Patent
US 9,236,633transition metal oxide
transition metal carbide
molybdenum oxide
MoO₃
FIG. 3 is a schematic illustration of an evolution of electron diffraction patterns with temperature of a graphene oxide (GO) sample according to an embodiment …
FIG. 3 is a schematic illustration of an evolution of electron diffraction patterns with temperature of a graphene oxide (GO) sample according to an embodiment …
FIGS. 4(a), 4(b), 4(c), and 4(d) are graphs plotting normal incidence (NI) infrared absorbance spectra of (a) unreduced graphene oxide, (b) thermally reduced …
FIGS. 4(a), 4(b), 4(c), and 4(d) are graphs plotting normal incidence (NI) infrared absorbance spectra of (a) unreduced graphene oxide, (b) thermally reduced …
FIG. 6(b), high frequency components of the image beyond the lattice resolution of the microscope were filtered out. In the diffractogram of this region, two …
FIG. 7, a direct band gap of approximately 0.9 eV is shown at the X point of a GMO according to an embodiment of the present invention. The size (and …
FIG. 7, a direct band gap of approximately 0.9 eV is shown at the X point of a GMO according to an embodiment of the present invention. The size (and …
FIG. 7, a direct band gap of approximately 0.9 eV is shown at the X point of a GMO according to an embodiment of the present invention. The size (and …
FIG. 11). [0070] The atomic resolution HRTEM image in
FIG. 12 is a current-voltage graph of a TRG-O according to an embodiment of the present invention. [0021]
FIG. 15, the resulting cast and grid were subjected to vacuum at approximately 1. 3x 10 5 Pa and heated inside the TEM while monitored using SA E D. Graphene …
FIG. 16 (b), there was a hint of formation of rings Ring A (0.272nm) and B (0.16 1n m), which are equivalent to Ring III (0.260 nm) and Ring IV (0.152 nm), but …
FIG. 17 (e), an additional 10 minutes annealing showed stronger g r aphene monoxide rings (labeled III and IV), visible in many regions of the sample. …
FIGS. 18(a), 18(b), and 18(c) are SAED patterns of a GMO according to an embodiment of the present invention (a) of a first region at 22 ° C, (b) of the first …
FIGS. 19(a) and 19(b) are SAED patterns of a GMO according to an embodiment of the present invention (a) of a second region at 22 ° C and (b) of the second …
FIGS. 20(a) and 20(b) are SAED patterns of a GMO according to an embodiment of the present invention (a) of a first region at 22 ° C and (b) of the first region …
FIG. 22(a). For the fully optimized structure, GMO is a semiconductor with a calculated indirect band gap of approximately 0.6 eV. Upon planar deformation, GMO …
FIG. 22(a). For the fully optimized structure, GMO is a semiconductor with a calculated indirect band gap of approximately 0.6 eV. Upon planar deformation, GMO …
FIG. 25(b) shows the (local) band structure of the combined system in the middle of the graphene region and k-projected ("unfolded") onto the graphene 1x1 …
FIG. 25(b) shows the (local) band structure of the combined system in the middle of the graphene region and k-projected ("unfolded") onto the graphene 1x1 …
| — |
Pressure | 0.00001 Pa | — |
Thickness | 3300–3600 cm | — |
— | 0.18–0.21 eV | — |
Pressure | 13–1330 Pa | — |
— | 0.2–0.5 eV | — |
Temperature | ≥ 1200 °C | — |
Thickness | 0.305–0.31 nm | — |
— | 0–1.35 eV | — |
— | 0.1–1.35 eV | — |
Thickness | ≤ 200 nm | — |
Thickness | ≤ 50 nm | — |
— | ≥ 1 eV | — |
— | ≥ 0.1 eV | — |
— | ≥ 0.2 eV | — |
— | ≥ 0.3 eV | — |
— | ≥ 0.4 eV | — |
— | ≥ 0.5 eV | — |
— | ≥ 0.6 eV | — |
— | ≥ 0.7 eV | — |
— | ≥ 0.8 eV | — |
