Patent
US 10,092,882anodic aluminum oxide
polyamide
cellulose acetate
Pore Size | — | reduced graphene oxide |
Pore Size | — | reduced graphene oxide |
Thickness | 0.3–20 nm | — |
Thickness | ≤ 5 nm | — |
Thickness | ≥ 50 nm | — |
Thickness | ≥ 10 nm | — |
Thickness | 5–10 nm | — |
Thickness | 2–5 nm | — |
Temperature | 175–225 °C | — |
Temperature | 200–225 °C | — |
Pressure | 1–5 torr | — |
Thickness | 10–400 nm | — |
Thickness | ≤ 3 nm | — |
Thickness | ≤ 0.4 nm | — |
Duration | ≥ 15 hours | — |
Thickness | 1–100 nm | — |
Thickness | 0.4–10 nm | — |
anodic aluminum oxide
polyamide
cellulose acetate
Pore Size | — | reduced graphene oxide |
Pore Size | — | reduced graphene oxide |
Thickness | 0.3–20 nm | — |
Thickness | ≤ 5 nm | — |
Thickness | ≥ 50 nm | — |
Thickness | ≥ 10 nm | — |
Thickness | 5–10 nm | — |
Thickness | 2–5 nm | — |
Temperature | 175–225 °C | — |
Temperature | 200–225 °C | — |
Pressure | 1–5 torr | — |
Thickness | 10–400 nm | — |
Thickness | ≤ 3 nm | — |
Thickness | ≤ 0.4 nm | — |
Duration | ≥ 15 hours | — |
Thickness | 1–100 nm | — |
Thickness | 0.4–10 nm | — |
anodic aluminum oxide
polyamide
cellulose acetate
Pore Size | — | reduced graphene oxide |
Pore Size | — | reduced graphene oxide |
Thickness | 0.3–20 nm | — |
Thickness | ≤ 5 nm | — |
Thickness | ≥ 50 nm | — |
Thickness | ≥ 10 nm | — |
Thickness | 5–10 nm | — |
Thickness | 2–5 nm | — |
Temperature | 175–225 °C | — |
Temperature | 200–225 °C | — |
Pressure | 1–5 torr | — |
Thickness | 10–400 nm | — |
Thickness | ≤ 3 nm | — |
Thickness | ≤ 0.4 nm | — |
Duration | ≥ 15 hours | — |
Thickness | 1–100 nm | — |
Thickness | 0.4–10 nm | — |
anodic aluminum oxide
polyamide
cellulose acetate
Pore Size | — | reduced graphene oxide |
Pore Size | — | reduced graphene oxide |
Thickness | 0.3–20 nm | — |
Thickness | ≤ 5 nm | — |
Thickness | ≥ 50 nm | — |
Thickness | ≥ 10 nm | — |
Thickness | 5–10 nm | — |
Thickness | 2–5 nm | — |
Temperature | 175–225 °C | — |
Temperature | 200–225 °C | — |
Pressure | 1–5 torr | — |
Thickness | 10–400 nm | — |
Thickness | ≤ 3 nm | — |
Thickness | ≤ 0.4 nm | — |
Duration | ≥ 15 hours | — |
Thickness | 1–100 nm | — |
Thickness | 0.4–10 nm | — |