methods:exposing intermediate graphene thin film to doping gas, exciting plasma, low energy ion beam implanting dopant, thermal diffusion from solid-state dopants in target receiving substrate (dopants introduced by melting process), thermal diffusion from solid-state dopants in target receiving substrate (dopants introduced by ion beam implantation), thermal diffusion from solid-state dopants in thin film coating on target receiving substrate, pre-implanting solid-state dopants in catalyst thin film and allowing thermal diffusion during graphene deposition
dopant types:n-type, p-type
dopant species:nitrogen, boron, phosphorous, fluorine, lithium, potassium, sulfur