Patent
US 10,351,711ENGINEERED COMPOSITE STRUCTURE USING GRAPHENE OXIDE
CHRISTIANSEN, Sean, RESTREPO, David, O'DONNELL, Dan, McINNIS, Matthew et al.
29 September 2016·US
Copyright © 2026 Matter42. All rights reserved.
Patent
Atlas literature
Patent
US 10,351,711Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of making one or more composite structures using flakes of graphene, graphene oxide and/or reduced graphene oxide; comprising: obtaining substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes that are not distorted through the graphene/graphite flake production process, with a surface area to thickness ratio of [[about]] a minimum of 200 Angstroms; thermally functionalizing the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes to be compatible a with chemical binding, hydrophobicity, and/or polarity of a host material, to be directly incorporated in the long and short range ordering or bonding of the host material; and entraining the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes in the host material. Currently amended
The method of claim 1, wherein 95 % of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes have surface area to thickness ratios of more than 200 Angstroms. Original
The method of claim 1, wherein a thickness of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes is 16 nanometers or less. Original
The method of claim 1, wherein 95 % of a thicknesses of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes is about 0.8 to 16 nanometers, and the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes have a surface area to thickness ratios greater than 48400 to 1 Angstroms. Original
The method of claim 1, wherein the maximum dimension of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes varies between 220 Angstroms and 100 microns. Original
The method of claim 1, further comprising mixing the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes with an additional powder or multiple powders to achieve [[have]] uniform distribution, dispersion and/or entrainment of graphene/graphite oxide flake within the host material,,, and reacting, casting or otherwise causing the powders to become ordered, by thermal, chemical, electrical or other processes that [[to]] induce order or bonding to occur between the powders. Currently amended
The method of claim 1, wherein the one or more composite structures are created by forming localized regions of a higher concentration of graphene, graphene oxide and/or reduced graphene oxide in the host material, not to exceed 10% loading by weight. Currently amended
The method of claim 1, wherein the host material is selected from ordinary Portland cement, polypropylene (PP), polyethylene (PE), Polycarbonate (PC), ceramic powders, ceramic powder is aluminum oxide, zirconium oxide, silica, silicon dioxide, or combination thereof, metal powders, metal powders of titanium, titanium hydride, tantalum, cobalt chrome, niobium, stainless steel, nickel, copper, aluminum, or combinations thereof, a polycrystalline material, polyvinylidene fluoride (PVF), or polyvinylidene difluoride (PVDF), polyurethane, poly(butyleneterephthalate), nylon 11, poly(et h yleneterephthalate), poly(ether ether ketone), poly(phenylene sulfide), polyolefin, an oxide, carbonate or silicate of an element of Groups 2a, 3a, 4a and 4b of the Periodic Table, poly(vinyl chloride) (PVC), poly(methylmethacrylate), polystyrene, polycarbonate/nylon alloy, polycarbonate/polyester alloy, ABS, ABS/nylon alloy, ABS/PVC alloy, acrylic copolymers, polysulfone, polysulfone/ABS alloy, polyetherimides, polyamide-imides, polyarylates, fluoropolymers, polyphenylene oxide/polystyrene blend, or poly(phenylene sulfide). Original
The method of claim 1, wherein the step of functionalizing is defined further as adding a chemical group selected from at least one of alkyl, alkenyl, alkynyl, phenyl, halo, hydroxyl, carbonyl, aldehyde, carbonate, carboxylate, carboxyl, ester, methoxy, hydroperoxy, ether, hemiacetal or hemiketal, acetal, ketal, orthoester, amide, amine, imine, imide, azide, azo, cyanate, nitrile, nitrite, nitro, nitroso, oxime, pyridine, thiol, sulfide, disulfide, sulfoxide, sulfone, sulfinic, thiocyanate, phosphine, phosphonic, phosphate, and/or bonoric. Original
