Patent
US 9,561,964METHOD AND APPARATUS FOR FORMING GRAPHENE
Hamid-Reza Jahangiri-Famenini
US
Copyright © 2026 Matter42. All rights reserved.
Patent
Atlas literature
Patent
US 9,561,964Patent drawings and their descriptions. Click a drawing to enlarge it.
Figure 1 is a schematic side view of an apparatus for forming a patterned organic material monolayer; [0
Figure 2 is a schematic side view of the apparatus for forming a patterned organic material monolayer of
Figure 3 is a schematic side view of an apparatus for forming graphene; [0
Figure 4 is a schematic side view of the apparatus for forming graphene of
Figure 5 is a schematic side view of another embodiment of an apparatus for forming a patterned organic material monolayer; [0
Figures 6 and 7 are schematic side views of the apparatus for forming a patterned organic material monolayer of
Figure 8 is a schematic side view of a portion of another embodiment of an apparatus for forming graphene; [0
Figure 9 is a schematic side view of the portion of the apparatus of
Figure 10 is a sectional side view of another embodiment of a substrate for use with the apparatus of
Figure 11 is a sectional side view of still another embodiment of a substrate for use with the apparatus of
Figure 12 is a sectional side view of still another embodiment of a substrate for use with the apparatus of
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of forming graphene, comprising: patterning an organic material monolayer disposed on a first substrate to yield a patterned organic material monolayer; and supplying thermal energy to said patterned organic material monolayer, said thermal energy being sufficient to carbonize said monolayer to form a patterned layer of graphene on said substrate, wherein said patterning is carried out by contacting the organic material monolayer with a stamp having a non-planar surface.
The method of claim 1, wherein said thermal energy is supplied by a hot plate, or by a heating element of any of a furnace, a kiln, and an oven.
The method of claim 1, further comprising disposing a second substrate onto said patterned organic material monolayer, said patterned organic material monolayer being arranged in a sandwich configuration between said first and second substrates.
The method of claim 1, wherein said organic material monolayer comprises a dopant, and wherein said supplying comprises forming a patterned layer of doped graphene on said substrate.
. canceled
The method of claim [[4]] 1, wherein said patterning is carried out by lifting-off portions of the organic material monolayer contacting said stamp.
The method of claim 5, wherein the non-planar surface is heated or cooled. Application No.: 14/641,271 Amendment Dated: Response to Office Action issued: 3
The method of claim 5, wherein the non-planar surface has one or more chemical substances disposed thereon to increase adhesion.
The method of claim [[4]] 1, wherein the non-planar surface is heated, and wherein said patterning is carried out by evaporating portions of the organic material monolayer contacting said stamp.
The method of claim [[4]] 1, wherein the non-planar surface has one or more chemical substances disposed thereon, and wherein said patterning is carried out by removing a portion of the organic material monolayer contacting said one or more chemical substances disposed on said stamp, the removing comprising at least one of: dissolving, etching, destroying, and reacting, the portion of the organic material monolayer.
A method of reducing evaporation of an organic material monolayer disposed on a substrate during carbonization thereof to form graphene, the method comprising: one or more of: (i) cooling said substrate during supplying of energy to at least a portion of the organic material monolayer; and (ii) placing said substrate in an environment having an elevated atmospheric pressure during supplying of energy to at least a portion of the organic material monolayer, to reduce evaporation of said organic material monolayer during carbonization, wherein said energy is sufficient to carbonize the at least a portion of said monolayer exposed thereto to form a layer of graphene on said substrate. Application No.: 14/641,271 Amendment Dated: Response to Office Action issued: 4
A method of forming graphene, comprising: supplying energy to at least a portion of an organic material monolayer disposed on a substrate, said energy being thermal energy supplied by a hot plate, or by a heating element of any of a furnace, a kiln, and an oven, said energy being sufficient to carbonize the at least a portion of said monolayer exposed thereto to form a layer of graphene on said substrate; and one or more of: (i) cooling said substrate during said supplying, and (ii) placing said substrate in an environment having an elevated atmospheric pressure, to reduce evaporation of said organic material monolayer during carbonization.
The method of claim 12, wherein said substrate comprises a plate.
The method of claim 12, wherein said organic material monolayer further comprises a dopant, and wherein said supplying comprises forming a layer of doped graphene on said substrate.
The method of claim 12, further comprising a combination of cooling said substrate and placing said substrate in said environment having said elevated atmospheric pressure during said supplying.
The method of claim 12, further comprising, after said supplying, removing an uncarbonized portion of said organic material monolayer.
