Patent
US 12,049,582 B2zinc chloride
ZnCl₂
oleic acid
metal halides (GaCl3, AlCl3, YCl3, MgBr2, ZnBr2, ZrCl₄)
zinc dioleate
photoluminescence quantum yield (dependent claim 2 range) | 96–100 | InP |
full width at half-maximum (dependent claim 3 range) | 10–40 | InP |
Temperature | 65–150 °C | — |
Thickness | 1–15 nm | — |
Thickness | 610–650 nm | — |
Thickness | 0.05–3.5 nm | — |
Temperature | 20–100 °C | — |
Temperature | 200–310 °C | — |
Duration | 2–240 minutes | — |
Duration | 2–200 minutes | — |
Duration | 30–120 minutes | — |
Thickness | 5–6 nm | — |
Thickness | 0.08–3.5 nm | — |
Temperature | 250–310 °C | — |
Temperature | 100–250 °C | — |
Thickness | 0.01–40 mM | — |
Thickness | 1–2.5 mM | — |
Thickness | 300–750 nm | — |
Thickness | 300–650 nm | — |
Thickness | 300–550 nm | — |
Thickness | 300–450 nm | — |
Thickness | 450–750 nm | — |
Thickness | 450–650 nm | — |
Thickness | 450–550 nm | — |
Thickness | 550–750 nm | — |
Thickness | 550–650 nm | — |
Thickness | 650–750 nm | — |
Thickness | 500–550 nm | — |
Thickness | 600–650 nm | — |
Thickness | 10–60 nm | — |
Thickness | 10–40 nm | — |
Thickness | 10–30 nm | — |
Thickness | 10–20 nm | — |
Thickness | 20–60 nm | — |
Thickness | 20–40 nm | — |
Thickness | 20–30 nm | — |
Thickness | 30–60 nm | — |
Thickness | 30–40 nm | — |
Thickness | 40–60 nm | — |
Thickness | 35–45 nm | — |
Thickness | 3–10 µm | — |
Thickness | 90–110 nm | — |
Thickness | 40–70 µm | — |
Thickness | 40–65 µm | — |
Thickness | 40–60 µm | — |
Thickness | 40–50 µm | — |
Thickness | ≤ 500 nm | — |
Thickness | ≤ 200 nm | — |
Thickness | ≤ 1 nm | — |
Thickness | ≤ 50 nm | — |
Thickness | ≤ 20 nm | — |
Thickness | ≤ 10 nm | — |
Thickness | ≤ 45 nm | — |
Thickness | ≤ 40 nm | — |
Thickness | ≤ 75 µm | — |
Thickness | ≤ 10 µm | — |
Thickness | 10–10 nm | — |
Cited non-patent literature · 1
zinc chloride
ZnCl₂
oleic acid
metal halides (GaCl3, AlCl3, YCl3, MgBr2, ZnBr2, ZrCl₄)
zinc dioleate
photoluminescence quantum yield (dependent claim 2 range) | 96–100 | InP |
full width at half-maximum (dependent claim 3 range) | 10–40 | InP |
Temperature | 65–150 °C | — |
Thickness | 1–15 nm | — |
Thickness | 610–650 nm | — |
Thickness | 0.05–3.5 nm | — |
Temperature | 20–100 °C | — |
Temperature | 200–310 °C | — |
Duration | 2–240 minutes | — |
Duration | 2–200 minutes | — |
Duration | 30–120 minutes | — |
Thickness | 5–6 nm | — |
Thickness | 0.08–3.5 nm | — |
Temperature | 250–310 °C | — |
Temperature | 100–250 °C | — |
Thickness | 0.01–40 mM | — |
Thickness | 1–2.5 mM | — |
Thickness | 300–750 nm | — |
Thickness | 300–650 nm | — |
Thickness | 300–550 nm | — |
Thickness | 300–450 nm | — |
Thickness | 450–750 nm | — |
Thickness | 450–650 nm | — |
Thickness | 450–550 nm | — |
Thickness | 550–750 nm | — |
Thickness | 550–650 nm | — |
Thickness | 650–750 nm | — |
Thickness | 500–550 nm | — |
Thickness | 600–650 nm | — |
Thickness | 10–60 nm | — |
Thickness | 10–40 nm | — |
Thickness | 10–30 nm | — |
Thickness | 10–20 nm | — |
Thickness | 20–60 nm | — |
Thickness | 20–40 nm | — |
Thickness | 20–30 nm | — |
Thickness | 30–60 nm | — |
Thickness | 30–40 nm | — |
Thickness | 40–60 nm | — |
Thickness | 35–45 nm | — |
Thickness | 3–10 µm | — |
Thickness | 90–110 nm | — |
Thickness | 40–70 µm | — |
Thickness | 40–65 µm | — |
Thickness | 40–60 µm | — |
Thickness | 40–50 µm | — |
Thickness | ≤ 500 nm | — |
Thickness | ≤ 200 nm | — |
Thickness | ≤ 1 nm | — |
Thickness | ≤ 50 nm | — |
Thickness | ≤ 20 nm | — |
Thickness | ≤ 10 nm | — |
Thickness | ≤ 45 nm | — |
Thickness | ≤ 40 nm | — |
Thickness | ≤ 75 µm | — |
Thickness | ≤ 10 µm | — |
Thickness | 10–10 nm | — |
Cited non-patent literature · 1