Canceled
Canceled
A method of making a composite structure using flakes of graphene, graphene oxide and/or reduced graphene oxide; comprising: obtaining substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes that are not distorted through the graphene/graphite flake production process, with a surface area to thickness ratio of [[about]] a minimum of 200 Angstroms; thermally functionalizing the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes to be compatible a with chemical binding, hydrophobicity, and/or polarity of a host material, to be directly incorporated in the long and short range ordering or bonding of the host material; entraining the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes in the host material; and forming a composite material with the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes in the host material. Currently amended
The method of claim 13, wherein 95 % of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes have surface area to thickness ratios of more than 200 Angstroms. Original
The method of claim 13, wherein a thickness of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes is 16 nanometers or less. Original
The method of claim 13, wherein 95 % of a thicknesses of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes is about 0.8 to 16 nanometers, and the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes have a surface area to thickness ratios greater than 48400 to 1 Angstroms. Original
The method of claim 13, wherein the maximum dimension of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes varies between 220 Angstroms and 100 microns. Original
The method of claim 13, further comprising mixing the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes with an additional powder or multiple powders to achieve [[have]] uniform distribution, dispersion and/or entrainment of graphene/graphite oxide flake with in the host material, and reacting, casting or otherwise causing the powders to become ordered, by thermal, chemical, electrical or other processes that t e induce order or bonding to occur between the powders. Currently amended
The method of claim 13, wherein the composite material comprises localized regions of a higher concentration of graphene oxide and/or reduced graphene oxide in the host material, not to exceed 10% loading by weight. Currently amended
The method of claim 13, wherein the host material is selected from ordinary Portland cement, polypropylene (PP), polyethylene (PE), Polycarbonate (PC), ceramic powders, ceramic powder is aluminum oxide, zirconium oxide, silica, silicon dioxide, or combination thereof, metal powders, metal powders of titanium, titanium hydride, tantalum, cobalt chrome, niobium, stainless steel, nickel, copper, aluminum, or combinations thereof, a polycrystalline material, polyvinylidene fluoride (PVF), or polyvinylidene difluoride (PVDF), polyurethane, poly(butyleneterephthalate), nylon 11, poly(et h yleneterephthalate), poly(ether ether ketone), poly(phenylene sulfide), polyolefin, an oxide, carbonate or silicate of an element of Groups 2a, 3a, 4a and 4b of the Periodic Table, poly(vinyl chloride) (PVC), poly(methylmethacrylate), polystyrene, polycarbonate/nylon alloy, polycarbonate/polyester alloy, ABS, ABS/nylon alloy, ABS/PVC alloy, acrylic copolymers, polysulfone, polysulfone/ABS alloy, polyetherimides, polyamide-imides, polyarylates, fluoropolymers, polyphenylene oxide/polystyrene blend, or poly(phenylene sulfide). Original
The method of claim 13, wherein the step of functionalizing is defined further as adding a chemical groups selected from at least one of alkyl, alkenyl, alkynyl, phenyl, halo, hydroxyl, carbonyl, aldehyde, carbonate, carboxylate, carboxyl, ester, methoxy, hydroperoxy, ether, hemiacetal or hemiketal, acetal, ketal, orthoester, amide, amine, imine, imide, azide, azo, cyanate, nitrile, nitrite, nitro, nitroso, oxime, pyridine, thiol, sulfide, disulfide, sulfoxide, sulfone, sulfinic, thiocyanate, phosphine, phosphonic, phosphate, and/or boronic. Currently amended
Canceled
Layer stacks claimed or described, ordered top of device to substrate.
engineered composite structure
Materials described outside the worked examples.
