Patent
US 11,578,266silylating agent (formula I)
basic compound
silylating agent selected from trimethylsilyl trifluoromethanesulfonate, triethylsilyl trifluoromethanesulfonate, tributylsilyl trifluoromethanesulfonate, triisopropylsilyl trifluoromethanesulfonate, triphenylsilyl trifluoromethanesulfonate, tert-butyldimethylsilyl trifluoromethanesulfonate
tris(trimethylsilyl)phosphine
P(SiMe₃)3
InP quantum dots
InP
PH₃ |
Pressure | ≤ 5 kPa | — |
Pressure | ≤ 0.01 kPa | — |
Pressure | ≥ 20 kPa | — |
Pressure | ≥ 4 kPa | — |
Thickness | 450–550 nm | — |
Thickness | 460–540 nm | — |
Pressure | 0–6 MPa | — |
Thickness | 400–800 nm | — |
Pressure | ≤ 1 pa | — |
Pressure | ≤ 120 pa | — |
Pressure | ≤ 2 kPa | — |
Pressure | ≤ 0.1 kPa | — |
Duration | ≤ 1 minute | — |
Duration | ≤ 2 minutes | — |
Pressure | ≥ 300 pa | — |
Pressure | ≥ 200 pa | — |
Pressure | ≥ 10 kPa | — |
Pressure | ≥ 5 kPa | — |
Duration | ≥ 180 minutes | — |
Duration | ≥ 60 minutes | — |
silylating agent (formula I)
basic compound
silylating agent selected from trimethylsilyl trifluoromethanesulfonate, triethylsilyl trifluoromethanesulfonate, tributylsilyl trifluoromethanesulfonate, triisopropylsilyl trifluoromethanesulfonate, triphenylsilyl trifluoromethanesulfonate, tert-butyldimethylsilyl trifluoromethanesulfonate
tris(trimethylsilyl)phosphine
P(SiMe₃)3
InP quantum dots
InP
PH₃ |
Pressure | ≤ 5 kPa | — |
Pressure | ≤ 0.01 kPa | — |
Pressure | ≥ 20 kPa | — |
Pressure | ≥ 4 kPa | — |
Thickness | 450–550 nm | — |
Thickness | 460–540 nm | — |
Pressure | 0–6 MPa | — |
Thickness | 400–800 nm | — |
Pressure | ≤ 1 pa | — |
Pressure | ≤ 120 pa | — |
Pressure | ≤ 2 kPa | — |
Pressure | ≤ 0.1 kPa | — |
Duration | ≤ 1 minute | — |
Duration | ≤ 2 minutes | — |
Pressure | ≥ 300 pa | — |
Pressure | ≥ 200 pa | — |
Pressure | ≥ 10 kPa | — |
Pressure | ≥ 5 kPa | — |
Duration | ≥ 180 minutes | — |
Duration | ≥ 60 minutes | — |
silylating agent (formula I)
basic compound
silylating agent selected from trimethylsilyl trifluoromethanesulfonate, triethylsilyl trifluoromethanesulfonate, tributylsilyl trifluoromethanesulfonate, triisopropylsilyl trifluoromethanesulfonate, triphenylsilyl trifluoromethanesulfonate, tert-butyldimethylsilyl trifluoromethanesulfonate
tris(trimethylsilyl)phosphine
P(SiMe₃)3
InP quantum dots
InP
PH₃ |
Pressure | ≤ 5 kPa | — |
Pressure | ≤ 0.01 kPa | — |
Pressure | ≥ 20 kPa | — |
Pressure | ≥ 4 kPa | — |
Thickness | 450–550 nm | — |
Thickness | 460–540 nm | — |
Pressure | 0–6 MPa | — |
Thickness | 400–800 nm | — |
Pressure | ≤ 1 pa | — |
Pressure | ≤ 120 pa | — |
Pressure | ≤ 2 kPa | — |
Pressure | ≤ 0.1 kPa | — |
Duration | ≤ 1 minute | — |
Duration | ≤ 2 minutes | — |
Pressure | ≥ 300 pa | — |
Pressure | ≥ 200 pa | — |
Pressure | ≥ 10 kPa | — |
Pressure | ≥ 5 kPa | — |
Duration | ≥ 180 minutes | — |
Duration | ≥ 60 minutes | — |
silylating agent (formula I)
basic compound
silylating agent selected from trimethylsilyl trifluoromethanesulfonate, triethylsilyl trifluoromethanesulfonate, tributylsilyl trifluoromethanesulfonate, triisopropylsilyl trifluoromethanesulfonate, triphenylsilyl trifluoromethanesulfonate, tert-butyldimethylsilyl trifluoromethanesulfonate
tris(trimethylsilyl)phosphine
P(SiMe₃)3
InP quantum dots
InP
PH₃ |
Pressure | ≤ 5 kPa | — |
Pressure | ≤ 0.01 kPa | — |
Pressure | ≥ 20 kPa | — |
Pressure | ≥ 4 kPa | — |
Thickness | 450–550 nm | — |
Thickness | 460–540 nm | — |
Pressure | 0–6 MPa | — |
Thickness | 400–800 nm | — |
Pressure | ≤ 1 pa | — |
Pressure | ≤ 120 pa | — |
Pressure | ≤ 2 kPa | — |
Pressure | ≤ 0.1 kPa | — |
Duration | ≤ 1 minute | — |
Duration | ≤ 2 minutes | — |
Pressure | ≥ 300 pa | — |
Pressure | ≥ 200 pa | — |
Pressure | ≥ 10 kPa | — |
Pressure | ≥ 5 kPa | — |
Duration | ≥ 180 minutes | — |
Duration | ≥ 60 minutes | — |