— | ≥ 0.9 eV | — |
transition metal oxide
transition metal carbide
molybdenum oxide
MoO₃
FIG. 3 is a schematic illustration of an evolution of electron diffraction patterns with temperature of a graphene oxide (GO) sample according to an embodiment …
FIG. 3 is a schematic illustration of an evolution of electron diffraction patterns with temperature of a graphene oxide (GO) sample according to an embodiment …
FIGS. 4(a), 4(b), 4(c), and 4(d) are graphs plotting normal incidence (NI) infrared absorbance spectra of (a) unreduced graphene oxide, (b) thermally reduced …
FIGS. 4(a), 4(b), 4(c), and 4(d) are graphs plotting normal incidence (NI) infrared absorbance spectra of (a) unreduced graphene oxide, (b) thermally reduced …
FIG. 6(b), high frequency components of the image beyond the lattice resolution of the microscope were filtered out. In the diffractogram of this region, two …
FIG. 7, a direct band gap of approximately 0.9 eV is shown at the X point of a GMO according to an embodiment of the present invention. The size (and …
FIG. 7, a direct band gap of approximately 0.9 eV is shown at the X point of a GMO according to an embodiment of the present invention. The size (and …
FIG. 7, a direct band gap of approximately 0.9 eV is shown at the X point of a GMO according to an embodiment of the present invention. The size (and …
FIG. 11). [0070] The atomic resolution HRTEM image in
FIG. 12 is a current-voltage graph of a TRG-O according to an embodiment of the present invention. [0021]
FIG. 15, the resulting cast and grid were subjected to vacuum at approximately 1. 3x 10 5 Pa and heated inside the TEM while monitored using SA E D. Graphene …
FIG. 16 (b), there was a hint of formation of rings Ring A (0.272nm) and B (0.16 1n m), which are equivalent to Ring III (0.260 nm) and Ring IV (0.152 nm), but …
FIG. 17 (e), an additional 10 minutes annealing showed stronger g r aphene monoxide rings (labeled III and IV), visible in many regions of the sample. …
FIGS. 18(a), 18(b), and 18(c) are SAED patterns of a GMO according to an embodiment of the present invention (a) of a first region at 22 ° C, (b) of the first …
FIGS. 19(a) and 19(b) are SAED patterns of a GMO according to an embodiment of the present invention (a) of a second region at 22 ° C and (b) of the second …
FIGS. 20(a) and 20(b) are SAED patterns of a GMO according to an embodiment of the present invention (a) of a first region at 22 ° C and (b) of the first region …
FIG. 22(a). For the fully optimized structure, GMO is a semiconductor with a calculated indirect band gap of approximately 0.6 eV. Upon planar deformation, GMO …
FIG. 22(a). For the fully optimized structure, GMO is a semiconductor with a calculated indirect band gap of approximately 0.6 eV. Upon planar deformation, GMO …
FIG. 25(b) shows the (local) band structure of the combined system in the middle of the graphene region and k-projected ("unfolded") onto the graphene 1x1 …
FIG. 25(b) shows the (local) band structure of the combined system in the middle of the graphene region and k-projected ("unfolded") onto the graphene 1x1 …
| — |
Pressure | 0.00001 Pa | — |
Thickness | 3300–3600 cm | — |
— | 0.18–0.21 eV | — |
Pressure | 13–1330 Pa | — |
— | 0.2–0.5 eV | — |
Temperature | ≥ 1200 °C | — |
Thickness | 0.305–0.31 nm | — |
— | 0–1.35 eV | — |
— | 0.1–1.35 eV | — |
Thickness | ≤ 200 nm | — |
Thickness | ≤ 50 nm | — |
— | ≥ 1 eV | — |
— | ≥ 0.1 eV | — |
— | ≥ 0.2 eV | — |
— | ≥ 0.3 eV | — |
— | ≥ 0.4 eV | — |
— | ≥ 0.5 eV | — |
— | ≥ 0.6 eV | — |
— | ≥ 0.7 eV | — |
— | ≥ 0.8 eV | — |
