyl alcohol (PVA)
polyvinyl butyral (PVB)
polyvinyl formal (PVF)
polyacrylonitrile (PAN)
binder (PTFE, PVDF, poly(acrylic) acid, ETFE, polyamide, polyimide, polyethylene, styrene-butadiene rubber, cellulose, polyacrylate rubber)
graphene
graphene oxide
partially reduced graphene oxide
| — |
Duration | 30–300 s | — |
Duration | 2–24 hours | — |
Thickness | 50–400 nm | — |
Thickness | 1–50 nm | — |
Thickness | 1–25 nm | — |
Thickness | 1–10 nm | — |
Duration | 3–5 hours | — |
Thickness | ≤ 500 nm | — |
silicon
Si
silicon oxide
SiOx
polymeric material (buffer layer)
boric acid
B(OH)3
citric acid
glutaraldehyde (GA)
fumaric acid
pyrolyzed polymeric material
polyvinyl alcohol (PVA)
polyvinyl butyral (PVB)
polyvinyl formal (PVF)
polyacrylonitrile (PAN)
binder (PTFE, PVDF, poly(acrylic) acid, ETFE, polyamide, polyimide, polyethylene, styrene-butadiene rubber, cellulose, polyacrylate rubber)
graphene
graphene oxide
partially reduced graphene oxide
| — |
Duration | 30–300 s | — |
Duration | 2–24 hours | — |
Thickness | 50–400 nm | — |
Thickness | 1–50 nm | — |
Thickness | 1–25 nm | — |
Thickness | 1–10 nm | — |
Duration | 3–5 hours | — |
Thickness | ≤ 500 nm | — |
silicon
Si
silicon oxide
SiOx
polymeric material (buffer layer)
boric acid
B(OH)3
citric acid
glutaraldehyde (GA)
fumaric acid
pyrolyzed polymeric material
polyvinyl alcohol (PVA)
polyvinyl butyral (PVB)
polyvinyl formal (PVF)
polyacrylonitrile (PAN)
binder (PTFE, PVDF, poly(acrylic) acid, ETFE, polyamide, polyimide, polyethylene, styrene-butadiene rubber, cellulose, polyacrylate rubber)
graphene
graphene oxide
partially reduced graphene oxide
| — |
Duration | 30–300 s | — |
Duration | 2–24 hours | — |
Thickness | 50–400 nm | — |
Thickness | 1–50 nm | — |
Thickness | 1–25 nm | — |
Thickness | 1–10 nm | — |
Duration | 3–5 hours | — |
Thickness | ≤ 500 nm | — |