graphene
graphene oxide
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Thickness | 22–100000 nm | — |
Thickness | 0.8–16 nm |
Patent
Atlas literature
Patent
US 10,351,711Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of making one or more composite structures using flakes of graphene, graphene oxide and/or reduced graphene oxide; comprising: obtaining substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes that are not distorted through the graphene/graphite flake production process, with a surface area to thickness ratio of [[about]] a minimum of 200 Angstroms; thermally functionalizing the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes to be compatible a with chemical binding, hydrophobicity, and/or polarity of a host material, to be directly incorporated in the long and short range ordering or bonding of the host material; and entraining the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes in the host material. Currently amended
The method of claim 1, wherein 95 % of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes have surface area to thickness ratios of more than 200 Angstroms. Original
The method of claim 1, wherein a thickness of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes is 16 nanometers or less. Original
The method of claim 1, wherein 95 % of a thicknesses of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes is about 0.8 to 16 nanometers, and the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes have a surface area to thickness ratios greater than 48400 to 1 Angstroms. Original
The method of claim 1, wherein the maximum dimension of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes varies between 220 Angstroms and 100 microns. Original
The method of claim 1, further comprising mixing the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes with an additional powder or multiple powders to achieve [[have]] uniform distribution, dispersion and/or entrainment of graphene/graphite oxide flake within the host material,,, and reacting, casting or otherwise causing the powders to become ordered, by thermal, chemical, electrical or other processes that [[to]] induce order or bonding to occur between the powders. Currently amended
The method of claim 1, wherein the one or more composite structures are created by forming localized regions of a higher concentration of graphene, graphene oxide and/or reduced graphene oxide in the host material, not to exceed 10% loading by weight. Currently amended
The method of claim 1, wherein the host material is selected from ordinary Portland cement, polypropylene (PP), polyethylene (PE), Polycarbonate (PC), ceramic powders, ceramic powder is aluminum oxide, zirconium oxide, silica, silicon dioxide, or combination thereof, metal powders, metal powders of titanium, titanium hydride, tantalum, cobalt chrome, niobium, stainless steel, nickel, copper, aluminum, or combinations thereof, a polycrystalline material, polyvinylidene fluoride (PVF), or polyvinylidene difluoride (PVDF), polyurethane, poly(butyleneterephthalate), nylon 11, poly(et h yleneterephthalate), poly(ether ether ketone), poly(phenylene sulfide), polyolefin, an oxide, carbonate or silicate of an element of Groups 2a, 3a, 4a and 4b of the Periodic Table, poly(vinyl chloride) (PVC), poly(methylmethacrylate), polystyrene, polycarbonate/nylon alloy, polycarbonate/polyester alloy, ABS, ABS/nylon alloy, ABS/PVC alloy, acrylic copolymers, polysulfone, polysulfone/ABS alloy, polyetherimides, polyamide-imides, polyarylates, fluoropolymers, polyphenylene oxide/polystyrene blend, or poly(phenylene sulfide). Original
The method of claim 1, wherein the step of functionalizing is defined further as adding a chemical group selected from at least one of alkyl, alkenyl, alkynyl, phenyl, halo, hydroxyl, carbonyl, aldehyde, carbonate, carboxylate, carboxyl, ester, methoxy, hydroperoxy, ether, hemiacetal or hemiketal, acetal, ketal, orthoester, amide, amine, imine, imide, azide, azo, cyanate, nitrile, nitrite, nitro, nitroso, oxime, pyridine, thiol, sulfide, disulfide, sulfoxide, sulfone, sulfinic, thiocyanate, phosphine, phosphonic, phosphate, and/or bonoric. Original
Canceled
Canceled
A method of making a composite structure using flakes of graphene, graphene oxide and/or reduced graphene oxide; comprising: obtaining substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes that are not distorted through the graphene/graphite flake production process, with a surface area to thickness ratio of [[about]] a minimum of 200 Angstroms; thermally functionalizing the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes to be compatible a with chemical binding, hydrophobicity, and/or polarity of a host material, to be directly incorporated in the long and short range ordering or bonding of the host material; entraining the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes in the host material; and forming a composite material with the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes in the host material. Currently amended
The method of claim 13, wherein 95 % of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes have surface area to thickness ratios of more than 200 Angstroms. Original
The method of claim 13, wherein a thickness of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes is 16 nanometers or less. Original
The method of claim 13, wherein 95 % of a thicknesses of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes is about 0.8 to 16 nanometers, and the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes have a surface area to thickness ratios greater than 48400 to 1 Angstroms. Original