— | ≥ 0.9 eV | — |
transition metal oxide
transition metal carbide
molybdenum oxide
MoO₃
FIG. 3 is a schematic illustration of an evolution of electron diffraction patterns with temperature of a graphene oxide (GO) sample according to an embodiment …
FIG. 3 is a schematic illustration of an evolution of electron diffraction patterns with temperature of a graphene oxide (GO) sample according to an embodiment …
FIGS. 4(a), 4(b), 4(c), and 4(d) are graphs plotting normal incidence (NI) infrared absorbance spectra of (a) unreduced graphene oxide, (b) thermally reduced …
FIGS. 4(a), 4(b), 4(c), and 4(d) are graphs plotting normal incidence (NI) infrared absorbance spectra of (a) unreduced graphene oxide, (b) thermally reduced …
FIG. 6(b), high frequency components of the image beyond the lattice resolution of the microscope were filtered out. In the diffractogram of this region, two …
FIG. 7, a direct band gap of approximately 0.9 eV is shown at the X point of a GMO according to an embodiment of the present invention. The size (and …
FIG. 7, a direct band gap of approximately 0.9 eV is shown at the X point of a GMO according to an embodiment of the present invention. The size (and …
FIG. 7, a direct band gap of approximately 0.9 eV is shown at the X point of a GMO according to an embodiment of the present invention. The size (and …
FIG. 11). [0070] The atomic resolution HRTEM image in
FIG. 12 is a current-voltage graph of a TRG-O according to an embodiment of the present invention. [0021]
FIG. 15, the resulting cast and grid were subjected to vacuum at approximately 1. 3x 10 5 Pa and heated inside the TEM while monitored using SA E D. Graphene …
FIG. 16 (b), there was a hint of formation of rings Ring A (0.272nm) and B (0.16 1n m), which are equivalent to Ring III (0.260 nm) and Ring IV (0.152 nm), but …
FIG. 17 (e), an additional 10 minutes annealing showed stronger g r aphene monoxide rings (labeled III and IV), visible in many regions of the sample. …
FIGS. 18(a), 18(b), and 18(c) are SAED patterns of a GMO according to an embodiment of the present invention (a) of a first region at 22 ° C, (b) of the first …
FIGS. 19(a) and 19(b) are SAED patterns of a GMO according to an embodiment of the present invention (a) of a second region at 22 ° C and (b) of the second …
FIGS. 20(a) and 20(b) are SAED patterns of a GMO according to an embodiment of the present invention (a) of a first region at 22 ° C and (b) of the first region …
FIG. 22(a). For the fully optimized structure, GMO is a semiconductor with a calculated indirect band gap of approximately 0.6 eV. Upon planar deformation, GMO …
FIG. 22(a). For the fully optimized structure, GMO is a semiconductor with a calculated indirect band gap of approximately 0.6 eV. Upon planar deformation, GMO …
FIG. 25(b) shows the (local) band structure of the combined system in the middle of the graphene region and k-projected ("unfolded") onto the graphene 1x1 …
FIG. 25(b) shows the (local) band structure of the combined system in the middle of the graphene region and k-projected ("unfolded") onto the graphene 1x1 …
| — |
Pressure | 0.00001 Pa | — |
Thickness | 3300–3600 cm | — |
— | 0.18–0.21 eV | — |
Pressure | 13–1330 Pa | — |
— | 0.2–0.5 eV | — |
Temperature | ≥ 1200 °C | — |
Thickness | 0.305–0.31 nm | — |
— | 0–1.35 eV | — |
— | 0.1–1.35 eV | — |
Thickness | ≤ 200 nm | — |
Thickness | ≤ 50 nm | — |
— | ≥ 1 eV | — |
— | ≥ 0.1 eV | — |
— | ≥ 0.2 eV | — |
— | ≥ 0.3 eV | — |
— | ≥ 0.4 eV | — |
— | ≥ 0.5 eV | — |
— | ≥ 0.6 eV | — |
— | ≥ 0.7 eV | — |
— | ≥ 0.8 eV | — |
— | ≥ 0.9 eV | — |
