Patent
US 9,331,151CVD graphene on copper
Figure 4 illustrates the Raman spectrum of a silicon-oxide substrate pre- treated in SC- 1 and oxygen plasma and coupled to a graphene layer; 15
Figure 5 illustrates a) a micrograph of a graphene layer grown by CVD, and b) the Raman spectrum of the graphene grown by CVD;
Figure 6 illustrates two Raman spectra of the graphene transferred onto a silicon-oxide substrate immediately after the treatment according to the disclosure (GR₂ 1) and after four weeks (GR₂₂); 20
Figure 7 illustrates I-V characteristics measured on CVD graphene transferred onto SiO 2 treated by means of the SC- 1 + oxygen plasma procedure and using the method according to the disclosure;
Figure 10 illustrates (a) the resistance measured between pairs of adjacent contacts in a TLM structure as a function of the distance between the contacts for backgate 8 voltages ranging from-40 to 40 V, (b) the plot of the sheet resistance as a function of Vg and (c) the conductance G= 1/R sh as a …
| 40 |
SiO₂ |
Temperature | 20–45 °C | — |
Voltage | 40–40 V | — |
Temperature | 1.5–1.9 k | — |
CVD graphene on copper
Figure 4 illustrates the Raman spectrum of a silicon-oxide substrate pre- treated in SC- 1 and oxygen plasma and coupled to a graphene layer; 15
Figure 5 illustrates a) a micrograph of a graphene layer grown by CVD, and b) the Raman spectrum of the graphene grown by CVD;
Figure 6 illustrates two Raman spectra of the graphene transferred onto a silicon-oxide substrate immediately after the treatment according to the disclosure (GR₂ 1) and after four weeks (GR₂₂); 20
Figure 7 illustrates I-V characteristics measured on CVD graphene transferred onto SiO 2 treated by means of the SC- 1 + oxygen plasma procedure and using the method according to the disclosure;
Figure 10 illustrates (a) the resistance measured between pairs of adjacent contacts in a TLM structure as a function of the distance between the contacts for backgate 8 voltages ranging from-40 to 40 V, (b) the plot of the sheet resistance as a function of Vg and (c) the conductance G= 1/R sh as a …
| 40 |
SiO₂ |
Temperature | 20–45 °C | — |
Voltage | 40–40 V | — |
Temperature | 1.5–1.9 k | — |
CVD graphene on copper
Figure 4 illustrates the Raman spectrum of a silicon-oxide substrate pre- treated in SC- 1 and oxygen plasma and coupled to a graphene layer; 15
Figure 5 illustrates a) a micrograph of a graphene layer grown by CVD, and b) the Raman spectrum of the graphene grown by CVD;
Figure 6 illustrates two Raman spectra of the graphene transferred onto a silicon-oxide substrate immediately after the treatment according to the disclosure (GR₂ 1) and after four weeks (GR₂₂); 20
Figure 7 illustrates I-V characteristics measured on CVD graphene transferred onto SiO 2 treated by means of the SC- 1 + oxygen plasma procedure and using the method according to the disclosure;
Figure 10 illustrates (a) the resistance measured between pairs of adjacent contacts in a TLM structure as a function of the distance between the contacts for backgate 8 voltages ranging from-40 to 40 V, (b) the plot of the sheet resistance as a function of Vg and (c) the conductance G= 1/R sh as a …
| 40 |
SiO₂ |
Temperature | 20–45 °C | — |
Voltage | 40–40 V | — |
Temperature | 1.5–1.9 k | — |
CVD graphene on copper
Figure 4 illustrates the Raman spectrum of a silicon-oxide substrate pre- treated in SC- 1 and oxygen plasma and coupled to a graphene layer; 15
Figure 5 illustrates a) a micrograph of a graphene layer grown by CVD, and b) the Raman spectrum of the graphene grown by CVD;
Figure 6 illustrates two Raman spectra of the graphene transferred onto a silicon-oxide substrate immediately after the treatment according to the disclosure (GR₂ 1) and after four weeks (GR₂₂); 20
Figure 7 illustrates I-V characteristics measured on CVD graphene transferred onto SiO 2 treated by means of the SC- 1 + oxygen plasma procedure and using the method according to the disclosure;
Figure 10 illustrates (a) the resistance measured between pairs of adjacent contacts in a TLM structure as a function of the distance between the contacts for backgate 8 voltages ranging from-40 to 40 V, (b) the plot of the sheet resistance as a function of Vg and (c) the conductance G= 1/R sh as a …
| 40 |
SiO₂ |
Temperature | 20–45 °C | — |
Voltage | 40–40 V | — |
Temperature | 1.5–1.9 k | — |