The method of claim 13, wherein the maximum dimension of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes varies between 220 Angstroms and 100 microns. Original
The method of claim 13, further comprising mixing the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes with an additional powder or multiple powders to achieve [[have]] uniform distribution, dispersion and/or entrainment of graphene/graphite oxide flake with in the host material, and reacting, casting or otherwise causing the powders to become ordered, by thermal, chemical, electrical or other processes that t e induce order or bonding to occur between the powders. Currently amended
The method of claim 13, wherein the composite material comprises localized regions of a higher concentration of graphene oxide and/or reduced graphene oxide in the host material, not to exceed 10% loading by weight. Currently amended
The method of claim 13, wherein the host material is selected from ordinary Portland cement, polypropylene (PP), polyethylene (PE), Polycarbonate (PC), ceramic powders, ceramic powder is aluminum oxide, zirconium oxide, silica, silicon dioxide, or combination thereof, metal powders, metal powders of titanium, titanium hydride, tantalum, cobalt chrome, niobium, stainless steel, nickel, copper, aluminum, or combinations thereof, a polycrystalline material, polyvinylidene fluoride (PVF), or polyvinylidene difluoride (PVDF), polyurethane, poly(butyleneterephthalate), nylon 11, poly(et h yleneterephthalate), poly(ether ether ketone), poly(phenylene sulfide), polyolefin, an oxide, carbonate or silicate of an element of Groups 2a, 3a, 4a and 4b of the Periodic Table, poly(vinyl chloride) (PVC), poly(methylmethacrylate), polystyrene, polycarbonate/nylon alloy, polycarbonate/polyester alloy, ABS, ABS/nylon alloy, ABS/PVC alloy, acrylic copolymers, polysulfone, polysulfone/ABS alloy, polyetherimides, polyamide-imides, polyarylates, fluoropolymers, polyphenylene oxide/polystyrene blend, or poly(phenylene sulfide). Original
The method of claim 13, wherein the step of functionalizing is defined further as adding a chemical groups selected from at least one of alkyl, alkenyl, alkynyl, phenyl, halo, hydroxyl, carbonyl, aldehyde, carbonate, carboxylate, carboxyl, ester, methoxy, hydroperoxy, ether, hemiacetal or hemiketal, acetal, ketal, orthoester, amide, amine, imine, imide, azide, azo, cyanate, nitrile, nitrite, nitro, nitroso, oxime, pyridine, thiol, sulfide, disulfide, sulfoxide, sulfone, sulfinic, thiocyanate, phosphine, phosphonic, phosphate, and/or boronic. Currently amended
Canceled
Layer stacks claimed or described, ordered top of device to substrate.
engineered composite structure
Materials described outside the worked examples.
graphene
graphene oxide
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Thickness | 22–100000 nm | — |
Thickness | 0.8–16 nm |
Patent
Atlas literature
Patent
US 10,351,711Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of making one or more composite structures using flakes of graphene, graphene oxide and/or reduced graphene oxide; comprising: obtaining substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes that are not distorted through the graphene/graphite flake production process, with a surface area to thickness ratio of [[about]] a minimum of 200 Angstroms; thermally functionalizing the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes to be compatible a with chemical binding, hydrophobicity, and/or polarity of a host material, to be directly incorporated in the long and short range ordering or bonding of the host material; and entraining the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes in the host material. Currently amended
The method of claim 1, wherein 95 % of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes have surface area to thickness ratios of more than 200 Angstroms. Original
The method of claim 1, wherein a thickness of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes is 16 nanometers or less. Original
The method of claim 1, wherein 95 % of a thicknesses of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes is about 0.8 to 16 nanometers, and the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes have a surface area to thickness ratios greater than 48400 to 1 Angstroms. Original
The method of claim 1, wherein the maximum dimension of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes varies between 220 Angstroms and 100 microns. Original
The method of claim 1, further comprising mixing the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes with an additional powder or multiple powders to achieve [[have]] uniform distribution, dispersion and/or entrainment of graphene/graphite oxide flake within the host material,,, and reacting, casting or otherwise causing the powders to become ordered, by thermal, chemical, electrical or other processes that [[to]] induce order or bonding to occur between the powders. Currently amended
The method of claim 1, wherein the one or more composite structures are created by forming localized regions of a higher concentration of graphene, graphene oxide and/or reduced graphene oxide in the host material, not to exceed 10% loading by weight. Currently amended
