Title: GRAPHENE ETCHING METHODS, SYSTEMS, A ND COMPOSITES Provid in g a patterned substrate nf0o with hydrophobi c regions and hydroph ilic regi ons Disposing grapbene on the >K 120 patterned substrate [Applying resist to the graphene 130 130 sur face such that the resist selectively adheres to portions of the graphene overlying either the hydrophobic regions o r the hydrophibc regions of the patterned substrate Cur ing the resist Etching exposed portions of-150 the graphene Removing the resist [60 60 FIG. I

ANDERSON; 2005 Carmelita Avenue; 601 Dahlia Way

Patent

Atlas literature

Patent

US 9,919,929

Title: GRAPHENE ETCHING METHODS, SYSTEMS, A ND COMPOSITES Provid in g a patterned substrate nf0o with hydrophobi c regions and hydroph ilic regi ons Disposing grapbene on the >K 120 patterned substrate [Applying resist to the graphene 130 130 sur face such that the resist selectively adheres to portions of the graphene overlying either the hydrophobic regions o r the hydrophibc regions of the patterned substrate Cur ing the resist Etching exposed portions of-150 the graphene Removing the resist [60 60 FIG. I

ANDERSON, Kraig, SJONG, Angele

EMPIRE TECHNOLOGY DEVELOPMENT LLC·18 June 2015·US

Title: GRAPHENE ETCHING METHODS, SYSTEMS, A ND COMPOSITES Provid in g a patterned substrate nf0o with hydrophobi c regions and hydroph ilic regi ons Disposing grapbene on the >K 120 patterned substrate [Applying resist to the graphene 130 130 sur face such that the resist selectively adheres to portions of the graphene overlying either the hydrophobic regions o r the hydrophibc regions of the patterned substrate Cur ing the resist Etching exposed portions of-150 the graphene Removing the resist [60 60 FIG. I | Matter42 Literature

Claims

Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.

