Patent
US 10,916,383Patent
Atlas literature
Patent
US 10,916,383Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of fabricating graphene, the method comprising: providing a patterned substrate, said patterned substrate comprising protrusions or indentations; depositing graphene oxide on the patterned substrate; and reducing the graphene oxide to graphene, wherein the patterned substrate has structures between 50 nm and 500 nm in height. Currently amended
The method of claim 1, wherein the patterned substrate comprises polyethylene terephthalate (PET). Original
The method of claim 1, further comprising the step of ultrasonicating the graphene oxide prior to deposition. Original
The method of claim 1, wherein the step of depositing graphene oxide comprises a technique selected from the group containing spin coating, drop casting, pad printing, doctor blading, casting, screen printing, ink-jet printing, roll coating, and brush coating. Original
The method of claim 1, wherein the step of reducing the graphene oxide to graphene comprises treating the graphene oxide with a high intensity light. Original
A graphene structure produced using the method of claim 1. Original
3-6. Canceled
Canceled
, A method of fabricating graphene, the method comprising: providing a patterned substrate, said patterned substrate comprising protrusions or indentations; depositing graphene oxide on the patterned substrate; and reducing the graphene oxide to graphene; wherein the patterned substrate has structures between 1.0 p m and 3 p m in height. Currently amended
The method of claim 7, wherein the patterned substrate comprises polyethylene terephthalate (PET). New
The method of claim 7, further comprising the step of ultrasonicating the graphene oxide prior to deposition. New
The method of claim 7, wherein the step of depositing graphene oxide comprises a technique selected from the group containing spin coating, drop casting, pad printing, doctor blading, casting, screen printing, ink-jet printing, roll coating, and brush coating. New
The method of claim 7, wherein the step of reducing the graphene oxide to graphene comprises treating the graphene oxide with a high intensity light. New
A graphene structure produced using the method of claim 7. New
Canceled
Canceled
19-20. Canceled
Canceled
Layer stacks claimed or described, ordered top of device to substrate.
multilayered graphene structure
electrode
capacitor
Materials described outside the worked examples.
graphene
graphene oxide
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
average distance between graphene layers | ≥ 1.6 | graphene |
oxygen content of graphene structure | ≤ 25 |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 10,916,383Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of fabricating graphene, the method comprising: providing a patterned substrate, said patterned substrate comprising protrusions or indentations; depositing graphene oxide on the patterned substrate; and reducing the graphene oxide to graphene, wherein the patterned substrate has structures between 50 nm and 500 nm in height. Currently amended
The method of claim 1, wherein the patterned substrate comprises polyethylene terephthalate (PET). Original
The method of claim 1, further comprising the step of ultrasonicating the graphene oxide prior to deposition. Original
The method of claim 1, wherein the step of depositing graphene oxide comprises a technique selected from the group containing spin coating, drop casting, pad printing, doctor blading, casting, screen printing, ink-jet printing, roll coating, and brush coating. Original
The method of claim 1, wherein the step of reducing the graphene oxide to graphene comprises treating the graphene oxide with a high intensity light. Original
A graphene structure produced using the method of claim 1. Original
3-6. Canceled
Canceled
, A method of fabricating graphene, the method comprising: providing a patterned substrate, said patterned substrate comprising protrusions or indentations; depositing graphene oxide on the patterned substrate; and reducing the graphene oxide to graphene; wherein the patterned substrate has structures between 1.0 p m and 3 p m in height. Currently amended
The method of claim 7, wherein the patterned substrate comprises polyethylene terephthalate (PET). New
The method of claim 7, further comprising the step of ultrasonicating the graphene oxide prior to deposition. New
The method of claim 7, wherein the step of depositing graphene oxide comprises a technique selected from the group containing spin coating, drop casting, pad printing, doctor blading, casting, screen printing, ink-jet printing, roll coating, and brush coating. New
The method of claim 7, wherein the step of reducing the graphene oxide to graphene comprises treating the graphene oxide with a high intensity light. New
A graphene structure produced using the method of claim 7. New
Canceled
Canceled
19-20. Canceled
Canceled
Layer stacks claimed or described, ordered top of device to substrate.
multilayered graphene structure
electrode
capacitor
Materials described outside the worked examples.