A method of fabricating a patterned organic material monolayer, comprising: patterning an organic material monolayer disposed on a first substrate to yield a patterned organic material monolayer, said patterning being carried out by exposing a portion of the organic material monolayer to a localized beam of energy, said energy being sufficient to evaporate or ablate the exposed portion of the organic material monolayer.
The method of claim 21, further comprising one or more of: (i) cooling said substrate during said patterning, and (ii) placing said substrate in an environment having an elevated atmospheric pressure during said patterning, to reduce evaporation of an unexposed portion of said organic material monolayer during said patterning.
The method of claim 21, wherein said localized beam of energy is any of a laser beam, a maser beam, and an electron beam.
The method of claim 21, wherein said substrate comprises a plate.
The method of claim 21, wherein said organic material monolayer comprises a dopant, and wherein said patterning comprises forming a doped patterned organic material monolayer on said substrate.
The method of claim 21, further comprising material monolayer in accordance with a pattern.
The method of claim 21, further comprising organic material monolayer, said additional energy to form a patterned layer of graphene on said moving said localized beam over said organic supplying additional energy to said patterned being sufficient to carbonize said monolayer substrate.
Materials described outside the worked examples.
organic material monolayer
graphene
C
Additional fabrication and treatment steps described in the patent.
Patent
Atlas literature
Patent
US 9,561,964Patent drawings and their descriptions. Click a drawing to enlarge it.
Figure 1 is a schematic side view of an apparatus for forming a patterned organic material monolayer; [0
Figure 2 is a schematic side view of the apparatus for forming a patterned organic material monolayer of
Figure 3 is a schematic side view of an apparatus for forming graphene; [0
Figure 4 is a schematic side view of the apparatus for forming graphene of
Figure 5 is a schematic side view of another embodiment of an apparatus for forming a patterned organic material monolayer; [0
Figures 6 and 7 are schematic side views of the apparatus for forming a patterned organic material monolayer of
Figure 8 is a schematic side view of a portion of another embodiment of an apparatus for forming graphene; [0
Figure 9 is a schematic side view of the portion of the apparatus of
Figure 10 is a sectional side view of another embodiment of a substrate for use with the apparatus of
Figure 11 is a sectional side view of still another embodiment of a substrate for use with the apparatus of
Figure 12 is a sectional side view of still another embodiment of a substrate for use with the apparatus of
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of forming graphene, comprising: patterning an organic material monolayer disposed on a first substrate to yield a patterned organic material monolayer; and supplying thermal energy to said patterned organic material monolayer, said thermal energy being sufficient to carbonize said monolayer to form a patterned layer of graphene on said substrate, wherein said patterning is carried out by contacting the organic material monolayer with a stamp having a non-planar surface.
The method of claim 1, wherein said thermal energy is supplied by a hot plate, or by a heating element of any of a furnace, a kiln, and an oven.
The method of claim 1, further comprising disposing a second substrate onto said patterned organic material monolayer, said patterned organic material monolayer being arranged in a sandwich configuration between said first and second substrates.
The method of claim 1, wherein said organic material monolayer comprises a dopant, and wherein said supplying comprises forming a patterned layer of doped graphene on said substrate.
. canceled
The method of claim [[4]] 1, wherein said patterning is carried out by lifting-off portions of the organic material monolayer contacting said stamp.
The method of claim 5, wherein the non-planar surface is heated or cooled. Application No.: 14/641,271 Amendment Dated: Response to Office Action issued: 3
The method of claim 5, wherein the non-planar surface has one or more chemical substances disposed thereon to increase adhesion.
The method of claim [[4]] 1, wherein the non-planar surface is heated, and wherein said patterning is carried out by evaporating portions of the organic material monolayer contacting said stamp.
The method of claim [[4]] 1, wherein the non-planar surface has one or more chemical substances disposed thereon, and wherein said patterning is carried out by removing a portion of the organic material monolayer contacting said one or more chemical substances disposed on said stamp, the removing comprising at least one of: dissolving, etching, destroying, and reacting, the portion of the organic material monolayer.