21 independent · 18 dependent

1
Independentgraphenehydrophobic resisthydrophilic resistetched graphene structure (method product)
A method for etching graphene, the method comprising: providing a patterned substrate comprising one or more hydrophobic regions and one or more hydrophilic regions patterned on a surface of the patterned substrate; disposing graphene on the one or more hydrophobic regions and on the one or more hydrophilic regions patterned on the surface of the patterned substrate; applying a resist to a surface of the graphene opposite to the patterned substrate, wherein applying the resist to the surface of the graphene comprises applying a hydrophobic resist or a hydrophilic resist to the surface of the graphene, the hydrophobic resist selectively adheres to portions of the surface of the graphene overlying the one or more hydrophobic regions of the patterned substrate and the hydrophilic resist selectively adheres to portions of the surface of the graphene overlying the one or more hydrophilic regions of the patterned substrate, and wherein portions of the surface of the graphene not covered by the resist form exposed portions of the graphene; and etching the exposed portions of the graphene to form one or more etched graphene structures. Previously presented
1. 2
  Dependent← claim 1
  The method of Claim 1, further comprising curing the resist. Original
2. 3
  Dependent← claim 1hydrophobic resist
  The method of Claim 1, wherein applying the resist to the surface of the graphene comprises applying the hydrophobic resist to the surface of the graphene, the hydrophobic resist selectively adheres to portions of the surface of the graphene overlying the hydrophobic regions of the patterned substrate. Previously presented
3. 7
  Dependent← claim 1hydrophilic resist
  The method of Claim 1, wherein applying the resist to the surface of the graphene comprises applying the hydrophilic resist to the surface of the graphene, the hydrophilic resist selectively adheres to portions of the surface of the graphene overlying the hydrophilic regions of the patterned substrate. Previously presented
4. 11
  Dependent← claim 1surfactant resist
  The method of Claim 1, wherein applying the hydrophilic resist or the hydrophobic resist to the surface of graphene comprises applying a hydrophilic surfactant resist or a hydrophobic surfactant resist to the surface of the graphene. Previously presented
5. 17
  Dependent← claim 1
  The method of Claim 1, further comprising removing the resist after etching the exposed portions of the graphene. Previously presented
6. 20
  Dependent← claim 1graphene
  The method of Claim 1, further comprising removing the patterned substrate from the one or more etched graphene structures, wherein removing the patterned substrate comp ri ses: adhering one or more of the etched graphene structures to a release tape; peeling the release tape to separate the one or more of the etched graphene structures from the patterned substrate; and heating and/or irradiating the release tape to separate the one or more of the etched graphene structures from the release tape. Currently amended
7. 26
  Dependent← claim 1fluoropolymer/non-polar polymer
  The method of Claim 1. wherein the one or more hydrophobic regions comprises one or more of a void, a non-polar polymer, and a ﬂuoropolymer. Previously presented
4
Independent
Canceled
6
Independent
Canceled
8
Independent
Canceled
10
Independent
Canceled
13
Independent
13 -16. Canceled
16
Independent
Canceled
18
Independent
-19. Canceled
19
Independent
Canceled
21
Independent
-25. Canceled
25
Independent
Canceled
27
Independentgraphenehydrophobic resisthydrophilic resistgraphene composite (claim 27)
A graphene composite comprising: a patterned substrate comprising one or more hydrophobic regions and one or more hydrophilic regions patterned on a surface of the patterned substrate; graphene disposed on the one or more hydrophobic regions and on the one or more hydrophilic regions patterned on the surface of the patterned substrate; and a resist disposed on portions of a surface of the graphene opposite to the patterned substrate, wherein the resist is a hydrophobic resist or a hydrophilic resist, the hydrophobic resist is disposed on portions of the substrate overlying the one or more hydrophobic regions of the patterned substrate and the hydrophilic resist is disposed on portions of the substrate overlying the one or more hydrophilic regions of the patterned substrate. Previously presented
1. 28
  Dependent← claim 27fluoropolymer/non-polar polymer
  The graphene composite of Claim 27, wherein the one or more hydrophobic regions comprise one or more of a void, a non-polar polymer, and a ﬂuoropolymer. Original
2. 34
  Dependent← claim 27hydrophobic resist
  The graphene composite of Claim 27, wherein the resist is the hydrophobic resist and is disposed on. portions of the surface of the graphene overlying the one or more hydrophobic regions of the patterned substrate. Previously presented
3. 37
  Dependent← claim 27hydrophilic resist
  The graphene composite of Claim 27, wherein the resist is the hydrophilic resist and is disposed on portions of the surface of the graphene overlying the one or more hydrophilic regions of the patterned substrate Previously presented
29
Independent
29-33. Canceled
33
Independent
Canceled
36
Independent
Canceled
39
Independent
- 42. Canceled
42
Independent
Canceled
43
Independentgraphenesurfactant resistgraphene composite with surfactant resist (claim 43)
A graphene composit,. comprising: a patterned substrate comprising one or more hydrophobic regions and one or more hydrophilic regions patterned on a surface of the patterned substrate; one or more graphene structures overlying the one or more hydrophobic regions or the one or more hydrophilic regions of the patterned substrate, wherein a shape of the one or more graphene structures corresponds to a shape of the hydrophobic regions or the hydrophilic regions of the patterned substrate; and a resist disposed on portions of a surface of the graphene opposite to the patterned substrate, wherein the resist is a surfactant resist and is disposed on portions of the substrate overlying either the one or more hydrophobic regions or the one or more hydrophilic regions of the patterned substrate. Currently amended
1. 45
  Dependent← claim 43
  The graphene composite of Claim 43, wherein the resist is a cured resist. Previously presented
2. 46
  Dependent← claim 43graphene
  The composite of Claim 43, wherein the one or more graphene structures are not covered by the resist and form the exposed portions of the graphene. Previously presented
3. 59
  Dependent← claim 43surfactant resist
  The graphene composite of Claim 43, wherein the surfactant resist comprises one or more of a block copolymer, a vinyl-containing surfactant, a thi ol -containing surfactant, a[[.]] phospholipid surfactant, a nonionic surfactant, or a haloalkyl group. Currently amended
44
Independent
Canceled
47
Independent
-58. Canceled
58
Independent
Canceled

Reported properties

Performance values and ranges asserted in the specification or claims.