graphene
graphene oxide
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
average distance between graphene layers | ≥ 1.6 | graphene |
oxygen content of graphene structure | ≤ 25 |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 10,916,383Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of fabricating graphene, the method comprising: providing a patterned substrate, said patterned substrate comprising protrusions or indentations; depositing graphene oxide on the patterned substrate; and reducing the graphene oxide to graphene, wherein the patterned substrate has structures between 50 nm and 500 nm in height. Currently amended
The method of claim 1, wherein the patterned substrate comprises polyethylene terephthalate (PET). Original
The method of claim 1, further comprising the step of ultrasonicating the graphene oxide prior to deposition. Original
The method of claim 1, wherein the step of depositing graphene oxide comprises a technique selected from the group containing spin coating, drop casting, pad printing, doctor blading, casting, screen printing, ink-jet printing, roll coating, and brush coating. Original
The method of claim 1, wherein the step of reducing the graphene oxide to graphene comprises treating the graphene oxide with a high intensity light. Original
A graphene structure produced using the method of claim 1. Original
3-6. Canceled
Canceled
, A method of fabricating graphene, the method comprising: providing a patterned substrate, said patterned substrate comprising protrusions or indentations; depositing graphene oxide on the patterned substrate; and reducing the graphene oxide to graphene; wherein the patterned substrate has structures between 1.0 p m and 3 p m in height. Currently amended
The method of claim 7, wherein the patterned substrate comprises polyethylene terephthalate (PET). New
The method of claim 7, further comprising the step of ultrasonicating the graphene oxide prior to deposition. New
The method of claim 7, wherein the step of depositing graphene oxide comprises a technique selected from the group containing spin coating, drop casting, pad printing, doctor blading, casting, screen printing, ink-jet printing, roll coating, and brush coating. New
The method of claim 7, wherein the step of reducing the graphene oxide to graphene comprises treating the graphene oxide with a high intensity light. New
A graphene structure produced using the method of claim 7. New
Canceled
Canceled
19-20. Canceled
Canceled
Layer stacks claimed or described, ordered top of device to substrate.
multilayered graphene structure
electrode
capacitor
Materials described outside the worked examples.
graphene
graphene oxide
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
average distance between graphene layers | ≥ 1.6 | graphene |
oxygen content of graphene structure | ≤ 25 |
Related documents with shared materials, methods, properties, or citations.
Patent
Atlas literature
Patent
US 10,916,383Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of fabricating graphene, the method comprising: providing a patterned substrate, said patterned substrate comprising protrusions or indentations; depositing graphene oxide on the patterned substrate; and reducing the graphene oxide to graphene, wherein the patterned substrate has structures between 50 nm and 500 nm in height. Currently amended
The method of claim 1, wherein the patterned substrate comprises polyethylene terephthalate (PET). Original
The method of claim 1, further comprising the step of ultrasonicating the graphene oxide prior to deposition. Original
The method of claim 1, wherein the step of depositing graphene oxide comprises a technique selected from the group containing spin coating, drop casting, pad printing, doctor blading, casting, screen printing, ink-jet printing, roll coating, and brush coating. Original
The method of claim 1, wherein the step of reducing the graphene oxide to graphene comprises treating the graphene oxide with a high intensity light. Original
A graphene structure produced using the method of claim 1. Original
3-6. Canceled
Canceled
, A method of fabricating graphene, the method comprising: providing a patterned substrate, said patterned substrate comprising protrusions or indentations; depositing graphene oxide on the patterned substrate; and reducing the graphene oxide to graphene; wherein the patterned substrate has structures between 1.0 p m and 3 p m in height. Currently amended
The method of claim 7, wherein the patterned substrate comprises polyethylene terephthalate (PET). New
The method of claim 7, further comprising the step of ultrasonicating the graphene oxide prior to deposition. New
The method of claim 7, wherein the step of depositing graphene oxide comprises a technique selected from the group containing spin coating, drop casting, pad printing, doctor blading, casting, screen printing, ink-jet printing, roll coating, and brush coating. New
The method of claim 7, wherein the step of reducing the graphene oxide to graphene comprises treating the graphene oxide with a high intensity light. New
A graphene structure produced using the method of claim 7. New
Canceled
Canceled
19-20. Canceled
Canceled
Layer stacks claimed or described, ordered top of device to substrate.
