Abstract

We demonstrate high-throughput three-dimensional imaging of threading dislocations in ammonothermal GaN wafers using polarized-light microscopy with collimated LED illumination. Threading dislocations exhibited focal-depth-dependent in-plane shifts, enabling visualization of their three-dimensional inclination behavior over large areas. Synchrotron radiation X-ray topography indicated that dislocations with identical in-plane Burgers vector components tended to exhibit similar trace geometries and inclination directions. The threading dislocations were found to be tilted by approximately 3.3° from the c-axis in directions perpendicular to their Burgers vectors, indicating climb-mediated motion associated with strain relaxation during crystal growth. These results demonstrate a simple nondestructive approach for large-area three-dimensional characterization of dislocations in GaN wafers.

Abstract

We demonstrate high-throughput three-dimensional imaging of threading dislocations in ammonothermal GaN wafers using polarized-light microscopy with collimated LED illumination. Threading dislocations exhibited focal-depth-dependent in-plane shifts, enabling visualization of their three-dimensional inclination behavior over large areas. Synchrotron radiation X-ray topography indicated that dislocations with identical in-plane Burgers vector components tended to exhibit similar trace geometries and inclination directions. The threading dislocations were found to be tilted by approximately 3.3° from the c-axis in directions perpendicular to their Burgers vectors, indicating climb-mediated motion associated with strain relaxation during crystal growth. These results demonstrate a simple nondestructive approach for large-area three-dimensional characterization of dislocations in GaN wafers.

Abstract

We demonstrate high-throughput three-dimensional imaging of threading dislocations in ammonothermal GaN wafers using polarized-light microscopy with collimated LED illumination. Threading dislocations exhibited focal-depth-dependent in-plane shifts, enabling visualization of their three-dimensional inclination behavior over large areas. Synchrotron radiation X-ray topography indicated that dislocations with identical in-plane Burgers vector components tended to exhibit similar trace geometries and inclination directions. The threading dislocations were found to be tilted by approximately 3.3° from the c-axis in directions perpendicular to their Burgers vectors, indicating climb-mediated motion associated with strain relaxation during crystal growth. These results demonstrate a simple nondestructive approach for large-area three-dimensional characterization of dislocations in GaN wafers.

Abstract

We demonstrate high-throughput three-dimensional imaging of threading dislocations in ammonothermal GaN wafers using polarized-light microscopy with collimated LED illumination. Threading dislocations exhibited focal-depth-dependent in-plane shifts, enabling visualization of their three-dimensional inclination behavior over large areas. Synchrotron radiation X-ray topography indicated that dislocations with identical in-plane Burgers vector components tended to exhibit similar trace geometries and inclination directions. The threading dislocations were found to be tilted by approximately 3.3° from the c-axis in directions perpendicular to their Burgers vectors, indicating climb-mediated motion associated with strain relaxation during crystal growth. These results demonstrate a simple nondestructive approach for large-area three-dimensional characterization of dislocations in GaN wafers.