The method of claim 1, wherein the host material is selected from ordinary Portland cement, polypropylene (PP), polyethylene (PE), Polycarbonate (PC), ceramic powders, ceramic powder is aluminum oxide, zirconium oxide, silica, silicon dioxide, or combination thereof, metal powders, metal powders of titanium, titanium hydride, tantalum, cobalt chrome, niobium, stainless steel, nickel, copper, aluminum, or combinations thereof, a polycrystalline material, polyvinylidene fluoride (PVF), or polyvinylidene difluoride (PVDF), polyurethane, poly(butyleneterephthalate), nylon 11, poly(et h yleneterephthalate), poly(ether ether ketone), poly(phenylene sulfide), polyolefin, an oxide, carbonate or silicate of an element of Groups 2a, 3a, 4a and 4b of the Periodic Table, poly(vinyl chloride) (PVC), poly(methylmethacrylate), polystyrene, polycarbonate/nylon alloy, polycarbonate/polyester alloy, ABS, ABS/nylon alloy, ABS/PVC alloy, acrylic copolymers, polysulfone, polysulfone/ABS alloy, polyetherimides, polyamide-imides, polyarylates, fluoropolymers, polyphenylene oxide/polystyrene blend, or poly(phenylene sulfide). Original
The method of claim 1, wherein the step of functionalizing is defined further as adding a chemical group selected from at least one of alkyl, alkenyl, alkynyl, phenyl, halo, hydroxyl, carbonyl, aldehyde, carbonate, carboxylate, carboxyl, ester, methoxy, hydroperoxy, ether, hemiacetal or hemiketal, acetal, ketal, orthoester, amide, amine, imine, imide, azide, azo, cyanate, nitrile, nitrite, nitro, nitroso, oxime, pyridine, thiol, sulfide, disulfide, sulfoxide, sulfone, sulfinic, thiocyanate, phosphine, phosphonic, phosphate, and/or bonoric. Original
Canceled
Canceled
A method of making a composite structure using flakes of graphene, graphene oxide and/or reduced graphene oxide; comprising: obtaining substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes that are not distorted through the graphene/graphite flake production process, with a surface area to thickness ratio of [[about]] a minimum of 200 Angstroms; thermally functionalizing the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes to be compatible a with chemical binding, hydrophobicity, and/or polarity of a host material, to be directly incorporated in the long and short range ordering or bonding of the host material; entraining the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes in the host material; and forming a composite material with the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes in the host material. Currently amended
The method of claim 13, wherein 95 % of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes have surface area to thickness ratios of more than 200 Angstroms. Original
The method of claim 13, wherein a thickness of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes is 16 nanometers or less. Original
The method of claim 13, wherein 95 % of a thicknesses of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes is about 0.8 to 16 nanometers, and the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes have a surface area to thickness ratios greater than 48400 to 1 Angstroms. Original
The method of claim 13, wherein the maximum dimension of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes varies between 220 Angstroms and 100 microns. Original
The method of claim 13, further comprising mixing the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes with an additional powder or multiple powders to achieve [[have]] uniform distribution, dispersion and/or entrainment of graphene/graphite oxide flake with in the host material, and reacting, casting or otherwise causing the powders to become ordered, by thermal, chemical, electrical or other processes that t e induce order or bonding to occur between the powders. Currently amended
The method of claim 13, wherein the composite material comprises localized regions of a higher concentration of graphene oxide and/or reduced graphene oxide in the host material, not to exceed 10% loading by weight. Currently amended
The method of claim 13, wherein the host material is selected from ordinary Portland cement, polypropylene (PP), polyethylene (PE), Polycarbonate (PC), ceramic powders, ceramic powder is aluminum oxide, zirconium oxide, silica, silicon dioxide, or combination thereof, metal powders, metal powders of titanium, titanium hydride, tantalum, cobalt chrome, niobium, stainless steel, nickel, copper, aluminum, or combinations thereof, a polycrystalline material, polyvinylidene fluoride (PVF), or polyvinylidene difluoride (PVDF), polyurethane, poly(butyleneterephthalate), nylon 11, poly(et h yleneterephthalate), poly(ether ether ketone), poly(phenylene sulfide), polyolefin, an oxide, carbonate or silicate of an element of Groups 2a, 3a, 4a and 4b of the Periodic Table, poly(vinyl chloride) (PVC), poly(methylmethacrylate), polystyrene, polycarbonate/nylon alloy, polycarbonate/polyester alloy, ABS, ABS/nylon alloy, ABS/PVC alloy, acrylic copolymers, polysulfone, polysulfone/ABS alloy, polyetherimides, polyamide-imides, polyarylates, fluoropolymers, polyphenylene oxide/polystyrene blend, or poly(phenylene sulfide). Original
The method of claim 13, wherein the step of functionalizing is defined further as adding a chemical groups selected from at least one of alkyl, alkenyl, alkynyl, phenyl, halo, hydroxyl, carbonyl, aldehyde, carbonate, carboxylate, carboxyl, ester, methoxy, hydroperoxy, ether, hemiacetal or hemiketal, acetal, ketal, orthoester, amide, amine, imine, imide, azide, azo, cyanate, nitrile, nitrite, nitro, nitroso, oxime, pyridine, thiol, sulfide, disulfide, sulfoxide, sulfone, sulfinic, thiocyanate, phosphine, phosphonic, phosphate, and/or boronic. Currently amended
Canceled
Layer stacks claimed or described, ordered top of device to substrate.