multilayered graphene structure
electrode
capacitor
Materials described outside the worked examples.
graphene
graphene oxide
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
average distance between graphene layers | ≥ 1.6 | graphene |
oxygen content of graphene structure | ≤ 25 |
Related documents with shared materials, methods, properties, or citations.
polyethylene terephthalate
Thickness | 50–500 nm | — |
Thickness | 10–100 nm | — |
Thickness | 25–100 nm | — |
Thickness | 100–200 nm | — |
Thickness | 10–500 nm | — |
Thickness | 100–500 nm | — |
Thickness | 100–400 nm | — |
Thickness | 75–300 nm | — |
Voltage | 0.3–1 V | — |
Voltage | 1–1 V | — |
Thickness | 500–3000 cm | — |
Thickness | ≤ 1 nm | — |
— | ≥ 0.1 W | — |
— | ≥ 0.15 W | — |
— | ≥ 0.2 W | — |
— | ≥ 0.25 W | — |
— | ≥ 0.3 W | — |
— | ≥ 0.35 W | — |
— | ≥ 10 W | — |
— | ≥ 1 W | — |
— | ≥ 200 W | — |
— | ≥ 300 W | — |
— | ≥ 400 W | — |
polyethylene terephthalate
Thickness | 50–500 nm | — |
Thickness | 10–100 nm | — |
Thickness | 25–100 nm | — |
Thickness | 100–200 nm | — |
Thickness | 10–500 nm | — |
Thickness | 100–500 nm | — |
Thickness | 100–400 nm | — |
Thickness | 75–300 nm | — |
Voltage | 0.3–1 V | — |
Voltage | 1–1 V | — |
Thickness | 500–3000 cm | — |
Thickness | ≤ 1 nm | — |
— | ≥ 0.1 W | — |
— | ≥ 0.15 W | — |
— | ≥ 0.2 W | — |
— | ≥ 0.25 W | — |
— | ≥ 0.3 W | — |
— | ≥ 0.35 W | — |
— | ≥ 10 W | — |
— | ≥ 1 W | — |
— | ≥ 200 W | — |
— | ≥ 300 W | — |
— | ≥ 400 W | — |
polyethylene terephthalate
Thickness | 50–500 nm | — |
Thickness | 10–100 nm | — |
Thickness | 25–100 nm | — |
Thickness | 100–200 nm | — |
Thickness | 10–500 nm | — |
Thickness | 100–500 nm | — |
Thickness | 100–400 nm | — |
Thickness | 75–300 nm | — |
Voltage | 0.3–1 V | — |
Voltage | 1–1 V | — |
Thickness | 500–3000 cm | — |
Thickness | ≤ 1 nm | — |
— | ≥ 0.1 W | — |
— | ≥ 0.15 W | — |
— | ≥ 0.2 W | — |
— | ≥ 0.25 W | — |
— | ≥ 0.3 W | — |
— | ≥ 0.35 W | — |
— | ≥ 10 W | — |
— | ≥ 1 W | — |
— | ≥ 200 W | — |
— | ≥ 300 W | — |
— | ≥ 400 W | — |
polyethylene terephthalate
Thickness | 50–500 nm | — |
Thickness | 10–100 nm | — |
Thickness | 25–100 nm | — |
Thickness | 100–200 nm | — |
Thickness | 10–500 nm | — |
Thickness | 100–500 nm | — |
Thickness | 100–400 nm | — |
Thickness | 75–300 nm | — |
Voltage | 0.3–1 V | — |
Voltage | 1–1 V | — |
Thickness | 500–3000 cm | — |
Thickness | ≤ 1 nm | — |
— | ≥ 0.1 W | — |
— | ≥ 0.15 W | — |
— | ≥ 0.2 W | — |
— | ≥ 0.25 W | — |
— | ≥ 0.3 W | — |
— | ≥ 0.35 W | — |
— | ≥ 10 W | — |
— | ≥ 1 W | — |
— | ≥ 200 W | — |
— | ≥ 300 W | — |
— | ≥ 400 W | — |