Property	Value	Material
Thickness	10–20000000 nm	—
Thickness	100–1000000 nm	—
Thickness	≤ 10 mm	—
Thickness	≤ 2 nm	—

Claims

Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.

21 independent · 18 dependent

1
Independentgraphenehydrophobic resisthydrophilic resistetched graphene structure (method product)
A method for etching graphene, the method comprising: providing a patterned substrate comprising one or more hydrophobic regions and one or more hydrophilic regions patterned on a surface of the patterned substrate; disposing graphene on the one or more hydrophobic regions and on the one or more hydrophilic regions patterned on the surface of the patterned substrate; applying a resist to a surface of the graphene opposite to the patterned substrate, wherein applying the resist to the surface of the graphene comprises applying a hydrophobic resist or a hydrophilic resist to the surface of the graphene, the hydrophobic resist selectively adheres to portions of the surface of the graphene overlying the one or more hydrophobic regions of the patterned substrate and the hydrophilic resist selectively adheres to portions of the surface of the graphene overlying the one or more hydrophilic regions of the patterned substrate, and wherein portions of the surface of the graphene not covered by the resist form exposed portions of the graphene; and etching the exposed portions of the graphene to form one or more etched graphene structures. Previously presented
1. 2
  Dependent← claim 1
  The method of Claim 1, further comprising curing the resist. Original
2. 3
  Dependent← claim 1hydrophobic resist
  The method of Claim 1, wherein applying the resist to the surface of the graphene comprises applying the hydrophobic resist to the surface of the graphene, the hydrophobic resist selectively adheres to portions of the surface of the graphene overlying the hydrophobic regions of the patterned substrate. Previously presented
3. 7
  Dependent← claim 1hydrophilic resist
  The method of Claim 1, wherein applying the resist to the surface of the graphene comprises applying the hydrophilic resist to the surface of the graphene, the hydrophilic resist selectively adheres to portions of the surface of the graphene overlying the hydrophilic regions of the patterned substrate. Previously presented
4. 11
  Dependent← claim 1surfactant resist
  The method of Claim 1, wherein applying the hydrophilic resist or the hydrophobic resist to the surface of graphene comprises applying a hydrophilic surfactant resist or a hydrophobic surfactant resist to the surface of the graphene. Previously presented
5. 17
  Dependent← claim 1
  The method of Claim 1, further comprising removing the resist after etching the exposed portions of the graphene. Previously presented
6. 20
  Dependent← claim 1graphene
  The method of Claim 1, further comprising removing the patterned substrate from the one or more etched graphene structures, wherein removing the patterned substrate comp ri ses: adhering one or more of the etched graphene structures to a release tape; peeling the release tape to separate the one or more of the etched graphene structures from the patterned substrate; and heating and/or irradiating the release tape to separate the one or more of the etched graphene structures from the release tape. Currently amended
7. 26
  Dependent← claim 1fluoropolymer/non-polar polymer
  The method of Claim 1. wherein the one or more hydrophobic regions comprises one or more of a void, a non-polar polymer, and a ﬂuoropolymer. Previously presented
4
Independent
Canceled
6
Independent
Canceled
8
Independent
Canceled
10
Independent
Canceled
13
Independent
13 -16. Canceled
16
Independent
Canceled
18
Independent
-19. Canceled
19
Independent
Canceled
21
Independent
-25. Canceled
25
Independent
Canceled
27
Independentgraphenehydrophobic resisthydrophilic resistgraphene composite (claim 27)
A graphene composite comprising: a patterned substrate comprising one or more hydrophobic regions and one or more hydrophilic regions patterned on a surface of the patterned substrate; graphene disposed on the one or more hydrophobic regions and on the one or more hydrophilic regions patterned on the surface of the patterned substrate; and a resist disposed on portions of a surface of the graphene opposite to the patterned substrate, wherein the resist is a hydrophobic resist or a hydrophilic resist, the hydrophobic resist is disposed on portions of the substrate overlying the one or more hydrophobic regions of the patterned substrate and the hydrophilic resist is disposed on portions of the substrate overlying the one or more hydrophilic regions of the patterned substrate. Previously presented
1. 28
  Dependent← claim 27fluoropolymer/non-polar polymer
  The graphene composite of Claim 27, wherein the one or more hydrophobic regions comprise one or more of a void, a non-polar polymer, and a ﬂuoropolymer. Original
2. 34
  Dependent← claim 27hydrophobic resist
  The graphene composite of Claim 27, wherein the resist is the hydrophobic resist and is disposed on. portions of the surface of the graphene overlying the one or more hydrophobic regions of the patterned substrate. Previously presented
3. 37
  Dependent← claim 27hydrophilic resist
  The graphene composite of Claim 27, wherein the resist is the hydrophilic resist and is disposed on portions of the surface of the graphene overlying the one or more hydrophilic regions of the patterned substrate Previously presented
29
Independent
29-33. Canceled
33
Independent
Canceled
36
Independent
Canceled
39
Independent
- 42. Canceled
42
Independent
Canceled
43
Independentgraphenesurfactant resistgraphene composite with surfactant resist (claim 43)
A graphene composit,. comprising: a patterned substrate comprising one or more hydrophobic regions and one or more hydrophilic regions patterned on a surface of the patterned substrate; one or more graphene structures overlying the one or more hydrophobic regions or the one or more hydrophilic regions of the patterned substrate, wherein a shape of the one or more graphene structures corresponds to a shape of the hydrophobic regions or the hydrophilic regions of the patterned substrate; and a resist disposed on portions of a surface of the graphene opposite to the patterned substrate, wherein the resist is a surfactant resist and is disposed on portions of the substrate overlying either the one or more hydrophobic regions or the one or more hydrophilic regions of the patterned substrate. Currently amended
1. 45
  Dependent← claim 43
  The graphene composite of Claim 43, wherein the resist is a cured resist. Previously presented
2. 46
  Dependent← claim 43graphene
  The composite of Claim 43, wherein the one or more graphene structures are not covered by the resist and form the exposed portions of the graphene. Previously presented
3. 59
  Dependent← claim 43surfactant resist
  The graphene composite of Claim 43, wherein the surfactant resist comprises one or more of a block copolymer, a vinyl-containing surfactant, a thi ol -containing surfactant, a[[.]] phospholipid surfactant, a nonionic surfactant, or a haloalkyl group. Currently amended
44
Independent
Canceled
47
Independent
-58. Canceled
58
Independent
Canceled