zinc chloride
ZnCl₂
oleic acid
metal halides (GaCl3, AlCl3, YCl3, MgBr2, ZnBr2, ZrCl₄)
zinc dioleate
photoluminescence quantum yield (dependent claim 2 range) | 96–100 | InP |
full width at half-maximum (dependent claim 3 range) | 10–40 | InP |
Temperature | 65–150 °C | — |
Thickness | 1–15 nm | — |
Thickness | 610–650 nm | — |
Thickness | 0.05–3.5 nm | — |
Temperature | 20–100 °C | — |
Temperature | 200–310 °C | — |
Duration | 2–240 minutes | — |
Duration | 2–200 minutes | — |
Duration | 30–120 minutes | — |
Thickness | 5–6 nm | — |
Thickness | 0.08–3.5 nm | — |
Temperature | 250–310 °C | — |
Temperature | 100–250 °C | — |
Thickness | 0.01–40 mM | — |
Thickness | 1–2.5 mM | — |
Thickness | 300–750 nm | — |
Thickness | 300–650 nm | — |
Thickness | 300–550 nm | — |
Thickness | 300–450 nm | — |
Thickness | 450–750 nm | — |
Thickness | 450–650 nm | — |
Thickness | 450–550 nm | — |
Thickness | 550–750 nm | — |
Thickness | 550–650 nm | — |
Thickness | 650–750 nm | — |
Thickness | 500–550 nm | — |
Thickness | 600–650 nm | — |
Thickness | 10–60 nm | — |
Thickness | 10–40 nm | — |
Thickness | 10–30 nm | — |
Thickness | 10–20 nm | — |
Thickness | 20–60 nm | — |
Thickness | 20–40 nm | — |
Thickness | 20–30 nm | — |
Thickness | 30–60 nm | — |
Thickness | 30–40 nm | — |
Thickness | 40–60 nm | — |
Thickness | 35–45 nm | — |
Thickness | 3–10 µm | — |
Thickness | 90–110 nm | — |
Thickness | 40–70 µm | — |
Thickness | 40–65 µm | — |
Thickness | 40–60 µm | — |
Thickness | 40–50 µm | — |
Thickness | ≤ 500 nm | — |
Thickness | ≤ 200 nm | — |
Thickness | ≤ 1 nm | — |
Thickness | ≤ 50 nm | — |
Thickness | ≤ 20 nm | — |
Thickness | ≤ 10 nm | — |
Thickness | ≤ 45 nm | — |
Thickness | ≤ 40 nm | — |
Thickness | ≤ 75 µm | — |
Thickness | ≤ 10 µm | — |
Thickness | 10–10 nm | — |
Cited non-patent literature · 1
zinc chloride
ZnCl₂
oleic acid
metal halides (GaCl3, AlCl3, YCl3, MgBr2, ZnBr2, ZrCl₄)
zinc dioleate
photoluminescence quantum yield (dependent claim 2 range) | 96–100 | InP |
full width at half-maximum (dependent claim 3 range) | 10–40 | InP |
Temperature | 65–150 °C | — |
Thickness | 1–15 nm | — |
Thickness | 610–650 nm | — |
Thickness | 0.05–3.5 nm | — |
Temperature | 20–100 °C | — |
Temperature | 200–310 °C | — |
Duration | 2–240 minutes | — |
Duration | 2–200 minutes | — |
Duration | 30–120 minutes | — |
Thickness | 5–6 nm | — |
Thickness | 0.08–3.5 nm | — |
Temperature | 250–310 °C | — |
Temperature | 100–250 °C | — |
Thickness | 0.01–40 mM | — |
Thickness | 1–2.5 mM | — |
Thickness | 300–750 nm | — |
Thickness | 300–650 nm | — |
Thickness | 300–550 nm | — |
Thickness | 300–450 nm | — |
Thickness | 450–750 nm | — |
Thickness | 450–650 nm | — |
Thickness | 450–550 nm | — |
Thickness | 550–750 nm | — |
Thickness | 550–650 nm | — |
Thickness | 650–750 nm | — |
Thickness | 500–550 nm | — |
Thickness | 600–650 nm | — |
Thickness | 10–60 nm | — |
Thickness | 10–40 nm | — |
Thickness | 10–30 nm | — |
Thickness | 10–20 nm | — |
Thickness | 20–60 nm | — |
Thickness | 20–40 nm | — |
Thickness | 20–30 nm | — |
Thickness | 30–60 nm | — |
Thickness | 30–40 nm | — |
Thickness | 40–60 nm | — |
Thickness | 35–45 nm | — |
Thickness | 3–10 µm | — |
Thickness | 90–110 nm | — |
Thickness | 40–70 µm | — |
Thickness | 40–65 µm | — |
Thickness | 40–60 µm | — |
Thickness | 40–50 µm | — |
Thickness | ≤ 500 nm | — |
Thickness | ≤ 200 nm | — |
Thickness | ≤ 1 nm | — |
Thickness | ≤ 50 nm | — |
Thickness | ≤ 20 nm | — |
Thickness | ≤ 10 nm | — |
Thickness | ≤ 45 nm | — |
Thickness | ≤ 40 nm | — |
Thickness | ≤ 75 µm | — |
Thickness | ≤ 10 µm | — |
Thickness | 10–10 nm | — |
Cited non-patent literature · 1