transition metal oxide
transition metal carbide
molybdenum oxide
MoO₃
FIG. 3 is a schematic illustration of an evolution of electron diffraction patterns with temperature of a graphene oxide (GO) sample according to an embodiment …
FIG. 3 is a schematic illustration of an evolution of electron diffraction patterns with temperature of a graphene oxide (GO) sample according to an embodiment …
FIGS. 4(a), 4(b), 4(c), and 4(d) are graphs plotting normal incidence (NI) infrared absorbance spectra of (a) unreduced graphene oxide, (b) thermally reduced …
FIGS. 4(a), 4(b), 4(c), and 4(d) are graphs plotting normal incidence (NI) infrared absorbance spectra of (a) unreduced graphene oxide, (b) thermally reduced …
FIG. 6(b), high frequency components of the image beyond the lattice resolution of the microscope were filtered out. In the diffractogram of this region, two …
FIG. 7, a direct band gap of approximately 0.9 eV is shown at the X point of a GMO according to an embodiment of the present invention. The size (and …
FIG. 7, a direct band gap of approximately 0.9 eV is shown at the X point of a GMO according to an embodiment of the present invention. The size (and …
FIG. 7, a direct band gap of approximately 0.9 eV is shown at the X point of a GMO according to an embodiment of the present invention. The size (and …
FIG. 11). [0070] The atomic resolution HRTEM image in
FIG. 12 is a current-voltage graph of a TRG-O according to an embodiment of the present invention. [0021]
FIG. 15, the resulting cast and grid were subjected to vacuum at approximately 1. 3x 10 5 Pa and heated inside the TEM while monitored using SA E D. Graphene …
FIG. 16 (b), there was a hint of formation of rings Ring A (0.272nm) and B (0.16 1n m), which are equivalent to Ring III (0.260 nm) and Ring IV (0.152 nm), but …
FIG. 17 (e), an additional 10 minutes annealing showed stronger g r aphene monoxide rings (labeled III and IV), visible in many regions of the sample. …
FIGS. 18(a), 18(b), and 18(c) are SAED patterns of a GMO according to an embodiment of the present invention (a) of a first region at 22 ° C, (b) of the first …
FIGS. 19(a) and 19(b) are SAED patterns of a GMO according to an embodiment of the present invention (a) of a second region at 22 ° C and (b) of the second …
FIGS. 20(a) and 20(b) are SAED patterns of a GMO according to an embodiment of the present invention (a) of a first region at 22 ° C and (b) of the first region …
FIG. 22(a). For the fully optimized structure, GMO is a semiconductor with a calculated indirect band gap of approximately 0.6 eV. Upon planar deformation, GMO …
FIG. 22(a). For the fully optimized structure, GMO is a semiconductor with a calculated indirect band gap of approximately 0.6 eV. Upon planar deformation, GMO …
FIG. 25(b) shows the (local) band structure of the combined system in the middle of the graphene region and k-projected ("unfolded") onto the graphene 1x1 …
FIG. 25(b) shows the (local) band structure of the combined system in the middle of the graphene region and k-projected ("unfolded") onto the graphene 1x1 …
| — |
Pressure | 0.00001 Pa | — |
Thickness | 3300–3600 cm | — |
— | 0.18–0.21 eV | — |
Pressure | 13–1330 Pa | — |
— | 0.2–0.5 eV | — |
Temperature | ≥ 1200 °C | — |
Thickness | 0.305–0.31 nm | — |
— | 0–1.35 eV | — |
— | 0.1–1.35 eV | — |
Thickness | ≤ 200 nm | — |
Thickness | ≤ 50 nm | — |
— | ≥ 1 eV | — |
— | ≥ 0.1 eV | — |
— | ≥ 0.2 eV | — |
— | ≥ 0.3 eV | — |
— | ≥ 0.4 eV | — |
— | ≥ 0.5 eV | — |
— | ≥ 0.6 eV | — |
— | ≥ 0.7 eV | — |
— | ≥ 0.8 eV | — |
— | ≥ 0.9 eV | — |