Reported properties

Performance values and ranges asserted in the specification or claims.

Property	Value	Material
Thickness	10–20000000 nm	—
Thickness	100–1000000 nm	—
Thickness	≤ 10 mm	—
Thickness	≤ 2 nm	—

Claims

Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.

21 independent · 18 dependent

1
Independentgraphenehydrophobic resisthydrophilic resistetched graphene structure (method product)
A method for etching graphene, the method comprising: providing a patterned substrate comprising one or more hydrophobic regions and one or more hydrophilic regions patterned on a surface of the patterned substrate; disposing graphene on the one or more hydrophobic regions and on the one or more hydrophilic regions patterned on the surface of the patterned substrate; applying a resist to a surface of the graphene opposite to the patterned substrate, wherein applying the resist to the surface of the graphene comprises applying a hydrophobic resist or a hydrophilic resist to the surface of the graphene, the hydrophobic resist selectively adheres to portions of the surface of the graphene overlying the one or more hydrophobic regions of the patterned substrate and the hydrophilic resist selectively adheres to portions of the surface of the graphene overlying the one or more hydrophilic regions of the patterned substrate, and wherein portions of the surface of the graphene not covered by the resist form exposed portions of the graphene; and etching the exposed portions of the graphene to form one or more etched graphene structures. Previously presented
1. 2
  Dependent← claim 1
  The method of Claim 1, further comprising curing the resist. Original
2. 3
  Dependent← claim 1hydrophobic resist
  The method of Claim 1, wherein applying the resist to the surface of the graphene comprises applying the hydrophobic resist to the surface of the graphene, the hydrophobic resist selectively adheres to portions of the surface of the graphene overlying the hydrophobic regions of the patterned substrate. Previously presented
3. 7
  Dependent← claim 1hydrophilic resist
  The method of Claim 1, wherein applying the resist to the surface of the graphene comprises applying the hydrophilic resist to the surface of the graphene, the hydrophilic resist selectively adheres to portions of the surface of the graphene overlying the hydrophilic regions of the patterned substrate. Previously presented
4. 11
  Dependent← claim 1surfactant resist
  The method of Claim 1, wherein applying the hydrophilic resist or the hydrophobic resist to the surface of graphene comprises applying a hydrophilic surfactant resist or a hydrophobic surfactant resist to the surface of the graphene. Previously presented
5. 17
  Dependent← claim 1
  The method of Claim 1, further comprising removing the resist after etching the exposed portions of the graphene. Previously presented
6. 20
  Dependent← claim 1graphene
  The method of Claim 1, further comprising removing the patterned substrate from the one or more etched graphene structures, wherein removing the patterned substrate comp ri ses: adhering one or more of the etched graphene structures to a release tape; peeling the release tape to separate the one or more of the etched graphene structures from the patterned substrate; and heating and/or irradiating the release tape to separate the one or more of the etched graphene structures from the release tape. Currently amended
7. 26
  Dependent← claim 1fluoropolymer/non-polar polymer
  The method of Claim 1. wherein the one or more hydrophobic regions comprises one or more of a void, a non-polar polymer, and a ﬂuoropolymer. Previously presented
4
Independent
Canceled