engineered composite structure
Materials described outside the worked examples.
graphene
graphene oxide
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Thickness | 22–100000 nm | — |
Thickness | 0.8–16 nm |
Patent
Atlas literature
Patent
US 10,351,711Claims define the patent's legal scope. Independent claims stand alone; dependent claims (nested) narrow them. Click a claim to expand its dependents.
A method of making one or more composite structures using flakes of graphene, graphene oxide and/or reduced graphene oxide; comprising: obtaining substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes that are not distorted through the graphene/graphite flake production process, with a surface area to thickness ratio of [[about]] a minimum of 200 Angstroms; thermally functionalizing the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes to be compatible a with chemical binding, hydrophobicity, and/or polarity of a host material, to be directly incorporated in the long and short range ordering or bonding of the host material; and entraining the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes in the host material. Currently amended
The method of claim 1, wherein 95 % of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes have surface area to thickness ratios of more than 200 Angstroms. Original
The method of claim 1, wherein a thickness of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes is 16 nanometers or less. Original
The method of claim 1, wherein 95 % of a thicknesses of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes is about 0.8 to 16 nanometers, and the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes have a surface area to thickness ratios greater than 48400 to 1 Angstroms. Original
The method of claim 1, wherein the maximum dimension of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes varies between 220 Angstroms and 100 microns. Original
The method of claim 1, further comprising mixing the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes with an additional powder or multiple powders to achieve [[have]] uniform distribution, dispersion and/or entrainment of graphene/graphite oxide flake within the host material,,, and reacting, casting or otherwise causing the powders to become ordered, by thermal, chemical, electrical or other processes that [[to]] induce order or bonding to occur between the powders. Currently amended
The method of claim 1, wherein the one or more composite structures are created by forming localized regions of a higher concentration of graphene, graphene oxide and/or reduced graphene oxide in the host material, not to exceed 10% loading by weight. Currently amended
The method of claim 1, wherein the host material is selected from ordinary Portland cement, polypropylene (PP), polyethylene (PE), Polycarbonate (PC), ceramic powders, ceramic powder is aluminum oxide, zirconium oxide, silica, silicon dioxide, or combination thereof, metal powders, metal powders of titanium, titanium hydride, tantalum, cobalt chrome, niobium, stainless steel, nickel, copper, aluminum, or combinations thereof, a polycrystalline material, polyvinylidene fluoride (PVF), or polyvinylidene difluoride (PVDF), polyurethane, poly(butyleneterephthalate), nylon 11, poly(et h yleneterephthalate), poly(ether ether ketone), poly(phenylene sulfide), polyolefin, an oxide, carbonate or silicate of an element of Groups 2a, 3a, 4a and 4b of the Periodic Table, poly(vinyl chloride) (PVC), poly(methylmethacrylate), polystyrene, polycarbonate/nylon alloy, polycarbonate/polyester alloy, ABS, ABS/nylon alloy, ABS/PVC alloy, acrylic copolymers, polysulfone, polysulfone/ABS alloy, polyetherimides, polyamide-imides, polyarylates, fluoropolymers, polyphenylene oxide/polystyrene blend, or poly(phenylene sulfide). Original
The method of claim 1, wherein the step of functionalizing is defined further as adding a chemical group selected from at least one of alkyl, alkenyl, alkynyl, phenyl, halo, hydroxyl, carbonyl, aldehyde, carbonate, carboxylate, carboxyl, ester, methoxy, hydroperoxy, ether, hemiacetal or hemiketal, acetal, ketal, orthoester, amide, amine, imine, imide, azide, azo, cyanate, nitrile, nitrite, nitro, nitroso, oxime, pyridine, thiol, sulfide, disulfide, sulfoxide, sulfone, sulfinic, thiocyanate, phosphine, phosphonic, phosphate, and/or bonoric. Original
Canceled
Canceled