A method of reducing evaporation of an organic material monolayer disposed on a substrate during carbonization thereof to form graphene, the method comprising: one or more of: (i) cooling said substrate during supplying of energy to at least a portion of the organic material monolayer; and (ii) placing said substrate in an environment having an elevated atmospheric pressure during supplying of energy to at least a portion of the organic material monolayer, to reduce evaporation of said organic material monolayer during carbonization, wherein said energy is sufficient to carbonize the at least a portion of said monolayer exposed thereto to form a layer of graphene on said substrate. Application No.: 14/641,271 Amendment Dated: Response to Office Action issued: 4
A method of forming graphene, comprising: supplying energy to at least a portion of an organic material monolayer disposed on a substrate, said energy being thermal energy supplied by a hot plate, or by a heating element of any of a furnace, a kiln, and an oven, said energy being sufficient to carbonize the at least a portion of said monolayer exposed thereto to form a layer of graphene on said substrate; and one or more of: (i) cooling said substrate during said supplying, and (ii) placing said substrate in an environment having an elevated atmospheric pressure, to reduce evaporation of said organic material monolayer during carbonization.
The method of claim 12, wherein said substrate comprises a plate.
The method of claim 12, wherein said organic material monolayer further comprises a dopant, and wherein said supplying comprises forming a layer of doped graphene on said substrate.
The method of claim 12, further comprising a combination of cooling said substrate and placing said substrate in said environment having said elevated atmospheric pressure during said supplying.
The method of claim 12, further comprising, after said supplying, removing an uncarbonized portion of said organic material monolayer.
A method of fabricating a patterned organic material monolayer, comprising: patterning an organic material monolayer disposed on a first substrate to yield a patterned organic material monolayer, said patterning being carried out by exposing a portion of the organic material monolayer to a localized beam of energy, said energy being sufficient to evaporate or ablate the exposed portion of the organic material monolayer.
The method of claim 21, further comprising one or more of: (i) cooling said substrate during said patterning, and (ii) placing said substrate in an environment having an elevated atmospheric pressure during said patterning, to reduce evaporation of an unexposed portion of said organic material monolayer during said patterning.
The method of claim 21, wherein said localized beam of energy is any of a laser beam, a maser beam, and an electron beam.
The method of claim 21, wherein said substrate comprises a plate.
The method of claim 21, wherein said organic material monolayer comprises a dopant, and wherein said patterning comprises forming a doped patterned organic material monolayer on said substrate.
The method of claim 21, further comprising material monolayer in accordance with a pattern.
The method of claim 21, further comprising organic material monolayer, said additional energy to form a patterned layer of graphene on said moving said localized beam over said organic supplying additional energy to said patterned being sufficient to carbonize said monolayer substrate.
Materials described outside the worked examples.
organic material monolayer
graphene
C
Additional fabrication and treatment steps described in the patent.
Patent
Atlas literature
Patent
US 9,561,964Patent drawings and their descriptions. Click a drawing to enlarge it.
Figure 1 is a schematic side view of an apparatus for forming a patterned organic material monolayer; [0
Figure 2 is a schematic side view of the apparatus for forming a patterned organic material monolayer of
Figure 3 is a schematic side view of an apparatus for forming graphene; [0
Figure 4 is a schematic side view of the apparatus for forming graphene of
Figure 5 is a schematic side view of another embodiment of an apparatus for forming a patterned organic material monolayer; [0
Figures 6 and 7 are schematic side views of the apparatus for forming a patterned organic material monolayer of
Figure 8 is a schematic side view of a portion of another embodiment of an apparatus for forming graphene; [0
Figure 9 is a schematic side view of the portion of the apparatus of
Figure 10 is a sectional side view of another embodiment of a substrate for use with the apparatus of
Figure 11 is a sectional side view of still another embodiment of a substrate for use with the apparatus of
Figure 12 is a sectional side view of still another embodiment of a substrate for use with the apparatus of
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of forming graphene, comprising: patterning an organic material monolayer disposed on a first substrate to yield a patterned organic material monolayer; and supplying thermal energy to said patterned organic material monolayer, said thermal energy being sufficient to carbonize said monolayer to form a patterned layer of graphene on said substrate, wherein said patterning is carried out by contacting the organic material monolayer with a stamp having a non-planar surface.
The method of claim 1, wherein said thermal energy is supplied by a hot plate, or by a heating element of any of a furnace, a kiln, and an oven.
The method of claim 1, further comprising disposing a second substrate onto said patterned organic material monolayer, said patterned organic material monolayer being arranged in a sandwich configuration between said first and second substrates.
The method of claim 1, wherein said organic material monolayer comprises a dopant, and wherein said supplying comprises forming a patterned layer of doped graphene on said substrate.
. canceled
The method of claim [[4]] 1, wherein said patterning is carried out by lifting-off portions of the organic material monolayer contacting said stamp.
The method of claim 5, wherein the non-planar surface is heated or cooled. Application No.: 14/641,271 Amendment Dated: Response to Office Action issued: 3
The method of claim 5, wherein the non-planar surface has one or more chemical substances disposed thereon to increase adhesion.