6
Independent
Canceled
8
Independent
Canceled
10
Independent
Canceled
13
Independent
13 -16. Canceled
16
Independent
Canceled
18
Independent
-19. Canceled
19
Independent
Canceled
21
Independent
-25. Canceled
25
Independent
Canceled
27
Independentgraphenehydrophobic resisthydrophilic resistgraphene composite (claim 27)
A graphene composite comprising: a patterned substrate comprising one or more hydrophobic regions and one or more hydrophilic regions patterned on a surface of the patterned substrate; graphene disposed on the one or more hydrophobic regions and on the one or more hydrophilic regions patterned on the surface of the patterned substrate; and a resist disposed on portions of a surface of the graphene opposite to the patterned substrate, wherein the resist is a hydrophobic resist or a hydrophilic resist, the hydrophobic resist is disposed on portions of the substrate overlying the one or more hydrophobic regions of the patterned substrate and the hydrophilic resist is disposed on portions of the substrate overlying the one or more hydrophilic regions of the patterned substrate. Previously presented
1. 28
  Dependent← claim 27fluoropolymer/non-polar polymer
  The graphene composite of Claim 27, wherein the one or more hydrophobic regions comprise one or more of a void, a non-polar polymer, and a ﬂuoropolymer. Original
2. 34
  Dependent← claim 27hydrophobic resist
  The graphene composite of Claim 27, wherein the resist is the hydrophobic resist and is disposed on. portions of the surface of the graphene overlying the one or more hydrophobic regions of the patterned substrate. Previously presented
3. 37
  Dependent← claim 27hydrophilic resist
  The graphene composite of Claim 27, wherein the resist is the hydrophilic resist and is disposed on portions of the surface of the graphene overlying the one or more hydrophilic regions of the patterned substrate Previously presented
29
Independent
29-33. Canceled
33
Independent
Canceled
36
Independent
Canceled
39
Independent
- 42. Canceled
42
Independent
Canceled
43
Independentgraphenesurfactant resistgraphene composite with surfactant resist (claim 43)
A graphene composit,. comprising: a patterned substrate comprising one or more hydrophobic regions and one or more hydrophilic regions patterned on a surface of the patterned substrate; one or more graphene structures overlying the one or more hydrophobic regions or the one or more hydrophilic regions of the patterned substrate, wherein a shape of the one or more graphene structures corresponds to a shape of the hydrophobic regions or the hydrophilic regions of the patterned substrate; and a resist disposed on portions of a surface of the graphene opposite to the patterned substrate, wherein the resist is a surfactant resist and is disposed on portions of the substrate overlying either the one or more hydrophobic regions or the one or more hydrophilic regions of the patterned substrate. Currently amended
1. 45
  Dependent← claim 43
  The graphene composite of Claim 43, wherein the resist is a cured resist. Previously presented
2. 46
  Dependent← claim 43graphene
  The composite of Claim 43, wherein the one or more graphene structures are not covered by the resist and form the exposed portions of the graphene. Previously presented
3. 59
  Dependent← claim 43surfactant resist
  The graphene composite of Claim 43, wherein the surfactant resist comprises one or more of a block copolymer, a vinyl-containing surfactant, a thi ol -containing surfactant, a[[.]] phospholipid surfactant, a nonionic surfactant, or a haloalkyl group. Currently amended
44
Independent
Canceled
47
Independent
-58. Canceled
58
Independent
Canceled