A method of making a composite structure using flakes of graphene, graphene oxide and/or reduced graphene oxide; comprising: obtaining substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes that are not distorted through the graphene/graphite flake production process, with a surface area to thickness ratio of [[about]] a minimum of 200 Angstroms; thermally functionalizing the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes to be compatible a with chemical binding, hydrophobicity, and/or polarity of a host material, to be directly incorporated in the long and short range ordering or bonding of the host material; entraining the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes in the host material; and forming a composite material with the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes in the host material. Currently amended
The method of claim 13, wherein 95 % of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes have surface area to thickness ratios of more than 200 Angstroms. Original
The method of claim 13, wherein a thickness of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes is 16 nanometers or less. Original
The method of claim 13, wherein 95 % of a thicknesses of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes is about 0.8 to 16 nanometers, and the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes have a surface area to thickness ratios greater than 48400 to 1 Angstroms. Original
The method of claim 13, wherein the maximum dimension of the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes varies between 220 Angstroms and 100 microns. Original
The method of claim 13, further comprising mixing the substantially flat graphene, graphene oxide and/or reduced graphene oxide flakes with an additional powder or multiple powders to achieve [[have]] uniform distribution, dispersion and/or entrainment of graphene/graphite oxide flake with in the host material, and reacting, casting or otherwise causing the powders to become ordered, by thermal, chemical, electrical or other processes that t e induce order or bonding to occur between the powders. Currently amended
The method of claim 13, wherein the composite material comprises localized regions of a higher concentration of graphene oxide and/or reduced graphene oxide in the host material, not to exceed 10% loading by weight. Currently amended
The method of claim 13, wherein the host material is selected from ordinary Portland cement, polypropylene (PP), polyethylene (PE), Polycarbonate (PC), ceramic powders, ceramic powder is aluminum oxide, zirconium oxide, silica, silicon dioxide, or combination thereof, metal powders, metal powders of titanium, titanium hydride, tantalum, cobalt chrome, niobium, stainless steel, nickel, copper, aluminum, or combinations thereof, a polycrystalline material, polyvinylidene fluoride (PVF), or polyvinylidene difluoride (PVDF), polyurethane, poly(butyleneterephthalate), nylon 11, poly(et h yleneterephthalate), poly(ether ether ketone), poly(phenylene sulfide), polyolefin, an oxide, carbonate or silicate of an element of Groups 2a, 3a, 4a and 4b of the Periodic Table, poly(vinyl chloride) (PVC), poly(methylmethacrylate), polystyrene, polycarbonate/nylon alloy, polycarbonate/polyester alloy, ABS, ABS/nylon alloy, ABS/PVC alloy, acrylic copolymers, polysulfone, polysulfone/ABS alloy, polyetherimides, polyamide-imides, polyarylates, fluoropolymers, polyphenylene oxide/polystyrene blend, or poly(phenylene sulfide). Original
The method of claim 13, wherein the step of functionalizing is defined further as adding a chemical groups selected from at least one of alkyl, alkenyl, alkynyl, phenyl, halo, hydroxyl, carbonyl, aldehyde, carbonate, carboxylate, carboxyl, ester, methoxy, hydroperoxy, ether, hemiacetal or hemiketal, acetal, ketal, orthoester, amide, amine, imine, imide, azide, azo, cyanate, nitrile, nitrite, nitro, nitroso, oxime, pyridine, thiol, sulfide, disulfide, sulfoxide, sulfone, sulfinic, thiocyanate, phosphine, phosphonic, phosphate, and/or boronic. Currently amended
Canceled
Layer stacks claimed or described, ordered top of device to substrate.
engineered composite structure
Materials described outside the worked examples.
graphene
graphene oxide
Additional fabrication and treatment steps described in the patent.
Performance values and ranges asserted in the specification or claims.
| Property | Value | Material |
|---|---|---|
Thickness | 22–100000 nm | — |
Thickness | 0.8–16 nm |
reduced graphene oxide
host material
| — |
Thickness | ≥ 200 Å | — |
reduced graphene oxide
host material
| — |
Thickness | ≥ 200 Å | — |
reduced graphene oxide
host material
| — |
Thickness | ≥ 200 Å | — |
reduced graphene oxide
host material
| — |
Thickness | ≥ 200 Å | — |