The method of claim [[4]] 1, wherein the non-planar surface is heated, and wherein said patterning is carried out by evaporating portions of the organic material monolayer contacting said stamp.
The method of claim [[4]] 1, wherein the non-planar surface has one or more chemical substances disposed thereon, and wherein said patterning is carried out by removing a portion of the organic material monolayer contacting said one or more chemical substances disposed on said stamp, the removing comprising at least one of: dissolving, etching, destroying, and reacting, the portion of the organic material monolayer.
A method of reducing evaporation of an organic material monolayer disposed on a substrate during carbonization thereof to form graphene, the method comprising: one or more of: (i) cooling said substrate during supplying of energy to at least a portion of the organic material monolayer; and (ii) placing said substrate in an environment having an elevated atmospheric pressure during supplying of energy to at least a portion of the organic material monolayer, to reduce evaporation of said organic material monolayer during carbonization, wherein said energy is sufficient to carbonize the at least a portion of said monolayer exposed thereto to form a layer of graphene on said substrate. Application No.: 14/641,271 Amendment Dated: Response to Office Action issued: 4
A method of forming graphene, comprising: supplying energy to at least a portion of an organic material monolayer disposed on a substrate, said energy being thermal energy supplied by a hot plate, or by a heating element of any of a furnace, a kiln, and an oven, said energy being sufficient to carbonize the at least a portion of said monolayer exposed thereto to form a layer of graphene on said substrate; and one or more of: (i) cooling said substrate during said supplying, and (ii) placing said substrate in an environment having an elevated atmospheric pressure, to reduce evaporation of said organic material monolayer during carbonization.
The method of claim 12, wherein said substrate comprises a plate.
The method of claim 12, wherein said organic material monolayer further comprises a dopant, and wherein said supplying comprises forming a layer of doped graphene on said substrate.
The method of claim 12, further comprising a combination of cooling said substrate and placing said substrate in said environment having said elevated atmospheric pressure during said supplying.
The method of claim 12, further comprising, after said supplying, removing an uncarbonized portion of said organic material monolayer.
A method of fabricating a patterned organic material monolayer, comprising: patterning an organic material monolayer disposed on a first substrate to yield a patterned organic material monolayer, said patterning being carried out by exposing a portion of the organic material monolayer to a localized beam of energy, said energy being sufficient to evaporate or ablate the exposed portion of the organic material monolayer.
The method of claim 21, further comprising one or more of: (i) cooling said substrate during said patterning, and (ii) placing said substrate in an environment having an elevated atmospheric pressure during said patterning, to reduce evaporation of an unexposed portion of said organic material monolayer during said patterning.
The method of claim 21, wherein said localized beam of energy is any of a laser beam, a maser beam, and an electron beam.
The method of claim 21, wherein said substrate comprises a plate.
The method of claim 21, wherein said organic material monolayer comprises a dopant, and wherein said patterning comprises forming a doped patterned organic material monolayer on said substrate.
The method of claim 21, further comprising material monolayer in accordance with a pattern.
The method of claim 21, further comprising organic material monolayer, said additional energy to form a patterned layer of graphene on said moving said localized beam over said organic supplying additional energy to said patterned being sufficient to carbonize said monolayer substrate.
Materials described outside the worked examples.
organic material monolayer
graphene
C
Additional fabrication and treatment steps described in the patent.
Patent
Atlas literature
Patent
US 9,561,964Patent drawings and their descriptions. Click a drawing to enlarge it.
Figure 1 is a schematic side view of an apparatus for forming a patterned organic material monolayer; [0
Figure 2 is a schematic side view of the apparatus for forming a patterned organic material monolayer of
Figure 3 is a schematic side view of an apparatus for forming graphene; [0
Figure 4 is a schematic side view of the apparatus for forming graphene of
Figure 5 is a schematic side view of another embodiment of an apparatus for forming a patterned organic material monolayer; [0
Figures 6 and 7 are schematic side views of the apparatus for forming a patterned organic material monolayer of
Figure 8 is a schematic side view of a portion of another embodiment of an apparatus for forming graphene; [0
Figure 9 is a schematic side view of the portion of the apparatus of
Figure 10 is a sectional side view of another embodiment of a substrate for use with the apparatus of
Figure 11 is a sectional side view of still another embodiment of a substrate for use with the apparatus of
Figure 12 is a sectional side view of still another embodiment of a substrate for use with the apparatus of
Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of forming graphene, comprising: patterning an organic material monolayer disposed on a first substrate to yield a patterned organic material monolayer; and supplying thermal energy to said patterned organic material monolayer, said thermal energy being sufficient to carbonize said monolayer to form a patterned layer of graphene on said substrate, wherein said patterning is carried out by contacting the organic material monolayer with a stamp having a non-planar surface.