Reported properties

Performance values and ranges asserted in the specification or claims.

Property	Value	Material
Thickness	10–20000000 nm	—
Thickness	100–1000000 nm	—
Thickness	≤ 10 mm	—
Thickness	≤ 2 nm	—

Claims

Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.

21 independent · 18 dependent

1
Independentgraphenehydrophobic resisthydrophilic resistetched graphene structure (method product)
A method for etching graphene, the method comprising: providing a patterned substrate comprising one or more hydrophobic regions and one or more hydrophilic regions patterned on a surface of the patterned substrate; disposing graphene on the one or more hydrophobic regions and on the one or more hydrophilic regions patterned on the surface of the patterned substrate; applying a resist to a surface of the graphene opposite to the patterned substrate, wherein applying the resist to the surface of the graphene comprises applying a hydrophobic resist or a hydrophilic resist to the surface of the graphene, the hydrophobic resist selectively adheres to portions of the surface of the graphene overlying the one or more hydrophobic regions of the patterned substrate and the hydrophilic resist selectively adheres to portions of the surface of the graphene overlying the one or more hydrophilic regions of the patterned substrate, and wherein portions of the surface of the graphene not covered by the resist form exposed portions of the graphene; and etching the exposed portions of the graphene to form one or more etched graphene structures. Previously presented
1. 2
  Dependent← claim 1
  The method of Claim 1, further comprising curing the resist. Original
2. 3
  Dependent← claim 1hydrophobic resist
  The method of Claim 1, wherein applying the resist to the surface of the graphene comprises applying the hydrophobic resist to the surface of the graphene, the hydrophobic resist selectively adheres to portions of the surface of the graphene overlying the hydrophobic regions of the patterned substrate. Previously presented
3. 7
  Dependent← claim 1hydrophilic resist
  The method of Claim 1, wherein applying the resist to the surface of the graphene comprises applying the hydrophilic resist to the surface of the graphene, the hydrophilic resist selectively adheres to portions of the surface of the graphene overlying the hydrophilic regions of the patterned substrate. Previously presented
4. 11
  Dependent← claim 1surfactant resist
  The method of Claim 1, wherein applying the hydrophilic resist or the hydrophobic resist to the surface of graphene comprises applying a hydrophilic surfactant resist or a hydrophobic surfactant resist to the surface of the graphene. Previously presented
5. 17
  Dependent← claim 1
  The method of Claim 1, further comprising removing the resist after etching the exposed portions of the graphene. Previously presented
6. 20
  Dependent← claim 1graphene
  The method of Claim 1, further comprising removing the patterned substrate from the one or more etched graphene structures, wherein removing the patterned substrate comp ri ses: adhering one or more of the etched graphene structures to a release tape; peeling the release tape to separate the one or more of the etched graphene structures from the patterned substrate; and heating and/or irradiating the release tape to separate the one or more of the etched graphene structures from the release tape. Currently amended
7. 26
  Dependent← claim 1fluoropolymer/non-polar polymer
  The method of Claim 1. wherein the one or more hydrophobic regions comprises one or more of a void, a non-polar polymer, and a ﬂuoropolymer. Previously presented
4
Independent
Canceled
6
Independent
Canceled
8
Independent
Canceled
10
Independent
Canceled
13
Independent
13 -16. Canceled
16
Independent
Canceled
18
Independent
-19. Canceled
19
Independent
Canceled
21
Independent
-25. Canceled
25
Independent
Canceled
27
Independentgraphenehydrophobic resisthydrophilic resistgraphene composite (claim 27)
A graphene composite comprising: a patterned substrate comprising one or more hydrophobic regions and one or more hydrophilic regions patterned on a surface of the patterned substrate; graphene disposed on the one or more hydrophobic regions and on the one or more hydrophilic regions patterned on the surface of the patterned substrate; and a resist disposed on portions of a surface of the graphene opposite to the patterned substrate, wherein the resist is a hydrophobic resist or a hydrophilic resist, the hydrophobic resist is disposed on portions of the substrate overlying the one or more hydrophobic regions of the patterned substrate and the hydrophilic resist is disposed on portions of the substrate overlying the one or more hydrophilic regions of the patterned substrate. Previously presented
1. 28
  Dependent← claim 27fluoropolymer/non-polar polymer
  The graphene composite of Claim 27, wherein the one or more hydrophobic regions comprise one or more of a void, a non-polar polymer, and a ﬂuoropolymer. Original
2. 34
  Dependent← claim 27hydrophobic resist
  The graphene composite of Claim 27, wherein the resist is the hydrophobic resist and is disposed on. portions of the surface of the graphene overlying the one or more hydrophobic regions of the patterned substrate. Previously presented
3. 37
  Dependent← claim 27hydrophilic resist
  The graphene composite of Claim 27, wherein the resist is the hydrophilic resist and is disposed on portions of the surface of the graphene overlying the one or more hydrophilic regions of the patterned substrate Previously presented
29
Independent
29-33. Canceled
33
Independent
Canceled
36
Independent
Canceled
39
Independent
- 42. Canceled
42
Independent
Canceled
43
Independentgraphenesurfactant resistgraphene composite with surfactant resist (claim 43)
A graphene composit,. comprising: a patterned substrate comprising one or more hydrophobic regions and one or more hydrophilic regions patterned on a surface of the patterned substrate; one or more graphene structures overlying the one or more hydrophobic regions or the one or more hydrophilic regions of the patterned substrate, wherein a shape of the one or more graphene structures corresponds to a shape of the hydrophobic regions or the hydrophilic regions of the patterned substrate; and a resist disposed on portions of a surface of the graphene opposite to the patterned substrate, wherein the resist is a surfactant resist and is disposed on portions of the substrate overlying either the one or more hydrophobic regions or the one or more hydrophilic regions of the patterned substrate. Currently amended
1. 45
  Dependent← claim 43
  The graphene composite of Claim 43, wherein the resist is a cured resist. Previously presented
2. 46
  Dependent← claim 43graphene
  The composite of Claim 43, wherein the one or more graphene structures are not covered by the resist and form the exposed portions of the graphene. Previously presented
3. 59
  Dependent← claim 43surfactant resist
  The graphene composite of Claim 43, wherein the surfactant resist comprises one or more of a block copolymer, a vinyl-containing surfactant, a thi ol -containing surfactant, a[[.]] phospholipid surfactant, a nonionic surfactant, or a haloalkyl group. Currently amended
44
Independent
Canceled
47
Independent
-58. Canceled
58
Independent
Canceled

Reported properties

Performance values and ranges asserted in the specification or claims.

Property	Value	Material
Thickness	10–20000000 nm	—
Thickness	100–1000000 nm	—
Thickness	≤ 10 mm	—
Thickness	≤ 2 nm	—

Claims

Device structures

Materials

Process steps

Reported properties

Claims

Device structures

Materials

Process steps

Reported properties

Claims

Device structures

Materials

Process steps

Reported properties

Claims

Device structures

Materials

Process steps

Reported properties