The method of claim 1, wherein said thermal energy is supplied by a hot plate, or by a heating element of any of a furnace, a kiln, and an oven.
The method of claim 1, further comprising disposing a second substrate onto said patterned organic material monolayer, said patterned organic material monolayer being arranged in a sandwich configuration between said first and second substrates.
The method of claim 1, wherein said organic material monolayer comprises a dopant, and wherein said supplying comprises forming a patterned layer of doped graphene on said substrate.
. canceled
The method of claim [[4]] 1, wherein said patterning is carried out by lifting-off portions of the organic material monolayer contacting said stamp.
The method of claim 5, wherein the non-planar surface is heated or cooled. Application No.: 14/641,271 Amendment Dated: Response to Office Action issued: 3
The method of claim 5, wherein the non-planar surface has one or more chemical substances disposed thereon to increase adhesion.
The method of claim [[4]] 1, wherein the non-planar surface is heated, and wherein said patterning is carried out by evaporating portions of the organic material monolayer contacting said stamp.
The method of claim [[4]] 1, wherein the non-planar surface has one or more chemical substances disposed thereon, and wherein said patterning is carried out by removing a portion of the organic material monolayer contacting said one or more chemical substances disposed on said stamp, the removing comprising at least one of: dissolving, etching, destroying, and reacting, the portion of the organic material monolayer.
A method of reducing evaporation of an organic material monolayer disposed on a substrate during carbonization thereof to form graphene, the method comprising: one or more of: (i) cooling said substrate during supplying of energy to at least a portion of the organic material monolayer; and (ii) placing said substrate in an environment having an elevated atmospheric pressure during supplying of energy to at least a portion of the organic material monolayer, to reduce evaporation of said organic material monolayer during carbonization, wherein said energy is sufficient to carbonize the at least a portion of said monolayer exposed thereto to form a layer of graphene on said substrate. Application No.: 14/641,271 Amendment Dated: Response to Office Action issued: 4
A method of forming graphene, comprising: supplying energy to at least a portion of an organic material monolayer disposed on a substrate, said energy being thermal energy supplied by a hot plate, or by a heating element of any of a furnace, a kiln, and an oven, said energy being sufficient to carbonize the at least a portion of said monolayer exposed thereto to form a layer of graphene on said substrate; and one or more of: (i) cooling said substrate during said supplying, and (ii) placing said substrate in an environment having an elevated atmospheric pressure, to reduce evaporation of said organic material monolayer during carbonization.
The method of claim 12, wherein said substrate comprises a plate.
The method of claim 12, wherein said organic material monolayer further comprises a dopant, and wherein said supplying comprises forming a layer of doped graphene on said substrate.
The method of claim 12, further comprising a combination of cooling said substrate and placing said substrate in said environment having said elevated atmospheric pressure during said supplying.
The method of claim 12, further comprising, after said supplying, removing an uncarbonized portion of said organic material monolayer.
A method of fabricating a patterned organic material monolayer, comprising: patterning an organic material monolayer disposed on a first substrate to yield a patterned organic material monolayer, said patterning being carried out by exposing a portion of the organic material monolayer to a localized beam of energy, said energy being sufficient to evaporate or ablate the exposed portion of the organic material monolayer.
The method of claim 21, further comprising one or more of: (i) cooling said substrate during said patterning, and (ii) placing said substrate in an environment having an elevated atmospheric pressure during said patterning, to reduce evaporation of an unexposed portion of said organic material monolayer during said patterning.
The method of claim 21, wherein said localized beam of energy is any of a laser beam, a maser beam, and an electron beam.
The method of claim 21, wherein said substrate comprises a plate.
The method of claim 21, wherein said organic material monolayer comprises a dopant, and wherein said patterning comprises forming a doped patterned organic material monolayer on said substrate.
The method of claim 21, further comprising material monolayer in accordance with a pattern.
The method of claim 21, further comprising organic material monolayer, said additional energy to form a patterned layer of graphene on said moving said localized beam over said organic supplying additional energy to said patterned being sufficient to carbonize said monolayer substrate.
Materials described outside the worked examples.
organic material monolayer
graphene
C
Additional fabrication and treatment steps described in the patent.
doped graphene
doped graphene
doped graphene
doped graphene